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41. 发明授权

US06850854B2 Semiconductor production system 失效
标题翻译：半导体生产系统
公开(公告)号：US06850854B2
公开(公告)日：2005-02-01
申请号：US10444981
申请日：2003-05-27
申请人： Hidemitsu Naya , Rikio Tomiyoshi , Shigeo Moriyama , Mutsumi Kikuchi , Kotaro Shimamura
发明人： Hidemitsu Naya , Rikio Tomiyoshi , Shigeo Moriyama , Mutsumi Kikuchi , Kotaro Shimamura
IPC分类号： G01R31/26 , G01R31/28 , G03F7/20 , H01L21/00 , H01L21/02 , H01L21/027 , H01L21/66 , G06F19/00
CPC分类号： H01L21/67225 , G03F7/70508 , G03F7/70991 , G05B19/418 , G05B19/41855 , G05B2219/31323 , G05B2219/31326 , G05B2219/45031 , H01L21/67276 , H04L67/1097 , Y02P90/185 , Y02P90/24 , Y02P90/265
摘要： A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.
摘要翻译：半导体制造系统具有具有曝光单元的半导体制造装置，用于控制曝光单元的控制单元和存储装置; 具有观察单元的半导体检查装置，用于控制观察单元的控制单元和存储装置; 以及半导体制造装置和半导体检查装置通常使用的存储装置。制造装置，检查装置和常用的存储装置经由存储区域网互连。随着半导体制造装置和存储装置经由存储区域网络连接在一起，可以高速地传送大量图像数据或设计数据，从而提高系统吞吐量。

42. 发明授权

US06336842B1 Rotary machining apparatus 有权
标题翻译：旋转加工机
公开(公告)号：US06336842B1
公开(公告)日：2002-01-08
申请号：US09574285
申请日：2000-05-19
申请人： Shigeo Ootsuki , Shigeo Moriyama , Takashi Kugaya , Kenichi Togawa , Makoto Kajiwara , Shyuichi Oowada , Yukio Suzuki , Yoko Sugawa
发明人： Shigeo Ootsuki , Shigeo Moriyama , Takashi Kugaya , Kenichi Togawa , Makoto Kajiwara , Shyuichi Oowada , Yukio Suzuki , Yoko Sugawa
IPC分类号： B24B4900
CPC分类号： B24B53/017 , B24B49/16
摘要： An object of the present invention is to provide a polishing apparatus which is capable of configuring a surface of a polishing tool without damaging the polishing tool. In order to solve the above-mentioned problem, the present invention provide a rotary machining apparatus comprising a polishing tool for polishing a sample; a rotary disk for holding the polishing tool; a tool for configuring a surface of the polishing tool; and a position adjusting mechanism for adjusting a gap between the tool and the polishing tool, which comprises a rotating mechanism for rotating the tool; and a sensor for sensing a change in the rotation of the rotating mechanism, a height at starting to configure the polishing tool using the tool being determined based on the change in the rotation obtained by the sensor.
摘要翻译：本发明的目的是提供一种能够构造抛光工具的表面而不损坏抛光工具的抛光装置。为了解决上述问题，本发明提供了一种旋转加工装置，其包括抛光用于抛光样品的工具; 用于保持抛光工具的旋转盘; 用于配置抛光工具的表面的工具; 以及位置调节机构，用于调整所述工具和所述研磨工具之间的间隙，所述间隙包括用于旋转所述工具的旋转机构; 以及用于感测旋转机构的旋转变化的传感器，基于由传感器获得的旋转变化确定的，使用该工具来开始构造抛光工具的高度。

43. 发明授权

US6077027A Semiconductor manufacturing apparatus for transferring articles with a bearing-less joint and method for manufacturing semiconductor device 有权
标题翻译：具有无轴承接头的物品的半导体制造装置及半导体装置的制造方法
公开(公告)号：US6077027A
公开(公告)日：2000-06-20
申请号：US289677
申请日：1999-04-12
申请人： Yoshio Kawamura , Hideo Kashima , Shigeo Moriyama
发明人： Yoshio Kawamura , Hideo Kashima , Shigeo Moriyama
IPC分类号： B65G49/07 , H01L21/677 , B25J17/00
CPC分类号： H01L21/67742 , Y10S414/139 , Y10T74/20329
摘要： In order to manufacture a semiconductor device of high performance a small-sized transfer arm mechanism, capable of retaining a predetermined transfer stroke, is put to practical use without any increase in the height of the arm mechanism. The transfer arm includes arcuate portions having center axes different from each other, and restraint generating means for generating restraints in directions where the individual center axes are attracted. This way, a plurality of arms are joined by joints having a structure for transmitting rolling motions to the arcuate portions contacting each other to thereby control the drive shaft of the arcuate portions rotationally and thereby move the arms. This transfer arm mechanism is used in various environments including semiconductor manufacturing, such as DRAMs.
摘要翻译：为了制造高性能的半导体装置，能够保持预定的传送冲程的小型传送臂机构被实际使用，而不会增加臂机构的高度。传送臂包括具有彼此不同的中心轴的弓形部分，以及用于在各个中心轴被吸引的方向上产生约束的约束产生装置。这样，多个臂通过具有用于将滚动运动传递到彼此接触的弓形部分的结构的接头连接，从而旋转地控制弓形部分的驱动轴，从而移动臂。该转移臂机构用于包括半导体制造在内的各种环境，例如DRAM。

44. 发明授权

US6043155A Polishing agent and polishing method 失效
公开(公告)号：US6043155A
公开(公告)日：2000-03-28
申请号：US33690
申请日：1998-03-03
申请人： Yoshio Homma , Kikuo Kusukawa , Shigeo Moriyama , Masayuki Nagasawa
发明人： Yoshio Homma , Kikuo Kusukawa , Shigeo Moriyama , Masayuki Nagasawa
IPC分类号： C09G1/02 , C09K3/14 , H01L21/3105
CPC分类号： H01L21/31053 , C09G1/02 , C09K3/1463
摘要： In order to polish an insulating film, a cerium oxide polishing agent (ceria slurry) is used. The ceria slurry is composed of cerium oxide powder containing Na, Ca, Fe, and Cr concentration of which is less than 10 ppm. Fragile inorganic and organic insulating films formed at relatively low temperatures can be polished without degrading the characteristics of the semiconductor element due to Na diffusion.

45. 发明授权

US5971701A Semiconductor manufacturing apparatus for transferring articles with a bearing-less joint and method for manufacturing semiconductor device 失效
标题翻译：具有无轴承接头的物品的半导体制造装置及半导体装置的制造方法
公开(公告)号：US5971701A
公开(公告)日：1999-10-26
申请号：US795858
申请日：1997-02-06
申请人： Yoshio Kawamura , Hideo Kashima , Shigeo Moriyama
发明人： Yoshio Kawamura , Hideo Kashima , Shigeo Moriyama
IPC分类号： B65G49/07 , H01L21/677 , B65G65/00
CPC分类号： H01L21/67742 , Y10S414/139 , Y10T74/20329
摘要： In order to manufacture a semiconductor device of high performance a small-sized transfer arm mechanism, capable of retaining a predetermined transfer stroke, is put to practical use without any increase in the height of the arm mechanism. The transfer arm includes arcuate portions having center axes different from each other, and restraint generating means for generating restraints in directions where the individual center axes are attracted. This way, a plurality of arms are joined by joints having a structure for transmitting rolling motions to the arcuate portions contacting each other to thereby control the drive shaft of the arcuate portions rotationally and thereby move the arms. This transfer arm mechanism is used in various environments including semiconductor manufacturing, such as DRAMs (dynamic random access memory).
摘要翻译：为了制造高性能的半导体装置，能够保持预定的传送冲程的小型传送臂机构被实际使用，而不会增加臂机构的高度。传送臂包括具有彼此不同的中心轴的弓形部分，以及用于在各个中心轴被吸引的方向上产生约束的约束产生装置。这样，多个臂通过具有用于将滚动运动传递到彼此接触的弓形部分的结构的接头连接，从而旋转地控制弓形部分的驱动轴，从而移动臂。该转移臂机构用于包括半导体制造在内的各种环境，例如DRAM（动态随机存取存储器）。

46. 发明授权

US5658115A Transfer apparatus 失效
标题翻译：转运设备
公开(公告)号：US5658115A
公开(公告)日：1997-08-19
申请号：US521957
申请日：1995-08-31
申请人： Takashi Yamazaki , Hiroyuki Sakai , Hiroshi Sugano , Shigeo Moriyama
发明人： Takashi Yamazaki , Hiroyuki Sakai , Hiroshi Sugano , Shigeo Moriyama
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677 , B65H5/08
CPC分类号： H01L21/67748 , H01L21/67069 , Y10S414/135
摘要： A transfer apparatus is to be used for a wafer loader of an electron beam drawing apparatus, and is constructed particularly in consideration of downsizing of the apparatus as a whole, high-speed transfer for coping with high throughput, and prevention of adhesion of foreign matters for the application to DRAM of 64 and 256 megabits. A transferring mechanism for positioning and fixing an object to be transferred due to combination of positioning projections which are formed on fixing tables on which an object to be transferred is set and transferring arm assemblies and groove portions which are formed in a lower surface of the transferred object. Positioning projections are formed on fixing tables on which an object to be transferred is set and on a transferring arm, and a transferring mechanism for positioning and fixing the object by means of the combination of the positioning projections and groove portions formed in a lower surface of the object is disposed in parallel with a main apparatus. The transferring arm has a vertically moving mechanism and a waiting position of the arm is set in the middle of the transferring path. This transfer apparatus has the structure suitable for high-speed transfer and has less possibility of generation and adhesion of foreign matters. In addition, the apparatus can be reduced in size as a whole.
摘要翻译：转印装置用于电子束拉伸装置的晶片装载机，特别考虑到整体装置的小型化，高速转印，高产量的处理，防止异物附着适用于64位和256兆位的DRAM。一种转印机构，用于定位和固定由于形成在待转印物体的固定台上的定位突起的组合而被转印的物体和传送臂组件和形成在被转印物体的下表面中的槽部分目的。定位突起形成在其上设置有待转印物体的固定台上，并且在转印臂上形成有用于定位和固定物体的转印机构，该转印机构通过定位突起和形成在下表面的槽部的组合该物体与主装置平行设置。传送臂具有垂直移动机构，并且臂的等待位置设置在传送路径的中间。该转印装置具有适于高速转印的结构，并且异物的产生和附着的可能性较小。另外，该装置的整体尺寸可以减小。

47. 发明授权

US5305364A Projection type X-ray lithography apparatus 失效
标题翻译：投影型X射线光刻设备
公开(公告)号：US5305364A
公开(公告)日：1994-04-19
申请号：US945146
申请日：1992-09-15
申请人： Kozo Mochiji , Hiroaki Oizumi , Shigeo Moriyama , Shinji Okazaki , Tsuneo Terasawa , Masaaki Itou
发明人： Kozo Mochiji , Hiroaki Oizumi , Shigeo Moriyama , Shinji Okazaki , Tsuneo Terasawa , Masaaki Itou
IPC分类号： G03F7/20 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70233 , G03F7/70808 , G03F7/70841 , G03F7/70866 , G03F7/70883 , G03F7/70933
摘要： Reduction projection type X-ray lithography with an exposing beam wavelength of 40-150A, longer than in conventional 1:1 proximity exposure, has a high-vacuum space. This would reduce wafer replacement work efficiency and contaminate optical mirrors with substances released by a resist decomposed during exposure except for separating an optical system chamber and a wafer exposing chamber by a differential pumping section and a thin-film window. Wafer exposure is under atmospheric pressure, improving productivity, accuracy of exposure and longevity of the optical devices.
摘要翻译：具有40-150A的曝光光束波长的还原投影型X射线光刻比传统的1：1接近曝光更长，具有高真空空间。这将降低晶片更换工作效率，并且通过在曝光期间分解的抗蚀剂释放的物质污染光学反射镜，除了通过差分泵送部分和薄膜窗口分离光学系统室和晶片曝光室之外。晶圆曝光在大气压下，提高了生产率，曝光精度和光学元件的寿命。

48. 发明授权

US5272744A Reflection mask 失效
标题翻译：反射面具
公开(公告)号：US5272744A
公开(公告)日：1993-12-21
申请号：US933300
申请日：1992-08-21
申请人： Masaaki Itou , Hiroaki Oizumi , Shigeo Moriyama
发明人： Masaaki Itou , Hiroaki Oizumi , Shigeo Moriyama
IPC分类号： G03F1/22 , G03F1/24 , G21K1/06 , H01L21/027 , G21K5/00
CPC分类号： G21K1/062 , B82Y10/00 , G03F1/24
摘要： In a reflection mask, there is formed at least one laminate structure comprising a high reflectivity portion, a middle portion and a high reflectivity portion. When there is a defect in the high reflectivity portion as the top layer, this high reflectivity portion and the underlying middle portion are removed in that defective position, thereby allowing the high reflectivity portion as the bottom layer to be exposed to repair the defect.
摘要翻译：在反射掩模中，形成至少一层包括高反射率部分，中间部分和高反射率部分的层压结构。当作为顶层的高反射率部分存在缺陷时，在该缺陷位置除去该高反射率部分和下面的中间部分，从而允许暴露高反射率部分以暴露以修复缺陷。

49. 发明授权

US4804445A Method for the surface treatment of an iron or iron alloy article 失效
标题翻译：铁或铁合金制品的表面处理方法
公开(公告)号：US4804445A
公开(公告)日：1989-02-14
申请号：US123269
申请日：1987-11-20
申请人： Yukio Ohta , Shigeo Moriyama , Akira Sato , Tohru Arai , Hironori Fujita , Yoshihiko Sugimoto
发明人： Yukio Ohta , Shigeo Moriyama , Akira Sato , Tohru Arai , Hironori Fujita , Yoshihiko Sugimoto
IPC分类号： C23C12/02 , C23C8/32
CPC分类号： C23C12/02
摘要： A surface layer which is composed of the carbonitride of molybdenum is formed on an article made of iron or an iron alloy by heating the article in the presence of a material containing molybdenum and a treating agent. The treating agent may be composed of at least one of the cyandides and cyanates of alkali metals and alkaline earth metals. The layer adhering closely to the article can be formed efficiently at a temperature which is so low that virtually no thermal strain may develop in the article.
摘要翻译：在含有钼和处理剂的材料的存在下，通过加热制品，在由铁或铁合金制成的制品上形成由钼的碳氮化物构成的表面层。处理剂可以由碱金属和碱土金属的氰化物和氰酸盐中的至少一种组成。可以在如此低的温度下有效地形成附着在制品上的层，实际上在制品中几乎不产生热应变。

50. 发明授权

US4739161A Fine displacement transducer employing plural optical fibers 失效
标题翻译：采用多根光纤的精细位移传感器
公开(公告)号：US4739161A
公开(公告)日：1988-04-19
申请号：US870814
申请日：1986-06-05
申请人： Shigeo Moriyama , Fumihiko Uchida
发明人： Shigeo Moriyama , Fumihiko Uchida
IPC分类号： G01B11/00 , G01B11/02 , G01C3/00 , G01C3/06 , G01C3/08 , H01J5/16
CPC分类号： G01B11/026
摘要： A fine displacement transducer, wherein either end of a first and a second optical fibers which are mutually adjacent are respectively provided in alignment with each other opposed to the reflection surface and the illuminating light is made incident from the one end of the first optical fiber and the light irradiated from the other end of the first optical fiber is made to illuminate its reflection surface, while the reflected light therefrom is received by the second optical fiber, so that the amount of displacement of the reflection surface relative to both end surfaces of the second optical fiber can be detected from the variation of intensity of the received light, and a measuring system wherein the reflected light from the reflection surface is received by either of the second or a separately provided third optical fiber to detect the intensity of received light for converting it into the electric signal.
摘要翻译：精细位移传感器，其中彼此相邻的第一和第二光纤的任一端分别设置成与反射表面相对准，并且照明光从第一光纤的一端入射，使从第一光纤的另一端照射的光照射其反射面，同时其反射光被第二光纤接收，使得反射面相对于第二光纤的两个端面的位移量可以从接收光的强度的变化来检测第二光纤，以及测量系统，其中来自反射表面的反射光由第二光纤或单独提供的第三光纤中的任一个接收，以检测接收光的强度将其转换为电信号。

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