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41. 外观设计

USD442218S1 Inkjet printer 失效
标题翻译：喷墨打印机
公开(公告)号：USD442218S1
公开(公告)日：2001-05-15
申请号：US29119934
申请日：2000-03-10
申请人： Masahiko Kobayashi , Takashi Yoshida
设计人： Masahiko Kobayashi , Takashi Yoshida

42. 发明授权

US06200432B1 Method of handling a substrate after sputtering and sputtering apparatus 有权
标题翻译：溅射和溅射装置处理基板的方法
公开(公告)号：US06200432B1
公开(公告)日：2001-03-13
申请号：US09437227
申请日：1999-11-10
申请人： Masahiko Kobayashi , Nobuyuki Takahashi
发明人： Masahiko Kobayashi , Nobuyuki Takahashi
IPC分类号： C23C1434
CPC分类号： C23C14/58 , C23C14/541 , C23C14/566
摘要： A substrate which has been heated to a predetermined temperature by a heating unit during sputtering is transferred into an unload-lock chamber having a vacuum pump system and a vent gas introducing system. The unload-lock chamber is provided with a cooling stage which makes surface contact with the substrate so as to forcedly cool the substrate to a predetermined temperature. The substrate is placed on the cooling stage and forcedly cooled. After the substrate is cooled to the predetermined temperature or lower, the vent gas introducing system is operated so that the interior of the unload-lock chamber is returned to the atmospheric pressure ambient. Since the substrate under a high temperature condition does not make contact with the atmospheric pressure ambient, film properties are prevented from being varied.
摘要翻译：在溅射期间通过加热单元被加热到预定温度的基板被转移到具有真空泵系统和排放气体引入系统的卸载锁定室中。卸载锁定室设置有冷却台，其与基板表面接触，以将基板强制冷却至预定温度。将基板放置在冷却台上并强制冷却。在将基板冷却至预定温度或更低温度之后，排气引入系统被操作，使得卸载锁定室的内部返回到大气压环境。由于在高温条件下的基板不与大气压环境接触，所以防止了膜性能的变化。

43. 发明授权

US06030510A Hot reflow sputtering method and apparatus 有权
标题翻译：热回流溅射法和设备
公开(公告)号：US06030510A
公开(公告)日：2000-02-29
申请号：US151738
申请日：1998-09-11
申请人： Masahiko Kobayashi , Nobuyuki Takahashi
发明人： Masahiko Kobayashi , Nobuyuki Takahashi
IPC分类号： C23C14/14 , C23C14/04 , C23C14/34 , C23C14/35 , C23C14/50 , C23C14/54 , C23C14/56 , H01L21/203 , H01L21/285 , H01L21/768
CPC分类号： C23C14/564 , C23C14/046 , C23C14/35 , C23C14/50 , C23C14/541 , H01J37/3405 , H01L21/76877
摘要： A method and apparatus for facilitating high-quality hot reflow sputtering with no occurrence of voids while reducing the processing time by rapid heating of the substrate. The method comprises two steps. In the first step, a thin base film 81 of aluminum is formed on the side and bottom surfaces of a minute hole 90 formed in the surface of a substrate 9. Substrate 9 is heated to a first temperature of no more than 100.degree. C. at which it is possible to prevent gaps occurring in the base film 81. In the second step, the hole is filled in with aluminum by depositing a further film of aluminum 82 inside hole 90 and causing it to reflow. Substrate 9 is heated to a second temperature which is higher than the first temperature. The hot reflow sputtering apparatus is equipped with an electrostatic attraction mechanism 43, which uses static electricity to grip substrate 9 against a substrate holder 4 provided with an indentation 40 in the substrate mounting surface thereof, and a pressurizing gas introduction system 42 which introduces a pressurizing gas into the indentation 40. A control unit 47 controls the apparatus so that neither electrostatic attraction mechanism 43 nor pressurizing gas introduction system 42 are operated in the first step. In the second step the pressurizing gas introduction system 42 is operated after the electrostatic attraction mechanism 43 has been operated.
摘要翻译：一种用于在不发生空隙的情况下促进高质量热回流溅射的方法和装置，同时通过快速加热衬底减少处理时间。该方法包括两个步骤。在第一步骤中，在基板9的表面形成的微小孔90的侧面和底面上形成有薄的铝基底膜81.将基板9加热至不超过100℃的第一温度。在此可以防止在基膜81中发生间隙。在第二步骤中，通过在孔90内沉积另外的铝82膜并使其回流，用铝填充孔。将基板9加热到高于第一温度的第二温度。热回流溅射装置配备有静电吸引机构43，该静电吸引机构43使用静电来将基板9抵靠在其基板安装表面中设置有凹口40的基板保持件4和加压气体导入系统42，气体进入压痕40.控制单元47控制装置，使得静电吸引机构43和加压气体导入系统42都不在第一步骤中操作。在第二步骤中，在静电吸引机构43被操作之后，加压气体引入系统42被操作。

44. 发明授权

US5883327A Keyboard system for an electric musical instrument in which each key is provided with an independent output to a processor 失效
标题翻译：用于电子乐器的键盘系统，其中每个键都具有与处理器的独立输出
公开(公告)号：US5883327A
公开(公告)日：1999-03-16
申请号：US988170
申请日：1992-12-09
申请人： Kosei Terada , Keigo Kikuchi , Masahiko Kobayashi
发明人： Kosei Terada , Keigo Kikuchi , Masahiko Kobayashi
IPC分类号： G10C3/12 , G10H1/053 , G10H1/18 , G10H1/34 , G10H5/00 , H04Q1/18
CPC分类号： G10H1/18 , G10H1/344 , G10H2220/271
摘要： A keyboard system for an electronic musical instrument includes: a keyboard having a number of keys; a keyboard central processing unit (CPU) coupled to the keyboard; a switch connected to each key on the keyboard; a pull-up resistor serially connected to each switch; a unit for applying voltage to a serial circuit of each switch and each pull-up resistor; and a unit for parallel supplying a signal at an intersection point between each switch and each pull-up resistor to the CPU. The operation states of a plurality of keys can be independently detected by sequentially detecting the potential at the interconnection points.
摘要翻译：一种用于电子乐器的键盘系统包括：具有多个键的键盘; 耦合到键盘的键盘中央处理单元（CPU）; 连接到键盘上的每个键的开关; 串联连接到每个开关的上拉电阻; 用于向每个开关和每个上拉电阻器的串行电路施加电压的单元; 以及用于在每个开关和每个上拉电阻之间的交点处并行地提供信号到CPU的单元。可以通过依次检测互连点的电位来独立地检测多个键的操作状态。

45. 再颁专利

USRE35898E Lens periphery processing apparatus, method for obtaining processing data, and lens periphery processing method 失效
标题翻译：透镜周边处理装置，获取处理数据的方法以及透镜周边处理方法
公开(公告)号：USRE35898E
公开(公告)日：1998-09-15
申请号：US700021
申请日：1996-08-20
申请人： Ryoji Shibata , Masahiko Kobayashi , Yukinobu Ban , Hirokatu Obayashi
发明人： Ryoji Shibata , Masahiko Kobayashi , Yukinobu Ban , Hirokatu Obayashi
IPC分类号： B24B9/14 , B24B17/10 , B24B47/22 , B24B49/00 , B24B51/00
CPC分类号： B24B51/00 , B24B47/225 , B24B49/00 , B24B9/148
摘要： An apparatus and a method for processing lens peripheries which allow lenses to be properly fitted in a frame, i.e., which processes lenses with high dimensional accuracy. For this purpose, the lens periphery processing apparatus and method are designed to comprise an input device for inputting the configuration of lens frame portions of the eyeglasses frame which is a result of three-dimensional measurement, a calculation device for deriving peripheral lengths of the lens frame portions from the three-dimensional lens frame portion configuration inputted by the input device, a tapered edge curve determining device for determining a curve .�.value.!. defined by the locus of the tapered edge of each lens, and a computing device for computing the locus of the tapered edge of each lens which substantially coincides with the peripheral length of the associated lens frame portion which is obtained by the calculation device.
摘要翻译：一种用于处理透镜周边的装置和方法，其允许透镜适当地装配在框架中，即处理具有高尺寸精度的透镜。为此，透镜周边处理装置和方法被设计为包括用于输入作为三维测量的结果的眼镜框的透镜框部分的配置的输入装置，用于导出透镜的周长的计算装置由输入装置输入的三维透镜框部分构造的框架部分，用于确定由每个透镜的锥形边缘的轨迹定义的曲线[值]的锥形边缘曲线确定装置，以及用于计算该轨迹的计算装置每个透镜的锥形边缘基本上与由计算装置获得的相关镜片框架部分的周长重合。

46. 发明授权

US5716256A Lens grinding apparatus for grinding an eyeglass lens from a plurality of directions 失效
标题翻译：用于从多个方向研磨眼镜镜片的镜片研磨装置
公开(公告)号：US5716256A
公开(公告)日：1998-02-10
申请号：US679482
申请日：1996-07-12
申请人： Toshiaki Mizuno , Ryoji Shibata , Masahiko Kobayashi , Yoshinori Matsuyama , Hirokatsu Ohbayashi , Masakazu Funakura
发明人： Toshiaki Mizuno , Ryoji Shibata , Masahiko Kobayashi , Yoshinori Matsuyama , Hirokatsu Ohbayashi , Masakazu Funakura
IPC分类号： B24B9/14 , B24B27/00 , B24B47/22
CPC分类号： B24B27/0046 , B24B47/225 , B24B9/14 , B24B9/148
摘要： A subject lens is held by two chuck shafts, which are rotated synchronously by pulse motors during a grinding operation. A group of grinding wheels are mounted on each of rotary shafts of right and left lens grinding parts. The rotary shafts are disposed on opposite sides of the chuck shafts. A desired grinding wheel for each processing is selected by moving the rotary shaft vertically. To grind the subject lens, the rotary shafts are moved independently by pulse motors toward the rotation axis of the chuck shafts based on lens frame shape data in the case of rough processing.
摘要翻译：被摄体透镜由两个卡盘轴保持，其在研磨操作期间由脉冲电机同步旋转。一组砂轮安装在左右镜片磨削零件的每个旋转轴上。旋转轴设置在卡盘轴的相对侧。通过垂直移动旋转轴来选择每个处理所需的砂轮。为了研磨被摄体透镜，在粗加工的情况下，基于透镜框形状数据，旋转轴由脉冲电机独立地移动到卡盘轴的旋转轴线。

47. 外观设计

USD387360S Backhoe 失效
公开(公告)号：USD387360S
公开(公告)日：1997-12-09
申请号：US52809
申请日：1996-04-09
申请人： Masahiro Ishizaki , Akira Takashima , Tadashi Kusunoki , Masahiko Kobayashi
设计人： Masahiro Ishizaki , Akira Takashima , Tadashi Kusunoki , Masahiko Kobayashi

48. 外观设计

USD383469S Backhoe 失效
公开(公告)号：USD383469S
公开(公告)日：1997-09-09
申请号：US47085
申请日：1995-11-21
申请人： Masahiro Ishizaki , Akira Takashima , Tadashi Kusunoki , Masahiko Kobayashi
设计人： Masahiro Ishizaki , Akira Takashima , Tadashi Kusunoki , Masahiko Kobayashi

49. 发明授权

US5514257A Method for forming Ti-tin laminates 失效
标题翻译：形成钛锡层压板的方法
公开(公告)号：US5514257A
公开(公告)日：1996-05-07
申请号：US305837
申请日：1994-09-14
申请人： Masahiko Kobayashi , Nobuyoki Takahashi
发明人： Masahiko Kobayashi , Nobuyoki Takahashi
IPC分类号： C23C14/06 , C23C14/16 , C23C14/34 , C23C14/35 , C23C14/56 , H01J37/34
CPC分类号： H01J37/3455 , C23C14/0641 , C23C14/165 , C23C14/564 , C23C14/568 , H01J37/3408
摘要： A method for forming Ti--TiN laminates adapted to reduce the formation of dust particles harmful to semiconductor devices without detriment to productivity, and a magnetron cathode for performing the method are provided. Ti films and TiN films are formed through sputtering of a Ti target using a multi-chamber system comprising at least two chambers each having a magnetron cathode in which a magnet can be moved to accommodate different films. The type of film being formed in each chamber is periodically alternated to prevent a buildup of TiN film adhered to the inner walls of the chambers which peels and causes dust particles.
摘要翻译：提供一种用于形成适于减少对半导体器件有害的灰尘颗粒的形成而不损害生产率的Ti-TiN层压体的方法，以及用于执行该方法的磁控阴极。使用包括至少两个室的多腔室系统通过溅射Ti靶而形成Ti膜和TiN膜，每个室具有可以移动磁体以适应不同膜的磁控阴极。在每个室中形成的膜的类型周期性地交替，以防止粘附到室的内壁上的TiN膜的积聚，其剥落并引起灰尘颗粒。

50. 发明授权

US5347762A Lens periphery processing apparatus, method for obtaining processing data, and lens periphery processing method 失效
标题翻译：透镜周边处理装置，获取处理数据的方法以及透镜周边处理方法
公开(公告)号：US5347762A
公开(公告)日：1994-09-20
申请号：US11759
申请日：1993-02-01
申请人： Ryoji Shibata , Masahiko Kobayashi , Yukinobu Ban , Hirokatu Obayashi
发明人： Ryoji Shibata , Masahiko Kobayashi , Yukinobu Ban , Hirokatu Obayashi
IPC分类号： B24B9/14 , B24B17/10 , B24B47/22 , B24B49/00 , B24B51/00
CPC分类号： B24B51/00 , B24B47/225 , B24B49/00 , B24B9/148
摘要： An apparatus and a method for processing lens peripheries which allow lenses to be properly fitted in a frame, i.e., which processes lenses with high dimensional accuracy. For this purpose, the lens periphery processing apparatus and method are designed to comprise an input device for inputting the configuration of lens frame portions of the eyeglasses frame which is a result of three-dimensional measurement, a calculation device for deriving peripheral lengths of the lens frame portions from the three-dimensional lens frame portion configuration inputted by the input device, a tapered edge curve determining device for determining a curve value defined by the locus of the tapered edge of each lens, and a computing device for computing the locus of the tapered edge of each lens which substantially coincides with the peripheral length of the associated lens frame portion which is obtained by the calculation device.
摘要翻译：一种用于处理透镜周边的装置和方法，其允许透镜适当地装配在框架中，即处理具有高尺寸精度的透镜。为此，透镜周边处理装置和方法被设计为包括用于输入作为三维测量的结果的眼镜框的透镜框部分的配置的输入装置，用于导出透镜的周长的计算装置由输入装置输入的三维透镜框部分构造的框架部分，用于确定由每个透镜的锥形边缘的轨迹定义的曲线值的渐缩边缘曲线确定装置，以及用于计算每个透镜的轨迹的计算装置每个透镜的锥形边缘基本上与由计算装置获得的相关联的透镜框部分的周长重合。

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