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41. 发明授权

US06850327B2 Inspection method and apparatus for projection optical systems 失效
标题翻译：投影光学系统的检测方法和装置
公开(公告)号：US06850327B2
公开(公告)日：2005-02-01
申请号：US10237130
申请日：2002-09-09
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G03F7/20 , G01B11/00
CPC分类号： G03F7/706 , G03F7/70358 , G03F7/70691
摘要： A reference mark is formed on an under-surface of a reference mark member that is disposed on a mask stage. The mask stage can be part of a projection exposure apparatus in which a substrate and a mask are moved in respective scanning directions during scanning exposure. The projection exposure apparatus also may include a projection system disposed under the mask stage, with the mask and substrate being provided on opposite sides of projection system. The mask stage may be moved into the image field of the projection system, and the reference mark is detected.
摘要翻译：参考标记形成在设置在掩模台上的参考标记部件的下表面上。掩模台可以是在扫描曝光期间基板和掩模在各个扫描方向上移动的投影曝光装置的一部分。投影曝光装置还可以包括设置在掩模台下方的投影系统，其中掩模和基板设置在投影系统的相对侧上。掩模台可以移动到投影系统的图像场中，并且检测到参考标记。

42. 发明授权

US06549277B1 Illuminance meter, illuminance measuring method and exposure apparatus 失效
标题翻译：照度计，照度测量方法和曝光装置
公开(公告)号：US06549277B1
公开(公告)日：2003-04-15
申请号：US09666425
申请日：2000-09-21
申请人： Hiroaki Narushima , Toshihiko Tsuji
发明人： Hiroaki Narushima , Toshihiko Tsuji
IPC分类号： G01J142
CPC分类号： H01L21/67253 , G01J1/42 , G03F7/70558
摘要： An illuminance meter is provided to simplify measuring tasks and labor associated with the process of determining the energy level of a radiation used in an exposure apparatus. A wafer-type illuminance meter has an optical sensor fabricated integrally within a dummy wafer, which is made of a thin disk so that it may be handled in a manner similar to a substrate wafer to be imprinted. The illuminance meter is retained on a wafer stage in a manner similar to the substrate wafer so as to be loaded on and unloaded off a number of exposure apparatuses to determine a level of illuminance in the vicinity of the image plane of each exposure apparatus that uses a type of radiation assigned to each exposure apparatus.
摘要翻译：提供照度计以简化与确定曝光设备中使用的辐射的能量水平的过程相关联的测量任务和劳动。晶片式照度计具有由虚拟晶片制成的光学传感器，该光学传感器由薄盘制成，以便可以以类似于待印刷的基板晶片的方式进行处理。以与衬底晶片相似的方式将照度计保持在晶片台上，以便将多个曝光装置装载并卸载，以确定使用的每个曝光装置的像面附近的照度水平分配给每个曝光装置的一种辐射。

43. 发明授权

US06525817B1 Inspection method and apparatus for projection optical systems 失效
标题翻译：投影光学系统的检测方法和装置
公开(公告)号：US06525817B1
公开(公告)日：2003-02-25
申请号：US09667754
申请日：2000-09-21
申请人： Tetsuo Taniguchi , Toshihiko Tsuji
发明人： Tetsuo Taniguchi , Toshihiko Tsuji
IPC分类号： G01B1100
CPC分类号： G03F7/706 , G03F7/70358 , G03F7/70691
摘要： The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.
摘要翻译：本发明涉及一种检测投影光学系统的图像形成特性的方法，用于将基准图案投影在基板上的掩模版上。根据检测方法，移动标线片台，使得标线上的基准标记进入第一基准位置和第二基准位置，并移动晶片台，使得晶片台上的光透射部分跨越图像形成通过投影光学系统获得的参考标记的投影图像的位置。在第一和第二参考位置处的标线片台和晶片台的位置分别被测量为阶段的移动距离。从测量的标线片和晶片台的移动距离来计算投影光学系统的图像形成特性。

44. 发明授权

US5270794A Fine structure evaluation apparatus and method 失效
标题翻译：精细结构评估装置及方法
公开(公告)号：US5270794A
公开(公告)日：1993-12-14
申请号：US905409
申请日：1992-06-29
申请人： Toshihiko Tsuji , Kenji Saito
发明人： Toshihiko Tsuji , Kenji Saito
IPC分类号： G01B11/00 , G01B11/02 , G01B11/30 , G01N21/94 , G01N21/95 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/66
CPC分类号： G01N21/9501 , G01B11/028 , G01N21/95607 , G01N2021/95676 , G01N21/95623
摘要： In an apparatus and a method for evaluating the pattern structure of a fine structure, the presence of foreign particles, or the like, an object having a fine structure is scanned with a light beam, or the spot size of the light beam projected onto the object is changed, and extreme values in light scattered by the object are detected. The fine structure is evaluated according to changes in the positions, the number, the intensities or the like of the extreme values, that is, according to distribution characteristics of the extreme values caused by the scanning or the changes in the spot size of the light beam.

45. 发明授权

US09332166B2 Imaging apparatus equipped with illumination optical system having a plurality of optical integrators that guide light 有权
标题翻译：配备有具有引导光的多个光学积分器的照明光学系统的成像设备
公开(公告)号：US09332166B2
公开(公告)日：2016-05-03
申请号：US13821490
申请日：2011-09-06
申请人： Tomoaki Kawakami , Toshihiko Tsuji
发明人： Tomoaki Kawakami , Toshihiko Tsuji
IPC分类号： G02B6/42 , H04N9/31 , H04N5/225 , G02B27/09
CPC分类号： H04N5/2256 , G02B27/0994
摘要： An imaging apparatus (1) includes an illumination optical system (100) that includes a light source (110) and is configured to guide light from the light source to a target(B), an imaging optical system configured to capture an image of the target, and a plurality of image sensors (430) arranged on an image plane of the imaging optical system. The illumination optical system includes a plurality of integrators (121,122). Light flux exits from one of the plurality of integrators illuminates at least one of the plurality of image sensors, and light exits from the other integrators illuminates at least one of the plurality of image sensors other than the image sensor illuminated by the light exits from the one of the plurality of integrators.
摘要翻译：一种成像装置（1）包括照明光学系统（100），其包括光源（110）并且被配置为将来自所述光源的光引导到目标（B）;成像光学系统，被配置为捕获所述光源目标和布置在成像光学系统的图像平面上的多个图像传感器（430）。照明光学系统包括多个积分器（121,122）。从多个积分器中的一个出射的光束照射多个图像传感器中的至少一个，并且来自其他积分器的光离开照亮多个图像传感器中的至少一个图像传感器，而不是由光照射的图像传感器从多个集成商之一。

46. 发明申请

US20130169788A1 MICROSCOPE, IMAGE ACQUISITION APPARATUS, AND IMAGE ACQUISITION SYSTEM 审中-公开
标题翻译：显微镜，图像采集设备和图像采集系统
公开(公告)号：US20130169788A1
公开(公告)日：2013-07-04
申请号：US13823062
申请日：2011-10-11
申请人： Toshihiko Tsuji , Hirofumi Fujii , Shun Mochizuki
发明人： Toshihiko Tsuji , Hirofumi Fujii , Shun Mochizuki
IPC分类号： G02B21/36
CPC分类号： G02B21/365 , G02B21/362 , G02B21/367
摘要： A microscope 1 includes an illumination device 10 for illuminating a object 30, an optical system 40 for forming an image of the object 30, and an imaging device 50 for capturing the image of the object 30. The imaging device 50 includes a plurality of imaging units. Each of the imaging units includes an image sensor and a movement mechanism for moving the image sensor.
摘要翻译：显微镜1包括用于照射物体30的照明装置10，用于形成物体30的图像的光学系统40以及用于捕获物体30的图像的成像装置50.成像装置50包括多个成像单位。每个成像单元包括用于移动图像传感器的图像传感器和移动机构。

47. 发明授权

US07265816B2 Illumination optical system, exposure apparatus, and device manufacturing method with modified illumination generator 失效
标题翻译：照明光学系统，曝光装置和具有改进照明发生器的装置制造方法
公开(公告)号：US07265816B2
公开(公告)日：2007-09-04
申请号：US11158017
申请日：2005-06-20
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70191
摘要： An illumination optical system for illuminating a target surface using light from a light source includes a modified illumination generator for generating a modified illumination with a predetermined polarization state for the target surface, wherein the modified illumination generator includes a λ/4 phase plate unit that includes a λ/4 phase plate for converting a circularly polarized light into a linearly polarized light in a predetermined direction, and a diffractive optical element unit that is arranged in a substantially conjugate relationship with the target surface, and includes a diffractive optical element used for the λ/4 phase plate to generate a predetermined illumination intensity distribution when the diffractive optical element unit receives the linearly polarized light.
摘要翻译：使用来自光源的光照射目标表面的照明光学系统包括：修正照明发生器，用于为目标表面产生具有预定极化状态的改进的照明，其中，所述修改的照明发生器包括：λ/ 4相位板单元，用于将圆偏振光转换成预定方向的线偏振光的λ/ 4相位板，以及与目标表面大体上共轭的衍射光学元件单元，并且包括用于所述衍射光学元件的衍射光学元件 λ/ 4相位板，以在衍射光学元件单元接收线偏振光时产生预定的照明强度分布。

48. 发明授权

US06946666B2 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same 失效
标题翻译：位置检测装置，使用其的装置，曝光装置和使用其的装置制造方法
公开(公告)号：US06946666B2
公开(公告)日：2005-09-20
申请号：US09082587
申请日：1998-05-21
申请人： Kenji Saito , Toshihiko Tsuji , Mitsuro Sugita
发明人： Kenji Saito , Toshihiko Tsuji , Mitsuro Sugita
IPC分类号： G03F7/20 , G03F9/00 , A61N5/00
CPC分类号： G03F7/70375 , B82Y10/00 , G03F9/7061 , G03F9/7088 , Y10S438/949
摘要： An exposure apparatus for irradiating exposure light onto a surface of an object to be exposed applied with a resist to form a pattern on the surface, wherein near-field light is used as the exposure light. The apparatus includes an alignment system for performing alignment using the near-field light, the alignment system detecting position information of the object to be exposed by irradiating light from an illumination device onto an alignment mark formed on the surface of the object to be exposed, and an alignment probe for detecting near-field light in the vicinity of the alignment mark.
摘要翻译：一种曝光装置，用于将曝光光照射到被照射物体的表面上，施加抗蚀剂以在表面上形成图案，其中使用近场光作为曝光光。该装置包括用于使用近场光进行对准的对准系统，对准系统通过将照明装置的光照射到形成在被曝光物体的表面上的对准标记来检测要曝光的物体的位置信息，以及用于检测对准标记附近的近场光的对准探针。

49. 发明申请

US20050105290A1 Illumination optical system and exposure apparatus 审中-公开
标题翻译：照明光学系统和曝光装置
公开(公告)号：US20050105290A1
公开(公告)日：2005-05-19
申请号：US10980341
申请日：2004-11-04
申请人： Toshihiko Tsuji
发明人： Toshihiko Tsuji
IPC分类号： G02B19/00 , G02B17/00 , G02B27/00 , G03F7/20 , H01L21/027 , G02B27/10
CPC分类号： G03F7/70075
摘要： Disclosed is an illumination optical system and an exposure apparatus having the same. In one aspect, the illumination optical system illuminates a surface to be illuminated, with light from a light source, wherein it includes a mirror having a reflection surface, and a stop having an aperture surface disposed approximately perpendicularly to the reflection surface of the mirror.
摘要翻译：公开了一种照明光学系统和具有该照明光学系统的曝光装置。在一个方面中，照明光学系统利用来自光源的光照亮要照明的表面，其中它包括具有反射表面的反射镜，以及具有近似垂直于反射镜的反射表面设置的孔表面的光阑。

50. 发明授权

US06603532B2 Illuminance measurement apparatus, exposure apparatus, and exposure method 失效
公开(公告)号：US06603532B2
公开(公告)日：2003-08-05
申请号：US09927935
申请日：2001-08-13
申请人： Toshihiko Tsuji , Keizaburo Kawada
发明人： Toshihiko Tsuji , Keizaburo Kawada
IPC分类号： G03B2770
CPC分类号： G03F7/70483 , G03B27/42
摘要： An illuminance measurement apparatus of the present invention is comprised of a chassis (20) having a detection surface (22) formed with a light receiving aperture (21) and a light receiving element having a light receiving surface arranged at a position corresponding to the light receiving aperture (21) in the chassis (20), wherein the chassis (20) is provided with a reflection surface (23) for detection light for detecting at least one of the position and posture of the detection surface (22).

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