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41. 发明申请

US20050231787A1 Micro-oscillation element 有权
标题翻译：微振荡元件
公开(公告)号：US20050231787A1
公开(公告)日：2005-10-20
申请号：US10926053
申请日：2004-08-26
申请人： Osamu Tsuboi , Norinao Kouma , Hisao Okuda , Hiromitsu Soneda , Satoshi Ueda , Ippei Sawaki , Yoshitaka Nakamura
发明人： Osamu Tsuboi , Norinao Kouma , Hisao Okuda , Hiromitsu Soneda , Satoshi Ueda , Ippei Sawaki , Yoshitaka Nakamura
IPC分类号： B81B3/00 , G02B26/00 , G02B26/08
CPC分类号： G02B26/0841
摘要： A micro-oscillation element includes a frame, a movable functional part, a driving mechanism, a beam extending from the functional part to the driving mechanism, and a torsion connector for connecting the frame and the beam to each other. The connector defines a rotational axis about which the functional part rotates. The rotational axis crosses the longitudinal direction of the beam. The beam is shorter than the functional part in the longitudinal direction of the rotational axis.
摘要翻译：微振荡元件包括框架，可动功能部件，驱动机构，从功能部件延伸到驱动机构的梁，以及用于将框架和梁彼此连接的扭转连接器。连接器限定了功能部件绕其旋转的旋转轴线。旋转轴线与梁的纵向方向交叉。光束比旋转轴的纵向方向上的功能部分短。

42. 发明申请

US20050037531A1 Method for manufacturing micro-structural unit 有权
标题翻译：微结构单元制造方法
公开(公告)号：US20050037531A1
公开(公告)日：2005-02-17
申请号：US10791903
申请日：2004-03-04
申请人： Norinao Kouma , Osamu Tsuboi , Hisao Okuda , Hiromitsu Soneda , Mi Xiaoyu , Satoshi Ueda , Ippei Sawaki , Yoshitaka Nakamura
发明人： Norinao Kouma , Osamu Tsuboi , Hisao Okuda , Hiromitsu Soneda , Mi Xiaoyu , Satoshi Ueda , Ippei Sawaki , Yoshitaka Nakamura
IPC分类号： B81C1/00 , B81B3/00 , H01L21/00 , H01L29/84
CPC分类号： B81C1/00626 , B81B2201/0235 , B81B2201/042 , B81B2203/0136 , B81B2203/04
摘要： A method for manufacturing a micro-structural unit is provided. By the method, micro-machining is performed on a material substrate including first through third conductive layers and two insulating layers, one of which is interposed between the first and the second conductive layers, and the other between the second and the third conductive layers. The method includes several etching steps performed on the layers of the material substrate that are different in thickness.
摘要翻译：提供一种微结构单元的制造方法。通过该方法，在包括第一至第三导电层和两个绝缘层的材料基板上进行微加工，其中一个绝缘层介于第一和第二导电层之间，另一个位于第二和第三导电层之间。该方法包括在不同厚度的材料基底的层上执行的几个蚀刻步骤。

43. 发明授权

US06887396B2 Micromirror unit and method of making the same 有权
标题翻译：微镜单元及其制作方法
公开(公告)号：US06887396B2
公开(公告)日：2005-05-03
申请号：US09950710
申请日：2001-09-13
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： B81B3/00 , B81C1/00 , G02B26/08 , G11B7/09 , C03C15/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

44. 发明授权

US08693083B2 Micromirror unit and method of making the same 有权
标题翻译：微镜单元及其制作方法
公开(公告)号：US08693083B2
公开(公告)日：2014-04-08
申请号：US13336190
申请日：2011-12-23
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

45. 发明申请

US20120105936A1 MICROMIRROR UNIT AND METHOD OF MAKING THE SAME 有权
标题翻译：微机单元及其制造方法
公开(公告)号：US20120105936A1
公开(公告)日：2012-05-03
申请号：US13336190
申请日：2011-12-23
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

46. 发明授权

US08107157B2 Micromirror unit and method of making the same 有权
标题翻译：微镜单元及其制作方法
公开(公告)号：US08107157B2
公开(公告)日：2012-01-31
申请号：US11480512
申请日：2006-07-05
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

47. 发明申请

US20070091415A1 Micromirror unit and method of making the same 有权
标题翻译：微镜单元及其制作方法
公开(公告)号：US20070091415A1
公开(公告)日：2007-04-26
申请号：US11480512
申请日：2006-07-05
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
摘要翻译：提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。该方法包括以下步骤。首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。然后，选择性地去除第二掩模图案。然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。最后，删除第一个掩模图案。

48. 发明授权

US07099066B2 Micromirror unit and method of making the same 有权
公开(公告)号：US07099066B2
公开(公告)日：2006-08-29
申请号：US11082881
申请日：2005-03-18
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

49. 发明申请

US20050162730A1 Micromirror unit and method of making the same 有权
公开(公告)号：US20050162730A1
公开(公告)日：2005-07-28
申请号：US11082881
申请日：2005-03-18
申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
发明人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
IPC分类号： B81B3/00 , B81C1/00 , G02B26/08 , G11B7/09 , G02B26/00
CPC分类号： B81C1/00142 , B81B3/0078 , B81B2201/042 , B81B2201/045 , B81B2203/0136 , B81B2203/0181 , B81B2203/058 , B81C1/00396 , G02B26/0841 , Y10S359/904
摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

50. 发明申请

US20100231087A1 Micro oscillating element 有权
标题翻译：微振荡元件
公开(公告)号：US20100231087A1
公开(公告)日：2010-09-16
申请号：US12659975
申请日：2010-03-26
申请人： Norinao Kouma , Osamu Tsuboi , Hiromitsu Soneda , Satoshi Ueda , Ippei Sawaki
发明人： Norinao Kouma , Osamu Tsuboi , Hiromitsu Soneda , Satoshi Ueda , Ippei Sawaki
IPC分类号： H02N11/00
CPC分类号： H02N1/008 , G02B26/0841
摘要： A micro oscillating element includes a frame and an oscillation section connected to the frame via a torsional joining section. The oscillation section includes a movable functional section, an arm section and a first comb-tooth electrode. The arm section extends from the functional section. The first comb-tooth electrode includes first electrode teeth extending from the arm section in a direction intersecting the arm section. The micro oscillating element further includes a second comb-tooth electrode to cooperate with the first comb-tooth electrode for causing the oscillation section to oscillate about an oscillation axis defined by the torsional joining section. The second comb-tooth, electrode includes second electrode teeth extending from the frame in a direction intersecting the arm section.
摘要翻译：微振荡元件包括框架和经由扭转接合部分连接到框架的振荡部分。振荡部包括可动功能部，臂部和第一梳齿电极。臂部分从功能部分延伸。第一梳齿电极包括从臂部沿与臂部相交的方向延伸的第一电极齿。微振荡元件还包括第二梳齿电极，与第一梳齿电极配合，用于使振动部分围绕由扭转接合部分限定的摆动轴线摆动。第二梳齿电极包括从框架沿与臂部相交的方向延伸的第二电极齿。

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