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41. 发明申请

US20070201106A1 Optimum noise filter setting for a scanner in a closed loop system 有权
标题翻译：闭环系统中扫描仪的最佳噪声滤波器设置
公开(公告)号：US20070201106A1
公开(公告)日：2007-08-30
申请号：US11364439
申请日：2006-02-28
申请人： Paul Cattrone , Hiroshi Tomita , Vivek Pathak
发明人： Paul Cattrone , Hiroshi Tomita , Vivek Pathak
IPC分类号： H04N1/40
CPC分类号： H04N1/4078 , H04N1/409
摘要： Disclosed is a method for determining optimum noise filter setting to be used by a scanner in a system including a printer and a detector forming a closed loop system. A test image including a plurality of horizontal lines, vertical lines, slanted lines and dots are printed using the printer and scanned back using the scanner. The scanned test image data is compared to the input test image data representing the test image, and based on such comparison, the optimum noise filter setting for the printer/scanner pair is determined and stored for future use. This method is particularly useful for printing barcodes having high data capacity.
摘要翻译：公开了一种用于确定由包括打印机和形成闭环系统的检测器的系统中的扫描仪使用的最佳噪声滤波器设置的方法。使用打印机打印包括多个水平线，垂直线，倾斜线和点的测试图像，并使用扫描仪进行扫描。将扫描的测试图像数据与表示测试图像的输入测试图像数据进行比较，并且基于这样的比较，确定并存储打印机/扫描仪对的最佳噪声滤波器设置以备将来使用。该方法对于打印具有高数据容量的条形码特别有用。

42. 发明申请

US20070182955A1 SUBSTRATE DEFECT INSPECTION METHOD, COMPUTER READABLE STORAGE MEDIUM, AND DEFECT INSPECTION APPARATUS 有权
标题翻译：基板缺陷检查方法，计算机可读存储介质和缺陷检查装置
公开(公告)号：US20070182955A1
公开(公告)日：2007-08-09
申请号：US11626028
申请日：2007-01-23
申请人： Hiroshi Tomita , Shinichi Shinozuka
发明人： Hiroshi Tomita , Shinichi Shinozuka
IPC分类号： G01N21/00
CPC分类号： G06T7/001 , G03F7/7065 , G06T2207/30148
摘要： In the present invention, data on a substrate image picked up by an image pickup unit is outputted to a difference calculation unit where a difference image from a normal substrate is calculated. A synthesis calculation unit calculates a synthesized image by rotating the difference image 360 degrees by every predetermined angle about the center of the substrate and synthesizing the images. A Zernike calculation unit digitizes the synthesized image by a Zernike polynomial and outputs a concentric circle component to a determination unit where the component is compared with a previously set threshold value, so that the presence or absence of a defect on the substrate is determined. The present invention can facilitate the determination of the presence or absence of a macro defect on the substrate and reduce the time required for the determination.
摘要翻译：在本发明中，由摄像单元拾取的基板图像上的数据被输出到差分计算单元，其中计算出与正常基板的差分图像。合成计算单元通过围绕基板的中心以预定的角度360度旋转差分图像来合成图像来计算合成图像。 Zernike计算单元通过Zernike多项式数字化合成图像，并将同心圆分量输出到确定单元，其中将分量与先前设置的阈值进行比较，从而确定基板上存在或不存在缺陷。本发明可以有助于确定基板上的宏观缺陷的存在或不存在，并且减少确定所需的时间。

43. 发明申请

US20070150169A1 Navigation systems, methods, and programs 失效
标题翻译：导航系统，方法和程序
公开(公告)号：US20070150169A1
公开(公告)日：2007-06-28
申请号：US11640318
申请日：2006-12-18
申请人： Hiroshi Tomita , Kenji Nagase
发明人： Hiroshi Tomita , Kenji Nagase
IPC分类号： G08G1/00
CPC分类号： G01C21/3691 , G08G1/096844
摘要： Vehicle navigation systems, methods, and programs, receive traffic information. The systems, methods, and programs determine whether there is a controlled road link within a predetermined distance of the vehicle and determine whether there is congestion information that begins with the controlled road link based on the received traffic information. The systems, methods, and programs provide, if the congestion information indicates that traffic congestion begins at the controlled link, guidance including traffic congestion guidance, the traffic congestion guidance indicating that the traffic congestion begins at the controlled road link.
摘要翻译：车辆导航系统，方法和程序，接收交通信息。系统，方法和程序确定在车辆的预定距离内是否存在受控的道路连接，并且基于所接收的交通信息来确定是否存在以受控道路链路开始的拥堵信息。系统，方法和程序如果拥塞信息指示在受控链路处开始交通拥堵，则提供包括交通拥堵指导在内的指导，指示交通拥堵在受控道路链路处开始。

44. 发明申请

US20070095363A1 Substrate cleaning apparatus and substrate cleaning method 失效
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：US20070095363A1
公开(公告)日：2007-05-03
申请号：US11588393
申请日：2006-10-27
申请人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
发明人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
IPC分类号： C23G1/00 , B08B7/04 , B08B3/00 , C03C23/00
CPC分类号： H01L21/67057 , B08B3/08 , B08B3/10
摘要： A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture.
摘要翻译：一种基板清洗装置，包括保持含有过氧化氢溶液和硫酸的混合物的处理罐，用于清洗浸在所述混合物中的基板; 所述循环管道在所述处理罐的初级侧之间延伸，所述处理罐的所述混合物被注入到所述处理罐中，所述处理罐的二次侧在所述处理罐的二次侧上从所述处理罐排出所述混合物，并且具有用于使所述混合物循环的泵 ; 设置在所述循环管道中的加热器，被配置为将所述混合物加热至预定温度; 化学注入管，被配置为在所述处理罐的初级侧和位于所述加热器的下游侧的次级侧之间的位置处将过氧化氢溶液注入到所述循环管道中; 以及设置在所述循环管道中的过滤器，其构造成去除所述混合物中的颗粒。

45. 发明申请

US20070093032A1 Method of manufacturing semiconductor device 失效
标题翻译：制造半导体器件的方法
公开(公告)号：US20070093032A1
公开(公告)日：2007-04-26
申请号：US11494736
申请日：2006-07-28
申请人： Takuya Kobayashi , Katsuyuki Sekine , Tomonori Aoyama , Hiroshi Tomita
发明人： Takuya Kobayashi , Katsuyuki Sekine , Tomonori Aoyama , Hiroshi Tomita
IPC分类号： H01L21/336
CPC分类号： H01L21/02148 , C23C16/401 , H01L21/02271 , H01L21/0234 , H01L21/31645 , H01L21/823462 , H01L21/823857 , H01L29/517 , H01L29/66553 , H01L29/6656
摘要： A method of manufacturing a semiconductor device includes forming a trench in an interlayer dielectric film on the semiconductor substrate, the trench reaching a semiconductor substrate and having a sidewall made of silicon nitride film; depositing a gate insulation film made of a HfSiO film at a temperature within a range of 200 degrees centigrade to 260 degrees centigrade, so that the HfSiO film is deposited on the semiconductor substrate which is exposed at a bottom surface of the trench without depositing the HfSiO film on the silicon nitride film; and filling the trench with a gate electrode made of metal.
摘要翻译：制造半导体器件的方法包括在半导体衬底上的层间电介质膜中形成沟槽，沟槽到达半导体衬底并具有由氮化硅膜制成的侧壁; 在200摄氏度至260摄氏度的温度范围内沉积由HfSiO膜制成的栅极绝缘膜，使得HfSiO膜沉积在暴露于沟槽底表面的半导体衬底上，而不沉积HfSiO 膜上的氮化硅膜; 并用金属制成的栅电极填充沟槽。

46. 发明申请

US20070039637A1 Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device 审中-公开
标题翻译：液浸式光学工具，液浸式光学工具的清洗方法，液浸式曝光方法及半导体装置的制造方法
公开(公告)号：US20070039637A1
公开(公告)日：2007-02-22
申请号：US11504053
申请日：2006-08-15
申请人： Tatsuhiko Higashiki , Hiroshi Tomita
发明人： Tatsuhiko Higashiki , Hiroshi Tomita
IPC分类号： B08B3/08 , H01L21/66
CPC分类号： G02B27/0006 , G03F7/70341 , G03F7/70925
摘要： There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.
摘要翻译：公开了一种液浸光学工具，其包括光源，光学透镜系统，移动待放置物体的物体基座的台，包括浸液介质流体供应装置的头部和液体浸没介质流体排出装置，以在光学透镜系统和物体之间提供液浸介质流体层，限制液浸介质流体层的区域的栅栏，以及清洁与已经接触的部分的清洁装置液体介质流体通过清洗溶液。

47. 发明授权

US07130163B2 Magnetoresistance effect element 有权
公开(公告)号：US07130163B2
公开(公告)日：2006-10-31
申请号：US10958250
申请日：2004-10-06
申请人： Hideaki Fukuzawa , Katsuhiko Koi , Hiromi Fuke , Hiroshi Tomita , Hitoshi Iwasaki , Masashi Sahashi
发明人： Hideaki Fukuzawa , Katsuhiko Koi , Hiromi Fuke , Hiroshi Tomita , Hitoshi Iwasaki , Masashi Sahashi
IPC分类号： G11B5/33
CPC分类号： H01F10/3272 , B82Y10/00 , B82Y25/00 , G11B5/3903 , G11B5/3932 , G11B2005/3996 , H01F10/3259 , H01F10/3295 , H01F41/325 , H01L43/08 , H01L43/10 , Y10T428/1114 , Y10T428/1121
摘要： There are provided a magnetoresistance effect element, a magnetic head, a magnetic head assembly and a magnetic recording system, which have high sensitivity and high reliability. The magnetoresistance effect element has two ferromagnetic layers, a non-magnetic layer provided between the ferromagnetic layers, and a layer containing an oxide or nitride as a principal component, wherein the layer containing the oxide or nitride as the principal component contains a magnetic transition metal element which does not bond to oxygen and nitrogen and which is at least one of Co, Fe and Ni.

48. 发明申请

US20060213538A1 Semiconductor cleaning apparatus and semiconductor cleaning method 审中-公开
标题翻译：半导体清洗装置及半导体清洗方法
公开(公告)号：US20060213538A1
公开(公告)日：2006-09-28
申请号：US11373987
申请日：2006-03-14
申请人： Kaori Umezawa , Hiroshi Tomita
发明人： Kaori Umezawa , Hiroshi Tomita
IPC分类号： B08B7/04 , B08B3/00
CPC分类号： B08B3/04 , B08B13/00 , H01L21/02052 , H01L21/67057 , H01L21/67253 , H01L22/12 , H01L22/26
摘要： A semiconductor cleaning apparatus according to the present invention comprises: a particle monitor which measures the number of particles in a processing liquid used in a rinse process after a semiconductor wafer is subjected to a cleaning process by means of the processing liquid; a specific resistance measuring unit which measures a specific resistance of a processing liquid used in the rinse process; and a control unit which determines an end point at which the rinse process is completed on the basis of the number of particles measured by the particle monitor and the specific resistance measured by the specific resistance measuring unit to end the rinse process.
摘要翻译：根据本发明的半导体清洁装置包括：粒子监测器，用于测量半导体晶片经过处理液体进行清洁处理后在冲洗过程中使用的处理液中的颗粒数; 电阻测量单元，其测量在冲洗过程中使用的处理液的电阻率; 以及控制单元，其基于由粒子监测器测量的粒子数和由比电阻测量单元测量的结束漂洗过程的比电阻来确定完成漂洗过程的终点。

49. 发明申请

US20060134923A1 Semiconductor substrate cleaning apparatus and method 审中-公开
标题翻译：半导体衬底清洗装置及方法
公开(公告)号：US20060134923A1
公开(公告)日：2006-06-22
申请号：US11260272
申请日：2005-10-28
申请人： Yoshihiro Ogawa , Hiroshi Tomita
发明人： Yoshihiro Ogawa , Hiroshi Tomita
IPC分类号： H01L21/306 , H01L21/302
CPC分类号： H01L21/02052 , H01L21/67051
摘要： According to the present invention, there is provided a semiconductor substrate cleaning apparatus comprising: a support which supports a semiconductor substrate; a rotating mechanism which rotates the semiconductor substrate; a first supply unit which supplies a first treatment liquid to which an ultrasonic wave is added, to a surface, on which no circuit pattern is formed, of the semiconductor substrate; and a second supply unit which supplies a second treatment liquid to an edge of a surface, on which a circuit pattern is formed, of the semiconductor substrate.
摘要翻译：根据本发明，提供一种半导体基板清洗装置，包括：支撑半导体基板的支撑体; 旋转所述半导体衬底的旋转机构; 第一供给单元，向半导体基板的没有电路图案的表面供给添加有超声波的第一处理液; 以及第二供给单元，其向半导体基板的形成有电路图案的表面的边缘供给第二处理液。

50. 发明申请

US20060035797A1 Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process 审中-公开
标题翻译：半导体衬底清洗液和半导体衬底清洗工艺
公开(公告)号：US20060035797A1
公开(公告)日：2006-02-16
申请号：US11201910
申请日：2005-08-10
申请人： Hiroshi Tomita , Yuji Yamada , Hiroaki Yamada , Norio Ishikawa , Yumiko Abe
发明人： Hiroshi Tomita , Yuji Yamada , Hiroaki Yamada , Norio Ishikawa , Yumiko Abe
IPC分类号： C23G1/00 , B08B3/00
CPC分类号： H01L21/02052 , C11D7/08 , C11D7/34 , C11D7/36 , C11D11/0047
摘要： A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per molecule, phytic acid, and a condensed phosphoric acid compound; an inorganic acid; and water. There is also provided a process for cleaning a semiconductor substrate that includes a first step of cleaning the semiconductor substrate using the semiconductor substrate cleaning liquid composition and, subsequent to the first step, a second step of cleaning the semiconductor substrate with pure water, ozone water formed by dissolving ozone gas in pure water, or aqueous hydrogen peroxide.
摘要翻译：提供一种半导体衬底清洗液组合物，其包含一种或多种选自每分子具有至少两个磺酸基的化合物，植酸和缩合磷酸化合物的类型; 无机酸; 和水。还提供了一种清洗半导体衬底的方法，该方法包括使用半导体衬底清洗液组合物清洗半导体衬底的第一步骤，在第一步骤之后，用纯水，臭氧水清洗半导体衬底的第二步骤通过将臭氧气体溶解在纯水或过氧化氢水溶液中形成。

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