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41. 发明申请

US20070007044A1 WASHPIPE SEAL 失效
标题翻译：洗手间密封
公开(公告)号：US20070007044A1
公开(公告)日：2007-01-11
申请号：US11427196
申请日：2006-06-28
申请人： Kevin Martin
发明人： Kevin Martin
IPC分类号： E21B21/06 , E21B21/00
CPC分类号： E21B21/02 , E21B2033/005
摘要： A controlled leakage seal assembly having a first stationary portion adapted to be connected in substantially fluid-tight relation to a source of drilling fluid and a second portion adapted to be connected in substantially fluid-tight relation to a rotary portion including a washpipe. The seal includes a first housing and a stack of radially inwardly extending, spaced apart annular stators, and a second seal housing and stack of spaced apart radially outwardly extending annular rotors interleaved with one another. The seal assembly, a cartridge, permits the first and second housings to rotate relative to each other in substantially fluid-tight relation except for the drilling fluid entering an outlet region at greatly reduced pressure. In a preferred embodiment, the seal is held by a sleeve that permits the cartridge to be removed and replaced while the fluid connections to the sleeve remains.
摘要翻译：一种受控的泄漏密封组件，其具有第一静止部分，该第一固定部分适于以基本上与流体密封的关系连接到钻井流体源，以及第二部分，其适于基本上与流体密封的关系连接到包括冲洗管的旋转部分。密封件包括第一壳体和径向向内延伸的间隔开的环形定子的堆叠，以及彼此交错的间隔开的径向向外延伸的环形转子的第二密封壳体和堆叠。密封组件，墨盒，允许第一和第二壳体以基本上流体密封的关系相对于彼此旋转，除了钻井流体以极大减小的压力进入出口区域。在优选实施例中，密封件由套筒保持，该套筒允许在保持与套筒的流体连接的情况下移除和更换墨盒。

42. 发明申请

US20060209519A1 Devices having compliant wafer-level input/output interconnections and packages using pillars and methods of fabrication thereof 有权
公开(公告)号：US20060209519A1
公开(公告)日：2006-09-21
申请号：US11416686
申请日：2006-05-03
申请人： Muhannad Bakir , Kevin Martin , James Meindl
发明人： Muhannad Bakir , Kevin Martin , James Meindl
IPC分类号： H01R9/00
CPC分类号： G01R31/2863 , G01R1/0491 , G02B6/12002 , G02B6/42 , G02B6/43 , G02B2006/12107 , H01L23/49811 , H01L2224/81141 , H01L2224/81193 , H05K3/303 , H05K3/326 , H05K2203/167 , Y02P70/613
摘要： Devices having one or more of the following: an input/output (I/O) interconnect system, an optical I/O interconnect, an electrical I/O interconnect, a radio frequency I/O interconnect, are disclosed. A representative I/O interconnect system includes a first substrate and a second substrate. The first substrate includes a compliant pillar vertically extending from the first substrate. The compliant pillar is constructed a first material. The second substrate includes a compliant socket adapted to receive the compliant pillar. The compliant socket is constructed of a second material.

43. 发明申请

US20050282782A1 Lewis acid mediated synthesis of cyclic esters 有权
标题翻译：路易斯酸介导的环酯的合成
公开(公告)号：US20050282782A1
公开(公告)日：2005-12-22
申请号：US11144348
申请日：2005-06-03
申请人： Kevin Martin
发明人： Kevin Martin
IPC分类号： A61K31/675 , C07D471/02 , C07F9/06 , C07F9/28 , C07F9/6512 , C07F9/6571
CPC分类号： C07F9/657181
摘要： Methods for the synthesis of cyclic phosphonic acid diesters from 1,3-diols are described, whereby cyclic phosphonic acid diesters are produced by reacting a chiral 1,3-diol and an activated phosphonic acid in the presence of a Lewis acid.
摘要翻译：描述了从1,3-二醇合成环状膦酸二酯的方法，由此在路易斯酸存在下使手性1,3-二醇和活化的膦酸反应来制备环状膦酸二酯。

44. 发明申请

US20050257709A1 Systems and methods for three-dimensional lithography and nano-indentation 审中-公开
标题翻译：三维光刻和纳米压痕的系统和方法
公开(公告)号：US20050257709A1
公开(公告)日：2005-11-24
申请号：US10699287
申请日：2003-10-31
申请人： Tony Mule , Paul Kohl , Muhannad Bakir , Kevin Martin , James Meindl , Hiren Thacker
发明人： Tony Mule , Paul Kohl , Muhannad Bakir , Kevin Martin , James Meindl , Hiren Thacker
IPC分类号： B41F1/00 , B81C1/00 , G03F7/00
CPC分类号： G03F7/00 , B81B2201/042 , B81B2201/047 , B81B2201/058 , B81B2203/0384 , B81C1/00119 , B81C2201/0108 , B81C2201/0152 , B81C2201/0159 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0015
摘要： Systems and methods for three dimensional lithography, nano-indentation, and combinations thereof are disclosed. One exemplary three dimensional lithography method, among others, includes: providing a substrate having at least one optical element, wherein the optical element is selected from a refractive element and a diffractive element; disposing a polymer layer on the substrate and the at least one optical element, wherein the polymer layer includes a polymer material selected from a positive-tone polymer material and a negative-tone polymer material; positioning a mask adjacent the polymer layer, wherein the mask does not cover at least one directly exposed portion of the polymer material directly overlaying the at least one element; and exposing the at least one directly exposed portion of the polymer material to optical energy, wherein the optical energy passes through the at least one directly exposed portion of the polymer material and interacts with the element, and the element redirects the optical energy through the polymer material forming at least one area of indirectly exposed polymer material.
摘要翻译：公开了用于三维光刻，纳米压痕及其组合的系统和方法。一种示例性的三维光刻方法，其中包括：提供具有至少一个光学元件的衬底，其中所述光学元件选自折射元件和衍射元件; 在所述基板和所述至少一个光学元件上设置聚合物层，其中所述聚合物层包括选自正性聚合物材料和负性聚合物材料的聚合物材料; 将掩模定位在所述聚合物层附近，其中所述掩模不覆盖直接覆盖所述至少一个元件的聚合物材料的至少一个直接暴露部分; 并且将所述聚合物材料的至少一个直接暴露部分暴露于光能，其中所述光能通过所述聚合物材料的所述至少一个直接暴露部分并且与所述元件相互作用，并且所述元件将所述光能重定向通过所述聚合物形成间接暴露的聚合物材料的至少一个区域的材料。

45. 发明授权

US5825373A Raster operation lookup and execution 失效
公开(公告)号：US5825373A
公开(公告)日：1998-10-20
申请号：US731264
申请日：1996-10-11
申请人： Kevin Martin
发明人： Kevin Martin
IPC分类号： G06F9/318 , G06F9/455 , G06F13/00
CPC分类号： G06F9/3017 , G06F9/45504
摘要： The present invention is a method and apparatus for executing three-operand raster operation in two-operand raster environments. Structurally, the present invention includes a lookup table having one entry for each three-operand raster operation which is to be emulated. The entry associated with a particular three-operand raster operation includes a template and zero or more two-operand raster operations. Execution of the three-operand raster operation begins by retrieving the lookup table entry associated with the three-operand raster operation. Each two-operand raster operation in the lookup table entry is then executed in sequence. During execution, the template is used to provide a mapping which chooses which operands of the three-operand raster operation will be used as operands for the two-operand raster operation in the sequence.

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