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    • 43. 发明授权
    • Photoresist composition
    • 光刻胶组成
    • US08304164B2
    • 2012-11-06
    • US12983594
    • 2011-01-03
    • Tatsuro MasuyamaYuichi MukaiMasahiko Shimada
    • Tatsuro MasuyamaYuichi MukaiMasahiko Shimada
    • G03F7/004G03F7/30
    • G03F7/0397G03F7/0045G03F7/0046G03F7/2041
    • The present invention provides a photoresist composition comprising: at least one selected from the group consisting of a monomer represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, W1 represents a C3-C20 divalent saturated cyclic hydrocarbon group, A1 represents a single bond or *-O—CO—W1— wherein * represents a binding position to W1═N— and W1 represents a C1-C10 divalent saturated hydrocarbon group, a polymer consisting of a structural unit derived from the monomer represented by the formula (I) and a polymer consisting of a structural unit derived from the monomer represented by the formula (I) and a structural unit derived from a monomer represented by the formula (II): wherein R3 represents a hydrogen atom or a methyl group, A2 represents a single bond or *-O—CO—(CH2)n— wherein * represents a binding position to R4—, n represents an integer of 1 to 7 and R4 represents a C3-C20 saturated cyclic hydrocarbon group, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
    • 本发明提供一种光致抗蚀剂组合物,其包括:选自由式(I)表示的单体中的至少一种:其中R1表示氢原子或甲基,W1表示C3-C20二价饱和环状烃基 ,A1表示单键或* -O-CO-W1-,其中*表示与W1 = N-的结合位置,W1表示C1-C10二价饱和烃基,由衍生自所表示的单体的结构单元组成的聚合物 由式(I)表示的结构单元和由式(I)表示的单体衍生的结构单元和由式(II)表示的单体衍生的结构单元构成的聚合物:其中,R3表示氢原子或甲基 基团,A2表示单键或* -O-CO-(CH2)n-,其中*表示与R4-的结合位置,n表示1〜7的整数,R4表示C3-C20饱和环状烃基, 树脂加工 g酸性不稳定基团,并且在碱性水溶液中不溶或难溶,但是通过酸和酸产生剂可溶于碱性水溶液。