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    • 42. 发明授权
    • Rear-illuminated-type photodiode array
    • 后照式光电二极管阵列
    • US07332751B2
    • 2008-02-19
    • US11073322
    • 2005-03-04
    • Yasuhiro Iguchi
    • Yasuhiro Iguchi
    • H01L31/072
    • H01L27/1446
    • A rear-illuminated-type photodiode array has (a) a first-electroconductive-type semiconductor substrate, (b) a first-electroconductive-type electrode that is placed at the rear side of the semiconductor substrate and has openings arranged one- or two-dimensionally, (c) an antireflective coating provided at each of the openings of the first-electroconductive-type electrode, (d) a first-electroconductive-type absorption layer formed at the front-face side of the substrate, (e) a leakage-lightwave-absorbing layer that is provided on the absorption layer and has an absorption edge wavelength longer than that of the absorption layer, (f) a plurality of second-electroconductive-type regions that are formed so as to penetrate through the leakage-lightwave-absorbing layer from the top surface and extend into the absorption layer to a certain extent and are arranged one- or two-dimensionally at the positions coinciding with those of the antireflective coatings at the opposite side, and (g) a second-electroconductive-type electrode provided on the top surface of each of the second-electroconductive-type regions.
    • 背照式光电二极管阵列具有(a)第一导电型半导体基板,(b)第一导电型电极,其设置在半导体基板的后侧,并且具有一或二个开口 (c)设置在第一导电型电极的每个开口处的抗反射涂层,(d)形成在基板的正面侧的第一导电型吸收层,(e) 设置在吸收层上并具有比吸收层的吸收边长波长的吸收边缘波长的漏光波吸收层,(f)多个第二导电型区域, 光吸收层从上表面延伸到吸收层一定程度,并且在相反侧的抗反射涂层的位置一一或二维地排列,(g)一个 设置在每个第二导电型区域的顶表面上的导电型电极。
    • 43. 发明授权
    • Semiconductor light receiving element
    • 半导体光接收元件
    • US06835990B2
    • 2004-12-28
    • US10359582
    • 2003-02-07
    • Yasuhiro IguchiAkira YamaguchiManabu ShiozakiTakashi IwasakiKenji Ohki
    • Yasuhiro IguchiAkira YamaguchiManabu ShiozakiTakashi IwasakiKenji Ohki
    • H01L310232
    • H01L31/02165G02B6/29361G02B6/4214
    • A semiconductor light receiving element has a semiconductor portion. The semiconductor portion includes a substrate, a light detecting portion, and a filter portion. The substrate, the light detecting portion, and the filter portion are provided sequentially in a direction of a predetermined axis. The light detecting portion has a light absorbing layer including a III-V semiconductor layer, a window layer including a III-V semiconductor layer, and an anode semiconductor region. The light absorbing layer is an n or i conductivity type semiconductor layer. The light absorbing layer is provided between a III-V semiconductor layer and the window layer. The light detecting portion is provided on one face of the semiconductor substrate with the III-V semiconductor layer interposed therebetween. The filter portion includes InGaAsP semiconductor layers and III-V semiconductor layers.
    • 半导体光接收元件具有半导体部分。 半导体部分包括基板,光检测部分和滤波部分。 基板,光检测部分和滤光器部分沿预定轴线方向依次设置。 光检测部分具有包括III-V半导体层的光吸收层,包括III-V半导体层的窗口层和阳极半导体区域。 光吸收层是n或i导电型半导体层。 光吸收层设置在III-V半导体层和窗口层之间。 光检测部分设置在半导体衬底的一个表面上,其间插入III-V半导体层。 滤波器部分包括InGaAsP半导体层和III-V半导体层。
    • 48. 发明授权
    • Image pickup device, visibility support apparatus, night vision device, navigation support apparatus, and monitoring device
    • 图像拾取装置,可见度支持装置,夜视装置,导航支援装置和监视装置
    • US08564666B2
    • 2013-10-22
    • US13548668
    • 2012-07-13
    • Youichi NagaiYasuhiro Iguchi
    • Youichi NagaiYasuhiro Iguchi
    • H04N7/18
    • B82Y20/00H01L27/14649H01L27/14694H01L31/035236
    • An image pickup device, a visibility support apparatus, a night vision device, a navigation support apparatus, and a monitoring device are provided in which noise and dark current are suppressed to thereby provide clear images regardless of whether it is day or night. The device includes a light-receiving layer 3 having a multi-quantum well structure and a diffusion concentration distribution control layer 4 disposed on the light-receiving layer so as to be opposite an InP substrate 1, wherein the light-receiving layer has a band gap wavelength of 1.65 to 3 μm, the diffusion concentration distribution control layer has a lower band gap energy than InP, a pn junction is formed for each light-receiving element by selective diffusion of an impurity element, and the impurity selectively diffused in the light-receiving layer has a concentration of 5×1016/cm3 or less. A diffusion concentration distribution control layer has an n-type impurity concentration of 2×1015/cm3 or less before the diffusion, the diffusion concentration distribution control layer having a portion adjacent to the light-receiving layer, the portion having a low impurity concentration. The concentration of the impurity element selectively diffused in the diffusion concentration distribution control layer is decreased to be 5×1016/cm3 or less toward the light-receiving layer.
    • 提供了一种图像拾取装置,可视性支持装置,夜视装置,导航支持装置和监视装置,其中抑制噪声和暗电流,从而提供清晰的图像,而不管它是白天还是夜晚。 该装置包括具有多量子阱结构的光接收层3和设置在光接收层上以与InP衬底1相对的扩散浓度分布控制层4,其中光接收层具有带 间隙波长为1.65〜3μm,扩散浓度分布控制层具有比InP低的带隙能量,通过杂质元素的选择性扩散形成每个受光元件的pn结,并且杂质选择性地扩散到光 接收层的浓度为5×1016 / cm3以下。 扩散浓度分布控制层在扩散前具有2×1015 / cm3以下的n型杂质浓度,扩散浓度分布控制层具有与光接收层相邻的部分,该杂质浓度低的部分。 在扩散浓度分布控制层中选择性扩散的杂质元素的浓度降低到光接收层的5×1016 / cm3以下。
    • 49. 发明授权
    • Light receiving device
    • 光接收装置
    • US08120061B2
    • 2012-02-21
    • US12522296
    • 2008-01-07
    • Yasuhiro IguchiYuichi Kawamura
    • Yasuhiro IguchiYuichi Kawamura
    • H01L31/102
    • B82Y20/00H01L31/03046H01L31/035236H01L31/109Y02E10/544
    • A light receiving device having small dark current and capable of sensing light in the wavelength range of 2.0 μm to 3.0 μm with high sensitivity is provided. The light receiving device has an InP substrate, and a light receiving layer formed by alternately stacking a larger layer formed of GaInNAsSbP mixed crystal having nitrogen content of at most 5% in 5 group, larger lattice constant than that of InP and thickness between hc and 11hc, the critical thickness hc being determined as hc=b(1−ν cos2α){log(hc/b)+1}/8πf(1+ν)cos λ and a smaller layer formed of GaInNAsSbP mixed crystal having nitrogen content of at most 5% in 5 group, smaller lattice constant than that of InP and thickness between hc and 11hc; absolute value of lattice mismatch of the larger layer and the smaller layer to the InP substrate is at least 0.5% and at most 5%; at least one of the layers has absorption edge wavelength of 2.0 μm to 3.0 μm; total thickness of respective layers is 2.0 μm to 4.0 μm; and thickness-weighted average lattice mismatch is set to be at most ±0.2%.
    • 提供具有小的暗电流并且能够以高灵敏度感测波长范围为2.0μm至3.0μm的光的光接收装置。 光接收装置具有InP基板,并且通过交替堆叠由5组中具有至多5%的氮含量的GaInNAsSbP混合晶体形成的较大层而形成的光接收层,其比InP的晶格常数大,hc和 11hc,临界厚度hc被确定为hc = b(1-&ngr;cos2α){log(hc / b)+1} / 8&pgr; f(1 +&ngr))cosλ,以及由GaInNAsSbP混合晶体形成的较小层 5组氮含量最多为5%,晶格常数小于InP,hc和11hc之间的厚度较小; 较大层和较小层与InP衬底的晶格失配的绝对值为至少0.5%且至多5%; 所述层中的至少一层的吸收边缘波长为2.0μm〜3.0μm; 各层的总厚度为2.0μm〜4.0μm; 厚度加权平均晶格失配最大为±0.2%。