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    • 50. 发明申请
    • Gradient colored mask
    • 渐变色面具
    • US20090130398A1
    • 2009-05-21
    • US11986189
    • 2007-11-20
    • Lyn M. IrvingMark E. IrvingLan B. Thai
    • Lyn M. IrvingMark E. IrvingLan B. Thai
    • G03F1/00G03F7/26
    • H01L27/1288G03F7/0005G03F7/2022H01L27/1214H01L27/1225H01L29/66765H01L29/7869Y10T428/24802
    • The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.
    • 本发明涉及一种用于形成结构的方法,包括:(a)提供透明支撑体; (b)形成具有选定的吸收光谱范围的彩色掩模,其中所述彩色掩模具有有效透明部分和部分吸收部分,其中所述部分吸收部分包括在吸收光谱范围内具有不同光密度的至少两个部分; (c)在吸收光谱范围内涂覆对可见光敏感的光致图案材料层; (d)曝光和显影所述光图案化材料以形成对应于所述部分吸收部分的所述两个部分中的至少一个的光图案; 和(e)沉积和图案化功能材料层,使得功能材料的图案对应于部分吸收部分的所述两个部分中的至少一个。