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41. 发明授权

US06941109B2 Computing network path delays so accurate absolute time can be forwarded from a server to a client 有权
标题翻译：计算网络路径延迟如此精确的绝对时间可以从服务器转发到客户端
公开(公告)号：US06941109B2
公开(公告)日：2005-09-06
申请号：US10079251
申请日：2002-02-19
申请人： Hiroshi Matsushita , Paul W. McBurney
发明人： Hiroshi Matsushita , Paul W. McBurney
IPC分类号： G04G5/00 , G01S1/00 , G01S19/25 , G06F13/00 , H04J3/06 , H04B7/19
CPC分类号： G01S19/256 , H04J3/0644 , H04J3/0667
摘要： A navigation-satellite receiver support data network comprises a server connected to the Internet to provide initialization information to clients for faster cold starts. The server includes a GPS receiver that provides for tracking of a constellation of navigation satellites. When a client is started cold, time and frequency are initially unknown to it. Test messages are sent back and forth over the Internet and a path delay time is computed from the average of the quickest transit times. This yields the offset time between the server's time system and the client's time system. The server sends current time information to the client, and the computed path delay is added. The client can then compute correct time from the server and path delay information, and thereby select much sooner which satellites are correct to search.
摘要翻译：导航卫星接收机支持数据网络包括连接到因特网的服务器，以向客户端提供初始化信息以用于更快的冷启动。服务器包括GPS接收器，用于跟踪导航卫星的星座。当客户开始冷静时，时间和频率最初是未知的。测试消息通过互联网来回发送，并且路径延迟时间是从最快的传输时间的平均值来计算的。这产生了服务器的时间系统和客户端的时间系统之间的偏移时间。服务器向客户端发送当前时间信息，并添加计算出的路径延迟。然后，客户端可以从服务器和路径延迟信息计算正确的时间，从而选择更早的哪个卫星正确搜索。

42. 发明授权

US6146911A Semiconductor wafer and method of manufacturing the same 有权
标题翻译：半导体晶片及其制造方法
公开(公告)号：US6146911A
公开(公告)日：2000-11-14
申请号：US263216
申请日：1999-03-05
申请人： Norihiko Tsuchiya , Hiroshi Matsushita
发明人： Norihiko Tsuchiya , Hiroshi Matsushita
IPC分类号： H01L21/324 , H01L21/02 , H01L21/66
CPC分类号： H01L22/12
摘要： The average density and scattered light intensity or the average density and average size of void defects contained in a surface region in a predetermined depth of a semiconductor wafer sample are measured. An ingot whose a semiconductor wafer sample satisfies D.times.Is.ltoreq.a predetermined value between the measured average density D and scattered light intensity Is or satisfies D.times.L.sup.3 .ltoreq.fixed value between the measured average density D and average size L is extracted and wafers cut from the ingot are annealed. The semiconductor wafers having few residual defects in a surface region wherein devices are to be formed can be obtained.
摘要翻译：测量包含在半导体晶片样品的预定深度的表面区域中的空隙的平均密度和散射光强度或平均密度和平均尺寸。将半导体晶片样品满足DxIs之间的测量平均密度D和散射光强度Is之间的预定值或满足DxL3 <测量平均密度D和平均尺寸L之间的固定值的晶锭，并从锭退火。可以获得在要形成器件的表面区域中具有很少残留缺陷的半导体晶片。

43. 发明授权

US5401375A Electro-endosmosis type dehydrator 失效
标题翻译：电渗式脱水机
公开(公告)号：US5401375A
公开(公告)日：1995-03-28
申请号：US54880
申请日：1993-04-30
申请人： Mikimasa Yamaguchi , Hitomi Kawakami , Hiroshi Matsushita , Hiroshi Imanishi
发明人： Mikimasa Yamaguchi , Hitomi Kawakami , Hiroshi Matsushita , Hiroshi Imanishi
IPC分类号： B01D61/56 , B30B9/24 , C02F11/12 , F26B5/00 , B01D57/02 , B01D61/42
CPC分类号： C02F11/12 , B01D61/56 , B30B9/241 , F26B5/00
摘要： In an electro-endosmosis type dehydrator in which the voltage of an electric power source 6 is applied across a rotary drum 1 having electrodes on the cylindrical wall and a press belt 3 confronted through a sludge passageway 4 with the cylindrical wall of the rotary drum, and water contained in the sludge 8 supplied to the sludge passageway is collected on the side of the press belt and discharged therefrom. The electrodes (or electrode assembly 2) on the rotary drum are a plurality of wire electrodes 22 which are arranged on the cylindrical wall of the rotary drum in such a manner that they are in parallel with one another with degasifying slits therebetween, whereby the gas produced on the side of the rotary drum by electrolysis of the sludge during electroendosmosis dehydration is quickly discharge out of the system through the degasifying slits.
摘要翻译：在将电力供应源6的电压施加在圆筒壁上具有电极的旋转滚筒1和通过污泥通道4与旋转滚筒的圆筒壁面对的压榨带3的电渗内型脱水机中，供给到污泥通道的污泥8中所含的水被收集在压榨带侧并从其排出。旋转滚筒上的电极（或电极组件2）是多个线电极22，它们以这样的方式设置在旋转鼓的圆筒壁上，使得它们彼此平行并具有脱气狭缝，由此气体在电沉积脱水期间通过电解电解在旋转鼓的一侧产生，通过脱气狭缝快速地排出系统。

44. 发明授权

US5198933A Recording medium emergency release mechanism 失效
标题翻译：记录中等紧急释放机制
公开(公告)号：US5198933A
公开(公告)日：1993-03-30
申请号：US666166
申请日：1991-03-07
申请人： Hiroshi Matsushita , Koichiro Nanke , Kouji Takahashi
发明人： Hiroshi Matsushita , Koichiro Nanke , Kouji Takahashi
IPC分类号： G11B17/04 , G11B17/043
CPC分类号： G11B17/0438
摘要： The invention is an information reproduction apparatus provided with supporting means for supporting a recording medium, a drive source for moving the recording medium between the initial insertion position and the reproduction position by driving said supporting means, transmission means for transmitting the driving force of said drive source to said supporting means, retraction means operable to force a transmission element to retract from said transmission means, said transmission element being a part of said transmission means, and motion means operable to force the recording medium to move from the reproduction position to the initial insertion position under the condition that said transmission element is not engaged in said transmission means. In forcibly moving said supporting means, when the drive is out of operation, said supporting means are released from the drive force by means of said retraction means, freeing the supporting means from the resistance force of the drive force.

45. 发明授权

US4435391A Dibenzoxazepine derivative, and pharmaceutical composition comprising the same 失效
标题翻译：二苯并氮杂衍生物，以及包含其的药物组合物
公开(公告)号：US4435391A
公开(公告)日：1984-03-06
申请号：US354651
申请日：1982-03-04
申请人： Kazuo Sasahara , Masamitsu Honda , Masuo Koizumi , Yasushi Murakami , Tomohiro Neichi , Hiroshi Nakakimura , Yukifumi Noda , Hiroshi Matsushita , Shun-ichi Hata
发明人： Kazuo Sasahara , Masamitsu Honda , Masuo Koizumi , Yasushi Murakami , Tomohiro Neichi , Hiroshi Nakakimura , Yukifumi Noda , Hiroshi Matsushita , Shun-ichi Hata
IPC分类号： A61K31/55 , A61P3/06 , A61P3/08 , A61P7/02 , C07D267/20 , C07D273/06
CPC分类号： C07D267/20 , Y10S514/866
摘要： Dibenzoxazepine derivatives of the formula: ##STR1## wherein R.sub.1, n, R.sub.2 and R.sub.3 are as defined in the description, process for preparing the same, pharmaceutical composition containing the same and method of treating diseases in circulatory organs administering the composition to a patient are disclosed.The compounds of the formula have lipid lowering activity, lipid peroxide lowering activity, blood sugar lowering activity and activity to inhibit the aggregation of platelets, and hence are useful as a medicine.
摘要翻译：下式的二苯并氮杂衍生物：其中R 1，n，R 2和R 3如说明书中所定义，其制备方法，含有该化合物的药物组合物和治疗患者的该组合物的循环器官中的疾病的方法是披露该化合物具有降脂活性，脂质过氧化物降低活性，血糖降低活性和抑制血小板聚集的活性，因此可用作药物。

46. 发明申请

US20130083549A1 LED LIGHTING DEVICE AND LED LUMINAIRE 审中-公开
标题翻译： LED照明设备和LED路灯
公开(公告)号：US20130083549A1
公开(公告)日：2013-04-04
申请号：US13598150
申请日：2012-08-29
申请人： Yuichiro Takahara , Masahiko Kamata , Hiroshi Matsushita , Hiromichi Nakajima , Shigeru Osawa , Shinichiro Matsumoto
发明人： Yuichiro Takahara , Masahiko Kamata , Hiroshi Matsushita , Hiromichi Nakajima , Shigeru Osawa , Shinichiro Matsumoto
IPC分类号： F21V29/00
CPC分类号： F21S8/026 , F21V15/01 , F21V23/005 , F21V29/70 , F21V29/713 , F21V29/89 , F21Y2115/10
摘要： According to one embodiment, the device main body includes a main body portion, a protruding portion, and a heat conducting portion. The main body portion has an opening on one end side and has a wall portion on the other end side that is opposite to the opening side. The protruding portion protrudes from the wall portion and an inside thereof continues into the main body portion. The heat conducting portion has one end side thereof protruding from the wall portion toward the opening and has the other end side thereof connected to the protruding portion in a way that enables heat conduction. The light emitting unit is connected to the one end side of the heat conducting portion in a way that enables heat conduction. The lighting unit is housed inside the device main body and a portion of the lighting circuit component is arranged inside the protruding portion.
摘要翻译：根据一个实施例，装置主体包括主体部分，突出部分和导热部分。主体部在一端侧具有开口部，在与开口侧相反的另一端侧具有壁部。突出部从壁部突出，其内部延伸到主体部。导热部的一端侧从壁部向开口突出，另一端侧以突出部与导热部连接。发光单元以能够进行热传导的方式连接到导热部分的一端侧。照明单元容纳在设备主体内部，并且照明电路部件的一部分布置在突出部分的内部。

47. 发明授权

US07970486B2 Method for controlling semiconductor manufacturing apparatus and control system of semiconductor manufacturing apparatus 有权
标题翻译：半导体制造装置的半导体制造装置及控制系统的控制方法
公开(公告)号：US07970486B2
公开(公告)日：2011-06-28
申请号：US11714231
申请日：2007-03-06
申请人： Hiroshi Matsushita , Junji Sugamoto , Masafumi Asano
发明人： Hiroshi Matsushita , Junji Sugamoto , Masafumi Asano
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32194 , G05B2219/45031 , Y02P90/18 , Y02P90/22
摘要： A method for controlling a semiconductor manufacturing apparatus for processing wafers divided for each lot, has acquiring quality control value data group containing quality control value data of wafers in a plurality of lots previously processed, and an equipment engineering system parameter group containing equipment engineering system parameters corresponding to the wafers; creating a prediction formula of quality control value data, acquiring a first equipment engineering system parameters; inputting the first equipment engineering system parameters to the prediction formula, and performing calculation to predict first quality control value data of the wafers in the first lot; determining processing of the wafers corresponding to the first quality control value data; acquiring measured first quality control value data of the wafers in the first lot; replacing the quality control value data corresponding to the wafers in the first processed lot; updating the prediction formula.
摘要翻译：一种用于控制用于处理每批批次的晶片的半导体制造装置的方法，具有包含先前处理的多个批次中的晶片的质量控制值数据的采集质量控制值数据组，以及包含设备工程系统参数的设备工程系统参数组对应于晶片; 创建质量控制值数据预测公式，获取第一设备工程系统参数; 将第一设备工程系统参数输入到预测公式中，并且执行计算以预测第一批中的晶片的第一质量控制值数据; 确定与第一质量控制值数据对应的晶片的处理; 获取第一批中的晶片的测量的第一质量控制值数据; 替换与第一处理批次中的晶片对应的质量控制值数据; 更新预测公式。

48. 发明授权

US07405088B2 Method for analyzing fail bit maps of waters and apparatus therefor 失效
标题翻译：分析水域及其设备失效位图的方法
公开(公告)号：US07405088B2
公开(公告)日：2008-07-29
申请号：US10801992
申请日：2004-03-17
申请人： Hiroshi Matsushita , Kenichi Kadota , Kenji Kawabata , Yoshiyuki Shioyama
发明人： Hiroshi Matsushita , Kenichi Kadota , Kenji Kawabata , Yoshiyuki Shioyama
IPC分类号： H01L21/00
CPC分类号： H01L22/20
摘要： A failure analysis method according to the invention includes inputting the positions of failures in multiple wafers of an input device; preparing multiple sections in the multiple wafers; calculating feature amounts, which are represented by at least one numerical value representing a distribution of the failures in the multiple wafers, for each of the multiple sections; and representing by a first numerical value, the degree of similarity between the multiple wafers in terms of the feature amounts. Subsequently, the method includes detecting another wafer, which has the first numerical value greater than a predetermined first threshold, for each of the multiple wafers and forming a similar wafer group of multiple wafers with similar distributions of the failures.
摘要翻译：根据本发明的故障分析方法包括在输入设备的多个晶片中输入故障的位置; 准备多个晶片的多个部分; 计算特征量，其由表示多个晶片中的故障的分布的至少一个数值表示，用于多个部分中的每一个; 并且通过第一数值表示在特征量方面的多个晶片之间的相似度。随后，该方法包括对于每个多个晶片检测具有大于预定第一阈值的第一数值的另一个晶片，并且形成具有类似故障分布的多个晶片的相似晶片组。

49. 发明申请

US20070225853A1 Method for controlling semiconductor manufacturing apparatus and control system of semiconductor manufacturing apparatus 有权
标题翻译：半导体制造装置的半导体制造装置及控制系统的控制方法
公开(公告)号：US20070225853A1
公开(公告)日：2007-09-27
申请号：US11714231
申请日：2007-03-06
申请人： Hiroshi Matsushita , Junji Sugamoto , Masafumi Asano
发明人： Hiroshi Matsushita , Junji Sugamoto , Masafumi Asano
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32194 , G05B2219/45031 , Y02P90/18 , Y02P90/22
摘要： A method for controlling a semiconductor manufacturing apparatus for processing wafers divided for each lot, has acquiring quality control value data group containing quality control value data of wafers in a plurality of lots previously processed, and an equipment engineering system parameter group containing equipment engineering system parameters corresponding to the wafers; creating a prediction formula of quality control value data, acquiring a first equipment engineering system parameters; inputting the first equipment engineering system parameters to the prediction formula, and performing calculation to predict first quality control value data of the wafers in the first lot; determining processing of the wafers corresponding to the first quality control value data; acquiring measured first quality control value data of the wafers in the first lot; replacing the quality control value data corresponding to the wafers in the first processed lot; updating the prediction formula.
摘要翻译：一种用于控制用于处理每批批次的晶片的半导体制造装置的方法，具有包含先前处理的多个批次中的晶片的质量控制值数据的采集质量控制值数据组，以及包含设备工程系统参数的设备工程系统参数组对应于晶片; 创建质量控制值数据预测公式，获取第一设备工程系统参数; 将第一设备工程系统参数输入到预测公式中，并且执行计算以预测第一批中的晶片的第一质量控制值数据; 确定与第一质量控制值数据对应的晶片的处理; 获取第一批中的晶片的测量的第一质量控制值数据; 替换与第一处理批次中的晶片对应的质量控制值数据; 更新预测公式。

50. 发明授权

US07162072B2 Semiconductor processing device, semiconductor processing system and semiconductor processing management method 失效
标题翻译：半导体处理器件，半导体处理系统和半导体处理管理方法
公开(公告)号：US07162072B2
公开(公告)日：2007-01-09
申请号：US10328937
申请日：2002-12-24
申请人： Hiroshi Matsushita
发明人： Hiroshi Matsushita
IPC分类号： G06K9/00 , H04N7/18
CPC分类号： H01L21/67253 , G01N21/9501 , G01N2021/95615 , G06T7/0004 , G06T2207/30148 , Y10T29/41
摘要： A semiconductor processing device includes a processing section to process a semiconductor substrate in accordance with job information which is used to process the semiconductor substrate. An imaging section takes an image of a processed portion of the semiconductor substrate for each time of processing by the processing section. An image-processing section converts any one and another of the images to image data which are different from each other in data volume, and associates a result of processing from the processing section, the job information and the image data with each other in each processing. An input/output section outputs at least the result of processing and the image data.
摘要翻译：半导体处理装置包括根据用于处理半导体衬底的作业信息来处理半导体衬底的处理部分。成像部分通过处理部分每次处理半导体衬底的处理部分的图像。图像处理部分将图像中的任何一个和另一个转换为在数据量中彼此不同的图像数据，并且在每个处理中将来自处理部分的处理结果，作业信息和图像数据相关联。输入/输出部分至少输出处理结果和图像数据。

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