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41. 发明授权

US07110105B2 Method and apparatus for inspecting pattern defects 有权
公开(公告)号：US07110105B2
公开(公告)日：2006-09-19
申请号：US11192021
申请日：2005-07-29
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/9501 , G01N21/95684 , G01N2021/9513
摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

42. 发明申请

US20050264800A1 Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20050264800A1
公开(公告)日：2005-12-01
申请号：US11192021
申请日：2005-07-29
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956
CPC分类号： G01N21/95607 , G01N21/9501 , G01N21/95684 , G01N2021/9513
摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.
摘要翻译：用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性并且用相干减少的狭缝状激光束照射样品。获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

43. 发明申请

US20050206888A1 Method and apparatus for inspecting a pattern formed on a substrate 失效
标题翻译：用于检查在基板上形成的图案的方法和装置
公开(公告)号：US20050206888A1
公开(公告)日：2005-09-22
申请号：US11131379
申请日：2005-05-18
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G01N21/956 , G03F7/20 , G03F9/00
CPC分类号： G03F7/7065 , G01N21/95684
摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.
摘要翻译：图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器显示由图像处理器检测到的缺陷的信息。

44. 发明授权

US06943876B2 Method and apparatus for detecting pattern defects 失效
标题翻译：检测图案缺陷的方法和装置
公开(公告)号：US06943876B2
公开(公告)日：2005-09-13
申请号：US10223423
申请日：2002-08-20
申请人： Minoru Yoshida , Sachio Uto , Shunji Maeda , Toshihiko Nakata
发明人： Minoru Yoshida , Sachio Uto , Shunji Maeda , Toshihiko Nakata
IPC分类号： G01B11/30 , G01N21/956 , H01L21/66 , G02N21/88
CPC分类号： G01N21/95684
摘要： A method and apparatus for detecting pattern defects which includes annularly scanning of a laser beam emitted from a laser light source on a pupil of an objective lens, illuminating the scanned laser beam, through the objective lens, onto a sample on which there is formed a pattern coated with an optically transparent thin film, acquiring an optical image of the illuminated sample, and processing the acquired image to find defects in the pattern. The annular scan diameter of the laser beam is determined based on the thickness of the optically transparent thin film.
摘要翻译：一种用于检测图案缺陷的方法和装置，其包括从物镜的瞳孔上的激光光源发射的激光束的环状扫描，将扫描的激光束通过物镜照射到其上形成有涂覆有光学透明薄膜的图案，获取照射样品的光学图像，以及处理所获取的图像以发现图案中的缺陷。基于光学透明薄膜的厚度确定激光束的环形扫描直径。

45. 发明授权

US06765201B2 Ultraviolet laser-generating device and defect inspection apparatus and method therefor 有权
标题翻译：紫外线激光发生装置及缺陷检查装置及其方法
公开(公告)号：US06765201B2
公开(公告)日：2004-07-20
申请号：US09764457
申请日：2001-01-19
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunji Maeda
IPC分类号： G21K700
CPC分类号： G01N21/956 , G01N21/33 , G02F2001/3505 , G02F2001/3542 , H01S3/0092
摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.
摘要翻译：一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗并且在其中安装波长转换器装置，其中容器被气密密封，并在其中填充有惰性气体，例如氮气或氩气。

46. 发明授权

US08553214B2 Method and equipment for detecting pattern defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US08553214B2
公开(公告)日：2013-10-08
申请号：US12876709
申请日：2010-09-07
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

47. 发明申请

US20100104173A1 Method And Apparatus For Inspecting A Pattern Formed On A Substrate 有权
标题翻译：检查基板上形成的图案的方法和装置
公开(公告)号：US20100104173A1
公开(公告)日：2010-04-29
申请号：US12649898
申请日：2009-12-30
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe , Masahiro Watanabe
IPC分类号： G06K9/62
CPC分类号： G03F7/7065 , G01N21/95684
摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.
摘要翻译：将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息。

48. 发明申请

US20090153840A1 Method And Apparatus For Inspecting Pattern Defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：US20090153840A1
公开(公告)日：2009-06-18
申请号：US12366003
申请日：2009-02-05
申请人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
发明人： Minoru Yoshida , Shunji Maeda , Atsushi Shimoda , Kaoru Sakai , Takafumi Okabe
IPC分类号： G01N21/88 , G01N21/00
CPC分类号： G01N21/95684 , G01N2021/9513
摘要： An apparatus and method for inspecting defects includes an illuminator for irradiating light having an ultraviolet wavelength emitted from a light source onto a specimen through a reflection objective lens, an image-former for forming an image of light reflected from the specimen by the illumination of the light from the illuminator, which is passed through at least the reflection objective lens, a detector which detects the image of light formed by the image-former with an image sensor, and an image processor for processing a signal output from the detector to detect defects on the specimen. The image sensor is a reverse-surface irradiation type image sensor.
摘要翻译：用于检查缺陷的装置和方法包括：照射器，用于将通过光源发射的具有从光源发射的紫外线波长的光通过反射物镜照射到样本上;成像器，用于形成从样本反射的光的图像，至少通过反射物镜的照明器的光，用图像传感器检测由成像器形成的光的图像的检测器，以及用于处理从检测器输出的信号以检测缺陷的图像处理器在标本上。图像传感器是反面照射型图像传感器。

49. 发明申请

US20090073443A1 Method And Equipment For Detecting Pattern Defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20090073443A1
公开(公告)日：2009-03-19
申请号：US12271348
申请日：2008-11-14
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本，检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

50. 发明授权

US07221486B2 Method and apparatus for picking up 2D image of an object to be sensed 失效
标题翻译：拾取被感测物体的2D图像的方法和装置
公开(公告)号：US07221486B2
公开(公告)日：2007-05-22
申请号：US10265659
申请日：2002-10-08
申请人： Hiroshi Makihira , Shunji Maeda , Kenji Oka , Minoru Yoshida , Yasuhiko Nakayama
发明人： Hiroshi Makihira , Shunji Maeda , Kenji Oka , Minoru Yoshida , Yasuhiko Nakayama
IPC分类号： H04N1/04
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A method and apparatus for sensing by a linear image sensor a two-dimensional image of an object to be sensed includes detecting a position of the object by a position sensor having a first resolution, picking up an image of the object being projected in a direction (V-scan direction) generally perpendicular to an internal scan (H-scan) direction of the linear image sensor in synchronism with relative movement between the object and the linear image sensor, periodically switching a pixel size along the V-scan direction between a plurality of predefined pixel sizes during the relative movement between the object and the linear image sensor in accordance with information of the relative movement detected by the position sensor, and producing from an output of the linear image sensor a two-dimensional image of the projected image having a second resolution of the object to be sensed. The second resolution is a higher resolution than the first resolution.
摘要翻译：一种用于通过线性图像传感器检测待检测物体的二维图像的方法和装置包括通过具有第一分辨率的位置传感器检测物体的位置，拾取沿着方向投影的物体的图像（V扫描方向），与物体和线性图像传感器之间的相对运动同步地与线性图像传感器的内部扫描（H扫描）方向大致垂直，周期性地沿着V扫描方向切换像素尺寸，根据由位置传感器检测到的相对运动的信息，在物体和线性图像传感器之间的相对运动期间的多个预定像素尺寸，并且从线性图像传感器的输出产生投影图像的二维图像具有要被感测的物体的第二分辨率。第二项决议是比第一项决议更高的决议。

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