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    • 41. 发明授权
    • Process for the production of polyamidocarboxylic acids
    • 制备聚酰胺羧酸的方法
    • US3981847A
    • 1976-09-21
    • US521848
    • 1974-11-07
    • Gerhard MeyerAnton TothDieter Laudien
    • Gerhard MeyerAnton TothDieter Laudien
    • C08G73/00C08G73/10
    • C08G73/1032
    • A process for the producing a polyamidocarboxylic acid, or so-called polyamic acid, which is the prepolymer in forming a polyamide and which requires the reaction of a tetracarboxylic acid dianhydride with a diprimary diamine below about 50.degree.C. in an anhydrous, polar, aprotic organic solvent, characterized by an initial treatment of the dianhydride by only wetting with an inert organic solvent or by at least wetting this dianhydride with the polar, aprotic solvent and thereafter adding to the wetted dianhydride a solution of the diamine in the polar, aprotic solvent under thorough mixing, preferably within a very short period of time after treating the dianhydride. Stable polyamic acid solutions formed in this manner are useful intermediates in preparing films, filaments or other shaped polyimide products.
    • 制备聚酰胺羧酸或所谓的聚酰胺酸的方法,该聚酰胺酸是形成聚酰胺中的预聚物,其需要使四羧酸二酐与低于约50℃的二元二胺在无水,极性, 非质子有机溶剂,其特征在于通过仅用惰性有机溶剂润湿或至少用极性非质子溶剂润湿该二酐,然后将二胺在极性,非质子中的溶液加入到二酸酐中,初始处理二酐 溶剂在充分混合下,优选在处理二酐之后的非常短的时间内。 以这种方式形成的稳定的聚酰胺酸溶液是制备膜,长丝或其它成型聚酰亚胺产品的有用的中间体。
    • 46. 发明申请
    • DEFINING A PATTERN ON A SUBSTRATE
    • 在基板上定义一个图案
    • US20080074656A1
    • 2008-03-27
    • US11949038
    • 2007-12-02
    • Gerhard MeyerHanspeter OttReto SchlittlerPercy Zahl
    • Gerhard MeyerHanspeter OttReto SchlittlerPercy Zahl
    • G01N21/00
    • G03F7/2047G03F1/84H01J2237/2817H01J2237/2818
    • The invention provides an apparatus for defining a pattern on a substrate (52). The apparatus comprises an emission source (48) for directing an emission (50) to the substrate (52), defining a working position (60) between the emission source (48) and the substrate (52), at least one shadow mask (66) having one or more apertures (68, 70, 72, 74) and at least one inspection device for inspecting the properties of the substrate (52) and/or the pattern, the inspection device having at least one inspection tool (82; 88, 90, 92, 94). The shadow mask (66) and the inspection tool (82; 88, 90, 92, 94) are separately provided on a movable portion (6), so that the shadow mask (66) and the inspection tool (82; 88, 90, 92, 94) are subsequently movable into the working position (60). The invention is further related to a method for defining a pattern on a substrate.
    • 本发明提供一种用于在衬底(52)上限定图案的装置。 该装置包括用于将发射(50)引导到衬底(52)的发射源(48),限定在发射源(48)和衬底(52)之间的工作位置(60),至少一个荫罩( 66)具有一个或多个孔(68,70,72,74)和至少一个用于检查基底(52)和/或图案的性质的检查装置,所述检查装置具有至少一个检查工具(82; 88,90,92,94)。 阴影掩模(66)和检查工具(82; 88,90,92,94)分别设置在可动部分(6)上,使得荫罩(66)和检查工具(82; 88,90 ,92,94)随后可移动到所述工作位置(60)中。 本发明还涉及一种用于在衬底上限定图案的方法。