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    • 41. 发明授权
    • Mask manufacturing method
    • 面膜制作方法
    • US06839890B2
    • 2005-01-04
    • US10247947
    • 2002-09-20
    • Mitsuro SugitaKenji SaitohKenji Yamazoe
    • Mitsuro SugitaKenji SaitohKenji Yamazoe
    • G03F1/42G03F1/36G03F1/68G03F1/70G03F1/76G03F7/20H01L21/027G06K17/50
    • G03F1/36
    • A method for forming, on a mask, a mask pattern used for exposure. The mask pattern includes a first pattern that blends plural types of patterns, and second pattern that is smaller in size than the first pattern. The mask pattern is arranged on the mask so that the first pattern may be resolved and the second pattern is restrained from being resolved. The method includes the steps of classifying the first pattern into one of a periodic pattern having at least three elements having two equal intervals in at least one direction among two orthogonal directions, an isolated pair pattern that does not belong to the periodic pattern and includes a pair of elements arranged in at least one direction among the two orthogonal directions, and an isolated element that does not belong to the isolated pair pattern and includes only one element without constituting any pair in any of the two orthogonal directions, arranging the second pattern for the isolated pair pattern, arranging the second pattern for the isolated element, and arranging the second pattern for the periodic pattern.
    • 一种在掩模上形成用于曝光的掩模图案的方法。 掩模图案包括混合多种类型的图案的第一图案和尺寸小于第一图案的第二图案。 掩模图案被布置在掩模上,使得可以解析第一图案并且限制第二图案被解析。 该方法包括以下步骤:将第一图案分类为在两个正交方向之间的至少一个方向上具有至少三个具有两个等间隔的元件的周期性图案之一,不属于周期性图案的隔离对图案,并且包括 在两个正交方向上沿至少一个方向布置的一对元件,以及不属于隔离对图案并且仅包含一个元件而不在两个正交方向中的任一个中构成任何对的隔离元件,将第二图案设置为 隔离对图案,布置用于隔离元件的第二图案,并且布置用于周期性图案的第二图案。
    • 42. 发明授权
    • Mask pattern creating method and mask pattern creating apparatus
    • 掩模图案创建方法和掩模图案制作装置
    • US06670080B2
    • 2003-12-30
    • US09356700
    • 1999-07-20
    • Mitsuro SugitaTetsunobu Kochi
    • Mitsuro SugitaTetsunobu Kochi
    • G03F900
    • G03F7/70466G03F1/70G03F7/203
    • A method for creating a mask pattern used in multiple exposure for carrying out overlay printing of a micro-line pattern and a mask pattern a minimum line width of which is wider than a line width of the micro-line pattern to form a target pattern having a minimum line width corresponding to the line width of the micro-line pattern, the method having: a step of preparing data of the target pattern desired to form after the exposure; a step of carrying out a logical operation of predetermined micro-line pattern data and the target pattern data; a step of dividing a surface of the mask pattern into plural types of areas, based on the result of the logical operation; a step of setting a single light transmittance or a plurality of light transmittances required or allowed for the types of areas and grouping areas for which one light transmittance can be selected, in each light transmittance; and a step of synthesizing a synthetic pattern from grouped patterns formed in the respective light transmittances, wherein data of the synthetic pattern is used as data of the mask pattern.
    • 一种用于创建用于多次曝光的掩模图案的方法,用于执行微线图案的叠加印刷和其最小线宽比微线图案的线宽宽的掩模图案,以形成具有 与微线图案的线宽对应的最小线宽,该方法具有:准备在曝光之后形成的目标图案的数据的步骤;执行预定微线图案的逻辑运算的步骤 数据和目标图案数据;基于逻辑操作的结果将掩模图案的表面划分为多种类型的区域的步骤;将单个光透射率或多个光透射率设置为要求或允许的步骤 在每种透光率下,可以选择一种透光率的区域和分组区域的类型; 以及从形成在各个光透射中的分组图案合成合成图案的步骤,其中使用合成图案的数据作为掩模图案的数据。
    • 44. 发明授权
    • Optical tomographic imaging apparatus
    • 光学层析成像装置
    • US08749795B2
    • 2014-06-10
    • US13568418
    • 2012-08-07
    • Mitsuro Sugita
    • Mitsuro Sugita
    • G01B9/02
    • G01B9/02044G01B9/02048G01B9/02063G01B9/02091
    • Provided is an optical tomographic imaging apparatus that is capable of shortening a period of time of focusing at multiple focus positions when images split in a depth direction are obtained by zone focusing. The optical tomographic imaging apparatus includes: a focus position setting device for splitting a zone within a predetermined imaging depth range into multiple focus zones so as to set multiple focus positions; a reference position setting device for setting at least two reference positions in an imaging depth direction within the predetermined imaging depth range; and a focus controlling device for performing control so as to perform focusing at the multiple focus positions sequentially based on focus position information generated by the focus position setting device and a focus condition of in-focus at the at least two reference positions set in advance by the reference position setting device.
    • 提供一种光学断层图像摄像装置,其能够缩短通过区域聚焦获得沿着深度方向分割的图像时的多个聚焦位置的聚焦时间。 光学层析成像装置包括:聚焦位置设定装置,用于将预定成像深度范围内的区域分割成多个聚焦区域,以便设定多个聚焦位置; 参考位置设定装置,用于在所述预定成像深度范围内的成像深度方向上设定至少两个基准位置; 以及聚焦控制装置,用于执行控制,以便基于由聚焦位置设置装置产生的焦点位置信息和在预先设置的至少两个参考位置处的焦点对焦条件来顺序地在多个焦点位置执行聚焦。 参考位置设定装置。