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41. 发明授权

US4664815A Ink production system 失效
标题翻译：油墨生产系统
公开(公告)号：US4664815A
公开(公告)日：1987-05-12
申请号：US792244
申请日：1985-10-30
申请人： Kunitaka Ozawa , Masahiro Haruta , Tsuyoshi Eida , Takashi Hamamoto
发明人： Kunitaka Ozawa , Masahiro Haruta , Tsuyoshi Eida , Takashi Hamamoto
IPC分类号： B01D15/08 , C09B67/54
CPC分类号： C09B67/0096 , B01D15/08
摘要： An ink production system constructed with a dyestuff solution producing unit, a dyestuff solution processing unit by execution of chromatographic operations on the dyestuff solution, and an ink preparation unit to effect preparation of ink with the refined dyestuff solution as discharged from the processing unit.
摘要翻译：由染料溶液产生单元构成的油墨生产系统，通过对染料溶液进行色谱操作的染料溶液处理单元和用于从处理单元排出的精制染料溶液制备油墨的油墨制备单元。

42. 发明授权

US4521805A Printing apparatus or system 失效
标题翻译：打印设备或系统
公开(公告)号：US4521805A
公开(公告)日：1985-06-04
申请号：US370464
申请日：1982-04-21
申请人： Naoki Ayata , Seiji Saito , Hidetoshi Suzuki , Kunitaka Ozawa , Noboru Koumura , Koji Kazuma
发明人： Naoki Ayata , Seiji Saito , Hidetoshi Suzuki , Kunitaka Ozawa , Noboru Koumura , Koji Kazuma
IPC分类号： H04N1/032 , H04N1/393 , H04N1/50 , H04N1/46
CPC分类号： H04N1/506 , H04N1/032 , H04N1/3935 , H04N2201/33321 , H04N2201/33328 , H04N2201/33378
摘要： A printing apparatus has at least one first recording head and at least one second recording head. These recording heads allow recording in binary mode, halftone mode, normal mode, and fine mode. A printing system has at least two recording units. One recording unit has a plurality of recording heads for recording in yellow, cyan and magenta, and the other recording unit has a recording head for recording in black. Upon a signal scanning operation, the printing system is capable of printing a plurality of copies at high speed and with good quality. A change in size of the original does not result in a problem since the apparatus is capable of feeding a recording paper sheet of corresponding size or printing only for a desired length.
摘要翻译：打印装置具有至少一个第一记录头和至少一个第二记录头。这些记录头允许以二进制模式，半色调模式，正常模式和精细模式进行记录。打印系统具有至少两个记录单元。一个记录单元具有用于以黄色，青色和品红色记录的多个记录头，另一个记录单元具有用于黑色记录的记录头。在信号扫描操作中，打印系统能够以高速和高品质打印多个副本。原稿的尺寸变化不会产生问题，因为该装置能够以相应的尺寸或只打印期望长度的方式供给相应尺寸的记录纸。

43. 发明授权

US4476486A Image recording system utilizing a plurality of recording units 失效
标题翻译：利用多个记录单元的图像记录系统
公开(公告)号：US4476486A
公开(公告)日：1984-10-09
申请号：US328240
申请日：1981-12-07
申请人： Naoki Ayata , Noboru Koumura , Seiji Saito , Hidetoshi Suzuki , Kunitaka Ozawa , Koji Kazuma
发明人： Naoki Ayata , Noboru Koumura , Seiji Saito , Hidetoshi Suzuki , Kunitaka Ozawa , Koji Kazuma
IPC分类号： H04N1/23 , H04N1/32 , H04N1/22
CPC分类号： H04N1/2361 , H04N1/2307 , H04N1/32502 , H04N1/32523 , H04N1/32539 , H04N1/32545 , H04N1/3255 , H04N1/32555 , H04N2201/0081 , H04N2201/0082
摘要： An image recording apparatus of the invention has a number of recording units for recording image data of the same or different colors on one or more recording media; a counter to set the number of copies to be produced; and a switch device which selects the recording units to be used in a current recording operation according to the number of copies to be produced and statuses of the respective recording units. A number of copies can be produced simultaneously by the recording units within a period of time shorter than a period of time required for sequentially recording the same number of copies. Dichromatic or polychromatic recording may be freely selected or combined with monochromatic recording by selecting feed paths and an auxiliary path for guiding the recording paper sheet.
摘要翻译：本发明的图像记录装置具有多个用于在一个或多个记录介质上记录相同或不同颜色的图像数据的记录单元; 设置要生产的份数的柜台; 以及开关装置，其根据要生产的份数和各个记录单元的状态来选择要在当前记录操作中使用的记录单元。记录单元可以在短于顺序记录相同份数所需时间的时间段内同时产生多份副本。可以通过选择进给路径和用于引导记录纸的辅助路径来自由选择或与单色记录组合二色或多色记录。

44. 发明授权

US5964540A Printer apparatus 失效
标题翻译：打印机装置
公开(公告)号：US5964540A
公开(公告)日：1999-10-12
申请号：US488417
申请日：1995-06-07
申请人： Tadashi Shiina , Tetsuo Suzuki , Tetsuzo Mori , Kunitaka Ozawa , Katsunori Hatanaka , Masakazu Ozawa
发明人： Tadashi Shiina , Tetsuo Suzuki , Tetsuzo Mori , Kunitaka Ozawa , Katsunori Hatanaka , Masakazu Ozawa
IPC分类号： B41J25/304 , G06K15/10 , H04N1/50 , B41J3/54
CPC分类号： G06K15/102 , B41J25/304 , H04N1/506 , G06K2215/0077
摘要： A recording apparatus having a memory for storing recording data, and an address counter for controlling addresses in the memory in the direction of the columns or rows. The address counter controls a read start address for starting a process of reading the memory, thereby compensating for deviations in the longitudinal or widthwise direction of recording paper.
摘要翻译：具有用于存储记录数据的存储器的记录装置和用于控制存储器中列或行的方向上的地址的地址计数器。地址计数器控制用于开始读取存储器的处理的读取起始地址，从而补偿记录纸的纵向或宽度方向上的偏差。

45. 发明授权

US5898477A Exposure apparatus and method of manufacturing a device using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US5898477A
公开(公告)日：1999-04-27
申请号：US782297
申请日：1997-01-15
申请人： Keiji Yoshimura , Kunitaka Ozawa , Hiroshi Kurosawa , Noriyasu Hasegawa
发明人： Keiji Yoshimura , Kunitaka Ozawa , Hiroshi Kurosawa , Noriyasu Hasegawa
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70358 , G03F7/70058 , G03F7/70558
摘要： An exposure apparatus includes a mask scanning device for scanning a mask on which a pattern is formed, a projection optical system for projecting the pattern on the mask onto a wafer, a wafer scanning device for scanning the wafer, onto which the pattern is projected by the projection optical system, an illuminating device for illuminating the mask in an illumination area narrower than the pattern by synchronously scanning the mask and the wafer relative to each other, using the mask scanning device and the wafer scanning device, so as to expose and transfer the pattern on the wafer, a detection device for detecting information regarding exposure before exposing and transferring the pattern onto the wafer by the illuminating device and for producing detection results, and a display for displaying exposure information obtained from the detection results. Also disclosed are methods of manufacturing semiconductor devices, for example, using such an exposure apparatus.
摘要翻译：曝光装置包括用于扫描其上形成有图案的掩模的掩模扫描装置，用于将掩模上的图案投影到晶片上的投影光学系统，用于扫描晶片的晶片扫描装置，其上突出有图案的晶片扫描装置投影光学系统，使用掩模扫描装置和晶片扫描装置通过使掩模和晶片相对于彼此同步扫描而在比图案窄的照明区域中照亮掩模的照明装置，以便曝光和转印晶片上的图案，用于检测关于在通过照明装置曝光并将图案转印到晶片上并且用于产生检测结果之前的曝光的信息的检测装置，以及用于显示从检测结果获得的曝光信息的显示器。还公开了制造半导体器件的方法，例如使用这种曝光装置。

46. 发明授权

US5822389A Alignment apparatus and SOR X-ray exposure apparatus having same 失效
标题翻译：对准装置和具有该对准装置的SOR X射线曝光装置
公开(公告)号：US5822389A
公开(公告)日：1998-10-13
申请号：US464038
申请日：1995-06-05
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.
摘要翻译：同步加速器曝光包括用于产生同步加速器辐射束的同步加速器辐射源，以及具有用于保持掩模的掩模台和用于保持摇摆的晶片台的曝光单元，用于将辐射束引导到曝光单元的光束端口具有用于反射辐射束的反射镜的单元，用于使晶片相对于晶片台对准的预对准系统，用于使由晶片台保持的晶片相对于由掩模台保持的掩模对准的精细对准系统，用于存储掩模的掩模存储装置，用于存储晶片的晶片存储装置，用于在掩模存储装置和掩模台之间传送掩模的掩模传送装置和用于在晶片存储装置和掩模载台之间传送晶片的晶片传送装置晶圆台。

47. 发明授权

US5610965A Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US5610965A
公开(公告)日：1997-03-11
申请号：US197569
申请日：1994-02-17
申请人： Makiko Mori , Kunitaka Ozawa , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Eiji Sakamoto
发明人： Makiko Mori , Kunitaka Ozawa , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Eiji Sakamoto
IPC分类号： G03F1/76 , G03F7/20 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70866 , G03F7/70875
摘要： A method of exposing a wafer to exposure energy such as ultraviolet rays or X-rays through a mask to transfer a pattern of the mask onto the wafer, for example. The temperature of the mask and/or the wafer increases during the exposure operation by absorption of the exposure energy. While the wafer is being exposed, the temperature of the mask and/or the wafer is detected. If the temperature is going to exceed an exposable temperature range determined on the basis of the line width of the pattern to be transferred, the exposure operation is interrupted. Then, the heat accumulated in the mask and/or the wafer is removed. Thereafter, the exposure operation is resumed. This is repeated until the predetermined or required amount of exposure is reached, for one shot. By this, thermal expansion of the mask and the wafer during the exposure operation is prevented to assure the precision of the pattern transfer.
摘要翻译：例如，通过掩模将晶片暴露于诸如紫外线或X射线的曝光能量以将掩模的图案转印到晶片上的方法。掩模和/或晶片的温度在曝光操作期间通过吸收曝光能量而增加。当晶片被暴露时，检测掩模和/或晶片的温度。如果温度超过基于要传送的图案的线宽确定的可曝光温度范围，则曝光操作被中断。然后，除去积存在掩模和/或晶片中的热量。此后，恢复曝光操作。一直重复直到达到预定或所需的曝光量。由此，防止曝光操作期间的掩模和晶片的热膨胀，从而确保图案转印的精度。

48. 发明授权

US5579495A Information processing in which a simulation of parallelism is achieved 失效
标题翻译：实现并行仿真的信息处理
公开(公告)号：US5579495A
公开(公告)日：1996-11-26
申请号：US411406
申请日：1995-03-28
申请人： Kunitaka Ozawa , Tsuneaki Kadosawa , Takashi Nakamura , Eiji Koga , Hitoshi Watanabe
发明人： Kunitaka Ozawa , Tsuneaki Kadosawa , Takashi Nakamura , Eiji Koga , Hitoshi Watanabe
IPC分类号： G06F9/46 , G06F9/48 , G06F9/40
CPC分类号： G06F9/4881
摘要： An information processing system having a memory for storing a plurality of programs executed in a parallel processing manner, an instruction interpretation section for interpreting instructions in the programs, and an instruction execution section for executing the interpreted instructions. Queues for registering the numbers of the steps of the programs to be executed, wherein the numbers of the steps to be executed next are registered in the queues, the number of each step registered in the queues is read out, the processing to be performed in accordance with the step corresponding to the step number read out is interpreted, and instructions are given to the instruction interpretation section according to the content of the step interpreted. The step numbers of other steps to be executed are registered in the queues, and the plurality of programs are executed in parallel based on the order of the queues.
摘要翻译：一种具有用于存储以并行处理方式执行的多个程序的存储器的信息处理系统，用于解释程序中的指令的指令解释部分以及用于执行解释指令的指令执行部分。用于登记要执行的程序的步骤的编号的队列，其中接下来要执行的步骤的编号被登记在队列中，读出登记在队列中的每个步骤的数量，在根据对应于步骤编号读出的步骤进行解释，并且根据所解释的步骤的内容给出指令解释部分的指令。要执行的其他步骤的步骤号被登记在队列中，并且基于队列的顺序并行地执行多个程序。

49. 发明授权

US5226523A Conveying apparatus and method of controlling the same 失效
标题翻译：输送装置及其控制方法
公开(公告)号：US5226523A
公开(公告)日：1993-07-13
申请号：US963517
申请日：1992-10-20
申请人： Eigo Kawakami , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Mitsutoshi Kuno , Kazunori Iwamoto , Takao Kariya
发明人： Eigo Kawakami , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Mitsutoshi Kuno , Kazunori Iwamoto , Takao Kariya
IPC分类号： G03F7/20 , G05B19/23
CPC分类号： G03F7/70741 , G03F7/7075 , G05B19/231
摘要： A conveying apparatus includes a plurality of position limiting devices provided along the direction of conveyance and a selecting device operable to select one of or those of the plurality of position limiting devices which are effective in view of a target position, before a start of conveyance. The selecting device is further operable to select, again, one of or those of the plurality of position limiting devices which are effective in view of the current position of an article being conveyed, after a start of conveyance.
摘要翻译：传送装置包括沿着传送方向设置的多个位置限制装置，以及选择装置，可操作以在开始传送之前选择在目标位置有效的多个位置限制装置中的一个或那些位置限制装置。选择装置还可操作以在开始运送之后再次选择多个位置限制装置中的一个或那些位置限制装置中的一个或那些位置限制装置，其在待传送物品的当前位置有效。

50. 发明授权

US5161176A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5161176A
公开(公告)日：1992-11-03
申请号：US802705
申请日：1991-12-06
申请人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
发明人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066
摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.
摘要翻译：曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。

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