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    • 49. 发明授权
    • pMOS EEPROM non-volatile data storage
    • pMOS EEPROM非易失性数据存储
    • US6144581A
    • 2000-11-07
    • US201327
    • 1998-11-30
    • Christopher J. DiorioCarver A. Mead
    • Christopher J. DiorioCarver A. Mead
    • G11C16/04
    • G11C16/0416G11C16/10
    • A pMOS EEPROM cell includes a source, drain, channel, control gate and well contact. The device is a fully functional single element p-type floating gate MOSFET. A floating gate overlaps the well contact and completely surrounds the drain and source implants. The pMOS cell is written to by means of hot-electron injection, using an intrinsic feedback mechanism to write analog values. Hot electrons are generated in the channel by means of hole impact ionization at the transistor's drain. The pMOS cell is erased by Fowler-Nordheim tunneling. The tunneling voltage is applied only to the well to tunnel electrons from the floating gate. The well-source and well-drain junctions are protected from breakdown by means of guard rings.
    • pMOS EEPROM单元包括源极,漏极,通道,控制栅极和阱接触。 该器件是一个功能齐全的单元件p型浮栅MOSFET。 浮动栅极与阱接触重叠,并完全围绕漏极和源植入。 通过热电子注入将pMOS单元写入,使用内在反馈机制来写入模拟值。 通过在晶体管漏极处的空穴冲击电离在通道中产生热电子。 Fowler-Nordheim隧道消除了pMOS细胞。 隧道电压仅施加到阱以从浮动栅极隧道电子。 井源井漏井路口通过护环免受破坏。