会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 49. 发明授权
    • Blind via formation in a photoimageable dielectric material
    • 通过在可光成像的电介质材料中形成盲目
    • US06569604B1
    • 2003-05-27
    • US09345723
    • 1999-06-30
    • Anilkumar Chinuprasad BhattFrancis Joseph Downes, Jr.Robert Lee LewisVoya R. Markovich
    • Anilkumar Chinuprasad BhattFrancis Joseph Downes, Jr.Robert Lee LewisVoya R. Markovich
    • G03C500
    • H01L23/49816H01L23/49827H01L2224/16H05K3/0023H05K3/0035H05K3/4602H05K2201/09827H05K2203/1476
    • A blind via structure, and associated laser ablation methods of formation, that includes a blind via within a photoimageable dielectric (PID) layer on a substrate, such that the sidewall of the blind via makes an obtuse angle with the blind end of the blind via. The obtuse-angled sidewall may be formed by executing two processes in sequence. In the first process, photoimaging of the PID layer, with selective exposure to ultraviolet light, results in one or more blind vias having acute-angled sidewalls. The photoimaging cross links the PID material that had been selectively exposed to ultraviolet light such that a subsequent developing step removes PID material not cross linked, or weakly cross linked, to simultaneously form multiple blind vias having different sized openings. In the second process, laser ablation is selectively employed to remove the acute-angled sidewalls from particular blind vias in a way that forms replacement obtuse-angled sidewalls in the laser-ablated blind vias. Alternatively, the first process involving photoimaging may be omitted such that the second step involving laser ablation forms the entire obtuse-angled blind via. The resultant blind via structure includes at least one blind via having an obtuse-angled sidewall, and optionally, at least one blind via having an acute-angled sidewall.
    • 盲通孔结构和相关联的激光烧蚀消融方法,其包括在衬底上的可光成像电介质(PID)层内的盲通孔,使得盲通孔的侧壁与盲孔的盲端通过钝角 。 可以通过依次执行两个过程来形成钝角侧壁。 在第一个过程中,通过选择性地暴露在紫外线下的PID层的光成像产生一个或多个具有锐角侧壁的盲孔。 光学成像将选择性暴露于紫外线的PID材料交叉连接,使得随后的显影步骤除去未交联或弱交联的PID材料,以同时形成具有不同尺寸开口的多个盲孔。 在第二过程中,激光烧蚀被选择性地用于在激光烧蚀的盲孔中形成置换钝角侧壁的方式从特定的盲孔中去除锐角侧壁。 或者,可以省略涉及光成像的第一过程,使得涉及激光烧蚀的第二步骤形成整个钝角盲孔。 所得到的盲通孔结构包括至少一个具有钝角侧壁的盲孔,并且可选地,至少一个具有锐角侧壁的盲孔。