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    • 41. 发明授权
    • Method for making through-hole and ink-jet printer head fabricated using the method
    • 使用该方法制造通孔和喷墨打印头的方法
    • US07008552B2
    • 2006-03-07
    • US10600763
    • 2003-06-23
    • Norio Ohkuma
    • Norio Ohkuma
    • G01D15/00G11B5/127
    • B41J2/1629B41J2/1603B41J2/1628B41J2/1642
    • A method for making a through-hole in a silicon substrate includes the steps of forming a high-impurity-concentration region in the periphery of a through-hole-forming region at a first surface of the silicon substrate, forming an etching stop layer over the through-hole-forming region and the high-impurity-concentration region, forming a mask layer having an opening at a second surface of the silicon substrate, etching the silicon substrate at the opening through the mask layer until the etching stop layer is exposed to the second surface, further etching the silicon substrate until the etched portion extends to the high-impurity-concentration region, and removing the etching stop layer at least at the portion exposed to the second surface. Also disclosed is an ink-jet printer head including an ink supply port fabricated using the method for making the through-hole.
    • 在硅衬底中制造通孔的方法包括以下步骤:在硅衬底的第一表面的通孔形成区域的周围形成高杂质浓度区域,形成蚀刻停止层 通孔形成区域和高杂质浓度区域,在硅衬底的第二表面形成具有开口的掩模层,通过掩模层在开口处蚀刻硅衬底,直到蚀刻停止层露出 进一步蚀刻硅衬底,直到蚀刻部分延伸到高杂质浓度区域,并且至少在暴露于第二表面的部分去除蚀刻停止层。 还公开了一种喷墨打印机头,其包括使用制造通孔的方法制造的供墨口。
    • 43. 发明授权
    • Method for manufacturing an ink jet head, and an ink jet head
    • 喷墨头的制造方法以及喷墨头
    • US6145965A
    • 2000-11-14
    • US665499
    • 1996-06-18
    • Genji InadaNorio Ohkuma
    • Genji InadaNorio Ohkuma
    • B41J2/05B41J2/14B41J2/16B41J2/015
    • B41J2/1631B41J2/1404B41J2/1603B41J2/1639B41J2002/14467
    • A method for manufacturing an ink jet head comprises a first step of arranging on a substrate a passage molding material to form ink paths conductively connected to discharge ports for discharging ink, a second step of arranging on the substrate an edge portion molding material in the vicinity of the passage molding material, a third step of arranging on the substrate a wall formation material to cover the passage molding material and the edge portion molding material, and a fourth step of forming the paths with the wall formation material by removing the passage molding material from the substrate. With this method, it is possible to manufacture an ink jet head having an ink chamber and nozzles, which are configured substantially the same as the molding members, without creating cracks and other defects that are liable to occur on the extruded corners of the passage molding material with respect to the substrate when the conventional technique is applied.
    • 一种喷墨头的制造方法,其特征在于,在基板上配置通道成形材料,形成导电性地连接到排出口的墨水路径的第一工序,在基板上配置边缘部分成型材料的第二工序 所述通道模塑材料的第三步骤是在所述基底上布置覆盖所述通道模塑材料和所述边缘部分模塑材料的壁形成材料,以及通过除去所述通道模塑材料形成所述路径的第四步骤 从底物。 利用这种方法,可以制造具有墨水室的喷墨头和与模制构件基本相同的喷嘴,而不产生在通道模制件的挤压角上容易发生的裂纹和其它缺陷 当应用传统技术时相对于基底的材料。
    • 44. 发明授权
    • Through hole formation method and a substrate provided with a through
hole
    • 通孔形成方法和具有通孔的基板
    • US6107209A
    • 2000-08-22
    • US98326
    • 1998-06-17
    • Norio Ohkuma
    • Norio Ohkuma
    • B41J2/05B41J2/16B81B1/00H01L21/20
    • B81C1/00087B41J2/16B41J2/1629B41J2/1642B81B2201/052
    • A method of Si anisotropic etching makes it possible to relax the restrictions imposed upon the processing configuration of an Si substrate provided with the plane orientation. This Si anisotropic etching method can be preferably used for the formation of the ink supply opening of an ink jet head, for example. When an Si material (Si substrate) having the crystal plane orientation is processed by this anisotropic etching method, it is arranged to give heat treatment to such Si material in advance before etching. Thus, the processed section can be obtained in a bent configuration formed by the two planes of crystal plane orientation. Therefore, the etching initiation surface is made smaller than that needed for the conventional art even when the same width should be obtained for a penetrating process, hence making a chip smaller accordingly for the reduction of costs.
    • Si各向异性蚀刻的方法使得可以放松对具有<100>面取向的Si衬底的处理构造施加的限制。 例如,该Si各向异性蚀刻方法可以优选用于形成喷墨头的供墨口。 当通过该各向异性蚀刻方法处理具有<100>晶面取向的Si材料(Si衬底)时,预先在蚀刻之前对这种Si材料进行热处理。 因此,可以以由晶面取向的两个<111>面形成的弯曲构造获得加工部分。 因此,即使对于穿透过程应该获得相同的宽度,使得蚀刻引发表面比传统技术所需的更小,因此为了降低成本而使芯片更小。
    • 46. 发明授权
    • Ink jet recording head, fabrication method thereof, and printer with ink
jet recording head
    • 喷墨记录头,其制造方法和具有喷墨记录头的打印机
    • US5730889A
    • 1998-03-24
    • US813997
    • 1997-03-10
    • Masashi MiyagawaNorio OhkumaGenji Inada
    • Masashi MiyagawaNorio OhkumaGenji Inada
    • B41J2/16G03F7/00B41J3/00
    • G03F7/00B41J2/1603B41J2/1623B41J2/1631B41J2/1632B41J2/1639B41J2/1642B41J2/1645B41J2/1646G03F7/0015G03F7/0035
    • A method of fabricating an ink jet recording head includes forming a photosensitive resin layer on a substrate having formed thereon an energy generation device for generating energy for ejecting recording droplets; pattern-wise exposing the photosensitive resin layer to an active radiation to a portion of the photosensitive resin layer where formation of a pattern of an ink fluid path is desired; laminating a top plate on the photosensitive resin layer; and eluting the pattern exposed portion of the photosensitive resin layer to form a pattern of an ink fluid path. An ink jet recording head includes a substrate a substrate; an energy generation device provided on the substrate and for generating energy for ejecting recording droplets; an exposed photosensitive resin layer provided on the substrate, the resin layer comprising a heat-crosslinking positive type resist material, and being provided with an ink fluid path defined between the substrate and the exposed photosensitive resin layer; a top plate laminated on the exposed photosensitive layer, the top plate being provided with an ink supply port communicating with the ink fluid path; and the ink fluid path ending as an ink ejection port on a side opposite to a side of the ink supply port. An ink jet recording apparatus includes a portion for mounting such an ink jet recording head.
    • 一种制造喷墨记录头的方法,包括在其上形成有用于产生用于喷射记录液滴的能量的能量产生装置的基板上形成感光性树脂层; 将感光性树脂层图案化地曝光到需要形成油墨流体路径的图案的感光性树脂层的一部分上的有源辐射; 在感光性树脂层上层叠顶板; 并且洗脱感光性树脂层的图案曝光部分以形成油墨流体路径的图案。 喷墨记录头包括基板,基板; 设置在基板上并用于产生用于喷射记录液滴的能量的能量产生装置; 设置在基板上的曝光的感光性树脂层,所述树脂层包含热交联正型抗蚀剂材料,并且在所述基板和所述曝光的感光性树脂层之间设置有墨液路径; 层压在所述曝光的感光层上的顶板,所述顶板设置有与所述油墨流体通路连通的供墨口; 并且墨液路径在与供墨口侧相反的一侧作为喷墨口而终止。 喷墨记录装置包括用于安装这种喷墨记录头的部分。
    • 48. 发明授权
    • Transfer recording medium
    • 转移记录介质
    • US4973542A
    • 1990-11-27
    • US130555
    • 1987-12-08
    • Masanori TakenouchiMasashi MiyagawaNorio Ohkuma
    • Masanori TakenouchiMasashi MiyagawaNorio Ohkuma
    • B41M5/382G03C1/72G03F7/34
    • B41M5/38242Y10S428/913Y10S428/914Y10T428/2984Y10T428/2989
    • A transfer recording medium comprises a substrate and a transfer recording layer disposed thereon capable of changing its transfer characteristic when provided with light energy and heat energy. The transfer recording layer comprises image forming elements which are solid at room temperature and comprise at least a colorant and a functional component sensitive to the provision of light energy and heat energy. Since the image forming elements have a mode particle size of 5-25 .mu.m and comprise 50% by number or more of those having a particle size of .+-.4 .mu.m or less from the mode particle size, the transfer recording medium affords a clear transferred image with high resolution at a high transfer rate when provided with light and heat energies, at least one of which is applied imagewise.
    • 转印记录介质包括基板和设置在其上的转印记录层,当提供光能和热能时能够改变其转印特性。 转印记录层包括在室温下为固体并且至少包含着色剂和对提供光能和热能敏感的功能组分的图像形成元件。 由于图像形成元件具有5-25μm的模式粒径,并且包含从模式粒径的粒径为+/-4μm以下的那些的50重量%以上,所以转印记录介质提供 当具有光和热能时,以高传输速率具有高分辨率的清晰转印图像,其中至少一个被成像应用。