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41. 发明授权

US07230682B2 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置以及程序和信息存储介质
公开(公告)号：US07230682B2
公开(公告)日：2007-06-12
申请号：US10901209
申请日：2004-07-29
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/32 , G03B27/68
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： An exposure method of forming pattern on object via projection optical system, including deciding optimal adjustment amount of adjustment device which adjusts image forming property of the projection optical system to optimize the image forming property under pattern to be formed and exposure condition of the pattern, based on information related to wavefront aberration of the projection optical system, Zernike Sensitivity Chart corresponding to the pattern and the exposure condition, wavefront aberration variation table that denotes relation between adjustment amount of the adjustment device and change in coefficients of terms in the Zernike polynomial, and restraint condition with respect to the adjustment amount of the adjustment device, and exposing the pattern on the object under the exposure condition via the projection optical system of which the image forming property is adjusted by the adjustment device based on the decided optimal adjustment amount.
摘要翻译：一种通过投影光学系统在物体上形成图案的曝光方法，包括确定调整投影光学系统的图像形成特性的调整装置的最佳调节量，以优化待形成的图案下的图像形成特性和图案的曝光条件关于与投影光学系统的波前像差相关的信息，对应于图案和曝光条件的Zernike感光度图，表示调节装置的调整量与Zernike多项式中的项的系数的变化之间的关系的波前像差变化表，以及基于调整装置的调整量，通过调整装置调整图像形成特性的投影光学系统，根据所确定的最佳调整量，在曝光条件下将图案曝光在物体上。

42. 发明申请

US20070115450A1 Exposure apparatus, exposure method, method for producing device, and optical part 审中-公开
标题翻译：曝光装置，曝光方法，制造装置的方法和光学部件
公开(公告)号：US20070115450A1
公开(公告)日：2007-05-24
申请号：US11639245
申请日：2006-12-15
申请人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
发明人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
IPC分类号： G03B27/58 , G01N21/00
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译：曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。曝光装置（EX）具有用于保持基板（P）的基板台（PT），具有防液平面（30A）的板构件（30）可替换地设置在基板台（PT）上，以防止液体保留，保持良好的曝光精度。

43. 发明申请

US20060139614A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20060139614A1
公开(公告)日：2006-06-29
申请号：US11297324
申请日：2005-12-09
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

44. 发明申请

US20060132738A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20060132738A1
公开(公告)日：2006-06-22
申请号：US11339505
申请日：2006-01-26
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, and a projection system arranged to project the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system is configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid, and a measurement device is configured to obtain a pressure of liquid in the space.
摘要翻译：光刻投影设备包括布置成调节辐射束的照明系统，被配置为保持图案形成装置的支撑结构，所述图案形成装置能够赋予辐射束图案，衬底台被配置为保持衬底，以及投影系统布置成将图案化的辐射束投影到基板的目标部分上。此外，液体供给系统构造成至少部分地用液体填充投影系统和基板台面上的物体之间的空间，并且测量装置被配置为获得空间中的液体的压力。

45. 发明申请

US20060119820A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20060119820A1
公开(公告)日：2006-06-08
申请号：US11338826
申请日：2006-01-25
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： In a lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, and a projection system arranged to project the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system is configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system having a member extending along at least part of the boundary of the space, wherein the member has a liquid inlet which faces the substrate.
摘要翻译：在光刻投影设备中包括布置成调节辐射束的照明系统，被配置为保持图案形成装置的支撑结构，所述图案形成装置能够赋予辐射束图案，衬底台被配置为保持衬底，以及投影系统布置成将图案化的辐射束投影到基板的目标部分上。此外，液体供应系统被配置为向投影系统和基板之间的空间提供液体，液体供应系统具有沿着空间的边界的至少一部分延伸的构件，其中该构件具有液体入口其面向基板。

46. 发明申请

US20060098179A1 Exposure method, exposure apparatus, and method for producing device 有权
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US20060098179A1
公开(公告)日：2006-05-11
申请号：US11312478
申请日：2005-12-21
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/70433 , G03F7/7085 , G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： A liquid immersion photolithography system has an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. In addition, a plurality of nozzles are arranged so as to provide a substantially uniform velocity distribution of the liquid flow between the substrate and the projection optical system.
摘要翻译：液浸光刻系统具有用电磁辐射使基板曝光的曝光系统，并且包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。此外，多个喷嘴被布置成在基板和投影光学系统之间提供基本均匀的液体流速分布。

47. 发明申请

US20060082744A1 Exposure method, exposure apparatus, and method for producing device 有权
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US20060082744A1
公开(公告)日：2006-04-20
申请号：US11287317
申请日：2005-11-28
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/70433 , G03F7/7085 , G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： An exposure method forms an immersion area in at least a part of a substrate including a projection area of a projection optical system and projects an image of a mask pattern onto the substrate through liquid between the projection optical system and the substrate. Distribution of the mask pattern is measured (S1) and adjustment is made so that a desired image of the pattern is projected onto the substrate according to distribution of the exposure light incident into the liquid between the projection optical system and the substrate when exposing the substrate (S4 to S6). It is possible to expose the substrate with the pattern accurately regardless of the distribution of the mask pattern.
摘要翻译：曝光方法在包括投影光学系统的投影区域的基板的至少一部分中形成浸没区域，并且通过投影光学系统和基板之间的液体将掩模图案的图像投影到基板上。测量掩模图案的分布（S 1），并且进行调整，使得根据入射到投影光学系统和基板之间的液体中的曝光光的分布将图案的期望图像投影到基板上，基材（S 4〜S 6）。无论掩模图案的分布如何，都可以精确地曝光具有图案的基板。

48. 发明申请

US20050259234A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20050259234A1
公开(公告)日：2005-11-24
申请号：US11147285
申请日：2005-06-08
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： Liquid is supplied by a supply mechanism to a space between a lens and a wafer via a supply nozzle on one side of the lens, and the liquid is recovered by a recovery mechanism via a recovery pipe on the other side of the lens. When the supply and the recovery of the liquid are performed in parallel, a predetermined amount of liquid (exchanged at all times) is held between the lens and the substrate on the stage. Accordingly, when exposure (pattern transfer on the substrate) is performed in this state, an immersion method is applied and a pattern is transferred with good precision onto the substrate. In addition, in the case the liquid leaks out from under the lower edge of a peripheral wall, the liquid that could not be recovered is recovered by an auxiliary recovery mechanism via a slit. And, by such operations, the substrate is freed from the residual liquid on the substrate.
摘要翻译：通过供给机构，通过透镜一侧的供给喷嘴将供给机构供给到透镜和晶片间的空间，液体通过透镜另一侧的回收管被回收机构回收。当并行进行液体的供给和回收时，在透镜和台架上的基板之间保持预定量的液体（始终进行交换）。因此，当在该状态下进行曝光（在基板上进行图案转印）时，施加浸渍方法，并将图案以良好的精度传送到基板上。此外，在液体从周壁的下边缘下方泄漏的情况下，通过狭缝通过辅助回收机构回收无法回收的液体。并且，通过这样的操作，基板从基板上的残余液体中除去。

49. 发明申请

US20050219489A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20050219489A1
公开(公告)日：2005-10-06
申请号：US11141518
申请日：2005-06-01
申请人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
发明人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
IPC分类号： G03B27/42 , G03F7/20 , G03F9/00
CPC分类号： G03F9/7019 , G03F7/70341 , G03F9/7011 , G03F9/7015 , G03F9/7034 , G03F9/7046 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间来对基板进行曝光，并且通过使用投影光学系统通过液体将图案的图像投影到基板上。曝光装置包括用于保持基板的基板台，用于将液体供给到投影光学系统的像面的一侧的液体供应单元，以及用于检测关于投影光学系统的表面的表面信息的聚焦/调平检测系统底物不通过液体。曝光装置在基于通过投影光学系统和液体形成的图像平面之间的位置关系的基础上，对基板进行液浸曝光，基于由聚焦/调平检测系统。可以以令人满意的图案转印精度进行液浸曝光。

50. 发明授权

US06661498B1 Projection exposure apparatus and method employing rectilinear aperture stops for use with periodic mask patterns 失效
标题翻译：采用直线光阑的投影曝光装置和方法，用于周期性掩模图案
公开(公告)号：US06661498B1
公开(公告)日：2003-12-09
申请号：US09546233
申请日：2000-04-10
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03B27/42 , G03F7/7025 , G03F7/70308 , G03F7/70425
摘要： A projection optical system and method projects and forms an image of a pattern arrayed on a first surface (mask), and exhibiting a periodicity in a predetermined direction (X- or Y-direction), on a second surface (wafer). A stop has an aperture showing a line symmetry with respect to a symmetric axis intersecting an optical axis of the projection optical system and extending in a direction (Y- or X-direction) orthogonal to the predetermined direction and having the outline at least a part of which are rectilinear portions. The stop is disposed on a Fourier transform plane of the first surface within the projection optical system or a surface in the vicinity thereof.
摘要翻译：投影光学系统和方法投影并形成排列在第一表面（掩模）上的图案的图像，并且在第二表面（晶片）上呈现在预定方向（X或Y方向）上的周期性。止动件具有相对于与投影光学系统的光轴相交的对称轴线对称的孔，并且在与预定方向正交的方向（Y或X方向）上延伸，并且具有轮廓至少一部分其中直线部分为直线部分。停止件设置在投影光学系统内的第一表面的傅立叶变换平面或其附近的表面上。

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