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    • 41. 发明授权
    • Schottky barrier tunnel single electron transistor and method of manufacturing the same
    • 肖特基势垒隧道单电子晶体管及其制造方法
    • US07605065B2
    • 2009-10-20
    • US11839704
    • 2007-08-16
    • Moon Gyu JangYark Yeon KimJae Heon ShinSeong Jae Lee
    • Moon Gyu JangYark Yeon KimJae Heon ShinSeong Jae Lee
    • H01L21/28H01L21/44
    • H01L29/7613B82Y10/00H01L29/872
    • Provided are a Schottky barrier tunnel single electron transistor and a method of manufacturing the same that use a Schottky barrier formed between metal and semiconductor by replacing a source and a drain with silicide as a reactant of silicon and metal, instead of a conventional method of manufacturing a single electron transistor (SET) that includes source and drain regions by implanting dopants such that an artificial quantum dot is formed in a channel region. As a result, it does not require a conventional PADOX process to form a quantum dot for a single electron transistor (SET), height and width of a tunneling barrier can be artificially adjusted by using silicide materials that have various Schottky junction barriers, and it is possible to improve current driving capability of the single electron transistor (SET).
    • 提供了一种肖特基势垒隧道单电子晶体管及其制造方法,其替代传统的制造方法,而是用硅化物替代源极和漏极作为硅和金属的反应物,从而形成金属和半导体之间形成的肖特基势垒 单电子晶体管(SET),其通过注入掺杂剂而包括源极和漏极区域,使得在沟道区域中形成人造量子点。 结果,不需要传统的PADOX工艺来形成单电子晶体管(SET)的量子点,隧道势垒的高度和宽度可以通过使用具有各种肖特基结屏障的硅化物材料进行人工调整,而且 可以提高单电子晶体管(SET)的电流驱动能力。
    • 43. 发明申请
    • THERMOELECTRIC ELEMENT
    • 热电元件
    • US20130146114A1
    • 2013-06-13
    • US13610981
    • 2012-09-12
    • Moon Gyu JANG
    • Moon Gyu JANG
    • H01L35/28
    • H01L35/32
    • Disclosed is a thermoelectric element capable of being easily fabricated by employing a semiconductor CMOS process, and improving the thermoelectric efficiency by reducing thermal conductivity while improving electric conductivity between a heat absorption part and a heat emission unit. The thermoelectric element according to an exemplary embodiment of the present disclosure includes a common electrode configured to absorb heat; a first electrode and a second electrode formed on an identical plane to a plane of the common electrode and configured to emit heat; an N-leg connected between the common electrode and the first electrode and configured to supply electrons; and a P-leg connected between the common electrode and the second electrode and configured to supply holes, in which a barrier material for suppressing thermal conduction between the common electrode and the first and second electrodes is formed in the N-leg and the P-leg.
    • 公开了一种能够通过采用半导体CMOS工艺容易地制造的热电元件,并且通过降低热导率同时改善吸热部分和发热单元之间的导电性来提高热电效率。 根据本公开的示例性实施例的热电元件包括​​构造成吸收热量的公共电极; 第一电极和第二电极,形成在与公共电极的平面相同的平面上并且被配置为发热; 连接在所述公共电极和所述第一电极之间并被配置为提供电子的N脚; 以及连接在所述公共电极和所述第二电极之间并被配置为提供空穴的P腿,其中在所述N腿和所述P-腿中形成用于抑制所述公共电极与所述第一和第二电极之间的热传导的阻挡材料, 腿。
    • 49. 发明授权
    • Biosensor and method of manufacturing the same
    • 生物传感器及其制造方法
    • US08022444B2
    • 2011-09-20
    • US12195305
    • 2008-08-20
    • Tae Youb KimNae Man ParkHan Young YuMoon Gyu JangJong Heon Yang
    • Tae Youb KimNae Man ParkHan Young YuMoon Gyu JangJong Heon Yang
    • H01L27/085H01L27/14H01L21/00
    • G01N27/4146G01N27/4145Y10S977/71Y10S977/742Y10S977/963
    • Provided are a biosensor with a silicon nanowire and a method of manufacturing the same, and more particularly, a biosensor with a silicon nanowire including a defect region formed by irradiation of an electron beam, and a method of manufacturing the same. The biosensor includes: a silicon substrate; a source region disposed on the silicon substrate; a drain region disposed on the silicon substrate; and a silicon nanowire disposed on the source region and the drain region, and having a defect region formed by irradiation of an electron beam. Therefore, by irradiating a certain region of a high-concentration doped silicon nanowire with an electron beam to lower electron mobility in the certain region, it is possible to maintain a low contact resistance between the silicon nanowire and a metal electrode and to lower operation current of a biomaterial detection part, thereby improving sensitivity of the biosensor.
    • 本发明提供一种具有硅纳米线的生物传感器及其制造方法,更具体地,涉及具有通过电子束照射形成的缺陷区域的硅纳米线的生物传感器及其制造方法。 生物传感器包括:硅衬底; 设置在所述硅基板上的源极区域; 设置在所述硅基板上的漏极区域; 以及设置在源极区域和漏极区域上的硅纳米线,并且具有通过电子束的照射而形成的缺陷区域。 因此,通过用特定的区域照射具有电子束的高浓度掺杂的硅纳米线的特定区域来降低电子迁移率,可以保持硅纳米线与金属电极之间的低接触电阻并降低工作电流 的生物材料检测部件,从而提高生物传感器的灵敏度。