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41. 发明申请

US20130038844A1 LIGHT SOURCE DEVICE, METHOD OF DRIVING DISCHARGE LAMP, AND PROJECTOR 审中-公开
标题翻译：光源装置，驱动放电灯的方法和投影仪
公开(公告)号：US20130038844A1
公开(公告)日：2013-02-14
申请号：US13563179
申请日：2012-07-31
申请人： Junichi SUZUKI , Satoshi KITO
发明人： Junichi SUZUKI , Satoshi KITO
IPC分类号： H05B41/36 , G03B21/14
CPC分类号： H05B41/2928 , G03B21/2026 , G03B33/12 , H05B37/0227
摘要： A light source device including a discharge lamp that has a first electrode and a second electrode opposed to each other in a hollow portion in which a discharge medium is enclosed; and a driving device that supplies a driving voltage to the first electrode and the second electrode, wherein the driving voltage is applied to the discharge medium through the first electrode and the second electrode such that the discharge medium emits light, wherein the driving device changes a relative potential of the first electrode with respect to the second electrode at a plurality of frequencies.
摘要翻译：一种光源装置，包括：放电灯，具有第一电极和第二电极，所述第一电极和第二电极在封装有放电介质的中空部分中彼此相对; 以及向第一电极和第二电极提供驱动电压的驱动装置，其中驱动电压通过第一电极和第二电极施加到放电介质，使得放电介质发光，其中驱动装置改变第一电极相对于第二电极的多个频率的相对电位。

42. 发明申请

US20120319599A1 LIGHT SOURCE APPARATUS, DISCHARGE LAMP DRIVING METHOD, AND PROJECTOR 有权
标题翻译：光源设备，放电灯驱动方法和投影仪
公开(公告)号：US20120319599A1
公开(公告)日：2012-12-20
申请号：US13478536
申请日：2012-05-23
申请人： Junichi Suzuki , Satoshi Kito
发明人： Junichi Suzuki , Satoshi Kito
IPC分类号： H05B41/36
CPC分类号： H05B41/36 , G03B21/2026 , G03B21/206 , H05B41/2858
摘要： A light source apparatus includes a discharge lamp including a light-emitting container, and a pair of electrodes disposed such that a respective tip portion thereof opposes each other in the light-emitting container, and a driving unit that supplies a driving current to the pair of electrodes. The driving unit includes an AC supplier that supplies an alternating current of a frequency not lower than 1 kHz and not higher than 10 GHz to the pair of electrodes and a DC supplier that supplies a direct current to the pair of electrodes. The AC supplier is configured so as to alternately repeat an AC supply section in which the alternating current is supplied and an AC stop section in which the supply of the alternating current is stopped, and the DC supplier is configured so as to supply the direct current during a period corresponding to the AC stop section.
摘要翻译：光源装置包括：放电灯，其包括发光容器;以及一对电极，其布置成使得其顶端部分在发光容器内彼此相对;以及驱动单元，用于向所述发射容器提供驱动电流的电极。驱动单元包括向一对电极提供频率不低于1kHz且不高于10GHz的交流电的AC供应器，以及向一对电极提供直流电的DC供应器。 AC供给器被配置为交替重复提供交流电的AC供电部和停止供给交流电的AC停止部，并且DC供给器被配置为提供直流电在与AC停止部相对应的期间。

43. 发明申请

US20120128886A1 NUCLEAR POWER PLANT, METHOD OF FORMING CORROSION-RESISTANT COATING THEREFOR, AND METHOD OF OPERATING NUCLEAR POWER PLANT 有权
标题翻译：核能发电厂，其耐腐蚀涂层的形成方法和操作核电厂的方法
公开(公告)号：US20120128886A1
公开(公告)日：2012-05-24
申请号：US13362962
申请日：2012-01-31
申请人： Masato Okamura , Tetsuo Oosato , Seiji Yamamoto , Tadasu Yotsuyanagi , Nagayoshi Ichikawa , Kenji Yamazaki , Junichi Takagi , Hidehiro Urata , Shunichi Suzuki , Kenro Takamori , Junichi Suzuki
发明人： Masato Okamura , Tetsuo Oosato , Seiji Yamamoto , Tadasu Yotsuyanagi , Nagayoshi Ichikawa , Kenji Yamazaki , Junichi Takagi , Hidehiro Urata , Shunichi Suzuki , Kenro Takamori , Junichi Suzuki
IPC分类号： C23C4/10 , C23C16/00
CPC分类号： G21C17/0225 , G21C13/08 , G21C17/022 , G21Y2002/103 , G21Y2004/10 , Y02E30/40
摘要： In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a catalytic substance having a property of an N-type semiconductor is deposited on the oxide film. The oxide film maintains the property of the P-type semiconductor.
摘要翻译：在核电站中，将反应器结构体的金属成分表面的耐腐蚀氧化膜暴露于高温水中，含有具有P型半导体的性质的氧化物的耐腐蚀性氧化物膜，并且在氧化物膜上沉积具有N型半导体性质的催化物质。氧化膜保持P型半导体的性质。

44. 发明申请

US20120104286A1 METHOD FOR RESIZING PATTERN TO BE WRITTEN BY LITHOGRAPHY TECHNIQUE, AND CHARGED PARTICLE BEAM WRITING METHOD 有权
公开(公告)号：US20120104286A1
公开(公告)日：2012-05-03
申请号：US13349002
申请日：2012-01-12
申请人： Jun YASHIMA , Junichi SUZUKI , Takayuki ABE
发明人： Jun YASHIMA , Junichi SUZUKI , Takayuki ABE
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.

45. 发明授权

US08164516B2 GPS-based positioning system for mobile GPS terminals 有权
标题翻译： GPS定位系统，用于移动GPS终端
公开(公告)号：US08164516B2
公开(公告)日：2012-04-24
申请号：US12033000
申请日：2008-02-18
申请人： Ikuo Tsujimoto , Junichi Suzuki , Chiayee Steve Chang , Lionel Jacques Garin , Ashutosh Pande
发明人： Ikuo Tsujimoto , Junichi Suzuki , Chiayee Steve Chang , Lionel Jacques Garin , Ashutosh Pande
IPC分类号： G01S19/06 , G01S19/25
CPC分类号： G01S19/05 , G01S5/0009 , G01S19/09 , G01S19/25 , G01S19/48
摘要： The present invention discloses a GPS system that uses call-processor intelligence to determine the mode of operation of a GPS receiver located in a GPS terminal. The modes are selected based on the availability of network facilities, the GPS information that can be acquired, or user input requirements.
摘要翻译：本发明公开了一种GPS系统，其使用呼叫处理器智能来确定位于GPS终端中的GPS接收机的操作模式。根据网络设施的可用性，可以获取的GPS信息或用户输入要求，选择模式。

46. 发明申请

US20120043633A1 RADIATION DETECTOR 审中-公开
标题翻译：辐射探测器
公开(公告)号：US20120043633A1
公开(公告)日：2012-02-23
申请号：US13265889
申请日：2009-04-30
申请人： Junichi Suzuki , Kenji Sato , Hidetoshi Kishimoto
发明人： Junichi Suzuki , Kenji Sato , Hidetoshi Kishimoto
IPC分类号： H01L31/115
CPC分类号： H01L31/115 , H01L27/14659 , H01L31/02005
摘要： According to a radiation detector of this invention, a common electrode for bias voltage application and a lead wire for bias voltage supply are connected through a conductive plate as a planarly formed plate interposed therebetween. Since the conductive plate is connected instead of connecting the lead wire directly onto the common electrode, it can prevent damage to a radiation sensitive semiconductor and avoid performance degradation. Since the conductive plate is formed planarly, even if a conductive paste with high resistance is used, connection resistance can be lowered to be comparable to the use of silver paste. That is, the range of selection of the conductive paste is broadened. Also, connection can be made without using an insulating seat and performance degradation can be avoided. As a result, performance degradation can be avoided, without using an insulating seat.
摘要翻译：根据本发明的辐射检测器，用于偏压施加的公共电极和用于偏压供电的引线通过导电板连接，作为插入其间的平面形成的板。由于连接导电板而不是将引线直接连接到公共电极上，所以可以防止对辐射敏感半导体的损坏，并避免性能下降。由于导电板是平面形成的，即使使用具有高电阻的导电膏，也可以将连接电阻降低到与使用银膏相当的连接电阻。也就是说，导电浆料的选择范围变宽。而且，可以在不使用绝缘座的情况下进行连接，并且可以避免性能下降。结果，可以避免性能下降，而不使用绝缘座。

47. 发明申请

US20120036486A1 METHOD FOR RESIZING PATTERN TO BE WRITTEN BY LITHOGRAPHY TECHNIQUE, AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：用于通过算术技术来记录图案的方法和充电的粒子束写法
公开(公告)号：US20120036486A1
公开(公告)日：2012-02-09
申请号：US13275448
申请日：2011-10-18
申请人： Jun Yashima , Junichi Suzuki , Takayuki Abe
发明人： Jun Yashima , Junichi Suzuki , Takayuki Abe
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.
摘要翻译：通过使用光刻技术来调整要写入的图案的尺寸的方法包括：对通过将目标工件的写入区域进行实际分割而形成的每个小区域，计算用于校正由负载效应引起的尺寸误差的图案的第一维度校正量基于每个小区域的面积密度预定尺寸的网格，根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量，通过使用来校正第一维度校正量第二维度校正量，并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸，并输出调整大小的结果。

48. 发明授权

US08065635B2 Method for resizing pattern to be written by lithography technique, and charged particle beam writing method 有权
标题翻译：用于通过光刻技术来调整图案的尺寸的方法，以及带电粒子束写入方法
公开(公告)号：US08065635B2
公开(公告)日：2011-11-22
申请号：US11851176
申请日：2007-09-06
申请人： Jun Yashima , Junichi Suzuki , Takayuki Abe
发明人： Jun Yashima , Junichi Suzuki , Takayuki Abe
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.
摘要翻译：通过使用光刻技术来调整要写入的图案的尺寸的方法包括：对通过将目标工件的写入区域进行实际分割而形成的每个小区域，计算用于校正由负载效应引起的尺寸误差的图案的第一维度校正量基于每个小区域的面积密度预定尺寸的网格，根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量，通过使用来校正第一维度校正量第二维度校正量，并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸，并输出调整大小的结果。

49. 发明授权

US08050100B2 Non-volatile semiconductor memory device with a sense amplifier reference circuit having a MONOS transfer transistor 有权
标题翻译：具有具有MONOS转移晶体管的读出放大器参考电路的非易失性半导体存储器件
公开(公告)号：US08050100B2
公开(公告)日：2011-11-01
申请号：US12697505
申请日：2010-02-01
申请人： Masami Hanyu , Junichi Suzuki , Junichi Yamashita
发明人： Masami Hanyu , Junichi Suzuki , Junichi Yamashita
IPC分类号： G11C16/28
CPC分类号： G11C16/28
摘要： A non-volatile semiconductor memory device includes a sense amplifier, first and second bit lines that are connected to the sense amplifier, a first memory cell column that is connected to the first bit line, the first memory cell column being formed by a plurality of MONOS type transistors, a first constant current source that is connected to the second bit line, the first constant current source generating a reference current for the first memory cell column, and a first switch that is provided between the first constant current source and the second bit line, the first switch being formed by a MONOS type transistor.
摘要翻译：非易失性半导体存储器件包括读出放大器，连接到读出放大器的第一和第二位线，连接到第一位线的第一存储器单元列，第一存储单元列由多个 MONOS型晶体管，连接到第二位线的第一恒定电流源，产生第一存储单元列的参考电流的第一恒定电流源和设置在第一恒定电流源和第二恒定电流源之间的第一开关，第一开关由MONOS型晶体管形成。

50. 发明授权

US08023868B2 Development roller, development device, and image forming apparatus 失效
标题翻译：显影辊，显影装置和成像装置
公开(公告)号：US08023868B2
公开(公告)日：2011-09-20
申请号：US12388880
申请日：2009-02-19
申请人： Yoichi Yamada , Masahiro Maeda , Junichi Suzuki , Takatomo Fukumoto
发明人： Yoichi Yamada , Masahiro Maeda , Junichi Suzuki , Takatomo Fukumoto
IPC分类号： G03G15/08
CPC分类号： G03G15/0818
摘要： A development roller includes a base unit having a base recess and a base projection that are formed in a predetermined area of a circumference surface of the base unit by pressing a regular pattern in pressure machining, and a surface layer formed on the circumference surface of the base unit and having a recess and a projection formed respectively in accordance with the base recess and the base projection of the base unit. A thickness of the surface layer is larger than a maximum height of a base swollen portion close to the side edge of the base projection from a regular surface of the base projection.
摘要翻译：显影辊包括具有基座凹部和基部凸起的基座单元，该基座凹部和底部凸起通过在加压加工中按压规则图案而形成在基座单元的圆周表面的预定区域中，并且形成在表面层上的表面层并且具有根据基座单元的基座凹部和基座突起分别形成的凹部和突起。表面层的厚度大于从基底突起的规则表面靠近基底突起的侧边缘的基部肿胀部分的最大高度。

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