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    • 32. 发明申请
    • Solid-state image pick-up device
    • 固态摄像装置
    • US20030151075A1
    • 2003-08-14
    • US10366672
    • 2003-02-14
    • Makoto Shizukuishi
    • H01L027/148
    • H01L27/14812H01L27/14831H01L27/14843H01L29/42396
    • A honeycomb CCD, whose light receiving portion and a certain light receiving portion 105 adjoining thereto are arranged at a position to be shifted by half a pixel pitch in line and row directions, has charge transfer electrodes 111-114 formed of double-layered polysilicon electrode, a metal wiring 125, having smaller resistivity thereto, which is arranged in the longitudinal direction along each VCCD to intersect and cross over the charge transfer electrodes 111-114 being connected by a contact hole 126, by which electrical resistance of the polysilicon layer of the charge transfer electrodes can be lowered without increasing thickness thereof.
    • 将其光接收部分和与其相邻的特定光接收部分105布置在行和行方向上偏移半个像素间距的蜂窝CCD具有由双层多晶硅电极形成的电荷转移电极111-114 具有较小的电阻率的金属布线125沿着每个VCCD在纵向方向上布置以交叉并交叉通过接触孔126连接的电荷转移电极111-114,由此,多晶硅层的电阻 可以在不增加电荷转移电极的厚度的情况下降低电荷转移电极。
    • 34. 发明授权
    • Charge coupled devices
    • 电荷耦合器件
    • US06218686B1
    • 2001-04-17
    • US09405492
    • 1999-09-24
    • Jung-Hyun Nam
    • Jung-Hyun Nam
    • H01L2976
    • H01L27/14812H01L29/42396H01L29/76841
    • A charge coupled device has a transfer electrode portion having a first gate electrode, a second gate electrode having an end portion partially overlapping an end portion of the first gate electrode, and a third gate electrode having one end portion partially overlapping the other end portion of the first gate electrode. The charge coupled device also has a charge transfer portion located in a semiconductor substrate under the first, second and third gate electrodes, which includes a first potential area formed in the semiconductor substrate under the second gate electrode and a second potential area formed in the semiconductor substrate under the third gate electrode. The charge coupled device further has a clock portion which includes a first clock terminal connected to the first and third gate electrodes, and a second clock terminal connected to the second gate electrode. This charge coupled device may prevent unnecessary local potential barriers or wells produced by a misalignment, and thus may provide increased charge transfer efficiency.
    • 电荷耦合器件具有转移电极部分,该转移电极部分具有第一栅电极,第二栅电极具有部分与第一栅电极的端部重叠的端部,以及第三栅电极, 第一栅电极。 电荷耦合器件还具有位于第一,第二和第三栅电极下的半导体衬底中的电荷转移部分,其包括形成在第二栅电极下的半导体衬底中的第一电位区域和形成在半导体中的第二电势区域 衬底在第三栅电极下。 电荷耦合器件还具有一个时钟部分,该时钟部分包括连接到第一和第三栅极的第一时钟端子和连接到第二栅电极的第二时钟端子。 该电荷耦合器件可以防止由于未对准而产生的不必要的局部势垒或阱,从而可以提供增加的电荷转移效率。
    • 35. 发明授权
    • Charge coupled device
    • 电荷耦合器件
    • US5986295A
    • 1999-11-16
    • US772183
    • 1996-12-19
    • Jung-hyun Nam
    • Jung-hyun Nam
    • H01L21/339H01L27/148H01L29/423H01L29/762H01L29/768
    • H01L29/42396H01L27/14812H01L29/76841
    • A charge coupled device and a manufacturing method therefor are provided. The charge coupled device has a transfer electrode portion having a first gate electrode, a second gate electrode having an end portion partially overlapping an end portion of the first gate electrode, and a third gate electrode having one end portion partially overlapping the other end portion of the first gate electrode and the other end portion thereof partially overlapping the other end portion of the second gate electrode. The charge coupled device also has a charge transfer portion located in a semiconductor substrate under the first, second and third gate electrodes, which includes a first potential area formed in the semiconductor substrate under the second gate electrode and a second potential area formed in the semiconductor substrate under the third gate electrode. The charge coupled device further has a clock portion which includes a first clock terminal connected to the first and third gate electrodes, and a second clock terminal connected to the second gate electrode. This charge coupled device may prevent unnecessary local potential barriers or wells produced by a misalignment, and thus may provide increased charge transfer efficiency.
    • 提供了一种电荷耦合器件及其制造方法。 电荷耦合器件具有转移电极部分,该转移电极部分具有第一栅电极,第二栅电极具有与第一栅电极的端部部分重叠的端部,第三栅电极具有部分与第一栅电极的另一端部分重叠的第三栅电极 第一栅电极和另一端部分与第二栅电极的另一端部重叠。 电荷耦合器件还具有位于第一,第二和第三栅电极下的半导体衬底中的电荷转移部分,其包括形成在第二栅电极下的半导体衬底中的第一电位区域和形成在半导体中的第二电势区域 衬底在第三栅电极下。 电荷耦合器件还具有一个时钟部分,该时钟部分包括连接到第一和第三栅极的第一时钟端子和连接到第二栅电极的第二时钟端子。 该电荷耦合器件可以防止由于未对准而产生的不必要的局部势垒或阱,从而可以提供增加的电荷转移效率。
    • 36. 发明授权
    • Fabrication process for solid-state image pick-up device with CCD
register
    • 具有CCD寄存器的固态摄像装置的制作工艺
    • US5904494A
    • 1999-05-18
    • US835412
    • 1997-04-09
    • Yasuaki HokariChihiro Ogawa
    • Yasuaki HokariChihiro Ogawa
    • H01L21/26H01L21/316H01L21/339H01L27/148H01L29/423H01L29/762H01L31/18H01L21/00
    • H01L29/42396H01L27/148H01L27/14831H01L31/1864Y02E10/50
    • At first, first transfer electrodes are formed selectively on a semiconductor substrate. Then, the surface of the first transfer electrodes are thermally oxidized at a temperature of 850.degree. to 950.degree. C. to form thermal oxide layers. After depositing a polycrystalline silicon layer over the substrate, rapid annealing is performed the first transfer electrodes, the thermal oxide layers and the polycrystalline silicon layer by a halogen lamp. Thus, after forming the polycrystalline silicon layer to be second transfer electrodes, annealing is performed by heating by lamp. Therefore, the thermal oxide layers can be efficiently heated by the irradiation heat from the polycrystalline silicon layer located upper side thereof and also from the first electrodes located at backside. Accordingly, the tolerance voltage of the thermal oxide layer can be improved and the thickness of the thermal oxide layer can be made thinner.
    • 首先,在半导体基板上选择性地形成第一转印电极。 然后,将第一转印电极的表面在850〜950℃的温度下热氧化,形成热氧化层。 在衬底上沉积多晶硅层之后,通过卤素灯对第一转移电极,热氧化物层和多晶硅层进行快速退火。 因此,在将多晶硅层形成为第二转移电极之后,通过灯加热进行退火。 因此,可以通过位于其上侧的多晶硅层的照射热以及位于背面的第一电极来有效地加热热氧化物层。 因此,可以提高热氧化物层的公差电压,并且可以使热氧化物层的厚度更薄。
    • 38. 发明授权
    • Charge coupled device and imaging device having a charge coupled device
    • 电荷耦合器件和具有电荷耦合器件的成像器件
    • US5652442A
    • 1997-07-29
    • US493045
    • 1995-06-21
    • Edwin Roks
    • Edwin Roks
    • H01L27/148G11C19/28G11C27/04H01L21/339H01L29/423H01L29/762H01L29/768
    • G11C27/04G11C19/282H01L29/42396
    • The invention relates to a charge coupled device with a buried channel in which charge is detected by a MOST (MOS transistor) incorporated in the channel and having a surface channel of the conductivity type opposed to that of the charge coupled device. The source zone is situated in the centre of the CCD channel and is formed simultaneously with the channel bounding zone. The gate electrode comprises two portions situated on either side of the source zone, which portions, seen at the surface, do not overlap the source and drain zones. Below the gate electrode, a zone is formed of the same conductivity type as but with a higher doping than the CCD channel, which zone forms a charge storage region for the charge packet to be read out during the reading-out process. The source and drain zones are connected to the MOST channel region by means of extensions. The detector can be manufactured in a self-aligned manner, has a high charge storage capacity, a good noise behaviour, and a high speed.
    • 本发明涉及具有埋入通道的电荷耦合器件,其中电荷由并入通道中的MOST(MOS晶体管)检测,并具有与电荷耦合器件相反的导电类型的表面沟道。 源区位于CCD通道的中心,与通道边界区同时形成。 栅电极包括位于源极区两侧的两个部分,在表面看到的部分不与源区和漏区重叠。 在栅极电极下面,与CCD通道相比,具有相同导电类型的掺杂区域,该区域形成用于在读出过程期间读出的电荷分组的电荷存储区域。 源区和漏区通过扩展连接到MOST通道区。 检测器可以以自对准方式制造,具有高电荷存储容量,良好的噪声特性和高速度。
    • 40. 发明授权
    • CCD having transfer electrodes of 3 layers
    • CCD具有3层的传输电极
    • US5393997A
    • 1995-02-28
    • US264257
    • 1994-06-22
    • Takashi FukushoIsao HirotaMotoyuki Koike
    • Takashi FukushoIsao HirotaMotoyuki Koike
    • H01L27/14H01L29/423H01L29/78H01L31/00
    • H01L29/42396
    • A solid state imager device comprises a plurality of pixels arranged in rows and columns, each of the pixels consisting of a light sensing element and a vertical transfer portion adjacent to the light sensing element, the vertical transfer portion having three gate portions such as a first, a second and a third gate portions insulated each other, the third gate portion located in the center of the three gate portions, a plurality of rows of base portions disposed in the horizontal direction and connecting the respective gate portions, a vertical wiring device disposed over the gate portions through an insulating layer, the vertical wiring device including, a first wiring film connecting the first gate portions, a second wiring film connecting the second gate portions, a third wiring film connecting the third gate portions which is connected to the odd row of the base portions, a fourth wiring film connecting the third gate portions which is connected to the even rows of the base portions, a read out pulse device for supplying a read out voltage pulse to the third and fourth wiring films, and a transfer pulse device for supplying a transfer voltage pulse to the three gate portions so as to transfer signal charges in the vertical direction.
    • 固态成像装置包括排列成行和列的多个像素,每个像素由光感测元件和与光感测元件相邻的垂直传送部分组成,垂直传送部分具有三个门部分,例如第一 ,第二栅极部分和第三栅极部分彼此绝缘,位于三个栅极部分的中心的第三栅极部分,沿水平方向设置并连接各个栅极部分的多排基底部分,垂直布线装置设置 通过绝缘层在栅极部分之上,垂直布线装置包括:连接第一栅极部分的第一布线膜,连接第二栅极部分的第二布线膜,连接第三栅极部分的第三布线膜,其连接到奇数 连接基座部分的偶数行的第四布线膜 ns,用于向第三和第四布线膜提供读出电压脉冲的读出脉冲装置,以及用于向三个栅极部分提供转印电压脉冲以在垂直方向上传送信号电荷的转印脉冲装置。