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31. 发明授权

US09151719B2 Inspection apparatus 有权
标题翻译：检验仪器
公开(公告)号：US09151719B2
公开(公告)日：2015-10-06
申请号：US14361657
申请日：2012-11-19
申请人： Hitachi High-Technologies Corporation
发明人： Koichi Taniguchi , Kei Shimura , Sachio Uto
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , G02B26/06 , G02B26/08 , G01N21/47
CPC分类号： G01N21/9505 , G01N21/47 , G01N21/4788 , G01N21/95684 , G01N2021/4707 , G02B26/06 , G02B26/0825
摘要： When it is tried to detect a microscopic defect, it is desired that the width of the above-mentioned illuminated region in the minor axis direction should be short. In the related art, although an illuminated region is formed by converging light by some means, it is not easy to form an illuminated region with a narrower width. This is because various aberrations possessed by optical elements themselves used for convergence, aberrations possessed by other optical elements disposed on optical paths, assembly errors, and the like have undesired influence on the formation of linear illumination. In the related art, sufficient consideration has not been paid to the above points. The present invention is characterized in that it includes a system for changing the wavefront of light.
摘要翻译：当试图检测微观缺陷时，期望上述照明区域在短轴方向上的宽度应该较短。在现有技术中，虽然通过某种方式会聚光来形成照明区域，但是不容易形成具有较窄宽度的照明区域。这是因为用于会聚的光学元件本身具有的各种像差，设置在光路上的其他光学元件所具有的像差，组装误差等对线形照明的形成具有不期望的影响。在现有技术中，还没有充分考虑上述几点。本发明的特征在于它包括用于改变光的波前的系统。

32. 发明授权

US09013787B2 Microscope and inspection apparatus 有权
标题翻译：显微镜和检查仪器
公开(公告)号：US09013787B2
公开(公告)日：2015-04-21
申请号：US13744890
申请日：2013-01-18
申请人： Lasertec Corporation
发明人： Haruhiko Kusunose , Takamasa Tsubouchi
IPC分类号： G02B21/06 , G02B21/00 , G02B21/10 , F21V8/00 , G01N21/95
CPC分类号： G02B21/06 , G01N21/9501 , G01N21/9505 , G02B6/0008 , G02B21/0092 , G02B21/10
摘要： A system including a microscope and an inspection apparatus in which an objective lens having a large numerical aperture is used for detecting a defect existing inside a sample. A light source apparatus produces linearly polarized light. The polarization maintaining fibers optically coupled to the light source apparatus project the linearly polarized light onto the sample surface as an illumination beam of P-polarized light at an incidence angle substantially equal to the Brewster's angle of the sample. The scattered light generated by the defect existing in the sample is emitted from the sample and is collected by the objective lens whose optical axis is perpendicular to the sample surface. Since the illumination beam of P-polarized light is projected at the incidence angle equal to the Brewster's angle of the sample, no surface reflection occurs and it is possible to use the objective lens having a large numerical aperture.
摘要翻译：一种包括显微镜和检查装置的系统，其中使用具有大数值孔径的物镜来检测样品内存在的缺陷。光源装置产生线偏振光。与光源装置光学耦合的偏振保持光纤将线偏振光投射到样品表面上，作为基本上等于样品的布鲁斯特角的入射角的P偏振光的照明光束。由样品中存在的缺陷产生的散射光从样品发射，并由其光轴垂直于样品表面的物镜收集。由于P偏振光的照明光束以等于样品的布鲁斯特角的入射角投影，所以不会发生表面反射，并且可以使用具有大数值孔径的物镜。

33. 发明申请

US20150029819A1 SURFACE AND SUBSURFACE DETECTION SENSOR 审中-公开
标题翻译：表面和表面检测传感器
公开(公告)号：US20150029819A1
公开(公告)日：2015-01-29
申请号：US14339187
申请日：2014-07-23
申请人： Araz Yacoubian
发明人： Araz Yacoubian
IPC分类号： G01H9/00 , G01N21/88 , G01N29/24
CPC分类号： G01N29/2418 , G01N21/171 , G01N21/1717 , G01N21/9501 , G01N21/9505 , G01N29/043 , G01N2291/263
摘要： A sensor can include a plurality of imaging components configured to perform (1) subsurface imaging by acoustical excitation and optical detection, and (2) interferometric surface topographic measurement.
摘要翻译：传感器可以包括多个成像部件，其被配置为通过声学激发和光学检测执行（1）地下成像，以及（2）干涉表面形貌测量。

34. 发明授权

US08879056B2 Multi-spot illumination for wafer inspection 有权
标题翻译：多点照明用于晶圆检查
公开(公告)号：US08879056B2
公开(公告)日：2014-11-04
申请号：US13898470
申请日：2013-05-21
申请人： KLA-Tencor Corporation
发明人： Guoheng Zhao , Azmi Kadkly
IPC分类号： G01N21/00 , G01N21/95 , F21V5/00
CPC分类号： F21V5/008 , G01N21/8806 , G01N21/9501 , G01N21/9505
摘要： Illumination subsystems for multi-spot wafer inspection are provided. One illumination subsystem includes a diffractive optical element configured to separate an illumination light beam into multiple light beams and a refractive lens array positioned in the path of the multiple light beams. The refractive lens array is configured to relay the laser beam waist at the diffractive optical element onto a wafer surface and to separately and simultaneously focus each of the multiple light beams to a wafer for inspection.
摘要翻译：提供了多点晶圆检查的照明子系统。一个照明子系统包括被配置为将照明光束分离成多个光束的衍射光学元件和位于多个光束的路径中的折射透镜阵列。折射透镜阵列被配置为将衍射光学元件处的激光束腰部中继到晶片表面上，并且将多个光束中的每一个分别并且同时聚焦到晶片以进行检查。

35. 发明申请

US20140218724A1 Optical Inspector 有权
标题翻译：光学检查员
公开(公告)号：US20140218724A1
公开(公告)日：2014-08-07
申请号：US13757099
申请日：2013-02-01
申请人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
发明人： Steven W. Meeks , Rusmin Kudinar , Hung P. Nguyen
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/9505 , G01N21/956 , G01N21/958
摘要： An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a separating minor, and a first and second detector. The radiating source is configured to irradiate a first position on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The telecentric scan lens directs specular reflection and near specular scattered radiation to the time varying beam reflector. The specular reflection is directed by the separating mirror to the first detector. The near specular scattered radiation is not reflected by the separating minor and propagates to the second detector. In response, the optical inspector determines the total reflectivity, the surface slope, or the near specular scattered radiation intensity of the sample.
摘要翻译：光学检查器包括辐射源，时变光束反射器，远心扫描透镜，分离光和第一和第二检测器。辐射源被配置成用源光束照射时变光束反射器上的第一位置。时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。远心扫描透镜将镜面反射和近镜面散射辐射引导到时变光束反射器。镜面反射由分离镜引导到第一检测器。近镜面散射的辐射不会被分离的小分子反射并传播到第二个检测器。作为响应，光学检查器确定样品的总反射率，表面斜率或近镜面散射辐射强度。

36. 发明授权

US08698083B2 Solar cell evaluation method, evaluation device, maintenance method, maintenance system, and method of manufacturing solar cell module 有权
标题翻译：太阳能电池评估方法，评估装置，维护方法，维护系统以及制造太阳能电池组件的方法
公开(公告)号：US08698083B2
公开(公告)日：2014-04-15
申请号：US13388129
申请日：2010-08-03
申请人： Takashi Fuyuki , Ayumi Tani
发明人： Takashi Fuyuki , Ayumi Tani
IPC分类号： G01J5/00 , G01N21/00 , G01N21/66 , G01R31/26 , G01N21/95
CPC分类号： G01R31/2605 , G01N21/66 , G01N21/88 , G01N21/9505 , G01R31/308 , G06T2207/10048 , H01L31/186 , H02S50/10 , Y02E10/50 , Y02P70/521
摘要： A method and device for evaluating a solar cell each of which makes it possible to easily evaluate a defect of a solar cell especially in such a manner that an internal cause defect and an external cause defect are distinguished from each other. The device includes: electric current passing means for passing, in a forward direction, an electric current through a solar cell element constituting the solar cell; light emission detecting means for detecting, out of light emitted from the solar cell element due to the electric current passed by the electric current passing means, light in a first range of wavelengths from 800 nm to 1300 nm and light in a second range of wavelengths from 1400 nm to 1800 nm; and judging means for distinguishing between an internal cause defect and an external cause defect.
摘要翻译：一种用于评估太阳能电池的方法和装置，每个太阳能电池都可以容易地评估太阳能电池的缺陷，特别是以内部原因缺陷和外部原因缺陷彼此区分。该装置包括：电流通过装置，用于沿向前方向通过构成太阳能电池的太阳能电池元件的电流; 发光检测装置，用于检测由于通过电流通过装置的电流而从太阳能电池元件发出的光，在第一波长范围为800nm至1300nm的光和在第二波长范围内的光从1400nm到1800nm; 以及用于区分内部原因缺陷和外部原因缺陷的判断装置。

37. 发明申请

US20140055599A1 INSPECTION DEVICE, BONDING SYSTEM AND INSPECTION METHOD 审中-公开
标题翻译：检查装置，接合系统和检查方法
公开(公告)号：US20140055599A1
公开(公告)日：2014-02-27
申请号：US13967938
申请日：2013-08-15
申请人： TOKYO ELECTRON LIMITED
发明人： Shinji KOGA , Akinori MIYAHARA , Hiroshi TOMITA , Shuji IWANAGA , Takeshi TAMURA
IPC分类号： G01N21/95 , H04N5/33
CPC分类号： G01N21/9503 , G01N21/9501 , G01N21/9505 , H01L22/12 , H04N5/33
摘要： An inspection device for inspecting the interior of an overlapped substrate produced by bonding one substrate and another substrate, comprising: a first holding unit configured to hold the rear surface of the overlapped substrate and include a cutout formed to expose a portion of the rear surface of the overlapped substrate when viewed from the top; a second holding unit configured to hold and rotate the overlapped substrate; an infrared irradiator configured to irradiate the rear surface or front surface exposed from the cutout of the overlapped substrate held on the first holding unit with an infrared ray; and an image pickup unit configured to receive the infrared ray emitted from the infrared irradiator and image the overlapped substrate held on the first holding unit in division for each of regions exposed from the cutout.
摘要翻译：一种检查装置，用于检查通过粘合一个基板和另一个基板而产生的重叠基板的内部，包括：第一保持单元，其构造成保持重叠基板的后表面，并且包括切口，其形成为将背面的一部分从顶部观察时的重叠基板; 第二保持单元，其构造成保持并旋转所述重叠的基板; 红外线照射器，被配置为用从红外线照射被保持在第一保持单元上的重叠基板的切口露出的后表面或前表面; 以及图像拾取单元，被配置为接收从所述红外线照射器发射的红外线，并且对于从所述切口暴露的每个区域划分，对保持在所述第一保持单元上的重叠基板进行成像。

38. 发明申请

US20130176454A1 Air Pocket Detection Methods and Systems 有权
标题翻译：空气口袋检测方法和系统
公开(公告)号：US20130176454A1
公开(公告)日：2013-07-11
申请号：US13712561
申请日：2012-12-12
申请人： MEMC ELECTRONIC MATERIALS, INC.
发明人： John F. Valley
IPC分类号： G06T7/00
CPC分类号： G06T7/0002 , G01N21/00 , G01N21/59 , G01N21/88 , G01N21/9505 , G01N2021/5957 , G01N2021/8477 , G06F17/10 , G06T7/0004 , G06T7/68 , G06T2207/10048 , G06T2207/30148 , H01L22/12
摘要： Methods and systems for use in detecting an air pocket in a single crystal material are described. One example method includes providing a matrix including a plurality of data units, the plurality of data units including image data related to a region of interest of the single crystal material; determining, by a processor, a difference between data units of the matrix and a corresponding data unit of the matrix, wherein the corresponding data unit is defined by a first operation of the matrix; calculating, by the processor, a first index value based on the differences of the corresponding data units; and identifying an air pocket within the single crystal material based on the first index value and a predetermined threshold.
摘要翻译：描述了用于检测单晶材料中的气穴的方法和系统。一个示例性方法包括提供包括多个数据单元的矩阵，所述多个数据单元包括与单晶材料的感兴趣区域相关的图像数据; 由处理器确定矩阵的数据单元与矩阵的相应数据单元之间的差异，其中相应的数据单元由矩阵的第一操作定义; 由处理器基于相应的数据单元的差异来计算第一索引值; 以及基于所述第一指标值和预定阈值来识别所述单晶材料内的空气袋。

39. 发明授权

US08462329B2 Multi-spot illumination for wafer inspection 有权
标题翻译：多点照明用于晶圆检查
公开(公告)号：US08462329B2
公开(公告)日：2013-06-11
申请号：US13187375
申请日：2011-07-20
申请人： Guoheng Zhao , Azmi Kadkly
发明人： Guoheng Zhao , Azmi Kadkly
IPC分类号： G01N21/94
CPC分类号： F21V5/008 , G01N21/8806 , G01N21/9501 , G01N21/9505
摘要： Illumination subsystems for multi-spot wafer inspection are provided.
摘要翻译：提供了多点晶圆检查的照明子系统。

40. 发明授权

US08450688B2 Refraction assisted illumination for imaging 有权
$Refraction assisted illumination for imaging$
标题翻译：折射辅助照明成像
公开(公告)号：US08450688B2
公开(公告)日：2013-05-28
申请号：US13190264
申请日：2011-07-25
申请人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives , William T. Lotshaw , Steven C. Moss
发明人： Stephen La Lumondiere , Terence Yeoh , Martin Siu Wo Leung , Neil A. Ives , William T. Lotshaw , Steven C. Moss
IPC分类号： G01J5/02
CPC分类号： G01N21/9505 , H04N5/2256
摘要： Various embodiments are directed to systems and methods for imaging subsurface features of a semiconductor object comprising a first region having a first doping property and a second region having a second doping property. The semiconductor object may comprise subsurface features and material between a surface of the semiconductor object and the subsurface features. The material may have an index of refraction that is greater than an index of refraction of a surrounding medium in contact with the surface of the semiconductor object. For example, a system may comprise an imaging device comprising an objective. The imaging device may be sensitive to a first wavelength. The system may also comprise an illumination source to emit illumination substantially at the first wavelength. The illumination may be directed towards the surface of the semiconductor object at a first angle relative to a normal of the surface. The first angle is greater than an acceptance angle of the objective of the imaging device. Also, the first wavelength may have a photonic energy substantially equal to a bandgap of the first region.
摘要翻译：各种实施例涉及用于对包括具有第一掺杂特性的第一区域和具有第二掺杂特性的第二区域的半导体物体的次表面特征进行成像的系统和方法。半导体物体可以包括半导体物体的表面和地下特征之间的地下特征和材料。材料可以具有大于与半导体物体的表面接触的周围介质的折射率的折射率。例如，系统可以包括包括物镜的成像装置。成像装置可能对第一波长敏感。该系统还可以包括基本上以第一波长发射照明的照明源。照明可以相对于表面的法线以第一角度指向半导体物体的表面。第一角度大于成像装置的物镜的接受角度。此外，第一波长可以具有基本上等于第一区域的带隙的光子能量。

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