会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 37. 发明授权
    • Single-crystalline silicon alkaline texturing with glycerol or ethylene glycol additives
    • 甘油或乙二醇添加剂的单晶硅碱性织构
    • US08440494B2
    • 2013-05-14
    • US13112465
    • 2011-05-20
    • Kathryn C. FisherJun LiuSatyavolu S. Papa RaoGeorge G. TotirJames Vichiconti
    • Kathryn C. FisherJun LiuSatyavolu S. Papa RaoGeorge G. TotirJames Vichiconti
    • H01L21/00
    • C09K13/02H01L31/02363Y02E10/50
    • Alternative additives that can be used in place of isopropyl alcohol in aqueous alkaline etchant solutions for texturing a surface of a single-crystalline silicon substrate are provided. The alternative additives do not have volatile constituents, yet can be used in an aqueous alkaline etchant solution to provide a pyramidal shaped texture surface to the single-crystalline silicon substrate that is exposed to such an etchant solution. Also provided is a method of forming a textured silicon surface. The method includes immersing a single-crystalline silicon substrate into an etchant solution to form a pyramid shaped textured surface on the single-crystalline silicon substrate. The etchant solution includes an alkaline component, silicon (etched into the solution as a bath conditioner) and glycerol or ethylene glycol as an additive. The textured surface of the single-crystalline silicon substrate has (111) faces that are now exposed.
    • 提供了可用于代替异丙醇的水性碱性蚀刻剂溶液中用于织构单晶硅衬底的表面的替代添加剂。 替代的添加剂不具有挥发性成分,但也可用于碱性蚀刻剂水溶液中以向暴露于这种蚀刻剂溶液的单晶硅衬底提供金字塔形的纹理表面。 还提供了形成纹理硅表面的方法。 该方法包括将单晶硅衬底浸入蚀刻剂溶液中以在单晶硅衬底上形成棱锥形织构表面。 蚀刻剂溶液包括碱性组分,硅(作为浴调节剂蚀刻到溶液中)和甘油或乙二醇作为添加剂。 单晶硅衬底的纹理表面具有现在暴露的(111)面。