会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 32. 发明授权
    • Apparatus and method for removing condensable aluminum vapor from aluminum etch effluent
    • 从铝蚀刻流出物中除去可冷凝的铝蒸气的装置和方法
    • US06238514B1
    • 2001-05-29
    • US09489374
    • 2000-01-21
    • Youfan Gu
    • Youfan Gu
    • H05H100
    • H01J37/32844B01D5/0036B01D8/00C23C16/4412Y02C20/30Y10S438/905
    • The present invention provides an improved aluminum chloride trap having a disposable element, wherein the disposable element contains trapping media for condensing, solidifying and trapping condensable aluminum chloride vapor. The trap is designed such that the disposable element may be easily removed for rapid and safe disposal of condensed aluminum chloride solids and subsequently replaced with a new disposable element. The disposable element efficiently traps condensable aluminum chloride vapor from an aluminum etch system without the need for internal or external cooling means, such that condensable aluminum chloride vapor is prevented from condensing and depositing on the interior walls of the trap or on the interior walls of a vacuum conduit system used in an aluminum etch system. The improved aluminum chloride trap of this invention eliminates the hazardous conditions associated with removing condensed aluminum chloride solids from the interior surfaces of the trap and from the interior walls of a vacuum conduit system of an aluminum etch system.
    • 本发明提供了具有一次性元件的改进的氯化铝捕集器,其中一次性元件包含用于冷凝,固化和捕获可冷凝的氯化铝蒸气的捕集介质。 陷阱设计成使得一次性元件可以容易地移除,以便快速和安全地处理冷凝的氯化铝固体,并随后用新的一次性元件代替。 一次性元件有效地从铝蚀刻系统中捕获可冷凝的氯化铝蒸气,而不需要内部或外部冷却装置,使得可冷凝的氯化铝蒸汽被防止冷凝和沉积在捕集器的内壁上或在内壁上的 在铝蚀刻系统中使用的真空管道系统。 本发明的改进的氯化铝捕集器消除了从捕集器的内表面和铝蚀刻系统的真空管道系统的内壁去除冷凝的氯化铝固体相关的危险条件。
    • 33. 发明授权
    • Method and apparatus for controlling polymerized teos build-up in vacuum pump lines
    • 用于控制真空泵管道中聚合聚合物积聚的方法和装置
    • US06197119B1
    • 2001-03-06
    • US09250928
    • 1999-02-18
    • Paul DozoretzYoufan Gu
    • Paul DozoretzYoufan Gu
    • C23C1600
    • H01J37/32844B01D5/0036C23C16/4412Y02C20/30Y10S438/905
    • A TEOS trap for controlling TEOS polymerization from reaction furnace effluent in a vacuum pump line a SiO2 CVD process includes a molecular species-selective flow impeding medium that adsorbs and retains TEOS and water molecules from the effluent long enough to consume substantially all the water molecules in TEOS hydrolysis reactions while allowing non-hydrolyzed TEOS, ethylene, and other gaseous byproducts to pass through the trap and retaining solid and liquid phase SiO2-rich TEOS polymers formed by the hydrolysis reactions in the trap for subsequent removal and disposal. The molecular species-selective flow impeding medium has a plurality of adsorption surfaces to make a surface density that performs the TEOS and water flow impeding fuction and solid and liquid phase TEOS polymer trapping function.
    • 用于在真空泵管线中控制来自反应炉流出物的TEOS聚合的TEOS捕集器,SiO 2 CVD工艺包括分子种类选择性流阻碍介质,其吸附并保留来自流出物的TEOS和水分子足够长以消耗基本上所有的水分子 TEOS水解反应,同时允许非水解的TEOS,乙烯和其他气态副产物通过捕集阱并保留通过水解反应形成的固体和液相SiO 2富集的TEOS聚合物,以便随后的去除和处置。 分子种类选择性流阻碍介质具有多个吸附表面,以形成执行TEOS和水流阻碍功能的表面密度以及固相和液相TEOS聚合物捕集功能。