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    • 36. 发明授权
    • Method of manufacturing SOI substrate and semiconductor device
    • 制造SOI衬底和半导体器件的方法
    • US06372593B1
    • 2002-04-16
    • US09619579
    • 2000-07-19
    • Nobuyoshi HattoriSatoshi YamakawaJunji Nakanishi
    • Nobuyoshi HattoriSatoshi YamakawaJunji Nakanishi
    • H01L21331
    • H01L21/76256H01L27/10873H01L27/1203Y10S438/933
    • First, a silicon germanium single-crystalline layer and a silicon single-crystalline layer are formed on a main surface of a bond wafer by epitaxy. The overall surface of the bond wafer is oxidized for forming a silicon oxide layer. Then, a base wafer is bonded to the bond wafer. The bond wafer and the base wafer bonded to each other are heated for reinforcing adhesion therebetween. Then, the bond wafer is removed by plasma etching with chlorine gas while making the silicon germanium single-crystalline layer serve as a stopper. Thereafter the silicon germanium single-crystalline layer is polished by chemical mechanical polishing to have a thickness suitable for forming a device. Thus implemented is a method of manufacturing an SOI substrate by bonding capable of employing a layer having a crystal state with small irregularity for serving as a stopper having selectivity for single-crystalline silicon and effectively using the stopper as a device forming layer.
    • 首先,通过外延在接合晶片的主表面上形成硅锗单晶层和硅单晶层。 接合晶片的整个表面被氧化以形成氧化硅层。 然后,将基底晶片接合到接合晶片。 将接合晶片和彼此接合的基底晶片加热,以加强它们之间的粘合。 然后,通过用氯气等离子体蚀刻除去接合晶片,同时使硅锗单晶层用作止动器。 此后,通过化学机械抛光对硅锗单晶层进行抛光,以具有适于形成器件的厚度。 这样实现的是通过接合制造SOI衬底的方法,该SOI衬底可以采用具有小的不规则性的晶体状态的层作为具有对单晶硅的选择性的阻挡层,并且有效地使用该阻挡件作为器件形成层。
    • 38. 发明授权
    • Manufactured method of alkoxy radical-containing silicone resin
    • 含有烷氧基的有机硅树脂的制造方法
    • US5300610A
    • 1994-04-05
    • US13901
    • 1993-02-05
    • Junji NakanishiToshio Saruyama
    • Junji NakanishiToshio Saruyama
    • C08G77/06C08G77/10C08G77/18C08K5/5419C08L83/04
    • C08G77/06C08G77/18
    • The invention provides a method for manufacturing an alkoxy radical-containing silicone resin wherein the molecular weight, viscosity, thermal transition point, and alkoxy radical content can be easily controlled. The method of the instant invention comprises combining under anhydrous conditions, (A) an alkoxysilane represented by the formula R.sup.4.sub.a Si(OR.sup.5).sub.4-a or its partial hydrolysis product wherein R.sup.4 is selected consisting of a monovalent hydrocarbon radical and a monovalent halogenated hydrocarbon radical, R.sup.5 is selected from the group consisting of an alkyl radical containing 1 to 6 carbon atoms, and a has a value of 0 to 3; and (B) an organopolysiloxane or a mixture of organopolysiloxanes selected from the group consisting of organopolysiloxanes that are made of siloxane units selected from the group consisting of R.sup.1 SiO3.sub./2 and R.sup.2 R.sup.3 SiO and mixtures thereof wherein R.sup.1, R.sup.2 and R.sup.3 are independently selected from the group consisting of monovalent hydrocarbon radicals and monovalent halogenated hydrocarbon radicals; followed by heating the mixture of (A) and (B) in the presence of a basic catalyst to perform a reequilibration reaction for said components (A) and (B).
    • 本发明提供一种制备含烷氧基自由基的有机硅树脂的方法,其中可以容易地控制分子量,粘度,热转变点和烷氧基含量。 本发明的方法包括在无水条件下组合(A)由式R4aSi(OR5)4-a表示的烷氧基硅烷或其部分水解产物,其中R4选自一价烃基和一价卤代烃基, R5选自含有1至6个碳原子的烷基,a值为0至3; 和(B)选自有机聚硅氧烷的有机聚硅氧烷或有机聚硅氧烷的混合物,所述有机聚硅氧烷由选自由R 1 SiO 3/2和R 2 R 3 SiO组成的组的硅氧烷单元制成的有机聚硅氧烷及其混合物,其中R 1,R 2和R 3独立地选自 由一价烃基和一价卤代烃基组成; 然后在碱性催化剂的存在下加热(A)和(B)的混合物,以对所述组分(A)和(B)进行重新平衡反应。