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31. 发明授权

US5996437A Precision motion stage with single guide beam and follower stage 失效
标题翻译：具有单引导梁和跟随台的精准运动台
公开(公告)号：US5996437A
公开(公告)日：1999-12-07
申请号：US799674
申请日：1997-02-11
申请人： W. Thomas Novak , Zahirudeen Premji , Uday G. Nayak , Akimitsu Ebihara
发明人： W. Thomas Novak , Zahirudeen Premji , Uday G. Nayak , Akimitsu Ebihara
IPC分类号： G12B5/00 , G02B21/26 , G03F7/20 , H01L21/027 , G05G11/00
CPC分类号： G03F7/707 , G03F7/70358 , G03F7/70716 , G03F7/70991 , Y10T74/20354 , Y10T74/20378
摘要： An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) difection and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam. A cable follower stage moves in the Y direction on the follower stage and supports the cables connecting to the main stage, thereby reducing cable drag. An air circulation system is provided in the magnetic tracks on the follower stage to remove heat from operation of the electromagnetic motors. Air is removed from a central region of each track by a vacuum duct enhanced by air plugs fitting at the two ends of the motor coil assembly on the main stage to contain the air therein.
摘要翻译：用于在微光刻系统中对准晶片的精确运动的XY平台。支撑晶片的主平台跨越在XY平面中沿第一线性方向磁驱动的可移动光束。机械独立于主舞台的跟随器阶段也在第一线性（X）等级中移动，并且其运动由具有主方向运动的控制系统在X方向上电子同步。电磁驱动电动机包括安装在从动台上的磁道，其与安装在主台的边缘上的电动机线圈配合，以沿着与X方向正交的第二线性（Y）方向移动主工作台。因此，主平台与XY平面中的机械扰动隔离，因为没有机械连接并且通过从梁中去除磁道的重量而被减轻。电缆跟随器级在从动台上沿Y方向移动，并支撑连接到主级的电缆，从而减少电缆阻力。在跟随器台上的磁道中设置有一个空气循环系统，以消除电磁马达的运行中的热量。空气从每个轨道的中心区域被一个真空管道除去，该真空管道通过安装在主台上的电动机线圈组件的两端的空气塞增强，以便在其中容纳空气。

32. 发明授权

US4549843A Mask loading apparatus, method and cassette 失效
标题翻译：面罩装载装置，方法和盒式磁带
公开(公告)号：US4549843A
公开(公告)日：1985-10-29
申请号：US475439
申请日：1983-03-15
申请人： Peter R. Jagusch , W. Thomas Novak
发明人： Peter R. Jagusch , W. Thomas Novak
IPC分类号： B23Q1/36 , G03F7/20 , G03F9/00 , H01L21/02
CPC分类号： G03F7/70691 , B23Q1/36 , G03F9/7023 , G03F9/7049 , Y10S101/36
摘要： A mask loading apparatus and method employing a cassette (200) detachably mounted on an in-out cassette holder (212). The cassette is made of low Z-materials, and comprises a cover (211) and a bottom mask-supporting tray (202) locked by machine-operable locking members (224) to the cover. A lift cylinder (218) has a vacuum cup (216) which is raised to support and hold the underside (213) of the tray and, when the tray is unlocked from the cover, to move the vacuum cup, tray and mask downwardly and then laterally by a transport arm (203) to a fixed location under a mask holder (205, 220) in a lithographic apparatus.The lift cylinder then raises the cup, tray and mask to abut the mask holder and to transfer the mask to the mask holder. The lift cylinder and empty tray is then lowered and removed from a position blocking the mask as it is to be used in the lithography processing. A reversal of the sequence of steps is utilized to unload the mask from its use mode and return it to its cassette cover. An anti-rotation pin (222) prevents tray movement in the cassette and pins (236) prevent mask movement on the tray. Indication bar code or read hole or clear window (231, 232 and 230) automatically show whether a mask or calibration plate is in a cassette to be transported.
摘要翻译：一种掩模装载装置和方法，其采用可拆卸地安装在输入盒架（212）上的盒（200）。盒由低Z材料制成，并且包括由机器可操作的锁定构件（224）锁定到盖的盖（211）和底部掩模支撑盘（202）。升降缸（218）具有一个真空杯（216），该真空杯被升高以支撑和保持该托盘的下侧（213），并且当托盘从该盖解锁时，向下移动该真空杯，托盘和面罩，然后由传送臂（203）横向移动到光刻设备中的掩模保持器（205,220）下的固定位置。提升筒然后升起杯子，托盘和面罩以邻接面罩座并将面罩转移到面罩座上。然后将升降缸和空托盘从阻挡掩模的位置降下并从其被用于光刻处理中移除。使用步骤顺序的反转来将掩模从其使用模式卸载并将其返回到其盒盖。防旋转销（222）防止托盘在盒中移动，并且销（236）防止托盘上的面罩移动。指示条形码或读取孔或清除窗口（231,232和230）自动显示掩模或校准板是否在要传输的盒中。

33. 发明授权

US09025043B2 Image segmentation from focus varied images using graph cuts 有权
标题翻译：图像分割从焦点变化的图像使用图形切割
公开(公告)号：US09025043B2
公开(公告)日：2015-05-05
申请号：US13119541
申请日：2008-09-24
申请人： Li Hong , Mark Takita , W. Thomas Novak
发明人： Li Hong , Mark Takita , W. Thomas Novak
IPC分类号： H04N5/228 , H04N5/262 , G06K9/34 , G03B13/18
CPC分类号： G03B13/18
摘要： A system for providing an adjusted image of a scene includes an optical assembly, a capturing system coupled to the optical assembly, and a control system. The optical assembly is adjustable to alternatively be focused on a first focal area and a second focal area that is different than the first focal area. The capturing system captures a first frame of the scene when the optical assembly is focused at the first focal area, and a second frame of the scene when the optical assembly is focused at the second focal area. The first frame includes a plurality of first pixels and the second frame includes a plurality of second pixels. The control system analyzes the first frame and the second frame and utilizes graph cuts techniques to assign a depth label to at least a portion of the first frame.
摘要翻译：用于提供场景的调整图像的系统包括光学组件，耦合到光学组件的捕获系统和控制系统。光学组件可调节以可选地聚焦在与第一焦点区域不同的第一焦点区域和第二焦点区域上。当光学组件聚焦在第一焦点区域时，捕获系统捕获场景的第一帧，以及当光学组件聚焦在第二焦点区域时的场景的第二帧。第一帧包括多个第一像素，第二帧包括多个第二像素。控制系统分析第一帧和第二帧，并利用图切割技术将深度标签分配给第一帧的至少一部分。

34. 发明授权

US08582119B2 Large scale metrology apparatus and method 有权
标题翻译：大规模计量仪器及方法
公开(公告)号：US08582119B2
公开(公告)日：2013-11-12
申请号：US13214717
申请日：2011-08-22
申请人： W. Thomas Novak , Daniel G. Smith , Lloyd Holland
发明人： W. Thomas Novak , Daniel G. Smith , Lloyd Holland
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , G01B11/002 , G01S5/16 , G01S5/163 , G01S17/00
摘要： A metrology system that uses a plurality of photo-detecting targets positioned on the objects to be assembled, a plurality of rotating photo-emitting heads, a master signal generator that generates a reference RF signal, and a signal processor that determines the position of each of the targets from signals generated by each target in response to the photo-emitting heads. During operation, the reference RF signal is broadcast to the rotating photo-emitting heads and the photo-detecting targets. The RF signal is used to determine the azimuth of the heads relative to a zero reference position to a high degree of accuracy.
摘要翻译：一种测量系统，其使用位于要组装的物体上的多个光检测目标，多个旋转光发射头，产生参考RF信号的主信号发生器，以及确定每个从由每个目标响应于光发射头的信号产生的目标。在操作期间，将参考RF信号广播到旋转的光发射头和光检测目标。 RF信号用于以高精确度确定磁头相对于零参考位置的方位角。

35. 发明申请

US20120019792A1 Liquid jet and recovery system for immersion lithography 审中-公开
标题翻译：用于浸没光刻的液体喷射和回收系统
公开(公告)号：US20120019792A1
公开(公告)日：2012-01-26
申请号：US13200982
申请日：2011-10-06
申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.
摘要翻译：液浸光刻设备包括其上保持晶片的台。投影系统通过浸没液将图案图像投影到曝光区域，以露出台上的晶片。多个供应开口布置成围绕曝光区域，液体从曝光区域的上方供应。多个恢复开口被布置成围绕曝光区域，通过该曝光区域从曝光区域上方收集液体。选择供给开口的一部分，以便在台架移动的方向上将曝光区域前方的液体供给。

36. 发明授权

US07929111B2 Environmental system including a transport region for an immersion lithography apparatus 有权
标题翻译：环境系统包括浸没式光刻设备的传送区域
公开(公告)号：US07929111B2
公开(公告)日：2011-04-19
申请号：US11819447
申请日：2007-06-27
申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a mesh member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
摘要翻译：布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。该装置还包括液体收集系统，该液体收集系统包括具有网状构件的液体收集构件，通过该网状构件从与液体收集构件相对的物体的表面收集液体。

37. 发明申请

US20100053588A1 Substrate Stage movement patterns for high throughput While Imaging a Reticle to a pair of Imaging Locations 审中-公开
标题翻译：基底阶段运动模式，用于高吞吐量，同时将刻线图成像到一对成像位置
公开(公告)号：US20100053588A1
公开(公告)日：2010-03-04
申请号：US12545487
申请日：2009-08-21
申请人： Michael B. Binnard , Eric Peter Goodwin , W. Thomas Novak , Daniel Gene Smith
发明人： Michael B. Binnard , Eric Peter Goodwin , W. Thomas Novak , Daniel Gene Smith
IPC分类号： G03B27/32
CPC分类号： G03B27/32
摘要： A new and useful optical imaging process is provided for imaging of a plurality of substrates, in a manner that makes efficient use of an optical imaging system with the capability to image a single reticle to a pair of imaging locations, and addresses the types of substrate stage movement patterns to accomplish such imaging in an efficient and effective manner. At least three substrates are imaged by moving their substrate stages in patterns whereby (i) two of the substrates are completely imaged at respective imaging locations, (ii) a substrate on at least one of the three stages is partially imaged at one imaging location and then partially imaged at the other imaging location, and (iii) the movement of the stages of the three substrates is configured to avoid movement of the stages of the three substrates in paths that would cause interference between movement of any one substrate stage with movement of any of the other substrate stages.
摘要翻译：提供了一种新的有用的光学成像方法，用于对多个基板进行成像，使得能够有效利用具有将单个掩模版成像到一对成像位置的能力的光学成像系统，并且寻址基板的类型阶段运动模式以有效和有效的方式完成这种成像。通过以图案移动它们的衬底台来成像至少三个衬底，由此（i）两个衬底在相应的成像位置处完全成像，（ii）三个阶段中的至少一个的衬底在一个成像位置被部分成像，然后在另一个成像位置部分地成像，并且（iii）三个基板的台阶的移动被配置为避免三个基板的阶段在路径中的移动，这将导致任何一个基板台的移动之间的干涉，任何其他衬底阶段。

38. 发明申请

US20090317751A1 Optical arrangement of autofocus elements for use with immersion lithography 有权
标题翻译：用于浸没光刻的自动对焦元件的光学布置
公开(公告)号：US20090317751A1
公开(公告)日：2009-12-24
申请号：US12461762
申请日：2009-08-24
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G03B27/64 , G03F7/20
CPC分类号： G03F7/70258 , G03F7/2041 , G03F7/70341 , G03F7/70641 , G03F7/70958 , G03F9/7026 , G03F9/7034
摘要： A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. A gap is formed between a member and a surface of the optical element through which the exposure beam does not pass. The liquid is supplied to the gap.
摘要翻译：光刻投影装置包括光学元件，通过该光学元件，用曝光光束照射基板。在曝光期间，光学元件和基板之间的空间被填充液体。在光学元件的部件和表面之间形成间隙，曝光光束不通过该光学元件。液体被供应到间隙。

39. 发明申请

US20090310115A1 APPARATUS AND METHOD FOR EXPOSING ADJACENT SITES ON A SUBSTRATE 审中-公开
标题翻译：用于在基板上暴露邻接位点的装置和方法
公开(公告)号：US20090310115A1
公开(公告)日：2009-12-17
申请号：US12469619
申请日：2009-05-20
申请人： W. Thomas Novak , Michael B. Binnard
发明人： W. Thomas Novak , Michael B. Binnard
IPC分类号： G03B27/58
CPC分类号： G03F7/70358 , G03F7/70425
摘要： An exposure apparatus (10) for transferring a mask pattern (452) from a mask (12) to a substrate (14) includes an illumination system (18), a mask stage assembly (22), a substrate stage assembly (24), and a control system (28). The substrate (14) includes a first site (1) and a second site (2) that are adjacent to each other and that are aligned with each other along a first axis. The illumination system (18) generates an illumination beam (35) that is directed at the mask (12). The mask stage assembly (22) retains and positions the mask (12) relative to the illumination beam (35). The substrate stage assembly (24) retains and positions the substrate (14). The control system (28) controls the illumination system (18) and the substrate stage assembly (24) so that the mask pattern (452) is sequentially transferred to the first site (1) and then the second site (2) while the substrate stage assembly (24) is moving the substrate (24) in a first mask direction along the first axis. With this design, the substrate (14) is being moved in the same direction along the first axis during the exposure of successive sites (1) (2) and there is no need to stop the substrate (14) and/or reverse the direction of the substrate (14) during the exposure of successive sites (1) (2). This allows the exposure apparatus (1) to have improved throughput for a given acceleration and deceleration profile.
摘要翻译：一种用于将掩模图案（452）从掩模（12）传送到基板（14）的曝光装置（10）包括照明系统（18），掩模台组件（22），基板台组件（24）和控制系统（28）。基板（14）包括彼此相邻并且沿着第一轴线彼此对准的第一位置（1）和第二位置（2）。照明系统（18）产生指向掩模（12）的照明光束（35）。掩模台组件（22）相对于照明光束（35）保持并定位掩模（12）。衬底台组件（24）保持并定位衬底（14）。控制系统（28）控制照明系统（18）和衬底台组件（24），使得掩模图案（452）顺序地转移到第一位置（1），然后第二位置（2），同时衬底台架组件（24）沿着第一轴线沿着第一掩模方向移动基板（24）。通过这种设计，在连续的位置（1）（2）的曝光期间，衬底（14）沿着第一轴在相同的方向上移动，并且不需要停止衬底（14）和/或反向在连续部位（1）（2）的曝光期间的衬底（14）。这允许曝光装置（1）对于给定的加速和减速曲线具有改进的吞吐量。

40. 发明授权

US07572019B2 Adaptive-optics actuator arrays and methods for using such arrays 有权
标题翻译：自适应光学致动器阵列和使用这种阵列的方法
公开(公告)号：US07572019B2
公开(公告)日：2009-08-11
申请号：US11413649
申请日：2006-04-27
申请人： W. Thomas Novak
发明人： W. Thomas Novak
IPC分类号： G02B5/08 , G02B7/182 , G03B27/54
CPC分类号： G02B26/0825 , G02B26/06 , G03F7/70266 , Y10T137/206
摘要： Actuator arrays for use in adaptive-optical elements and optical systems containing at least one such element are disclosed. The actuator arrays provide more precise control of the shape of the adaptive-optical surface while utilizing fewer actuators than conventional systems. An adaptive-optical system of an embodiment includes an array of force devices coupled to a deformable optical surface. The force devices of the array are arranged in braking groups and force-altering groups such that each force device belongs to a respective combination of braking group and force-altering group. A respective force controller is coupled to the force devices of each force-altering group, and a respective braking controller is coupled to the force devices of each braking group. The force-altering group adjusts as required the respective forces exerted on the optical surface by the force devices of the respective force-altering group, whereas the braking controller when actuated prevents changes in respective forces exerted by the force devices of the respective braking group.
摘要翻译：公开了用于自适应光学元件的致动器阵列和包含至少一个这样的元件的光学系统。致动器阵列提供对自适应光学表面的形状的更精确的控制，同时使用比常规系统更少的致动器。实施例的自适应光学系统包括耦合到可变形光学表面的力装置阵列。阵列的力装置布置在制动组和力改变组中，使得每个力装置属于制动组和力变换组的相应组合。相应的力控制器联接到每个力改变组的力装置，并且相应的制动控制器联接到每个制动组的力装置。力变化组根据需要根据相应的力变化组的力装置调整施加在光学表面上的力，而当致动时制动控制器防止由相应制动组的力装置施加的相应力的变化。

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