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    • 35. 发明申请
    • Semiconductor buried grating fabrication method
    • 半导体埋光栅制作方法
    • US20090246707A1
    • 2009-10-01
    • US12079524
    • 2008-03-27
    • Yabo LiKechang SongNicholas John VisovskyChung-En Zah
    • Yabo LiKechang SongNicholas John VisovskyChung-En Zah
    • G03F7/00
    • G03F7/0005G02B6/124G02B6/136H01S5/12
    • Methods for forming grating profiles in semiconductor laser structures comprise the steps of providing a semiconductor wafer comprising a wafer substrate, an etch stop layer disposed over the wafer substrate, a grating layer disposed over the etch stop layer, an etch mask layer disposed over the grating layer, and a photoresist layer disposed over the etch mask layer, forming a photoresist grating pattern, transferring the photoresist grating pattern into the grating layers via dry etching, and removing the photoresist layer, selectively wet etching the grating layer to form the grating profile in the grating layer. The placement of the grating layer between the etch mask and etch stop layers controls the selective wet etching step. The method also comprises removing the etch mask layer via selective wet etching without altering the grating profile, and regrowing an upper cladding layer to produce the semiconductor laser structure.
    • 在半导体激光器结构中形成光栅轮廓的方法包括以下步骤:提供包括晶片衬底的半导体晶片,设置在晶片衬底上的蚀刻停止层,设置在蚀刻停止层上方的光栅层,设置在光栅上的蚀刻掩模层 层和设置在蚀刻掩模层上的光致抗蚀剂层,形成光致抗蚀剂光栅图案,通过干蚀刻将光致抗蚀剂光栅图案转移到光栅层中,以及去除光致抗蚀剂层,选择性地湿蚀刻光栅层以形成光栅轮廓 光栅层。 在蚀刻掩模和蚀刻停止层之间放置光栅层控制选择性湿蚀刻步骤。 该方法还包括通过选择性湿蚀刻去除蚀刻掩模层而不改变光栅轮廓,并且重新生长上覆层以产生半导体激光器结构。
    • 36. 发明授权
    • System and method for modulating a semiconductor laser
    • 用于调制半导体激光器的系统和方法
    • US07502394B2
    • 2009-03-10
    • US11298367
    • 2005-12-08
    • Martin H HuNobuhiko NishiyamaChung-En Zah
    • Martin H HuNobuhiko NishiyamaChung-En Zah
    • H01S3/10H01S3/13H01S3/00
    • H04N9/3129H01S5/005H01S5/0092H01S5/06213H01S5/06251H01S5/06253H01S5/06256H04B10/54
    • Both a system and method are provided for modulating the intensity of an output beam generated by semiconductor laser. The exemplary system includes a source of pulsating current connected to the laser that generates a pulsating beam of laser light, an external modulator having an input that receives the pulsating beam, and an output controlled by pulsating control signal, wherein the output beam transmitted by the external modulator output is modulated by changing a relative phase angle between the pulsating current powering the laser, and the control signal of the external modulator over time. The external modulator may be an intensity-type modulator whose output is controlled by a gate signal having a constant phase, and the source of pulsating current powering the laser may be variable phase in order to modulate the output beam with an external modulator having a simple structure. Both the system and method are advantageously compatible with DFB lasers, and avoid wavelength drift and the consequent thermally induced patterning effect by powering the laser with a pulsating current having a constant duty cycle.
    • 提供了一种用于调制由半导体激光器产生的输出光束的强度的系统和方法。 示例性系统包括连接到激光器的脉冲电流源,其产生脉冲激光束,外部调制器,其具有接收脉动光束的输入端,以及由脉动控制信号控制的输出,其中由 通过改变为激光供电的脉动电流与外部调制器的控制信号之间的相对相位角随时间而调制外部调制器输出。 外部调制器可以是强度型调制器,其输出由具有恒定相位的栅极信号控制,为激光供电的脉动电流源可以是可变相位,以便用具有简单的外部调制器调制输出光束 结构体。 系统和方法都有利地与DFB激光器兼容,并且通过用具有恒定占空比的脉动电流为激光器供电来避免波长漂移和随之而来的热诱导图案化效应。
    • 40. 发明申请
    • P-TYPE ISOLATION REGIONS ADJACENT TO SEMICONDUCTOR LASER FACETS
    • P型隔离区域与半导体激光表面相邻
    • US20120236890A1
    • 2012-09-20
    • US13050058
    • 2011-03-17
    • Catherine G. CaneauFeng XieChung-En Zah
    • Catherine G. CaneauFeng XieChung-En Zah
    • H01S5/343H01L33/00H01S5/34
    • H01S5/3402B82Y20/00H01S5/06256H01S5/1017H01S5/168H01S5/2224H01S5/2231
    • A quantum cascade laser and its method of fabrication are provided. The quantum cascade laser comprises one or more p-type electrical isolation regions and a plurality of electrically isolated laser sections extending along a waveguide axis of the laser. An active waveguide core is sandwiched between upper and lower n-type cladding layers and the active core and the upper and lower n-type cladding layers extend through the electrically isolated laser sections of the quantum cascade laser. A portion of the upper n-type cladding layer comprises sufficient p-type dopant to have become p-type and to have become an electrical isolation region, which extends across at least a part of the thickness upper n-type cladding layer along a projection separating the sections of the quantum cascade laser. Laser structures are also contemplated where isolation regions are solely provided at the window facet sections of the laser to provide vertical isolation in the facet sections, to reduce the current into the facet regions of the laser, and help minimize potentially harmful facet heating.
    • 提供了量子级联激光器及其制造方法。 量子级联激光器包括沿着激光器的波导轴线延伸的一个或多个p型电隔离区域和多个电隔离的激光器部分。 有源波导芯夹在上,下n型覆层之间,有源芯和上,下n型覆层延伸穿过量子级联激光器的电隔离激光器部分。 上部n型包覆层的一部分包括足够的p型掺杂剂以成为p型并且已经成为电绝缘区域,其沿厚度的上部n型包覆层的至少一部分沿突出部 分离量子级联激光器的部分。 还设想了激光结构,其中仅在激光器的窗口部分处提供隔离区域以在小平面部分中提供垂直隔离,以减少进入激光器的小面区域的电流,并且帮助最小化潜在的有害面积加热。