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31. 发明申请

US20060278340A1 Confined plasma with adjustable electrode area ratio 有权
标题翻译：密闭等离子体具有可调电极面积比
公开(公告)号：US20060278340A1
公开(公告)日：2006-12-14
申请号：US11152022
申请日：2005-06-13
申请人： Andreas Fischer
发明人： Andreas Fischer
IPC分类号： C23F1/00
CPC分类号： H01J37/32623 , H01J37/32642
摘要： A plasma reactor comprises a chamber, a bottom electrode, a top electrode, a first set of confinement rings, a second set of confinement rings, and a ground extension. The top and bottom electrodes, the first and second sets of confinement rings, and the ground extension are all enclosed within the chamber. The first set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a first volume between the bottom electrode and the top electrode. The second set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a second volume between the bottom electrode and the top electrode. The second volume is at least greater than the first volume. A ground extension is adjacent to and surrounds the bottom electrode. The first set of confinement rings and the second set of confinement rings are capable of being raised and lowered to extend into a region above the ground extension.
摘要翻译：等离子体反应器包括腔室，底部电极，顶部电极，第一组约束环，第二组约束环和地面延伸部。顶部和底部电极，第一组和第二组约束环和接地延伸部都被封闭在腔室内。第一组限制环基本上平行于底部电极和顶部电极并围绕底部电极和顶部电极之间的第一容积。第二组限制环基本上平行于底部电极和顶部电极并围绕底部电极和顶部电极之间的第二体积。第二卷至少大于第一卷。接地延伸部分邻近并包围底部电极。第一组限制环和第二组限制环能够被升高和降低以延伸到地面延伸部上方的区域中。

32. 发明授权

US07138708B2 Electronic system for fixing power and signal semiconductor chips 有权
标题翻译：用于固定电源和信号半导体芯片的电子系统
公开(公告)号：US07138708B2
公开(公告)日：2006-11-21
申请号：US10495233
申请日：2002-10-15
申请人： Rainer Topp , Dirk Balszunat , Christoph Ruf , Andreas Fischer
发明人： Rainer Topp , Dirk Balszunat , Christoph Ruf , Andreas Fischer
IPC分类号： H01L25/07 , H01L23/48
CPC分类号： H01L25/162 , H01L23/13 , H01L23/49833 , H01L23/5385 , H01L2924/0002 , H01L2924/00
摘要： An electronic system having a sandwich design and including two carriers, each carrier having a printed circuit layer, the upper printed circuit layer being positioned on different planes.
摘要翻译：具有夹层结构并包括两个载体的电子系统，每个载体具有印刷电路层，上部印刷电路层位于不同的平面上。

33. 发明授权

US07026174B2 Method for reducing wafer arcing 有权
标题翻译：降低晶圆电弧的方法
公开(公告)号：US07026174B2
公开(公告)日：2006-04-11
申请号：US10261403
申请日：2002-09-30
申请人： Andreas Fischer
发明人： Andreas Fischer
IPC分类号： H01L21/66 , H01L21/3065 , H02N13/00
CPC分类号： H01L21/67069 , H01J2237/0206 , H01L21/31116 , H01L21/6831
摘要： A method for reducing wafer damage during an etching process is provided. In one of the many embodiments, the method includes assigning a bias voltage to each of at least one etching process, and generating the assigned bias voltage before initiation of one of the at least one etching process. The method further includes applying the assigned bias voltage to an electrostatic chuck before initiation of one of the at least one etching processes. The assigned bias voltage level reduces wafer arcing.
摘要翻译：提供了一种在蚀刻过程中减少晶片损伤的方法。在许多实施例中的一个实施例中，该方法包括将偏压分配给至少一个蚀刻工艺中的每一个，以及在开始至少一个蚀刻工艺之一之前产生所分配的偏置电压。该方法还包括在开始至少一个蚀刻工艺之一之前将所分配的偏置电压施加到静电卡盘。分配的偏置电压电平可降低晶圆电弧。

34. 发明授权

US07017835B2 Rotary atomizer for particulate paints 有权
公开(公告)号：US07017835B2
公开(公告)日：2006-03-28
申请号：US10606983
申请日：2003-06-26
申请人： Kurt Vetter , Rolf Schneider , Andreas Fischer , Robert F. Heldt
发明人： Kurt Vetter , Rolf Schneider , Andreas Fischer , Robert F. Heldt
IPC分类号： B05B1/34
CPC分类号： B05B3/1064 , B05B3/1014 , B05B3/1042 , B05B3/1092 , B05B5/0407 , B05B5/0426 , B05B13/0452
摘要： A rotary atomizer applies particulate paints with good color matching by reducing paint droplet size deviation and then optimizing the other paint spraying parameters. Paint droplet size parameters are reduced by using a bell cup having reduced flow deviations, including an overflow surface having a generally constant angle between a deflector and an atomizing edge.

35. 发明申请

US20050130620A1 Segmented radio frequency electrode apparatus and method for uniformity control 审中-公开
标题翻译：分段射频电极装置及均匀性控制方法
公开(公告)号：US20050130620A1
公开(公告)日：2005-06-16
申请号：US10735881
申请日：2003-12-16
申请人： Andreas Fischer
发明人： Andreas Fischer
IPC分类号： H01J37/32 , H01L20060101 , H04B1/28
CPC分类号： H01J37/32082 , H01J37/32532
摘要： A segmented radio frequency (RF) powered electrode for use in plasma processing. The electrode includes a first electrode, a second electrode surrounding the first electrode, and a dielectric material interposed between the first electrode and the second electrode. The dielectric material electrically isolates the first electrode from the second electrode. At least one dual frequency radio frequency power source outputs RF power at a first frequency and a second frequency. The first frequency and the second frequency are different such that at least one radio frequency switch routes at least the first frequency or the second frequency from the at least one dual frequency source to the first electrode, the second electrode, or the first electrode and the second electrode.
摘要翻译：用于等离子体处理的分段射频（RF）电源电极。电极包括第一电极，围绕第一电极的第二电极和插在第一电极和第二电极之间的电介质材料。电介质材料将第一电极与第二电极电隔离。至少一个双频射频功率源以第一频率和第二频率输出RF功率。第一频率和第二频率是不同的，使得至少一个射频开关至少将第一频率或第二频率从至少一个双频源引导到第一电极，第二电极或第一电极，以及第二电极。

36. 发明申请

US20050062315A1 Assembly support of a front end of a motor vehicle and method for detachably fixing a cooling module to an assembly support of a front end 有权
标题翻译：机动车辆的前端的组装支撑件和用于将冷却模块可拆卸地固定到前端的组件支撑件的方法
公开(公告)号：US20050062315A1
公开(公告)日：2005-03-24
申请号：US10504991
申请日：2003-02-18
申请人： Dirk Andritter , Stefan Schmidgall , Hans Schlingmann , Ralf Schmidt , Reinhold Bruckner , Dirk Kersting , Andreas Fischer , Martin Gehring , Horst Winkelmann
发明人： Dirk Andritter , Stefan Schmidgall , Hans Schlingmann , Ralf Schmidt , Reinhold Bruckner , Dirk Kersting , Andreas Fischer , Martin Gehring , Horst Winkelmann
IPC分类号： B60K11/04 , B62D25/08 , B60N2/00
CPC分类号： B62D25/084 , B60K11/04
摘要： A assembly support (33) of a front end of a motor vehicle is proposed, having at least one cooling module (1) which is detachably fixed to the assembly support (33) by means of at least two connecting points (9, 15; 11, 13). The assembly support (33) is characterized in that one of the connecting points (9; 11) is embodied as a pivot bearing (17; 19), and in that the other of the connecting points (13; 15) is embodied as a clip connection (21; 23). In addition, a method for detachably fixing a cooling module (1) to a assembly support (33) of a front end of a motor vehicle is proposed.
摘要翻译：提出了一种机动车辆前端的组件支撑件（33），其具有至少一个冷却模块（1），其通过至少两个连接点（9,15; 15）可拆卸地固定到组件支撑件（33）上。 11，13）。组件支撑件（33）的特征在于，连接点（9; 11）中的一个被实施为枢转轴承（17; 19），并且连接点（13; 15）中的另一个被实施为夹子连接件（21; 23）。此外，提出了一种用于将冷却模块（1）可拆卸地固定到机动车辆的前端的组装支撑件（33）的方法。

37. 发明授权

US06578423B2 Acoustic detection of dechucking and apparatus therefor 有权
公开(公告)号：US06578423B2
公开(公告)日：2003-06-17
申请号：US10150022
申请日：2002-05-20
申请人： Andreas Fischer
发明人： Andreas Fischer
IPC分类号： G01N2900
CPC分类号： G03F7/707 , G01N29/12 , G01N2291/02827 , G01N2291/2698 , H01L21/67259 , H01L21/6831
摘要： In a vacuum processing chamber, a monitoring arrangement for detecting when a substrate is sufficiently dechucked by an electrostatic clamp to allow safe movement thereof by a transfer mechanism such as a pin lifter. The monitoring arrangement includes an acoustic generator which outputs a sound wave at the resonant frequency of the substrate and the dechucking condition is detected when the sound wave is adsorbed by the substrate. The arrangement can be used during processing of wafers such as plasma etching or chemical vapor deposition.

38. 发明授权

US06562190B1 System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber 有权
标题翻译：使用等离子体处理室中的单频RF功率处理晶片的系统，装置和方法
公开(公告)号：US06562190B1
公开(公告)日：2003-05-13
申请号：US09685051
申请日：2000-10-06
申请人： Andras Kuthi , Andreas Fischer
发明人： Andras Kuthi , Andreas Fischer
IPC分类号： H05H100
CPC分类号： H01J37/32146 , H01J37/32082
摘要： The present invention provides a system, apparatus, and method for processing a wafer using a single frequency RF power in a plasma processing chamber. The plasma processing system includes a modulated RF power generator, a plasma processing chamber, and a match network. The modulated RF power generator is arranged to generate a modulated RF power. The plasma processing chamber is arranged to receive the modulated RF power for processing the wafer and is characterized by an internal impedance during the plasma processing. The plasma processing chamber includes an electrostatic chuck for holding the wafer in place with the electrostatic chuck including a first electrode disposed under the wafer for receiving the modulated RF power. The plasma processing chamber further includes a second electrode disposed over the wafer. The modulated RF power generates plasma and ion bombardment energy for processing the wafer. The match network is coupled between the modulated RF power generator and the plasma processing chamber to receive and transmit the modulated RF power from the modulated RF power generator to the plasma processing chamber. The match network is further configured to match an impedance of the modulated RF power generator to the internal impedance of the plasma processing chamber.
摘要翻译：本发明提供了一种使用等离子体处理室中的单频RF功率来处理晶片的系统，装置和方法。等离子体处理系统包括调制的RF功率发生器，等离子体处理室和匹配网络。经调制的RF功率发生器被布置成产生调制的RF功率。等离子体处理室被布置成接收用于处理晶片的调制RF功率，其特征在于等离子体处理期间的内部阻抗。等离子体处理室包括用于将晶片保持在适当位置的静电卡盘，静电卡盘包括设置在晶片下方的用于接收调制RF功率的第一电极。等离子体处理室还包括设置在晶片上的第二电极。调制的RF功率产生用于处理晶片的等离子体和离子轰击能量。匹配网络耦合在调制的RF功率发生器和等离子体处理室之间，以将调制的RF功率从调制的RF功率发生器接收并传输到等离子体处理室。匹配网络还被配置为将调制的RF功率发生器的阻抗与等离子体处理室的内部阻抗相匹配。

39. 发明授权

US06242360B1 Plasma processing system apparatus, and method for delivering RF power to a plasma processing 有权
标题翻译：等离子体处理系统装置和用于将等离子体处理的RF功率传送的方法
公开(公告)号：US06242360B1
公开(公告)日：2001-06-05
申请号：US09342969
申请日：1999-06-29
申请人： Andreas Fischer , Babak Kadkhodayan , Andras Kuthi
发明人： Andreas Fischer , Babak Kadkhodayan , Andras Kuthi
IPC分类号： H01L2100
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32577
摘要： The present invention provides a plasma processing apparatus, system, and method for providing RF power to a plasma processing chamber. The plasma processing system includes an RF generator, a plasma chamber, a match network box, a first cable, a second cable, and means for electrically isolating the match network box. The RF generator is generates RF power for transmission to the plasma chamber. The plasma chamber receives the RF power for processing the wafer and is characterized by an internal impedance during the plasma processing. The plasma chamber has one or more walls for returning RF currents. The match network box is capable of receiving the RF currents and generates an impedance that matches the internal impedance of the plasma chamber to the impedance of the RF generator. The first cable is coupled between the RF generator and the match network box for transmitting RF power between the RF generator and the match network box. The second cable is coupled between the match network box and the plasma chamber for transmitting RF power between the match network and the plasma chamber. The second cable provides a return path for an RF return current from the plasma chamber to the match network box. The electrically isolating means electrically isolates the match network box from electrical contacts with the plasma chamber such that only the second cable provides the return path for the RF return current from the plasma chamber to the match network box.
摘要翻译：本发明提供了一种用于向等离子体处理室提供RF功率的等离子体处理装置，系统和方法。等离子体处理系统包括RF发生器，等离子体室，匹配网络盒，第一电缆，第二电缆以及用于电气隔离匹配网络盒的装置。 RF发生器产生用于传输到等离子体室的RF功率。等离子体室接收用于处理晶片的RF功率，其特征在于等离子体处理期间的内部阻抗。等离子体室具有用于返回RF电流的一个或多个壁。匹配网络盒能够接收RF电流并产生与等离子体室的内部阻抗匹配于RF发生器的阻抗的阻抗。第一条电缆耦合在RF发生器和匹配网络盒之间，用于在RF发生器和匹配网络盒之间传输RF功率。第二电缆耦合在匹配网络盒和等离子体室之间，用于在匹配网络和等离子体室之间传输RF功率。第二电缆提供用于从等离子体室到匹配网络盒的RF返回电流的返回路径。电隔离装置将匹配网络盒与等离子体室的电气接触电隔离，使得仅第二电缆提供用于从等离子体室到匹配网络盒的RF返回电流的返回路径。

40. 发明授权

US06182692B2 Valve assembly for an apparatus under pressure 有权
标题翻译：用于压力设备的阀组件
公开(公告)号：US06182692B2
公开(公告)日：2001-02-06
申请号：US09533627
申请日：2000-03-22
申请人： Andreas Fischer , Franz Kamp
发明人： Andreas Fischer , Franz Kamp
IPC分类号： F16K3700
CPC分类号： F16K1/305 , Y10T137/8326
摘要： A valve assembly for an apparatus under pressure, includes a valve casing with a connecting pipe having formed therein a fluid passageway. A valve body is received in the valve casing and movable against a valve seat for sealing the fluid passageway and thereby separate a high-pressure zone from a low-pressure zone. Integrated in a handwheel of the valve body is a manometer which is constraint against rotation, when the handwheel is turned with respect to the manometer. The manometer is in communication with the high-pressure zone regardless whether the valve seat is closed or open.
摘要翻译：一种用于在压力下的装置的阀组件，包括具有在其中形成有流体通道的连接管的阀壳。阀体容纳在阀壳体中并可抵靠阀座移动，用于密封流体通道，从而将高压区与低压区分离。当手轮相对于压力计转动时，集成在阀体的手轮中的是压力计，该压力计约束旋转。无论阀座是关闭还是打开，压力计都与高压区连通。

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