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    • 31. 发明授权
    • Pressure sensor
    • 压力传感器
    • US4524625A
    • 1985-06-25
    • US574693
    • 1984-01-24
    • Kiyoshi Takeuchi
    • Kiyoshi Takeuchi
    • G01L21/10G01L23/10F16B31/02
    • G01L23/10Y10S73/04
    • A pressure transducer suitable for remote sensing of pressure in hostile environments consists generally of a body and a sensing member. The body has first and second opposing inner surfaces defining an inside space therebetween. The sensing member is disposed within the inside space and has first and second opposite surfaces. The first surface of the sensing member contacts the first inner surface of the body. The second surface of the sensing member is separated from the second inner surface of the body by a predetermined clearance so that the second surface of the sensing member comes into contact with the second inner surface of the body only when the external force exerted on the body exceeds a predetermined level.
    • 适用于在恶劣环境中远程感测压力的压力传感器通常由身体和感测构件组成。 主体具有限定其间的内部空间的第一和第二相对的内表面。 感测构件设置在内部空间内并且具有第一和第二相对表面。 感测构件的第一表面接触身体的第一内表面。 感测构件的第二表面与本体的第二内表面以预定的间隙分开,使得感测构件的第二表面仅在施加在主体上的外力时才与主体的第二内表面接触 超过预定水平。
    • 37. 发明授权
    • Fin-type field effect transistor and semiconductor device
    • 鳍型场效应晶体管和半导体器件
    • US07859065B2
    • 2010-12-28
    • US11921685
    • 2006-06-05
    • Kiyoshi TakeuchiKatsuhiko Tanaka
    • Kiyoshi TakeuchiKatsuhiko Tanaka
    • H01L27/088
    • H01L21/84H01L27/1203H01L29/42384H01L29/66795H01L29/785
    • A constant distance can be maintained between source/drain regions without providing a gate side wall by forming a gate electrode comprising an eaves structure, and a uniform dopant concentration is kept within a semiconductor by ion implantation. As a result, a FinFET excellent in element properties and operation properties can be obtained. A field effect transistor, wherein a gate structure body is a protrusion that protrudes toward source and drain regions sides in a channel length direction and has a channel length direction width larger than that of the part adjacent to the insulating film in a gate electrode, and the protrusion comprises an eaves structure formed by the protrusion that extends in a gate electrode extending direction on the top surface of the semiconductor layer.
    • 通过形成包括檐结构的栅电极,通过离子注入将均匀的掺杂剂浓度保持在半导体内,可以在源极/漏极区之间保持恒定的距离而不提供栅极侧壁。 结果,可以获得元件性能和操作性能优异的FinFET。 一种场效应晶体管,其中栅极结构体是在沟道长度方向上朝向源极和漏极区域侧突出的突起,并且沟道长度方向宽度大于栅电极中与绝缘膜相邻的部分的沟道长度方向宽度;以及 突起包括由在半导体层的顶表面上沿栅电极延伸方向延伸的突起形成的檐结构。