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    • 33. 发明授权
    • Electret capacitor microphone
    • 驻极体电容麦克风
    • US07292696B2
    • 2007-11-06
    • US10503653
    • 2003-01-30
    • Shinichi SaekiHirofumi Yamada
    • Shinichi SaekiHirofumi Yamada
    • H04R25/00
    • H04R3/007H04R19/016
    • The present invention is an electret condenser microphone that includes an electro-acoustic transducer (M) having an electret portion (E) including a diaphragm (6) acting as an electrode and a stationary electrode (2, 25) disposed in opposition to the diaphragm (6), and a FET (10) effecting an impedance conversion on an output from the electro-acoustic transducer (M) and then outputting the converted output on a signal line (L). A capacitor (11) and a varistor (12) are provided in parallel between the signal line (L) and a ground (18) and a resistor (13) is incorporated in series in the signal line (L).
    • 本发明是一种驻极体电容麦克风,其包括具有驻极体部分(E)的电声换能器(M),所述驻极体部分(E)包括用作电极的隔膜(6)和与隔膜相对设置的固定电极(2,51) (6),以及FET(10),对来自电声换能器(M)的输出进行阻抗转换,然后在信号线(L)上输出转换后的输出。 在信号线(L)和地(18)之间并联设置电容器(11)和变阻器(12),并且在信号线(L)中并联有电阻器(13)。
    • 34. 发明申请
    • Sound detecting mechanism
    • 声音检测机构
    • US20060233400A1
    • 2006-10-19
    • US10565059
    • 2004-07-14
    • Yoshiaki OhbayashiMamoru YasudaShinichi SaekiMasatsugu KomaiKenichi Kagawa
    • Yoshiaki OhbayashiMamoru YasudaShinichi SaekiMasatsugu KomaiKenichi Kagawa
    • H04R25/00
    • H04R19/016H04R19/04
    • A sound detecting mechanism capable of forming a diaphragm and a back electrode on a substrate by a simple process includes acoustic holes corresponding to perforations formed on a front surface of a substrate. A second protective film, a sacrificial layer and a metal film are laminated on the front surface in a portion corresponding to the acoustic holes. The substrate is etched from the back surface thereof to a depth reaching the acoustic holes to form an acoustic opening. Subsequently, by effecting an etching from the back surface of the substrate through the acoustic holes, the sacrificial layer is removed and a void area is formed between the diaphragm made of the metal film, the substrate and the formed perforations. The sacrificial layer that remains after the etching is used as a spacer for maintaining a gap between the back electrodes and the diaphragm.
    • 能够通过简单的工艺在基板上形成隔膜和背面电极的声音检测机构包括对应于形成在基板前表面上的穿孔的声孔。 第二保护膜,牺牲层和金属膜层叠在与声孔对应的部分的前表面上。 衬底从其后表面被蚀刻到到达声孔的深度以形成声学开口。 随后,通过通过声孔从衬底的背面进行蚀刻,除去牺牲层,并且在由金属膜,衬底和形成的穿孔构成的隔膜之间形成空隙区域。 蚀刻后残留的牺牲层用作用于保持背电极和隔膜之间的间隙的间隔物。