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31. 发明授权

US08141009B2 Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process 有权
标题翻译：在光刻过程中使用电子束曝光和掩模版曝光准备数据进行混合曝光
公开(公告)号：US08141009B2
公开(公告)日：2012-03-20
申请号：US12398664
申请日：2009-03-05
申请人： Masaaki Miyajima , Hiromi Hoshino , Hiroshi Takita , Kozo Ogino
发明人： Masaaki Miyajima , Hiromi Hoshino , Hiroshi Takita , Kozo Ogino
IPC分类号： G06F17/50
CPC分类号： G03F1/36 , G03F1/68
摘要： A method for preparing data for exposure includes forming a first plurality of rectangular patterns from a reticle preparing rule; lining an object pattern for performing reticle exposure with the first rectangular patterns, and extracting a second plurality of rectangular patterns, disposed in an N×N matrix, from the first plurality of rectangular patterns in the object pattern; and performing a violation detecting treatment and a correcting treatment of the pattern width and the pattern distance of the reticle exposure pattern on the basis of the distance between the second plurality of rectangular patterns.
摘要翻译：一种用于制备用于曝光的数据的方法包括：从掩模版准备规则形成第一多个矩形图案; 利用所述第一矩形图案衬里进行掩模版曝光的物体图案，并从所述物体图案中的所述第一多个矩形图案提取以N×N矩阵设置的第二多个矩形图案; 并且基于第二多个矩形图案之间的距离执行违反检测处理和对掩模版曝光图案的图案宽度和图案距离的校正处理。

32. 发明授权

US08136057B2 Semiconductor device manufacturing method, data generating apparatus, data generating method and recording medium readable by computer recorded with data generating program 有权
标题翻译：半导体器件制造方法，数据生成装置，数据生成方法以及由数据生成程序记录的计算机可读取的记录介质
公开(公告)号：US08136057B2
公开(公告)日：2012-03-13
申请号：US13223782
申请日：2011-09-01
申请人： Hiromi Hoshino
发明人： Hiromi Hoshino
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A semiconductor manufacturing method comprising, a data generating process including, acquiring a simulation light pattern that simulates a shape of a light exposure pattern formed on a substrate on the basis of design data of a semiconductor device, acquiring a simulation electron beam exposure pattern that simulates a shape of an electron beam exposure pattern formed by an electron beam exposure on the substrate on the basis of the design data, extracting difference information representing a shape difference portion between the simulation light pattern and the simulation electron beam exposure pattern, acquiring changed design data for modifying shape by changing the design data in accordance with the difference information, conducting the electron beam exposure on the substrate by use of the changed design data for modifying the shape.
摘要翻译：一种半导体制造方法，包括：数据生成处理，其包括：基于半导体器件的设计数据获取模拟形成在基板上的曝光图案的形状的模拟光图案，获取模拟电子束曝光图案基于设计数据通过电子束曝光形成的电子束曝光图案的形状，提取表示模拟光图案和模拟电子束曝光图案之间的形状差异部分的差异信息，获取改变的设计数据用于通过根据差异信息改变设计数据来修改形状，通过使用用于修改形状的改变的设计数据在基板上进行电子束曝光。

33. 发明申请

US20090239160A1 METHOD FOR PREPARING DATA FOR EXPOSURE AND METHOD FOR MANUFACTURING PHOTO MASK 有权
标题翻译：用于制备曝光数据的方法和制造照相胶片的方法
公开(公告)号：US20090239160A1
公开(公告)日：2009-09-24
申请号：US12398664
申请日：2009-03-05
申请人： Masaaki MIYAJIMA , Hiromi Hoshino , Hiroshi Takita , Kozo Ogino
发明人： Masaaki MIYAJIMA , Hiromi Hoshino , Hiroshi Takita , Kozo Ogino
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/36 , G03F1/68
摘要： A method for preparing data for exposure includes forming a first plurality of rectangular patterns from a reticle preparing rule; lining an object pattern for performing reticle exposure with the first rectangular patterns, and extracting a second plurality of rectangular patterns, disposed in an N×N matrix, from the first plurality of rectangular patterns in the object pattern; and performing a violation detecting treatment and a correcting treatment of the pattern width and the pattern distance of the reticle exposure pattern on the basis of the distance between the second plurality of rectangular patterns.
摘要翻译：准备用于曝光的数据的方法包括从掩模版准备规则形成第一多个矩形图案; 利用所述第一矩形图案衬里进行掩模版曝光的物体图案，并从所述物体图案中的所述第一多个矩形图案提取设置在N×N矩阵中的第二多个矩形图案; 并且基于第二多个矩形图案之间的距离执行违反检测处理和对掩模版曝光图案的图案宽度和图案距离的校正处理。

34. 发明申请

US20090162760A1 SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND COMPUTER READABLE MEDIUM 有权
标题翻译：半导体器件，制造半导体器件的方法和计算机可读介质
公开(公告)号：US20090162760A1
公开(公告)日：2009-06-25
申请号：US12326154
申请日：2008-12-02
申请人： Hiromi Hoshino , Takashi Maruyama
发明人： Hiromi Hoshino , Takashi Maruyama
IPC分类号： G03C5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/7045 , Y10S430/143
摘要： In a multi-project-chip semiconductor device, semiconductor elements fabricated on a wafer have a layout that corresponds to an exposure order of a pattern of the semiconductor elements and that is based on information indicating manufacture conditions and the number of shots and are arranged such that the semiconductor elements having the same manufacture condition are adjacent to each other in ascending or descending order of the number of shots.
摘要翻译：在多项目芯片半导体器件中，制造在晶片上的半导体元件具有对应于半导体元件的图案的曝光顺序的布局，并且其基于指示制造条件和拍摄次数的信息，并且布置成具有相同制造条件的半导体元件以照射次数的升序或降序相互相邻。

35. 发明授权

US07500219B2 Exposure data generator and method thereof 有权
标题翻译：曝光数据发生器及其方法
公开(公告)号：US07500219B2
公开(公告)日：2009-03-03
申请号：US11237658
申请日：2005-09-29
申请人： Kozo Ogino , Hiromi Hoshino
发明人： Kozo Ogino , Hiromi Hoshino
IPC分类号： G06F17/50
CPC分类号： G03F1/68 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3174 , H01J2237/31764 , H01J2237/31769
摘要： A plurality of patterns placed within an target region are classified by their placement positions, a pattern adjacent to each side of each pattern is searched for by using the classification results, and adjacent pattern information is obtained. Next, a back-scattering intensity at an evaluation point on a pattern is calculated, a movement quantity of the side is calculated so that the sum of a forward-scattering intensity and the back-scattering intensity at the evaluation point becomes a reference exposure intensity by using the adjacent pattern information and the back-scattering intensity, and the pattern is then corrected.
摘要翻译：通过它们的放置位置对放置在目标区域内的多个图案进行分类，通过使用分类结果搜索与每个图案的每一侧相邻的图案，并且获得相邻的图案信息。接下来，计算图案的评价点的背散射强度，计算出侧面的移动量，使得评价点的前向散射强度与背散射强度的和成为基准曝光强度通过使用相邻图案信息和背散射强度，然后校正图案。

36. 发明申请

US20080007633A1 Captured Image Recording Apparatus, Captured Image Recording Method, Captured Image Reproducing Apparatus, Captured Image Reproducing Method, and Captured Image Recording/Reproducing System 失效
标题翻译：捕获的图像记录装置，捕获的图像记录方法，捕获的图像再现装置，捕获的图像再现方法和捕获的图像记录/再现系统
公开(公告)号：US20080007633A1
公开(公告)日：2008-01-10
申请号：US11667162
申请日：2006-09-08
申请人： Hiromi Hoshino
发明人： Hiromi Hoshino
IPC分类号： H04N5/76
CPC分类号： H04N5/232 , G11B20/10 , G11B27/034 , G11B27/322 , H04N5/23245 , H04N5/772 , H04N5/783 , H04N9/8063 , H04N9/8205
摘要： An image of an object is picked up by an image processing unit (10) to acquire an image signal of variable frame rate. An audio signal is acquired by an audio processing unit (20) to generate an audio signal having the number of frames caused to be in conformity with the system frame rate to generate a recording signal of recording frame rate from the image signal of the variable frame rate and an audio signal having the number of frames caused to be in conformity with the system frame rate. In recording a recording signal of the recording frame rate onto or into a recording medium (35) by a recording/reproducing unit (30), discrimination information indicating image pick-up frame rate and system frame rate is recorded onto or into the recording medium (35), e.g., as MXF (Material Exchange Format) file along with the image signal of the variable frame rate and the audio signal having the number of frames caused to be in conformity with the system frame rate.
摘要翻译：由图像处理单元（10）拾取对象的图像以获取可变帧率的图像信号。由音频处理单元（20）获取音频信号，以产生具有与系统帧速率一致的帧数的音频信号，以从可变帧的图像信号生成记录帧速率的记录信号速率和具有使得与系统帧速率一致的帧数的音频信号。在通过记录/再现单元（30）将记录帧速率的记录信号记录到记录介质（35）上时，将指示图像拾取帧速率和系统帧速率的识别信息记录在记录介质上（35），例如，作为MXF（物料交换格式）文件以及可变帧速率的图像信号以及具有与系统帧速率一致的帧数的音频信号。

37. 发明申请

US20060076513A1 Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method 审中-公开
标题翻译：可变矩形电子束曝光装置和图案曝光形成方法
公开(公告)号：US20060076513A1
公开(公告)日：2006-04-13
申请号：US11055107
申请日：2005-02-11
申请人： Yutaka Nakamura , Masaaki Miyajima , Hiromi Hoshino
发明人： Yutaka Nakamura , Masaaki Miyajima , Hiromi Hoshino
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/31776
摘要： A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles is provided which is capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. The apparatus comprises: a first slit member (10) in which a plurality of rectangular apertures (11, 12) are respectively arranged by different angles; a second slit member (20) in which a plurality of rectangular apertures (21, 22) which are respectively positioned in parallel with the corresponding rectangular apertures of the first slit member, are arranged; and a deflecting unit (40) for deflecting an electron beam, which has been transmitted through a plurality of apertures of the first slit member, so that, when the electron beam transmitted through the first aperture of the first slit member is transmitted through the corresponding first aperture of the second slit member, the electron beam transmitted through the apertures except for the first aperture of the first slit can be intercepted by the second slit member.
摘要翻译：提供了用于形成不同角度的矩形束的可变矩形电子束曝光装置，其能够相对于图案区域中具有任意角度的预定细纹图案进行高度细微的曝光。该装置包括：第一狭缝构件（10），多个矩形孔（11,12）分别以不同的角度布置; 第二狭缝构件（20），其中分别与所述第一狭缝构件的相应矩形孔平行布置的多个矩形孔（21,22）布置; 以及偏转单元（40），用于偏转已经透过第一狭缝部件的多个孔的电子束，使得当透过第一狭缝部件的第一孔的电子束透过相应的第二狭缝部件的第一开口部分，通过第一狭缝的第一开口部分以外的孔径透过的电子束可被第二狭缝部件截取。

38. 发明申请

US20050002648A1 Video-recording system, meta-data addition apparatus, imaging apparatus, video-signal recording apparatus, video-recording method, and meta-data format 失效
标题翻译：视频记录系统，元数据添加装置，成像装置，视频信号记录装置，视频记录方法和元数据格式
公开(公告)号：US20050002648A1
公开(公告)日：2005-01-06
申请号：US10809499
申请日：2004-03-26
申请人： Hiromi Hoshino , Yasuhiko Mikami
发明人： Hiromi Hoshino , Yasuhiko Mikami
IPC分类号： H04N5/222 , H04N5/232 , H04N5/445 , H04N5/77 , H04N5/775 , H04N5/781 , H04N5/85 , H04N5/907 , H04N5/91 , H04N9/804 , H04N9/82 , H04N5/783 , G06F7/00 , G06F17/00
CPC分类号： H04N9/8205 , H04N5/222 , H04N5/232 , H04N5/77 , H04N5/775 , H04N5/781 , H04N5/85 , H04N5/907 , H04N9/8042 , H04N9/8047
摘要： In order to present a video-recording system capable of managing a video material and meta data related to the video material in an integrated manner by directly linking the meta data to the video material, the video-recording system is provided with a meta data addition apparatus for adding the meta data to every frame of a video signal generated by an imaging apparatus as a video signal representing the video material and a VTR for recording the video signal including the additional meta data onto a recording medium. In such a configuration, concurrently with a shooting operation carried out by using the imaging apparatus, meta data related to a video signal generated in the shooting operation can be sequentially added to every frame of the video signal and, then, the video signal including the additional meta data can be sequentially recorded onto the recording medium. Thus, the meta data and the video signal can be recorded on the same recording medium by directly linking the meta data to the video signal so that the meta data and the video signal can be managed in an integrated manner.
摘要翻译：为了呈现能够通过将元数据直接链接到视频资料以集成的方式管理视频材料和元数据的视频记录系统，为视频记录系统提供元数据附加将元数据添加到由成像装置生成的视频信号的每个帧作为表示视频资料的视频信号的装置和用于将包括附加元数据的视频信号记录在记录介质上的VTR的装置。在这种结构中，与通过使用成像装置进行的拍摄操作同时，可以将与拍摄操作中生成的视频信号相关的元数据顺序地添加到视频信号的每一帧，然后，包括可以将附加的元数据顺序地记录到记录介质上。因此，通过将元数据直接链接到视频信号，可以将元数据和视频信号记录在相同的记录介质上，从而能够以集成的方式管理元数据和视频信号。

39. 发明授权

US5955738A Exposure data preparing apparatus, exposure data preparing method and charged particle beam exposure apparatus 失效
标题翻译：曝光数据准备装置，曝光数据准备方法和带电粒子束曝光装置
公开(公告)号：US5955738A
公开(公告)日：1999-09-21
申请号：US616517
申请日：1996-03-19
申请人： Yasuo Manabe , Hiromi Hoshino
发明人： Yasuo Manabe , Hiromi Hoshino
IPC分类号： H01L21/027 , H01J37/302
CPC分类号： H01J37/3026 , H01J2237/31762
摘要： An exposure data preparing apparatus includes a field placement editor for placing exposure patterns that correspond to design data. Placement is done for each sub-field obtained by dividing a field on an LSI to be designed, and each sub-field has a size that can be covered by deflection of a beam from an exposure apparatus. A map preparing editor prepares a plurality of maps that can be covered by a single shot of the charged particle beam, by dividing the sub-field in which the exposure pattern is placed. A CPU determines a beam dosage of the charged particle beam derived from a density of the exposure pattern in the map.
摘要翻译：曝光数据准备装置包括用于放置与设计数据相对应的曝光图案的场放置编辑器。对于通过划分要设计的LSI上的场而获得的每个子场进行放置，并且每个子场具有可被来自曝光设备的光束偏转覆盖的尺寸。映射准备编辑器通过划分其中放置曝光图案的子场来准备可被单个拍摄的带电粒子束覆盖的多个地图。 CPU确定从地图中曝光图案的浓度导出的带电粒子束的光束剂量。

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