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31. 发明授权

US06934123B2 Magnetic disk device and magnetic head slider 失效
标题翻译：磁盘装置和磁头滑块
公开(公告)号：US06934123B2
公开(公告)日：2005-08-23
申请号：US10851080
申请日：2004-05-24
申请人： Hidekazu Kohira , Masaaki Matsumoto , Hideaki Tanaka , Teruyoshi Higashiya , Kiyoshi Hashimoto , Akira Matsuda , Takanori Yamazaki
发明人： Hidekazu Kohira , Masaaki Matsumoto , Hideaki Tanaka , Teruyoshi Higashiya , Kiyoshi Hashimoto , Akira Matsuda , Takanori Yamazaki
IPC分类号： G11B5/012 , G11B5/60 , G11B15/64 , G11B17/32 , G11B21/20 , G11B21/21 , G11B33/14
CPC分类号： G11B21/21 , G11B5/012 , G11B5/6082 , G11B33/14
摘要： A magnetic disk device includes a magnetic disk, and a magnetic head slider. The slider has a magnetic head, a plurality of surfaces which are formed sequentially from an adjacent side to a magnetic disk, and a slider rail surface which is arranged near an air flow-out edge on a nearest surface of the plurality of surfaces. The slider rail surface includes a long sideways rail surface on an air flow-in side and a lengthwise rail surface on an air flow-out side. The nearest surface of the plurality of surfaces is arranged only in a center area with respect to a width of the slider near the air flow-out edge and has a width substantially less than the width of the slider. An area of the long sideways rail surface is larger than an area of the lengthwise rail surface.
摘要翻译：磁盘装置包括磁盘和磁头滑块。滑块具有磁头，从磁盘的相邻侧依次形成的多个表面和布置在多个表面的最近表面上的空气流出边缘附近的滑块轨道表面。滑块轨道表面包括在空气流入侧的长侧面的轨道表面和在空气流出侧上的纵向轨道表面。多个表面的最近表面仅布置在相对于靠近空气流出边缘的滑块的宽度的中心区域中，并且具有基本上小于滑块的宽度的宽度。长边横梁面的面积大于纵向导轨面的面积。

32. 发明申请

US20050009935A1 Method and instrument of polymer processing treatment 有权
标题翻译：聚合物加工处理方法与仪器
公开(公告)号：US20050009935A1
公开(公告)日：2005-01-13
申请号：US10886634
申请日：2004-07-09
申请人： Masaaki Mukaide , Toshiharu Goto , Takanori Yamazaki , Yoshihiko Iwamoto , Jun Kakizaki
发明人： Masaaki Mukaide , Toshiharu Goto , Takanori Yamazaki , Yoshihiko Iwamoto , Jun Kakizaki
IPC分类号： C08J11/10 , C08J11/04 , C08J11/24
CPC分类号： C08J11/24 , C08J11/10 , Y02W30/702 , Y02W30/706
摘要： The object of the present invention resides in providing a method and instrument of polymer processing treatment, wherein a sudden pressure change due to expansion by gasification of a reactant when it is exhausted from a reacting extruder is given in a little amount to a molding machine for a treated substance, and a change in the amount of the material supplied to the molding machine and a variation in molding are little, and hence continuous and uniform molding is possible. That is, the method of the present invention resides in a method of polymer processing treatment, which includes the steps of: reacting a polymer with a reactant under mixing and stirring at a high temperature and a high pressure in the inside of a reacting extruder to produce the treated substance; introducing said treated substance and a remaining reactant into a reactant-separation tank to separate the treated substance and the reactant; and molding the separated treated substance.
摘要翻译：本发明的目的在于提供一种聚合物加工处理的方法和仪器，其中当反应物从反应挤出机排出时，由反应物的气化引起的膨胀引起的突然的压力变化少量给予成型机被处理物质和供给到成型机的材料量的变化和成型变化很小，因此可以连续均匀地成型。也就是说，本发明的方法在于聚合物加工处理方法，其包括以下步骤：在反应挤出机内部的高温和高压下在混合和搅拌下使聚合物与反应物反应，生产经处理的物质; 将所述处理的物质和剩余的反应物引入反应物分离罐中以分离处理的物质和反应物; 并模制分离的处理物质。

33. 发明授权

US06556381B2 Magnetic disk device and magnetic head slider 有权
标题翻译：磁盘装置和磁头滑块
公开(公告)号：US06556381B2
公开(公告)日：2003-04-29
申请号：US09761734
申请日：2001-01-18
申请人： Hidekazu Kohira , Masaaki Matsumoto , Hideaki Tanaka , Teruyoshi Higashiya , Kiyoshi Hashimoto , Akira Matsuda , Takanori Yamazaki
发明人： Hidekazu Kohira , Masaaki Matsumoto , Hideaki Tanaka , Teruyoshi Higashiya , Kiyoshi Hashimoto , Akira Matsuda , Takanori Yamazaki
IPC分类号： G11B560
CPC分类号： G11B21/21 , G11B5/012 , G11B5/6082 , G11B33/14
摘要： A magnetic disk device is provided with a magnetic head slider mounted with a magnetic head and a magnetic disk, and the magnetic head slider has the possibility of contacting the magnetic disk at the vicinity of the magnetic head during operation of the magnetic disk device. The magnetic head slider is 1.25 mm or less in length, 1 mm or less in width and 0.3 mm or less in thickness, and the friction force exerted between the magnetic head slider and the magnetic disk is 10 mN or less. The magnetic head comprises four substantially parallel surfaces, and the depth from a first surface, which is the most adjacent surface to the magnetic disk, to a second surface is 10 nm to 50 nm, the depth from the second surface to a third surface is 50 nm to 200 nm, and the depth from the third surface to a fourth surface is 400 nm to 1 &mgr;m.
摘要翻译：磁盘装置设置有安装有磁头和磁盘的磁头滑块，并且磁头滑块在磁盘装置的操作期间具有与磁头附近的磁盘接触的可能性。磁头滑块的长度为1.25mm以下，宽度为1mm以下，厚度为0.3mm以下，磁头滑块与磁盘之间的摩擦力为10mN以下。磁头包括四个基本上平行的表面，并且从第一表面到与第二表面最相邻的表面的深度为10nm至50nm，从第二表面到第三表面的深度为 50nm至200nm，从第三表面到第四表面的深度为400nm至1μm。

34. 发明申请

US20100260881A1 METHOD OF TREATING POLYMER COMPOUND AND TREATMENT SYSTEM FOR THE SAME 失效
标题翻译：处理聚合物化合物的方法及其处理系统
公开(公告)号：US20100260881A1
公开(公告)日：2010-10-14
申请号：US12821788
申请日：2010-06-23
申请人： Toshiharu Goto , Takanori Yamazaki , Yoshihiko Iwamoto , Jun Kakizaki
发明人： Toshiharu Goto , Takanori Yamazaki , Yoshihiko Iwamoto , Jun Kakizaki
IPC分类号： B29C47/92 , B29C47/78
CPC分类号： B29C47/50 , B29B17/02 , B29B17/04 , B29B2017/0293 , B29B2017/046 , B29C47/0004 , B29C47/0011 , B29C47/0014 , B29C47/0066 , B29C47/366 , B29C47/822 , B29C47/8815 , B29C47/92 , B29C2947/92019 , B29C2947/92104 , B29C2947/924 , B29C2947/92466 , B29C2947/92514 , B29C2947/926 , B29C2947/92704 , B29C2947/92895 , B29C2947/92961 , B29K2023/06 , C08J11/08 , Y02W30/622 , Y02W30/625 , Y02W30/701
摘要： A method of treating a polymer compound has the steps of: mixing and agitating the polymer compound and a chemical agent in an extruder while controlling the inside of the extruder to be kept at a high temperature and a high pressure to have a reaction mixture containing a polymer treated product; supplying the reaction mixture continuously into a high-pressure container disposed following the extruder and retaining the reaction mixture at the high temperature and high pressure for a predetermined time; then supplying the reaction mixture continuously to a chemical agent separator to separate the polymer treated product; and supplying the separated polymer treated product continuously to a molding means to form it into a molded material.
摘要翻译：处理高分子化合物的方法具有以下步骤：在挤出机内混合搅拌高分子化合物和化学试剂，同时控制挤出机的内部保持在高温和高压下，使含有聚合物处理产品; 将反应混合物连续地供入设置在挤出机后面的高压容器中，并将反应混合物保持在高温高压下一段预定时间; 然后将反应混合物连续供给到化学试剂分离器以分离聚合物处理产物; 并将分离的聚合物处理产物连续地供给到模制装置中以将其形成为模制材料。

35. 发明授权

US07787216B2 Magnetic head slider and disk drive with reduced damage to recording medium 有权
标题翻译：磁头滑块和磁盘驱动器对记录介质的损坏减小
公开(公告)号：US07787216B2
公开(公告)日：2010-08-31
申请号：US11317331
申请日：2005-12-22
申请人： Kiyoshi Hashimoto , Hidekazu Kohira , Takanori Yamazaki , Koji Miyake
发明人： Kiyoshi Hashimoto , Hidekazu Kohira , Takanori Yamazaki , Koji Miyake
IPC分类号： G11B5/60
CPC分类号： G11B5/40 , G11B5/3106 , G11B5/6082
摘要： Embodiments of the invention reduce damage to a disk recording medium when a slider flying above the disk recording medium inside a magnetic disk drive comes into contact with the disk recording medium due to slider vibration. In one embodiment, a magnetic head slider includes a front pad, a rear pad, and carbon protective films. The front pad includes a step bearing surface disposed on the side of a leading end and leading side rail surfaces formed on the step bearing surface. The rear pad includes a rear step bearing surface disposed across a deep groove surface from the front pad and a trailing side rail surface formed on the rear step bearing surface. The carbon protective films are formed on regions including vertices of slider corner portions, respectively. The leading side rail surfaces and the trailing side rail surface are formed substantially on the same level. The carbon protective films are harder than a slider base material and have a small coefficient of friction. The films have a film thickness of about 10 nm or more.
摘要翻译：当在磁盘驱动器内的盘记录介质上方的滑块与滑块振动与盘记录介质接触时，本发明的实施例减少对盘记录介质的损坏。在一个实施例中，磁头滑块包括前垫，后垫和碳保护膜。前垫包括设置在前端侧的台阶承载面和形成在台阶承载面上的前侧侧轨面。后垫包括一个后台阶支承表面，该表面设置在远离前垫的深槽表面和形成在后台阶承载表面上的后侧轨面上。碳保护膜分别形成在包括滑块拐角部分的顶点的区域上。前导侧轨面和后侧轨道表面基本上形成在同一水平面上。碳保护膜比滑块基材硬，摩擦系数小。膜的膜厚度为约10nm以上。

36. 发明授权

US07679863B2 Magnetic head slider with trailing rail surface for flying height control 有权
标题翻译：磁头滑块，带有导轨表面，用于飞行高度控制
公开(公告)号：US07679863B2
公开(公告)日：2010-03-16
申请号：US11516828
申请日：2006-09-06
申请人： Kiyoshi Hashimoto , Hidekazu Kohira , Takanori Yamazaki , Koji Miyake
发明人： Kiyoshi Hashimoto , Hidekazu Kohira , Takanori Yamazaki , Koji Miyake
IPC分类号： G11B5/60
CPC分类号： G11B5/6005 , G11B5/6064
摘要： Embodiments of the invention provide a slider structure able to lower a flying height compensation ratio caused by a projecting deformation of an air bearing surface of a slider by a flying height control mechanism and afford a change in flying height with a low control power. In one embodiment, a slider is provided with a leading edge, an air bearing surface, and a trailing edge. The air bearing surface includes a front pad, the front pad being made up of a front step bearing surface, leading rail surfaces, and side step bearing surfaces. The air bearing surface also includes a negative pressure groove surface surrounded by the front pad. The air bearing surface further includes a rear pad, the rear pad being made up of a rear step bearing surface formed at the same depth as the depth of the front step bearing surface and positioned on the trailing edge side, a trailing rail surface, an intermediate groove deeper than the trailing rail surface, and a trailing pad surface lying at the same height as the trailing rail surface. The front and both sides of the trailing pad surface are surrounded by the trailing rail surface.
摘要翻译：本发明的实施例提供一种滑块结构，其能够通过飞行高度控制机构降低由滑块的空气轴承表面的突出变形引起的飞行高度补偿比，并且以较低的控制功率提供飞行高度的变化。在一个实施例中，滑块设置有前缘，空气支承表面和后缘。空气轴承表面包括前垫，前垫由前台阶承载面，前导轨面和侧台承载面构成。空气轴承表面还包括由前垫包围的负压槽表面。空气轴承表面还包括后垫，后垫由后台阶承载表面构成，该后承载表面形成在与前阶梯承载表面的深度相同的深度并且位于后缘侧，后轨道表面，比后导轨表面更深的中间槽，以及位于与后导轨表面相同高度的后垫表面。尾垫表面的前侧和两侧被后导轨表面包围。

37. 发明授权

US07569617B2 Method and instrument of polymer processing treatment 有权
标题翻译：聚合物加工处理方法与仪器
公开(公告)号：US07569617B2
公开(公告)日：2009-08-04
申请号：US10886634
申请日：2004-07-09
申请人： Masaaki Mukaide , Toshiharu Goto , Takanori Yamazaki , Yoshihiko Iwamoto , Jun Kakizaki
发明人： Masaaki Mukaide , Toshiharu Goto , Takanori Yamazaki , Yoshihiko Iwamoto , Jun Kakizaki
IPC分类号： C08J11/04
CPC分类号： C08J11/24 , C08J11/10 , Y02W30/702 , Y02W30/706
摘要： The object of the present invention resides in providing a method and instrument of polymer processing treatment, wherein a sudden pressure change due to expansion by gasification of a reactant when it is exhausted from a reacting extruder is given in a little amount to a molding machine for a treated substance, and a change in the amount of the material supplied to the molding machine and a variation in molding are little, and hence continuous and uniform molding is possible. That is, the method of the present invention resides in a method of polymer processing treatment, which includes the steps of: reacting a polymer with a reactant under mixing and stirring at a high temperature and a high pressure in the inside of a reacting extruder to produce the treated substance; introducing said treated substance and a remaining reactant into a reactant-separation tank to separate the treated substance and the reactant; and molding the separated treated substance.
摘要翻译：本发明的目的在于提供一种聚合物加工处理的方法和仪器，其中当反应物从反应挤出机排出时，由反应物的气化引起的膨胀引起的突然的压力变化少量给予成型机被处理物质和供给到成型机的材料量的变化和成型变化很小，因此可以连续均匀地成型。也就是说，本发明的方法在于聚合物加工处理方法，其包括以下步骤：在反应挤出机内部的高温和高压下在混合和搅拌下使聚合物与反应物反应，生产经处理的物质; 将所述处理的物质和剩余的反应物引入反应物分离罐中以分离处理的物质和反应物; 并模制分离的处理物质。

38. 发明授权

US07371808B2 Polymer treating method and apparatus 有权
标题翻译：聚合物处理方法和装置
公开(公告)号：US07371808B2
公开(公告)日：2008-05-13
申请号：US11618130
申请日：2006-12-29
申请人： Toshiharu Goto , Takanori Yamazaki
发明人： Toshiharu Goto , Takanori Yamazaki
IPC分类号： C08F6/00
CPC分类号： C08J11/24 , Y02P20/582 , Y02W30/706
摘要： A polymer treating method has the steps of: reacting a polymer compound with a reaction agent in a reaction vessel to generate a polymer treatment product; discharging the polymer treatment product containing the reaction agent from the reaction vessel; depressurizing the polymer treatment product; introducing the polymer treatment product into a degassing extruder; separating the reaction agent from the polymer treatment product through a vent box that is connected to upstream of the degassing extruder and that has a volume of equal to or more than that of the reaction vessel; and extruding the polymer treatment product from the degassing extruder.
摘要翻译：聚合物处理方法具有以下步骤：在反应容器中使高分子化合物与反应剂反应生成聚合物处理产物; 从反应容器中排出含有反应剂的聚合物处理产物; 减压聚合物处理产品; 将聚合物处理产物引入脱气挤出机中; 通过连接到脱气挤出机的上游并具有等于或大于反应容器的体积的排气箱将反应剂与聚合物处理产物分离; 并从脱气挤出机挤出聚合物处理产物。

39. 发明申请

US20070110837A1 Polymer treating method and apparatus 有权
公开(公告)号：US20070110837A1
公开(公告)日：2007-05-17
申请号：US11618130
申请日：2006-12-29
申请人： Toshiharu Goto , Takanori Yamazaki
发明人： Toshiharu Goto , Takanori Yamazaki
IPC分类号： B29C47/76
CPC分类号： C08J11/24 , Y02P20/582 , Y02W30/706
摘要： A polymer treating method has the steps of: reacting a polymer compound with a reaction agent in a reaction vessel to generate a polymer treatment product; discharging the polymer treatment product containing the reaction agent from the reaction vessel; depressurizing the polymer treatment product; introducing the polymer treatment product into a degassing extruder; separating the reaction agent from the polymer treatment product through a vent box that is connected to upstream of the degassing extruder and that has a volume of equal to or more than that of the reaction vessel; and extruding the polymer treatment product from the degassing extruder.

40. 发明授权

US07164556B2 Magnetic disk device and magnetic head slider 有权
标题翻译：磁盘装置和磁头滑块
公开(公告)号：US07164556B2
公开(公告)日：2007-01-16
申请号：US11201225
申请日：2005-08-11
申请人： Hidekazu Kohira , Masaaki Matsumoto , Hideaki Tanaka , Teruyoshi Higashiya , Kiyoshi Hashimoto , Akira Matsuda , Takanori Yamazaki
发明人： Hidekazu Kohira , Masaaki Matsumoto , Hideaki Tanaka , Teruyoshi Higashiya , Kiyoshi Hashimoto , Akira Matsuda , Takanori Yamazaki
IPC分类号： G11B5/60
CPC分类号： G11B21/21 , G11B5/012 , G11B5/6082 , G11B33/14
摘要： A magnetic head slider includes a magnetic head mounting surface, a slider rail surface, a step air bearing surface, and a negative pressure groove. The magnetic head mounting surface is arranged in a center area with respect to a width of the slider near an air flow-out edge on the slider and mounts a magnetic head. The slider rail surface has a first depth from the magnetic head mounting surface and its width on an air flow-in side for the magnetic head is wider that its width on an air flow-out side for the magnetic head. The step air bearing surface is formed on an air flow-in side of the slider rail surface and has a second depth from the slider rail surface. The negative-pressure groove which formed on an air flow-in side of the step air bearing surface and has a third depth from the step air bearing surface.
摘要翻译：磁头滑动器包括磁头安装表面，滑块轨道表面，台阶空气轴承表面和负压槽。磁头安装表面相对于滑动器的宽度设置在滑块附近的空气流出边缘的中心区域，并且安装磁头。滑块导轨表面具有从磁头安装表面的第一深度，并且其磁头的空气流入侧的宽度宽于其在磁头的空气流出侧的宽度。台阶空气轴承表面形成在滑块轨道表面的空气流入侧，并且具有从滑块轨道表面的第二深度。负压槽形成在台阶空气轴承面的空气流入侧，并且具有从台阶空气轴承面的第三深度。

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