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31. 发明申请

US20140102875A1 TARGET MATERIAL SUPPLY APPARATUS FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE 有权
标题翻译：用于极光超光源的目标材料供应装置
公开(公告)号：US20140102875A1
公开(公告)日：2014-04-17
申请号：US13652755
申请日：2012-10-16
申请人： Silvia De Dea , Georgiy O. Vaschenko , Peter Baumgart , Norbert Bowering
发明人： Silvia De Dea , Georgiy O. Vaschenko , Peter Baumgart , Norbert Bowering
IPC分类号： F16L9/14 , C23C14/35 , H05G2/00 , C23C14/34
CPC分类号： G03F7/70033 , C23C14/185 , H05G2/003 , H05G2/006 , H05G2/008
摘要： A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
摘要翻译：用于极紫外（EUV）光源的目标材料供应装置包括管，其包括限定在第一和第二端之间的第一端，第二端和侧壁。管的外表面的至少一部分包括电绝缘材料，第一端容纳加压目标材料，第二端限定出加压目标材料通过的孔，以产生目标材料液滴流。目标材料供应装置还包括在管的外表面上的导电涂层。涂层被配置为将管的外表面电连接到地，从而减少外表面上的表面电荷。

32. 发明申请

US20070170378A1 EUV light source optical elements 审中-公开
公开(公告)号：US20070170378A1
公开(公告)日：2007-07-26
申请号：US11725940
申请日：2007-03-19
申请人： Norbert Bowering , Alexander Ershov , Timothy Dyer , Hugh Grinolds
发明人： Norbert Bowering , Alexander Ershov , Timothy Dyer , Hugh Grinolds
IPC分类号： G01J3/10
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70175 , G03F7/70916
摘要： Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.

33. 发明申请

US20050205811A1 LPP EUV light source 失效
标题翻译： LPP EUV光源
公开(公告)号：US20050205811A1
公开(公告)日：2005-09-22
申请号：US10979919
申请日：2004-11-01
申请人： William Partlo , Daniel Brown , Igor Fomenkov , Norbert Bowering , Curtis Rettig , Joseph MacFarlane , Alexander Ershov , Bjorn Hansson
发明人： William Partlo , Daniel Brown , Igor Fomenkov , Norbert Bowering , Curtis Rettig , Joseph MacFarlane , Alexander Ershov , Bjorn Hansson
IPC分类号： G01J1/00 , G03F7/20 , H01J65/04 , H05G2/00
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.
摘要翻译：描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

34. 发明申请

US20050199830A1 EUV light source optical elements 有权
标题翻译： EUV光源光学元件
公开(公告)号：US20050199830A1
公开(公告)日：2005-09-15
申请号：US11021261
申请日：2004-12-22
申请人： Norbert Bowering , Alexander Ershov , Timothy Dyer , Hugh Grinolds
发明人： Norbert Bowering , Alexander Ershov , Timothy Dyer , Hugh Grinolds
IPC分类号： G03F7/20 , G03F9/00 , G21K1/06 , G01J1/00
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70175 , G03F7/70916
摘要： Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
摘要翻译：公开了用于形成等离子体产生的EUV光源光学元件的装置和方法，例如，包括使用各种二元层材料的MLM堆叠的反射器和包括用于等离子体产生的EUV光源室中的单个和二进制封盖层的封盖层，特别是在等离子体源材料与一种或多种MLM材料反应。

35. 发明授权

US07365351B2 Systems for protecting internal components of a EUV light source from plasma-generated debris 失效
标题翻译：用于保护EUV光源的内部部件免受等离子体产生的碎片的系统
公开(公告)号：US07365351B2
公开(公告)日：2008-04-29
申请号：US11512821
申请日：2006-08-30
申请人： Norbert Bowering , Bjorn A. M. Hansson
发明人： Norbert Bowering , Bjorn A. M. Hansson
IPC分类号： G01J3/10 , G01J1/00
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

36. 发明申请

US20070114469A1 Collector for EUV light source 失效
公开(公告)号：US20070114469A1
公开(公告)日：2007-05-24
申请号：US11603670
申请日：2006-11-21
申请人： William Partlo , Norbert Bowering , Alexander Ershov , Igor Fomenkov
发明人： William Partlo , Norbert Bowering , Alexander Ershov , Igor Fomenkov
IPC分类号： G01J3/10
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： It will be understood that an apparatus and method is disclosed, which may comprise a multi-layer reflecting coating forming an EUV reflective surface which may comprise a spectral filter tuned to selectively highly reflect light in a band centered about at a first preferred wavelength and to significantly reduce the reflection of light at a band centered about a second wavelength, e.g., it may be tuned to reflect maximally or almost maximally, near the top of the reflectivity curve, e.g., at around 13.5 nm and at a significantly lower reflectivity at, e.g., around 11 nm, to discriminate against light near 11 nm and favor light at around 13.5 nm. The spectral filter may comprise a plurality of nested grazing angle of incidence shells comprising reflective surfaces comprising the multi-layer reflective coating. e.g. multilayer mirrors, e.g., with one or more reflecting surfaces per shell.

37. 发明申请

US20060219957A1 Laser produced plasma EUV light source 有权
标题翻译：激光产生等离子体EUV光源
公开(公告)号：US20060219957A1
公开(公告)日：2006-10-05
申请号：US11358992
申请日：2006-02-21
申请人： Alexander Ershov , William Partlo , Norbert Bowering , Bjorn Hansson
发明人： Alexander Ershov , William Partlo , Norbert Bowering , Bjorn Hansson
IPC分类号： G01J3/10 , H05G2/00 , A61N5/06
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.
摘要翻译：公开了一种EUV光源，其可以包括例如激光源。 CO 2激光器，等离子体室和用于将来自激光源的激光束传递到等离子体室中的光束传送系统。公开了可以包括以下中的一个或多个的实施例; 可以提供旁路管线以建立等离子体室和辅助室之间的流体连通，聚焦光学器件例如。用于将激光束聚焦到等离子体室中的焦点的反射镜，用于转向等离子体室中的激光束焦斑的转向光学元件，以及用于调整焦度的光学装置。

38. 发明申请

US20050205810A1 High repetition rate laser produced plasma EUV light source 有权
公开(公告)号：US20050205810A1
公开(公告)日：2005-09-22
申请号：US10803526
申请日：2004-03-17
申请人： Robert Akins , Richard Sandstrom , William Partlo , Igor Fomenkov , Thomas Steiger , John Algots , Norbert Bowering , Robert Jacques , Frederick Palenschat , Jun Song
发明人： Robert Akins , Richard Sandstrom , William Partlo , Igor Fomenkov , Thomas Steiger , John Algots , Norbert Bowering , Robert Jacques , Frederick Palenschat , Jun Song
IPC分类号： G01J1/00 , G03F7/20 , H01J65/04 , H05G2/00
CPC分类号： B82Y10/00 , G03F7/70033 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

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