会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 33. 发明申请
    • ENGINE FUEL INJECTION CONTROL APPARATUS
    • 发动机燃油喷射控制装置
    • US20100305834A1
    • 2010-12-02
    • US12785754
    • 2010-05-24
    • Tomoki ItoSatoshi Watanabe
    • Tomoki ItoSatoshi Watanabe
    • F02D41/30F01L1/34
    • F02D41/064F02D13/023F02D13/0238F02D13/0261F02D41/345F02D2013/0292F02D2041/001Y02T10/18Y02T10/44
    • An engine fuel injection control apparatus includes a variable valve device that at least varies an intake valve open timing of an intake valve. A controller adjusts the variable valve device and a fuel injection timing of a fuel injection valve. The controller controls a fuel injection end timing in accordance with an overlap amount of the intake valve and an exhaust valve. The controller adjusts the fuel injection timing such that the fuel injection end timing is more advanced than the intake valve open timing and such that as an amount by which the overlap amount exceeds a prescribed overlap amount becomes larger, a time interval between the fuel injection end timing and the intake valve open timing is set to become increasingly larger, upon determining that the engine is being cold started and the overlap amount is larger than the prescribed overlap amount.
    • 发动机燃料喷射控制装置包括至少改变进气门的进气门打开正时的可变气门装置。 控制器调节可变阀装置和燃料喷射阀的燃料喷射正时。 控制器根据进气门和排气阀的重叠量控制燃油喷射结束时刻。 控制器调节燃料喷射正时,使得燃料喷射结束正时比进气门打开正时更前进,并且使得当重叠量超过规定重叠量的量变大时,燃料喷射端之间的时间间隔 在确定发动机冷起动并且重叠量大于规定重叠量时,定时和进气门打开正时被设定为越来越大。
    • 34. 发明申请
    • Negative resist composition and patterning process using the same
    • 负光刻胶组合物和使用其的图案化工艺
    • US20100304301A1
    • 2010-12-02
    • US12662763
    • 2010-05-03
    • Akinobu TanakaKeiichi MasunagaDaisuke DomonSatoshi Watanabe
    • Akinobu TanakaKeiichi MasunagaDaisuke DomonSatoshi Watanabe
    • G03F7/004G03F7/20
    • G03F7/0382
    • There is disclosed a negative resist composition comprising (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with the crosslinking agent by an action of an acid to thereby be insolubilized in alkali, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component; wherein the polymer to be used as the base polymer is: a polymer, which is obtained by polymerizing two or more kinds of monomers represented by the following general formula (1), or which is obtained by polymerizing a monomer mixture containing one or more kinds of monomers represented by the general formula (1) and one or more kinds of styrene monomers represented by the following general formula (2).
    • 公开了一种负型抗蚀剂组合物,其包含(A)可溶于碱的碱性聚合物,其通过酸的作用在碱中不溶解; 和/或交联剂和碱性聚合物的组合,其可溶于碱,并通过酸的作用与交联剂反应,从而不溶于碱,(B)酸产生剂,和(C) 作为碱性成分的含氮化合物; 其中用作基础聚合物的聚合物是:通过聚合由以下通式(1)表示的两种或更多种单体获得的聚合物,或通过使含有一种或多种的单体混合物 的由通式(1)表示的单体和一种或多种由以下通式(2)表示的苯乙烯单体。
    • 36. 发明申请
    • Chemically amplified positive resist composition and resist patterning process
    • 化学扩增正性抗蚀剂组合物和抗蚀剂图案化工艺
    • US20100167207A1
    • 2010-07-01
    • US12591540
    • 2009-11-23
    • Akinobu TanakaTakanobu TakedaSatoshi Watanabe
    • Akinobu TanakaTakanobu TakedaSatoshi Watanabe
    • G03F7/20G03F7/004
    • G03F7/0395G03F7/0045G03F7/0392
    • There is disclosed a chemically amplified positive resist composition to form a chemically amplified resist film to be used in a lithography, wherein the chemically amplified positive resist composition comprises at least, (A) a base resin, insoluble or poorly soluble in an alkaline solution, having a repeating unit whose phenolic ydroxyl group is protected by a tertiary alkyl group, while soluble in an alkaline solution when the tertiary alkyl group is removed; (B) an acid generator; (C) a basic component; and (D) an organic solvent, and a solid component concentration is controlled so that the chemically amplified resist film having the film thickness of 10 to 100 nm is obtained by a spin coating method. There can be provided, in a lithography, a chemically amplified positive resist composition giving a high resolution with a suppressed LER deterioration caused by film-thinning at the time of forming a chemically amplified resist film with the film thickness of 10 to 100 nm, and a resist patterning process using the same.
    • 公开了一种化学放大的正性抗蚀剂组合物,以形成用于光刻的化学放大的抗蚀剂膜,其中化学放大的正性抗蚀剂组合物至少包含(A)不溶于或难溶于碱性溶液的基础树脂, 具有酚羟基被叔烷基保护的重复单元,当叔烷基被除去时可溶于碱性溶液; (B)酸发生剂; (C)基本组成部分; 和(D)有机溶剂,并且通过旋涂法获得固体成分浓度,从而得到膜厚为10〜100nm的化学放大型抗蚀剂膜。 在平版印刷法中,可以提供化学放大的正性抗蚀剂组合物,其在形成10至100nm的膜厚度的化学放大抗蚀剂膜时产生具有抑制的由薄膜变薄引起的LER劣化的高分辨率,以及 使用其的抗蚀剂图案化工艺。
    • 38. 发明申请
    • Resist composition and patterning process
    • 抗蚀剂组成和图案化工艺
    • US20100009299A1
    • 2010-01-14
    • US12457192
    • 2009-06-03
    • Satoshi WatanabeAkinobu TanakaTakeru WatanabeTakeshi Kinsho
    • Satoshi WatanabeAkinobu TanakaTakeru WatanabeTakeshi Kinsho
    • G03F7/00C07C229/00
    • G03F7/0045G03F7/0382Y10S430/114Y10S430/128
    • The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.
    • 本发明涉及:抗蚀剂组合物,例如化学放大抗蚀剂组合物,除了在微制造的光刻中具有更高分辨率之外,甚至在抗蚀剂的衬底侧边界面上也提供优异的图案图形,特别是在光刻 采用KrF激光,ArF激光,F2激光,超短紫外光,电子束,X射线等作为曝光源; 以及利用抗蚀剂组合物的图案化工艺。 本发明提供一种化学放大抗蚀剂组合物,其包含至少具有羧基的一种或多种胺化合物或氧化胺化合物(除了具有包含在芳环的环结构中的胺或氧化胺的氮原子的那些) 并且不具有与氮原子共价键合的氢原子作为碱性中心。
    • 39. 发明授权
    • Portable wireless unit
    • 便携式无线单元
    • US07609212B2
    • 2009-10-27
    • US11718165
    • 2005-11-08
    • Kenichi SatoYukinari TakahashiSatoshi Watanabe
    • Kenichi SatoYukinari TakahashiSatoshi Watanabe
    • H01Q1/24
    • H01Q21/29H01Q1/243H01Q9/16H04M1/0235
    • A portable wireless unit having high antenna performance, which comprises: a first case having a first antenna element, a second antenna element and a second feeding section; a second case having a third antenna element, a third feeding section and a circuit board provided with a ground pattern; and a coupling section consisting of first and second electrically connected conductive coupling elements and coupling the first case and the second case to be extended and housed freely. The second coupling element is provided in the first case while being connected electrically with the first antenna element, the first coupling element is provided in the second case while being connected electrically with the first feeding section, and the first antenna element, the coupling section, and the ground pattern are operated as a dipole antenna.
    • 一种具有高天线性能的便携式无线单元,包括:第一壳体,具有第一天线元件,第二天线元件和第二馈电部分; 第二壳体,具有第三天线元件,第三馈电部分和设置有接地图案的电路板; 以及耦合部分,其由第一和第二电连接的导电耦合元件组成,并且将第一壳体和第二壳体联接以自由地延伸和容纳。 第二耦合元件设置在与第一天线元件电连接的第一壳体中,第一耦合元件设置在第二壳体中,同时与第一馈电部分电连接,第一天线元件,耦合部分, 并且接地图案作为偶极天线工作。
    • 40. 发明申请
    • Mobile Communication System
    • 移动通信系统
    • US20090239561A1
    • 2009-09-24
    • US12260174
    • 2008-10-29
    • Daisuke NittaTetsuo TomitaTomonori KumagaiSatoshi WatanabeKazunari Kobayashi
    • Daisuke NittaTetsuo TomitaTomonori KumagaiSatoshi WatanabeKazunari Kobayashi
    • H04B7/00
    • H04W88/12H04W8/06H04W88/08
    • A base station accommodation method and mobile communication system which allows the installation of many micro-miniature BTS devices are provided. The mobile communication system includes a plurality of base stations which accommodate a plurality of mobile terminals respectively; a plurality of first base station control devices, each of which accommodates a predetermined number of base stations out of the plurality of base stations; and a second base station control device which accommodates the plurality of first base station control devices, wherein each of the plurality of first base station control devices comprises, for supporting information identifying a mobile terminal, a mobile terminal data base to store identification information which identifies a base station to which the mobile terminal is subordinate, and a station data base to store an address of the base station.
    • 提供了允许安装许多微型BTS设备的基站调制方法和移动通信系统。 移动通信系统包括分别容纳多个移动终端的多个基站; 多个第一基站控制装置,其各自容纳多个基站中的预定数量的基站; 以及第二基站控制装置,其容纳所述多个第一基站控制装置,其中,所述多个第一基站控制装置中的每一个包括用于支持识别移动终端的信息,移动终端数据库,以存储标识的标识信息 移动终端所属的基站,以及用于存储基站的地址的站数据库。