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31. 发明申请

US20120027918A1 SHOWERHEAD SUPPORT STRUCTURE FOR IMPROVED GAS FLOW 有权
标题翻译：改善气体流量的淋浴支撑结构
公开(公告)号：US20120027918A1
公开(公告)日：2012-02-02
申请号：US13163241
申请日：2011-06-17
申请人： Robin L. Tiner , Soo Young Choi , Qunhua Wang , Jrjyan Jerry Chen
发明人： Robin L. Tiner , Soo Young Choi , Qunhua Wang , Jrjyan Jerry Chen
IPC分类号： C23C16/455 , B05D5/12
CPC分类号： B05B1/005 , C23C16/45565 , H01J37/3244
摘要： Embodiments of the present invention generally provide apparatus and methods for supporting a gas distribution showerhead in a processing chamber. In one embodiment, a gas distribution showerhead for a vacuum chamber is provided. The gas distribution showerhead comprises a body having a first side and a second side opposite the first side, and a plurality of gas passages formed through the body, the gas passages comprising a first bore formed in the first side that is fluidly coupled to a second bore formed in the second side by a restricting orifice, and a suspension feature formed in the first bore of at least one of the gas passages.
摘要翻译：本发明的实施例通常提供用于在处理室中支撑气体分配喷头的装置和方法。在一个实施例中，提供了一种用于真空室的气体分配喷头。所述气体分配喷头包括具有第一侧和与所述第一侧相对的第二侧的主体和穿过所述主体形成的多个气体通道，所述气体通道包括形成在所述第一侧中的第一孔，所述第一孔流体地联接到第二侧通过限制孔形成在第二侧中的孔，以及形成在至少一个气体通道的第一孔中的悬挂特征。

32. 发明授权

US08721791B2 Showerhead support structure for improved gas flow 有权
标题翻译：喷头支撑结构，用于改善气流
公开(公告)号：US08721791B2
公开(公告)日：2014-05-13
申请号：US13163241
申请日：2011-06-17
申请人： Robin L. Tiner , Soo Young Choi , Qunhua Wang , Jrjyan Jerry Chen
发明人： Robin L. Tiner , Soo Young Choi , Qunhua Wang , Jrjyan Jerry Chen
IPC分类号： C23C16/455 , H01J37/32
CPC分类号： B05B1/005 , C23C16/45565 , H01J37/3244
摘要： Embodiments of the present invention generally provide apparatus and methods for supporting a gas distribution showerhead in a processing chamber. In one embodiment, a gas distribution showerhead for a vacuum chamber is provided. The gas distribution showerhead comprises a body having a first side and a second side opposite the first side, and a plurality of gas passages formed through the body, the gas passages comprising a first bore formed in the first side that is fluidly coupled to a second bore formed in the second side by a restricting orifice, and a suspension feature formed in the first bore of at least one of the gas passages.
摘要翻译：本发明的实施例通常提供用于在处理室中支撑气体分配喷头的装置和方法。在一个实施例中，提供了一种用于真空室的气体分配喷头。所述气体分配喷头包括具有第一侧和与所述第一侧相对的第二侧的主体和穿过所述主体形成的多个气体通道，所述气体通道包括形成在所述第一侧中的第一孔，所述第一孔流体地联接到第二侧通过限制孔形成在第二侧中的孔，以及形成在至少一个气体通道的第一孔中的悬挂特征。

33. 发明申请

US20100206483A1 RF Bus and RF Return Bus for Plasma Chamber Electrode 有权
标题翻译：射频总线和等离子腔室电极的RF返回总线
公开(公告)号：US20100206483A1
公开(公告)日：2010-08-19
申请号：US12705600
申请日：2010-02-13
申请人： Carl A. Sorensen , Jozef Kudela , Robin L. Tiner , Suhail Anwar , John M. White
发明人： Carl A. Sorensen , Jozef Kudela , Robin L. Tiner , Suhail Anwar , John M. White
IPC分类号： C23F1/08 , C23C16/00 , C23C16/50
CPC分类号： H01J37/32174 , H01J37/32091
摘要： For coupling RF power from an RF input of a plasma chamber to the interior of a plasma chamber, an RF bus conductor is connected between the RF input and a plasma chamber electrode. In one embodiment, an RF return bus conductor is connected to an electrically grounded wall of the chamber, and the RF bus conductor and the RF return bus conductor have respective surfaces that are parallel and face each other. In another embodiment, the RF bus conductor has a transverse cross section having a longest dimension oriented perpendicular to the surface of the plasma chamber electrode that is closest to the RF bus conductor.
摘要翻译：为了将来自等离子体室的RF输入的RF功率耦合到等离子体室的内部，RF总线导体连接在RF输入端和等离子体室电极之间。在一个实施例中，RF返回总线导体连接到室的电接地壁，并且RF总线导体和RF返回总线导体具有彼此平行并相对的相应表面。在另一个实施例中，RF总线导体具有垂直于等离子体室电极表面的最长尺寸的横截面，其最接近RF总线导体。

34. 发明申请

US20100122655A1 BALL SUPPORTED SHADOW FRAME 审中-公开
标题翻译：球支撑阴影框架
公开(公告)号：US20100122655A1
公开(公告)日：2010-05-20
申请号：US12614479
申请日：2009-11-09
申请人： Robin L. Tiner , John M. White , Kyung-Tae Kim
发明人： Robin L. Tiner , John M. White , Kyung-Tae Kim
IPC分类号： B05C11/00 , B23P11/00
CPC分类号： C23C16/4585 , C23C16/042 , Y10T29/49895
摘要： Embodiments disclosed herein generally include an alignment assembly for aligning a shadow frame on a susceptor. For producing large area flat panel displays or solar panels, the shadow frame that protects the areas of the susceptor not covered by the substrate from deposition may be so large that the shadow frame bends and doesn't properly align. By utilizing an alignment assembly having one or more ball bearings, the shadow frame may roll on the susceptor to a proper alignment position. Thus, the shadow frame may be prevented from bending and also align on the susceptor.
摘要翻译：本文公开的实施例通常包括用于对准基座上的阴影框架的对准组件。为了制造大面积平板显示器或太阳能电池板，保护未被基板覆盖的基座的区域沉积的阴影框架可能太大，使得阴影框架弯曲并且不能正确对准。通过利用具有一个或多个球轴承的对准组件，阴影框架可以在基座上滚动到适当的对准位置。因此，可以防止阴影框架弯曲并且在基座上对准。

35. 发明授权

US08365682B2 Methods and apparatus for supporting substrates 有权
标题翻译：用于支撑基材的方法和装置
公开(公告)号：US08365682B2
公开(公告)日：2013-02-05
申请号：US11140777
申请日：2005-05-31
申请人： Wendell T. Blonigan , Carl Sorensen , John M. White , Robin L. Tiner
发明人： Wendell T. Blonigan , Carl Sorensen , John M. White , Robin L. Tiner
IPC分类号： B65G49/07
CPC分类号： H01L21/67259 , H01L21/68742 , H01L21/68778
摘要： Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.
摘要翻译：衬底支撑方法和装置包括垂直对齐的提升销，其具有接合摩擦板和/或磁场的承载表面，以在衬垫提升期间保持提升销的垂直取向。在一些实施例中，可以替代地或另外地使用磁场和/或加权来控制提升销的垂直定向，限制提升销的角度和/或防止提升销在基座中无意地结合，因为感受器被升高并且防止由此产生的基板不均匀的支撑。

36. 发明申请

US20120103989A1 METHOD AND APPARATUS FOR SEALING AN OPENING OF A PROCESSING CHAMBER 有权
标题翻译：用于密封加工室的开口的方法和装置
公开(公告)号：US20120103989A1
公开(公告)日：2012-05-03
申请号：US13349307
申请日：2012-01-12
申请人： Shinichi Kurita , Takayuki Matsumoto , Robin L. Tiner , John M. White , Suhail Anwar
发明人： Shinichi Kurita , Takayuki Matsumoto , Robin L. Tiner , John M. White , Suhail Anwar
IPC分类号： B65D43/26
CPC分类号： C23C16/54 , C23C16/45517
摘要： A method and apparatus for sealing an opening of a processing chamber are provided. In one embodiment, the invention generally provides a closure member integrated within a wall of a process chamber for sealing an opening within the wall of the chamber. In another embodiment, the invention provides a closure member configured to seal an opening in the wall of a processing chamber from the inside of the chamber.
摘要翻译：提供一种用于密封处理室的开口的方法和装置。在一个实施例中，本发明通常提供集成在处理室的壁内的封闭构件，用于密封腔室壁内的开口。在另一个实施例中，本发明提供了一种封闭构件，其构造成将处理室的壁中的开口与室的内部密封。

37. 发明授权

US06517303B1 Substrate transfer shuttle 失效
公开(公告)号：US06517303B1
公开(公告)日：2003-02-11
申请号：US09082484
申请日：1998-05-20
申请人： John M. White , Norman L. Turner , Robin L. Tiner , Ernst Keller , Shinichi Kurita , Wendell T. Blonigan , David E. Berkstresser
发明人： John M. White , Norman L. Turner , Robin L. Tiner , Ernst Keller , Shinichi Kurita , Wendell T. Blonigan , David E. Berkstresser
IPC分类号： B65G133
CPC分类号： H01L21/67748 , C03B25/08 , C03B29/08 , C03B35/142 , C03B35/202 , C03B2225/02 , C03C17/002 , F27D3/00 , F27D5/00 , H01L21/67173 , H01L21/67236 , Y02P40/57 , Y10S414/135 , Y10S414/139
摘要： The present invention provides an apparatus and method for substrate transport. In systems according to the invention, at least a first and second chamber are provided. The first chamber may be a load lock and the second chamber a processing chamber. A substrate transfer shuttle is provided and is moveable along a linear path defined by guide rollers between one position in the first chamber and another position in the second chamber. In this way, the substrate may be transferred, in both a forward and a reverse direction, between the first chamber and the second chamber. The substrate transfer shuttle is structured so that a substrate may be removed therefrom by moving a support in one of the chambers from a lowered position to an intermediate position, after which the substrate transfer shuttle may be removed from the chamber.

38. 发明授权

US08992723B2 RF bus and RF return bus for plasma chamber electrode 有权
标题翻译：用于等离子体室电极的RF总线和RF返回总线
公开(公告)号：US08992723B2
公开(公告)日：2015-03-31
申请号：US12705600
申请日：2010-02-13
申请人： Carl A. Sorensen , Jozef Kudela , Robin L. Tiner , Suhail Anwar , John M. White
发明人： Carl A. Sorensen , Jozef Kudela , Robin L. Tiner , Suhail Anwar , John M. White
IPC分类号： H01L21/3065 , C23C16/505 , H01J37/32
CPC分类号： H01J37/32174 , H01J37/32091
摘要： For coupling RF power from an RF input of a plasma chamber to the interior of a plasma chamber, an RF bus conductor is connected between the RF input and a plasma chamber electrode. In one embodiment, an RF return bus conductor is connected to an electrically grounded wall of the chamber, and the RF bus conductor and the RF return bus conductor have respective surfaces that are parallel and face each other. In another embodiment, the RF bus conductor has a transverse cross section having a longest dimension oriented perpendicular to the surface of the plasma chamber electrode that is closest to the RF bus conductor.
摘要翻译：为了将来自等离子体室的RF输入的RF功率耦合到等离子体室的内部，RF总线导体连接在RF输入端和等离子体室电极之间。在一个实施例中，RF返回总线导体连接到室的电接地壁，并且RF总线导体和RF返回总线导体具有彼此平行并相对的相应表面。在另一个实施例中，RF总线导体具有垂直于等离子体室电极表面的最长尺寸的横截面，其最接近RF总线导体。

39. 发明授权

US07534301B2 RF grounding of cathode in process chamber 有权
标题翻译：处理室中阴极的RF接地
公开(公告)号：US07534301B2
公开(公告)日：2009-05-19
申请号：US10946403
申请日：2004-09-21
申请人： John M. White , Robin L. Tiner , Beom Soo Park , Wendell T Blonigan
发明人： John M. White , Robin L. Tiner , Beom Soo Park , Wendell T Blonigan
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32082 , H01J37/32174
摘要： An apparatus for providing a short return current path for RF current between a process chamber wall and a substrate support is provided. The RF grounding apparatus, which is RF grounded and is place above the substrate transfer port, establishes electrical contact with the substrate support only during substrate processing, such as deposition, to provide return current path for the RF current. One embodiment of the RF grounding apparatus comprises one or more low impedance flexible curtains, which are electrically connected to the grounded chamber wall, and to one or more low impedance blocks, which make contacts with the substrate support during substrate processing. Another embodiment of the RF grounding apparatus comprises a plurality of low impedance flexible straps, which are electrically connected to the grounded chamber wall, and to one or more low impedance blocks, which make contacts with the substrate support during substrate processing. Yet another embodiment of the RF grounding apparatus comprises a plurality of probes, which either are electrically connected to the grounded chamber wall or are grounded by other means, and actuators accompanying the probes. The actuators move the probes to make electrical contact with the substrate support during substrate processing.
摘要翻译：提供一种用于在处理室壁和衬底支撑件之间提供用于RF电流的短的返回电流路径的装置。射频接地装置，其RF接地并位于衬底传送端口之上，仅在衬底处理（例如沉积）期间与衬底支撑件电接触，以提供RF电流的返回电流路径。 RF接地装置的一个实施例包括电连接到接地室壁的一个或多个低阻抗柔性窗帘，以及在衬底处理期间与衬底支撑件接触的一个或多个低阻抗块。 RF接地装置的另一实施例包括多个低阻抗柔性带，其电连接到接地室壁，以及一个或多个低阻抗块，其在衬底处理期间与衬底支撑件接触。 RF接地装置的另一个实施例包括多个探针，它们或者被电连接到接地室壁，或者通过其它装置接地，以及伴随探头的致动器。致动器在衬底处理期间移动探针以与衬底支撑件电接触。

40. 发明申请

US20090101069A1 RF RETURN PLATES FOR BACKING PLATE SUPPORT 审中-公开
标题翻译： RF返回板用于支撑板支持
公开(公告)号：US20090101069A1
公开(公告)日：2009-04-23
申请号：US12248869
申请日：2008-10-09
申请人： SUHAIL ANWAR , Robin L. Tiner , John M. White
发明人： SUHAIL ANWAR , Robin L. Tiner , John M. White
IPC分类号： C23C16/505
CPC分类号： C23C16/505 , C23C16/45565 , H01J37/32091 , H01J37/32174 , H01J37/3244
摘要： Embodiments of the present invention generally comprise an RF return plate for use in an apparatus that utilizes RF current. Whenever a backing plate is so large that a backing plate support structure is needed to prevent the backing plate from sagging, RF current that flows across the backing plate towards the showerhead may be partially diverted and flow up the support structure. The RF current that flows up the support structure puts an unwanted bias on the support structure and also contributes to reduction of the RF current flowing to the showerhead. By returning the RF current to the source, the amount of RF current that may flow up the support structure may be reduced. An RF return plate may be disposed between the chamber lid and the support structure to redirect any RF current that may flow up the support structure back down to the chamber lid.
摘要翻译：本发明的实施例通常包括用于利用RF电流的装置中的RF返回板。每当背板太大以至于需要背板支撑结构以防止背板下垂时，流过背板的喷头的RF电流可以部分地转向并沿支撑结构向上流动。在支撑结构上流动的RF电流在支撑结构上产生不想要的偏压，并且还有助于减少流向喷头的RF电流。通过将RF电流返回到源，可以减少可能流过支撑结构的RF电流的量。 RF返回板可以设置在室盖和支撑结构之间，以将可能从支撑结构向上流动的任何RF电流重新定向到室盖。

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