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    • 36. 发明申请
    • EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    • 曝光装置和装置制造方法
    • US20100141913A1
    • 2010-06-10
    • US12631619
    • 2009-12-04
    • Osamu Morimoto
    • Osamu Morimoto
    • G03B27/42G03B27/52G03B27/68
    • G03F7/70191G03B27/52G03B27/68G03F7/70283G03F7/70508G03F7/70783G03F7/70875
    • An apparatus which projects a pattern of an original onto a substrate by a projection optical system within a chamber to expose the substrate, comprises a measurement unit which performs measurement to calculate a deformation amount of the original, and a controller which calculates a predicted deformation amount of the original and corrects a projection magnification of the projection optical system so as to correct the predicted deformation amount, based on information representing a relationship between the deformation amount with reference to a shape of the original at a certain temperature and a time for which the original receives exposure light, a deformation amount of the original before exposure determined based on a measurement value obtained by measuring, by the measurement unit, the deformation amount of the original loaded into the chamber and unused for exposure, and the time for which the original receives the exposure light.
    • 一种通过室内的投影光学系统将原稿的图案投影到基板上以露出基板的装置包括:测量单元,其执行测量以计算原稿的变形量;以及控制器,其计算预测的变形量 并且校正投影光学系统的投影倍率,以便基于表示在一定温度下参考原稿的形状的变形量之间的关系的信息来校正预测变形量,并且其中 原稿接收曝光光,基于通过测量单元测量装载到室中的未被使用的原稿的变形量而获得的测量值,确定原始曝光前的变形量,以及原稿的原始时间 接收曝光灯。
    • 37. 发明申请
    • Novel Dispersant And Compositions Thereof
    • 新型分散剂及其组成
    • US20090093569A1
    • 2009-04-09
    • US12097286
    • 2006-12-14
    • Dean ThetfordPatrick J. SunderlandNeil L. SimpsonOsamu MorimotoFumitake Unezaki
    • Dean ThetfordPatrick J. SunderlandNeil L. SimpsonOsamu MorimotoFumitake Unezaki
    • C09B67/22B01F17/52C08G65/28
    • B01F17/0064B01F17/0057C08G65/30C08G65/329C08G2650/40C08G2650/50C09D7/45
    • A composition comprising a particulate Solid, an organic medium and a compound with an alkyleneoxy compound with an inorganic acidic polar head group (Z), wherein the compound is defined by Formula (1) and salts thereof: U—(Y)x-T-N(G)r(B-Z)q (Formula 1) wherein U is independently R′—N—(C)-T′-O—, or R—O—; R or R′ may be the same or different and are independently H or C1-50-optionally substituted hydrocarbyl, or hydrocarbonyl group (acyl group), or the residue of an epoxide, or the residue of an optionally substituted (meth) acrylic ester or amide group; Y is C2-4-alkyleneoxy; T or T′ is independently C2-4 alkylene; B is an alkylene group, such as, methylene; Z is an inorganic acidic polar head group, such as, a sulphur or phosphorus acidic polar head group; G and G′ may be the same or different and are independently H or C1-50-optionally substituted hydrocarbyl or C1-50-optionally substituted hydrocarbyl or hydrocarbonyl group or the residue of an epoxide, or the residue of an optionally substituted (meth) acrylic ester or amide group; r is zero or 1; q is 1 or 2, with the proviso that when q is 2, r is zero; and x is from 2 to 90.
    • 一种组合物,其包含颗粒状固体,有机介质和具有无机酸性极性头基(Z)的亚烷氧基化合物的化合物,其中所述化合物由式(1)及其盐定义:U-(Y)xTN )R(BZ)q(式1)其中U独立地为R'-N-(C)-T'-O-或RO-; R或R'可以相同或不同,并且独立地为H或C1-50任选取代的烃基或烃基(酰基)或环氧化物的残基,或任选取代的(甲基)丙烯酸酯的残基 或酰胺基; Y是C 2-4 - 亚烷氧基; T或T'独立地为C 2-4亚烷基; B是亚烷基,例如亚甲基; Z是无机酸性极性头基,如硫或磷酸性极性头基; G和G'可以相同或不同,并且独立地为H或C 1-50-任选取代的烃基或C 1-5 - 任选取代的烃基或烃基或环氧化物的残基,或任选取代的(甲基) 丙烯酸酯或酰胺基; r为零或1; q为1或2,条件是当q为2时,r为零; x为2-90。
    • 38. 发明授权
    • Exposure apparatus and device manufacturing method
    • 曝光装置和装置制造方法
    • US06714281B1
    • 2004-03-30
    • US09521211
    • 2000-03-08
    • Toshitaka AmanoOsamu Morimoto
    • Toshitaka AmanoOsamu Morimoto
    • G03B2752
    • G03F7/70641
    • An exposure apparatus or a device manufacturing method, wherein a focus measuring device measures a best focus position upon projecting and exposing, through a projection optical system, a pattern of an original plate onto a substrate placed on a movable stage, by obtaining predetermined estimating information indicative of a blur degree of an image being observed, when observing a reference mark on the movable stage or the surface of the substrate by the focus measuring device, while changing a relative position between the movable stage and the projection optical system toward an optical axis direction of the projection optical system. This exposure apparatus or device manufacturing method controls whether or not the best focus position is measured, based on (i) an elapsed time after a last projection and exposure or (ii) the estimating information obtained at a predetermined time by the focus measuring device and estimating information obtained at the time of measuring the best focus position at the preceding time.
    • 一种曝光装置或装置制造方法,其中聚焦测量装置通过投影光学系统将原版的图案投射到放置在可移动台上的基板上并测量最佳聚焦位置,通过获得预定的估计信息 当通过聚焦测量装置观察可移动台或基板的表面上的参考标记时,在将可移动台与投影光学系统之间的相对位置朝向光轴改变时,指示正在观察的图像的模糊度 投影光学系统的方向。 该曝光装置或装置的制造方法基于(i)最终投影曝光后的经过时间,或者通过焦点测量装置在预定时间获得的估计信息,以及 估计在前一时间测量最佳聚焦位置时获得的信息。