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31. 发明申请

US20080175706A1 STEAM TURBINE 有权
标题翻译：汽轮机
公开(公告)号：US20080175706A1
公开(公告)日：2008-07-24
申请号：US11968309
申请日：2008-01-02
申请人： Kazutaka IKEDA , Takashi Sasaki , Satoru Asai , Hitoshi Sakakida , Kenji Kamimura , Ryohei Ogino , Yasushi Ooishi
发明人： Kazutaka IKEDA , Takashi Sasaki , Satoru Asai , Hitoshi Sakakida , Kenji Kamimura , Ryohei Ogino , Yasushi Ooishi
IPC分类号： F01D11/12
CPC分类号： F01D25/246 , F01D5/3046 , F01D11/001 , F01D11/02 , F01D11/122 , F05D2220/31 , F05D2240/55
摘要： A steam turbine has: a casing; a rotor rotatably arranged in the casing; a nozzle diaphragm concentrically arranged with respect to the rotor, the nozzle diaphragm being engaged with the casing; moving blades arranged in circumferential direction on outer circumference of the rotor at positions adjacent to the nozzle diaphragm; seal strips circumferentially extending on tips of the moving blades, the seal strips protruding in radial outward direction; and an abradable structure rigidly connected to the nozzle diaphragm. The abradable structure faces the seal strips in radial direction at a facing surface, and has an abradable part made of an abradable material arranged at the facing surface.
摘要翻译：蒸汽轮机具有：壳体; 可旋转地布置在壳体中的转子; 相对于转子同心地布置的喷嘴隔膜，喷嘴隔膜与壳体接合; 在与所述喷嘴隔膜相邻的位置处，在所述转子的外周上沿圆周方向配置的动叶片; 密封条在活动叶片的尖端周向延伸，密封条沿径向向外的方向突出; 以及刚性地连接到喷嘴隔膜的可磨损结构。可磨损结构在面对面处径向地面向密封条，并且具有由布置在相对表面上的可磨损材料制成的可磨损部分。

32. 发明申请

US20070147990A1 SEALING DEVICE 审中-公开
标题翻译：密封装置
公开(公告)号：US20070147990A1
公开(公告)日：2007-06-28
申请号：US11612831
申请日：2006-12-19
申请人： Kenji Kamimura , Takashi Sasaki , Hitoshi Sakakida , Yoichi Tsuda , Satoru Asai
发明人： Kenji Kamimura , Takashi Sasaki , Hitoshi Sakakida , Yoichi Tsuda , Satoru Asai
IPC分类号： F01D11/08
CPC分类号： F16J15/445
摘要： A sealing device by which the leakage of fluid is further reduced by securely maintaining the adhesion between a base material and an abradable layer and further strengthening the prevention of fluid leakage is provided. The sealing device according to the present invention includes seal strips provided to either one of a rotating portion or a stationary portion forming a gap therebetween; and a coating layer provided to a base material of the rotating portion or the stationary portion so that the coating layer faces the seal strips. The coating layer is composed of an abradable layer and a bond coat layer.
摘要翻译：提供了通过牢固地保持基材和耐磨层之间的粘合力进一步减少流体泄漏的密封装置，并且进一步加强了防止流体泄漏。根据本发明的密封装置包括设置在旋转部分或静止部分中的任一个之间形成间隙的密封条; 以及设置在旋转部分或固定部分的基材上的涂层，使得涂层面向密封条。涂层由可磨损层和粘合涂层组成。

33. 发明申请

US20070013471A1 Superconducting coil, method for manufacturing thereof and welding device 审中-公开
标题翻译：超导线圈，其制造方法和焊接装置
公开(公告)号：US20070013471A1
公开(公告)日：2007-01-18
申请号：US11478343
申请日：2006-06-30
申请人： Koichi Minami , Satoru Asai , Yoshinobu Makino , Katsunori Shiihara , Toshio Kanahara
发明人： Koichi Minami , Satoru Asai , Yoshinobu Makino , Katsunori Shiihara , Toshio Kanahara
IPC分类号： H01F27/28 , H01L39/24
CPC分类号： H01F41/048 , B23K26/206 , B23K26/348 , H01F6/06 , Y10T29/49014
摘要： In the method of manufacturing a superconducting coil, a superconducting line coated with an insulating member is contained in a groove formed on a surface of a stainless steel plate, and a stainless steel lid is fitted in outer side of the superconducting line in an opening in the groove. The lid is formed to fit in the groove. Then, the plate and the lid are welded to seal at joint sections. The welding is conducted using a plurality of heat sources including a laser and an arc so that melting depth at the joint section is within a predetermined range. The lid may have two joint sections, and the welding of the joint sections of the lid may be conducted simultaneously. The plate may have a plurality of grooves, and the welding of the joint sections of the lid may be conducted simultaneously.
摘要翻译：在制造超导线圈的方法中，在不锈钢板的表面上形成的沟槽中包含涂覆有绝缘构件的超导线，并且在超导线的外侧的开口内装配有不锈钢盖凹槽盖形成为适合于凹槽。然后，板和盖被焊接以在接合部分处密封。使用包括激光和电弧的多个热源进行焊接，使得接合部的熔融深度在预定范围内。盖可以具有两个接合部分，并且盖的接合部分的焊接可以同时进行。该板可以具有多个槽，并且可以同时进行盖的接合部的焊接。

34. 发明授权

US5979779A Air conditioning system for vehicle 失效
标题翻译：汽车空调系统
公开(公告)号：US5979779A
公开(公告)日：1999-11-09
申请号：US8928
申请日：1998-01-20
申请人： Satoru Asai , Yuji Ito
发明人： Satoru Asai , Yuji Ito
IPC分类号： B60J5/10 , B60H1/00 , F24F7/00 , G05D23/00
CPC分类号： B60H1/0075 , B60H1/00021 , B60H2001/002
摘要： An air conditioning system for a cabin of a vehicle having a rear hatch. The air conditioning system has a sun radiation sensor for detecting a sun radiation amount into a rear part of the cabin and an air conditioning means for providing air conditioning at a rear seat section of the cabin in accordance with the sun radiation amount detected by the sun radiation amount sensor. The sun radiation amount sensor is mounted on the rear hatch in such a manner that the sun radiation sensor moves together with the movement of the rear hatch. A sensor for detecting if the rear hatch is open or closed is provided. A sun radiation amount detected by the sun radiation sensor during a closed condition of the rear hatch is memorized. When it is detected that the rear hatch is opened, the air conditioning, by the air conditioning means of the rear seat section, is done based on the memorized value of the sun radiation amount just before the rear hatch was opened.
摘要翻译：一种用于具有后舱口的车辆舱的空调系统。空调系统具有太阳辐射传感器，用于检测进入车厢后部的太阳辐射量，以及空调装置，用于根据太阳检测到的太阳辐射量在车厢的后座部分处提供空调辐射量传感器太阳辐射量传感器以这样的方式安装在后舱上，使得太阳辐射传感器随着后舱盖的运动而移动。提供用于检测后舱盖是否打开或关闭的传感器。记录在后舱的封闭状态下由太阳辐射传感器检测到的太阳辐射量。当检测到后舱口打开时，通过后座部分的空气调节装置的空调是基于刚好在后舱口打开之前的太阳辐射量的记忆值来完成的。

35. 发明授权

US5418093A Projection exposure method and an optical mask for use in projection exposure 失效
标题翻译：投影曝光方法和用于投影曝光的光学掩模
公开(公告)号：US5418093A
公开(公告)日：1995-05-23
申请号：US201079
申请日：1994-02-24
申请人： Satoru Asai , Isamu Hanyu , Mitsuji Nunokawa
发明人： Satoru Asai , Isamu Hanyu , Mitsuji Nunokawa
IPC分类号： G03F1/00 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70433 , G03F1/36
摘要： A projection exposure method includes the steps of (a) irradiating a light from a light source on an optical mask, where the optical mask includes a main space which transmits light and has a desired exposure pattern, and a subspace which transmits light and is provided adjacent to the main space, and (b) exposing a photoresist layer by the light which is transmitted through the optical mask via a lens so as to project an optical image of the main space, where the subspace has a narrow width such that the light transmitted through the subspace by itself does not expose the photosensitive layer.
摘要翻译：投影曝光方法包括以下步骤：（a）将来自光源的光照射在光学掩模上，其中光学掩模包括透光的主空间并具有期望的曝光图案，以及提供透光的子空间邻近主空间，和（b）通过透镜通过光掩模透射的光使光致抗蚀剂层曝光，以便投影主空间的光学图像，其中子空间具有窄的宽度，使得光透过子空间本身不会使感光层露出。

36. 发明申请

US20110150641A1 STEAM TURBINE AND STEAM TURBINE BLADE 有权
标题翻译：蒸汽涡轮机和蒸汽涡轮叶片
公开(公告)号：US20110150641A1
公开(公告)日：2011-06-23
申请号：US12977548
申请日：2010-12-23
申请人： Akio SAYANO , Masashi Takahashi , Masahiro Saito , Kazuyoshi Nakajima , Tadashi Tanuma , Satoru Asai , Kenji Kamimura
发明人： Akio SAYANO , Masashi Takahashi , Masahiro Saito , Kazuyoshi Nakajima , Tadashi Tanuma , Satoru Asai , Kenji Kamimura
IPC分类号： F01D9/02
CPC分类号： F01D5/286 , C23C18/1208 , F05D2220/31 , F05D2230/90 , F05D2250/60
摘要： A steam turbine 3 includes: a turbine rotor 4; a rotor blade 5 implanted to the turbine rotor 4; a stator blade 6 provided at an upstream side of the rotor blade 5; and a turbine casing 13 supporting the stator blade 6 and including the turbine rotor 4, the rotor blade 5 and the stator blade 6, and have a constitution in which a stage 7 is formed by a pair of the rotor blade 5 and the stator blade 6, and a steam passage 8 is formed by arranging plural stages 7 in an axial direction of the turbine rotor 4. A surface treatment to suppress an increase of a surface roughness caused by oxidation is performed for at least a part of a surface of the stator blade 6 and a surface of the rotor blade 5.
摘要翻译：蒸汽轮机3包括：涡轮机转子4; 植入涡轮转子4的转子叶片5; 设置在转子叶片5的上游侧的定子叶片6; 以及支撑定子叶片6并且包括涡轮转子4，转子叶片5和定子叶片6的涡轮壳体13，并且具有这样的构造，其中阶段7由一对转子叶片5和定子叶片形成并且通过在涡轮机转子4的轴向上配置多个级7来形成蒸汽通道8.为了抑制由氧化引起的表面粗糙度的增加，进行表面处理以至少部分表面粗糙度定子叶片6和转子叶片5的表面。

37. 发明授权

US07371489B2 Photomask, method for detecting pattern defect of the same, and method for making pattern using the same 有权
标题翻译：光掩模，用于检测图案缺陷的方法，以及使用其形成图案的方法
公开(公告)号：US07371489B2
公开(公告)日：2008-05-13
申请号：US11437628
申请日：2006-05-22
申请人： Tomohiko Yamamoto , Satoru Asai
发明人： Tomohiko Yamamoto , Satoru Asai
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F1/84 , G03F1/36 , G06T7/0004 , G06T2207/30148
摘要： There exist a pattern-dense region where patterns having an F-letter shape are dense and a pattern-interspersed region where small rectangular dummy patterns are interspersed. In the pattern-interspersed region, the dummy patterns are arranged in a manner that at least one dummy pattern exists in a scan target range of a mask pattern defect inspecting apparatus. With the dummy patterns formed in the pattern-interspersed region at the intervals as described above, when one scan target range is scanned by the mask pattern defect inspecting apparatus, at least one dummy pattern is included in the scan target range in the pattern-interspersed region. Therefore, mix-up of alignment in this range is prevented from occurring, which makes it possible to perform proper defect inspection.
摘要翻译：存在具有F字母形状的图案是密集的图案密集区域和散布有小矩形虚拟图案的图案散布区域。在图案散布区域中，虚设图案以在掩模图案缺陷检查装置的扫描目标范围内存在至少一个虚拟图案的方式布置。利用如上所述的间隔在图案散布区域中形成的虚拟图案，当通过掩模图案缺陷检查装置扫描一个扫描目标范围时，在图案散布的扫描目标范围中包括至少一个虚拟图案地区。因此，防止了在该范围内的对准混合，这使得可以进行适当的缺陷检查。

38. 发明申请

US20060210930A1 Photomask, method for detecting pattern defect of the same, and method for making pattern using the same 有权
公开(公告)号：US20060210930A1
公开(公告)日：2006-09-21
申请号：US11437628
申请日：2006-05-22
申请人： Tomohiko Yamamoto , Satoru Asai
发明人： Tomohiko Yamamoto , Satoru Asai
IPC分类号： G03C5/00 , G06F17/50
CPC分类号： G03F1/84 , G03F1/36 , G06T7/0004 , G06T2207/30148
摘要： There exist a pattern-dense region where patterns having an F-letter shape are dense and a pattern-interspersed region where small rectangular dummy patterns are interspersed. In the pattern-interspersed region, the dummy patterns are arranged in a manner that at least one dummy pattern exists in a scan target range of a mask pattern defect inspecting apparatus. With the dummy patterns formed in the pattern-interspersed region at the intervals as described above, when one scan target range is scanned by the mask pattern defect inspecting apparatus, at least one dummy pattern is included in the scan target range in the pattern-interspersed region. Therefore, mix-up of alignment in this range is prevented from occurring, which makes it possible to perform proper defect inspection.

39. 发明授权

US07074524B2 Photomask, method for detecting pattern defect of the same, and method for making pattern using the same 失效
标题翻译：光掩模，用于检测图案缺陷的方法，以及使用其形成图案的方法
公开(公告)号：US07074524B2
公开(公告)日：2006-07-11
申请号：US10367859
申请日：2003-02-19
申请人： Tomohiko Yamamoto , Satoru Asai
发明人： Tomohiko Yamamoto , Satoru Asai
IPC分类号： G03F9/00
CPC分类号： G03F1/84 , G03F1/36 , G06T7/0004 , G06T2207/30148
摘要： There exist a pattern-dense region where patterns having an F-letter shape are dense and a pattern-interspersed region where small rectangular dummy patterns are interspersed. In the pattern-interspersed region, the dummy patterns are arranged in a manner that at least one dummy pattern exists in a scan target range of a mask pattern defect inspecting apparatus. With the dummy patterns formed in the pattern-interspersed region at the intervals as described above, when one scan target range is scanned by the mask pattern defect inspecting apparatus, at least one dummy pattern is included in the scan target range in the pattern-interspersed region. Therefore, mix-up of alignment in this range is prevented from occurring, which makes it possible to perform proper defect inspection.
摘要翻译：存在具有F字母形状的图案是密集的图案密集区域和散布有小矩形虚拟图案的图案散布区域。在图案散布区域中，虚设图案以在掩模图案缺陷检查装置的扫描目标范围内存在至少一个虚拟图案的方式布置。利用如上所述的间隔在图案散布区域中形成的虚拟图案，当通过掩模图案缺陷检查装置扫描一个扫描目标范围时，在图案散布的扫描目标范围中包括至少一个虚拟图案地区。因此，防止了在该范围内的对准混合，这使得可以进行适当的缺陷检查。

40. 发明授权

US06045976A Optical exposure method 失效
公开(公告)号：US06045976A
公开(公告)日：2000-04-04
申请号：US734790
申请日：1996-10-25
申请人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
发明人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
IPC分类号： G03F7/20 , G03F7/207 , G03C5/00 , G03F9/00
CPC分类号： G03F7/70566 , G03F7/201 , G03F7/70091 , G03F7/701 , G03F7/70125 , G03F7/70241 , G03F7/70283 , G03F7/70583
摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.

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