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    • 33. 发明申请
    • FRONT CONTACT HETEROJUNCTION PROCESS
    • 前接触异常过程
    • US20160072000A1
    • 2016-03-10
    • US14578216
    • 2014-12-19
    • David D. Smith
    • David D. Smith
    • H01L31/18H01L31/0236H01L31/068H01L31/0368H01L31/0224
    • H01L31/1804H01L31/02363H01L31/0745H01L31/0747H01L31/075H01L31/1872Y02E10/547Y02E10/548Y02P70/521
    • Methods of fabricating solar cells using improved front contact heterojunction processes, and the resulting solar cells, are described. In an example, a solar cell includes a substrate having first and second light-receiving surfaces. A tunnel dielectric layer is disposed on the first and second light-receiving surfaces. An N-type polycrystalline silicon layer is disposed on the portion of the tunnel dielectric layer disposed on the first light-receiving surface. A P-type polycrystalline silicon layer is disposed on the portion of the tunnel dielectric layer disposed on the second light-receiving surface. A transparent conductive oxide layer is disposed on the N-type polycrystalline silicon layer and on the P-type polycrystalline silicon layer. A first set of conductive contacts is disposed on the portion of the transparent conductive oxide layer disposed on the N-type polycrystalline silicon layer. A second set of conductive contacts is disposed on the portion of the transparent conductive oxide layer disposed on the P-type polycrystalline silicon layer.
    • 描述了使用改进的前接触异质结工艺制造太阳能电池的方法,以及所得到的太阳能电池。 在一个示例中,太阳能电池包括具有第一和第二光接收表面的基板。 隧道介电层设置在第一和第二光接收表面上。 N型多晶硅层设置在设置在第一受光面上的隧道介电层的部分上。 P型多晶硅层设置在设置在第二受光面上的隧道介电层的部分上。 在N型多晶硅层和P型多晶硅层上设置透明导电氧化物层。 第一组导电触点设置在设置在N型多晶硅层上的透明导电氧化物层的部分上。 第二组导电触点设置在设置在P型多晶硅层上的透明导电氧化物层的部分上。
    • 35. 发明申请
    • SOLAR CELL EMITTER REGION FABRICATION USING ION IMPLANTATION
    • 太阳能电池发射区使用离子植入制造
    • US20150162483A1
    • 2015-06-11
    • US14562159
    • 2014-12-05
    • Timothy WeidmanDavid D. Smith
    • Timothy WeidmanDavid D. Smith
    • H01L31/18H01L31/0224H01L31/068H01L31/0368
    • H01L31/182H01L31/022441H01L31/035272H01L31/0682H01L31/1864H01L31/1872H01L31/1876Y02E10/546Y02E10/547Y02P70/521
    • Methods of fabricating solar cell emitter regions using ion implantation, and resulting solar cells, are described. In an example, a method of fabricating alternating N-type and P-type emitter regions of a solar cell involves forming a silicon layer above a substrate. Dopant impurity atoms of a first conductivity type are implanted, through a first shadow mask, in the silicon layer to form first implanted regions and resulting in non-implanted regions of the silicon layer. Dopant impurity atoms of a second, opposite, conductivity type are implanted, through a second shadow mask, in portions of the non-implanted regions of the silicon layer to form second implanted regions and resulting in remaining non-implanted regions of the silicon layer. The remaining non-implanted regions of the silicon layer are removed with a selective etch process, while the first and second implanted regions of the silicon layer are annealed to form doped polycrystalline silicon emitter regions.
    • 描述了使用离子注入制造太阳能电池发射极区域的方法,以及所得到的太阳能电池。 在一个示例中,制造太阳能电池的交替的N型和P型发射极区域的方法涉及在衬底上形成硅层。 第一导电类型的掺杂杂质原子通过第一阴影掩模在硅层中注入以形成第一注入区,并产生硅层的非注入区。 通过第二阴影掩模,在硅层的非注入区域的一部分中注入第二相对导电类型的掺杂杂质原子,以形成第二注入区,并产生硅层的剩余未注入区。 通过选择性蚀刻工艺去除硅层的其余非注入区域,同时对硅层的第一和第二注入区域进行退火以形成掺杂的多晶硅发射极区域。