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    • 37. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    • 半导体器件及制造半导体器件的方法
    • US20090065809A1
    • 2009-03-12
    • US12282112
    • 2008-01-04
    • Shinya Yamakawa
    • Shinya Yamakawa
    • H01L29/16H01L27/092H01L21/3205
    • H01L29/66545H01L21/823807H01L21/823814H01L21/823842H01L29/165H01L29/517H01L29/665H01L29/66553H01L29/6656H01L29/6659H01L29/66606H01L29/66621H01L29/66628H01L29/66636H01L29/7848
    • A semiconductor device is provided in which a stress can be effectively applied from a semiconductor layer having a different lattice constant from a semiconductor substrate to a channel part, whereby carrier mobility can be improved and higher functionality can be achieved. In a semiconductor device 1 including a gate electrode 7 provided on a semiconductor substrate 3 via a gate insulating film 5 and semiconductor layers (stress applying layers) 9 formed by epitaxial growth in parts formed by digging down the surface of the semiconductor substrate 3 on both sides of the gate electrode 7, the semiconductor layers 9 are a layer having a different lattice constant from the semiconductor substrate 3, and the gate insulating film 5 and the gate electrode 7 are provided in a state of filling a part formed by digging down the surface of the semiconductor substrate 3 between the semiconductor layers 9. It is supposed that a depth position d2 of the gate insulating film 5 with respect to the surface of the semiconductor substrate 3 is shallower than a depth position d1 of the semiconductor layers 9.
    • 提供一种半导体器件,其中可以从具有从半导体衬底到沟道部分的具有不同晶格常数的半导体层有效地施加应力,由此可以提高载流子迁移率并且可以实现更高的功能。 在包括通过栅极绝缘膜5设置在半导体衬底3上的栅电极7的半导体器件1和通过在两者上挖掘半导体衬底3的表面而形成的部分中的外延生长形成的半导体层(应力施加层)9 栅电极7的侧面,半导体层9是具有与半导体基板3不同的晶格常数的层,并且栅极绝缘膜5和栅电极7以填充通过挖掘形成的部分而形成的部分的状态设置 在半导体层9之间的半导体衬底3的表面。假设栅极绝缘膜5相对于半导体衬底3的表面的深度位置d2比半导体层9的深度位置d1浅。