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    • 35. 发明授权
    • Jet mill
    • 喷射磨
    • US08061636B2
    • 2011-11-22
    • US12926214
    • 2010-11-02
    • Kenzo ItoMasahiro YamamotoEtsuo Yamamoto
    • Kenzo ItoMasahiro YamamotoEtsuo Yamamoto
    • B02C19/06
    • B02C19/061
    • A jet mill in which crushed material introduced into a crushing chamber is comminuted by gas being sprayed from a plurality of gas-jet nozzles, wherein high-efficiency pulverization is performed by optimizing various pulverization conditions according to the type of crushed material or other such properties. The direction in which gas is sprayed into the crushing chamber is variable adjustable; the spraying direction of each nozzle is displaced simultaneously by the electromotive actuator; swirl flow is produced in three dimensions, including the flow of a directional component that is perpendicular to the horizontal swirl flow; and a fine-powder discharge port of a first pulverization chamber and a fine powder introduction port of a second pulverization chamber are communicatingly connected by a ventilation duct.
    • 一种喷射式粉碎机,其中将粉碎材料引入破碎室中的粉碎是由多个气体喷嘴喷射的气体粉碎,其中通过根据粉碎材料的类型或其他这些性质优化各种粉碎条件进行高效粉碎 。 气体喷入破碎室的方向是可变的; 每个喷嘴的喷射方向由电动致动器同时移动; 漩涡流在三个维度上产生,包括垂直于水平涡流的方向分量的流动; 并且第一粉碎室的细粉末排出口和第二粉碎室的细粉末导入口通过通风管连通。
    • 39. 发明申请
    • THIN FILM FORMING METHOD AND FILM FORMING APPARATUS
    • 薄膜成型方法和薄膜成型装置
    • US20110117279A1
    • 2011-05-19
    • US12918275
    • 2009-02-17
    • Yasuharu ShinokawaKazuyoshi HondaYuma KamiyamaMasahiro YamamotoTomofumi Yanagi
    • Yasuharu ShinokawaKazuyoshi HondaYuma KamiyamaMasahiro YamamotoTomofumi Yanagi
    • B05D3/00C23C14/50
    • C23C14/562C23C14/24C23C14/541C23C16/466
    • A thin film forming apparatus (100) includes: a vacuum chamber (1); a substrate transfer mechanism (40) that is provided in the vacuum chamber (1) and feeds an elongated substrate (8) to a predetermined film forming section (4) that faces a film forming source (27); an endless belt (10) capable of moving in accordance with the feeding of the substrate (8) by the substrate transfer mechanism (40), and configured to define, along an outer peripheral surface of the endless belt itself, a transfer path of the substrate (8) in the film forming section (4) so that a thin film is formed on a surface of the substrate (8) that is being transferred linearly; a through-hole (16) formed in the endless belt (10); and a substrate cooling unit (30) for introducing a cooling gas between the endless belt (10) and a back surface of the substrate (8) through the through-hole (16) from a side of an inner peripheral surface of the endless belt (10) that is moving.
    • 薄膜形成装置(100)包括:真空室(1); 设置在所述真空室(1)中并将细长基板(8)供给到面向成膜源(27)的预定成膜部分(4)的基板传送机构(40); 能够根据基板传送机构(40)进给基板(8)而移动的环状带(10),并且被构造成沿着环状带本身的外周面限定出传送路径 在成膜部(4)中形成基板(8),使得在被直线转印的基板(8)的表面上形成薄膜; 形成在环形带(10)中的通孔(16); 以及基板冷却单元(30),用于通过所述通孔(16)从所述环形带(10)的内周面的一侧在所述环形带(10)和所述基板(8)的背面之间引入冷却气体, (10)正在移动。