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31. 发明申请

US20140063502A1 Image Intensifier Tube Design for Aberration Correction and Ion Damage Reduction 有权
标题翻译：图像增强管设计用于畸变校正和离子损伤减少
公开(公告)号：US20140063502A1
公开(公告)日：2014-03-06
申请号：US13957890
申请日：2013-08-02
申请人： KLA-Tencor Corporation
发明人： Ximan Jiang , Qing Li , Stephen Biellak
IPC分类号： H01J40/16
CPC分类号： H01J40/16 , H01J31/50
摘要： The disclosure is directed to image intensifier tube designs for field curvature aberration correction and ion damage reduction. In some embodiments, electrodes defining an acceleration path from a photocathode to a scintillating screen are configured to provide higher acceleration for off-axis electrons along at least a portion of the acceleration path. Off-axis electrons and on-axis electrons are accordingly focused on the scintillating screen with substantial uniformity to prevent or reduce field curvature aberration. In some embodiments, the electrodes are configured to generate a repulsive electric field near the scintillating screen to prevent secondary electrons emitted or deflected by the scintillating screen from flowing towards the photocathode and forming damaging ions.
摘要翻译：本发明涉及用于场曲率像差校正和离子损伤降低的图像增强管设计。在一些实施例中，限定从光电阴极到闪烁屏幕的加速路径的电极被配置为沿着加速路径的至少一部分为离轴电子提供更高的加速度。因此，离轴电子和轴上电子聚焦在闪烁屏上，具有大致均匀性以防止或减小场曲率像差。在一些实施例中，电极被配置为在闪烁屏幕附近产生排斥电场，以防止由闪烁屏幕发射或偏转的二次电子朝向光电阴极流动并形成有害离子。

32. 发明申请

US20130250385A1 Laser with Integrated Multi Line or Scanning Beam Capability 有权
标题翻译：具有集成多线或扫描光束能力的激光
公开(公告)号：US20130250385A1
公开(公告)日：2013-09-26
申请号：US13845587
申请日：2013-03-18
申请人： KLA-TENCOR CORPORATION
发明人： Christian Wolters , Jijen Vazhaeparambil , Dirk Woll , Anatoly Romanovsky , Bret Whiteside , Stephen Biellak , Guoheng Zhao
IPC分类号： G02B27/10 , G02B26/10 , G02F1/35 , G02F1/01
CPC分类号： G02B27/1006 , G02B26/10 , G02B26/106 , G02F1/0105 , G02F1/353 , G03F7/7065 , H01S3/0071 , H01S3/0092
摘要： A method and system for providing illumination is disclosed. The method may include providing a laser having a predetermined wavelength; performing at least one of: beam splitting or beam scanning prior to a frequency conversion; converting a frequency of each output beam of the at least one of: beam splitting or beam scanning; and providing the frequency converted output beam for illumination.
摘要翻译：公开了一种用于提供照明的方法和系统。该方法可以包括提供具有预定波长的激光; 在频率转换之前进行光束分割或光束扫描中的至少一个; 转换以下至少一个的每个输出光束的频率：分束或光束扫描; 并提供用于照明的频率转换输出光束。

33. 发明授权

US10690599B1 Radiation-induced false count mitigation and detector cooling 有权
公开(公告)号：US10690599B1
公开(公告)日：2020-06-23
申请号：US16170954
申请日：2018-10-25
申请人： KLA-Tencor Corporation
发明人： Stephen Biellak , Tyler Trytko
IPC分类号： G01N21/88 , G01T1/24 , G01N21/95
摘要： An inspection system with radiation-induced false count mitigation includes an illumination source configured to illuminate a sample and a liquid-cooling coincidence detector, which includes an illumination detector to detect illumination from the sample, a liquid-cooling device for regulating a temperature of the illumination detector via a liquid, and photodetectors to detect light generated in the liquid in response to particle radiation. The liquid-cooling coincidence detector may also include controllers to identify a set of illumination detection events based on an illumination signal received from the illumination detector, identify a set of radiation detection events based on radiation signals received from the photodetectors, compare the set of radiation detection events to the set of illumination detection events to identify a set of coincidence events, and exclude the set of coincidence events from the set of illumination detection events to generate a set of identified features on the sample.

34. 发明授权

US09841512B2 System and method for reducing radiation-induced false counts in an inspection system 有权
公开(公告)号：US09841512B2
公开(公告)日：2017-12-12
申请号：US14946563
申请日：2015-11-19
申请人： KLA-Tencor Corporation
发明人： Ximan Jiang , Anatoly Romanovsky , Christian Wolters , Stephen Biellak , Mous Tatarkhanov
IPC分类号： G01T1/24 , G01N21/95
CPC分类号： G01T1/24 , G01N21/9501
摘要： An inspection system with radiation-induced false count mitigation includes an illumination source configured to illuminate a sample, a detector assembly comprising an illumination sensor configured to detect illumination from the sample, and one or more radiation sensors configured to detect particle radiation, and control circuitry communicatively coupled to the detector. The control circuitry is configured to perform the steps of determining a set of radiation detection events based on one or more radiation signals received from the radiation sensors, determining a set of imaging events based on the illumination signal received from the illumination sensor, comparing the set of radiation detection events to the set of imaging events to generate a set of coincidence events, wherein the set of coincidence events comprises simultaneous imaging and radiation detection events, and excluding the set of coincidence events from the set of imaging events to generate a set of identified defect sites.

35. 发明授权

US09404873B2 Wafer inspection with multi-spot illumination and multiple channels 有权
标题翻译：晶圆检测采用多点照明和多通道
公开(公告)号：US09404873B2
公开(公告)日：2016-08-02
申请号：US13783290
申请日：2013-03-02
申请人： KLA-Tencor Corporation
发明人： Stephen Biellak , Mehdi Vaez-Iravani
IPC分类号： G01N21/88 , G01N21/95
CPC分类号： G01N21/8806 , G01N21/9501
摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to illuminate a set of spots on a wafer and a collection subsystem configured to collect light from the set of spots. The collection subsystem separately images the light collected from each of the individual spots onto only a corresponding first detector of a first detection subsystem. The collection subsystem also images the light collected from at least some of the individual spots onto a number of second detectors of a second detection subsystem that is less than a number of spots in the set. Output produced by the first and second detectors can be used to detect defects on the wafer.
摘要翻译：提供了配置用于检查晶片的系统。一个系统包括被配置为照亮晶片上的一组斑点的照明子系统和被配置为收集该组斑点的光的收集子系统。收集子系统将从每个单个斑点收集的光分别成像到第一检测子系统的对应的第一检测器上。收集子系统还将从至少一些单个点收集的光成像到第二检测子系统的多个第二检测器，该第二检测子系统小于集合中的多个点。由第一和第二检测器产生的输出可用于检测晶片上的缺陷。

36. 发明授权

US09182358B2 Multi-spot defect inspection system 有权
标题翻译：多点缺陷检测系统
公开(公告)号：US09182358B2
公开(公告)日：2015-11-10
申请号：US13834662
申请日：2013-03-15
申请人： KLA-Tencor Corporation
发明人： Zhiwei Xu , Christian Wolters , Juergen Reich , Bret Whiteside , Guoheng Zhao , Jijen Vazhaeparambil , Stephen Biellak , Sam Shamouilian , Mehdi Vaez-Iravani
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956
CPC分类号： G01N21/9501 , G01N21/956
摘要： The disclosure is directed to a system and method for inspecting a spinning sample by substantially simultaneously scanning multiple spots on a surface of the sample utilizing a plurality of illumination beams. Portions of illumination reflected, scattered, or radiated from respective spots on the surface of the sample are collected by at least one detector array. Information associated with at least one defect of the sample is determined by at least one computing system in communication with the detector array. According to various embodiments, at least one of scan pitch, spot size, spot separation, and spin rate is controlled to compensate pitch error due to tangential spot separation.
摘要翻译：本公开涉及一种用于通过基本上同时使用多个照明光束扫描样品表面上的多个点来检查纺丝样品的系统和方法。通过至少一个检测器阵列收集从样品表面上的各个点反射，散射或辐射的照射部分。与样品的至少一个缺陷相关联的信息由与检测器阵列通信的至少一个计算系统确定。根据各种实施例，控制扫描间距，光斑尺寸，光点分离和旋转速率中的至少一个以补偿由于切点分离引起的俯仰误差。

37. 发明申请

US20140118729A1 Illumination Energy Management in Surface Inspection 有权
标题翻译：表面检查照明能源管理
公开(公告)号：US20140118729A1
公开(公告)日：2014-05-01
申请号：US13662626
申请日：2012-10-29
申请人： KLA-Tencor Corporation
发明人： Christian Wolters , Aleksey Petrenko , Kurt L. Haller , Juergen Reich , Zhiwei Xu , Stephen Biellak , George J. Kren
IPC分类号： G01N21/95
CPC分类号： G01N21/8806 , F21V23/003 , G01N21/9501 , G01N2021/8835
摘要： The disclosure is directed to a system and method of managing illumination energy applied to illuminated portions of a scanned wafer to mitigate illumination-induced damage without unnecessarily compromising SNR of an inspection system. The wafer may be rotated at a selected spin frequency for scanning wafer defects utilizing the inspection system. Illumination energy may be varied over at least one scanned region of the wafer as a function of radial distance of an illuminated portion from the center of the wafer and the selected spin frequency of the wafer. Illumination energy may be further applied constantly over one or more scanned regions of the wafer beyond a selected distance from the center of the wafer.
摘要翻译：本公开涉及一种管理照射能量的系统和方法，所述照明能量施加到被扫描的晶片的照明部分，以减轻照射诱发的损伤，而不会不必要地损害检查系统的信噪比。可以以选定的旋转频率旋转晶片，以利用检查系统扫描晶片缺陷。照射能量可以在晶片的至少一个扫描区域上作为照射部分离晶片中心的径向距离和晶片的选定旋转频率的函数而变化。照明能量可以进一步在晶片的一个或多个扫描区域上恒定地超过距离晶片中心的选定距离。

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