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31. 发明授权

US08679987B2 Deposition of an amorphous carbon layer with high film density and high etch selectivity 有权
标题翻译：沉积具有高膜密度和高蚀刻选择性的无定形碳层
公开(公告)号：US08679987B2
公开(公告)日：2014-03-25
申请号：US13468776
申请日：2012-05-10
申请人： Patrick Reilly , Shahid Shaikh , Tersem Summan , Deenesh Padhi , Sanjeev Baluja , Juan Carlos Rocha-Alvarez , Thomas Nowak , Bok Hoen Kim , Derek R. Witty
发明人： Patrick Reilly , Shahid Shaikh , Tersem Summan , Deenesh Padhi , Sanjeev Baluja , Juan Carlos Rocha-Alvarez , Thomas Nowak , Bok Hoen Kim , Derek R. Witty
IPC分类号： H01L21/47 , H01L21/312
CPC分类号： H01L21/02527 , C23C16/26 , C23C16/56 , H01L21/02115 , H01L21/02274 , H01L21/02348 , H01L21/02592 , H01L21/0262 , H01L21/31144
摘要： Embodiments described herein relate to a method for processing a substrate. In one embodiment, the method includes introducing a gas mixture comprising a hydrocarbon source and a diluent gas into a deposition chamber located within a processing system, generating a plasma from the gas mixture in the deposition chamber at a temperature between about 200° C. and about 700° C. to form a low-hydrogen content amorphous carbon layer on the substrate, transferring the substrate into a curing chamber located within the processing system without breaking vacuum, and exposing the substrate to UV radiation within the curing chamber at a curing temperature above about 200° C.
摘要翻译：本文所述的实施例涉及一种用于处理衬底的方法。在一个实施方案中，该方法包括将包含烃源和稀释气体的气体混合物引入位于处理系统内的沉积室中，在沉积室中从约200℃至约200℃的温度和约700℃以在基底上形成低氢含量的无定形碳层，将基底转移到位于处理系统内的固化室中，而不破坏真空，并在固化温度下将基底暴露于固化室内的UV辐射高于约200℃

32. 发明申请

US20090305515A1 METHOD AND APPARATUS FOR UV CURING WITH WATER VAPOR 审中-公开
标题翻译：紫外线固化用水蒸气的方法和装置
公开(公告)号：US20090305515A1
公开(公告)日：2009-12-10
申请号：US12134413
申请日：2008-06-06
申请人： Dustin Ho , Scott Hendrickson , Juan Carlos Rocha-Alvarez , Sanjeev Baluja , Thomas Nowak
发明人： Dustin Ho , Scott Hendrickson , Juan Carlos Rocha-Alvarez , Sanjeev Baluja , Thomas Nowak
IPC分类号： H01L21/31 , H01L21/00 , C23C16/00
CPC分类号： H01L21/76224 , H01L21/02164 , H01L21/3105
摘要： Embodiments of the invention generally relate to a method and apparatus for curing dielectric material deposited in trenches or gaps in the surface of a substrate to produce a feature free of voids and seams. In one embodiment, the dielectric material is steam annealed while being exposed to ultraviolet radiation. In one embodiment, the dielectric material is further thermally annealed in a nitrogen environment.
摘要翻译：本发明的实施方案一般涉及用于固化沉积在基板表面中的沟槽或间隙中的电介质材料以产生无空隙和接缝的特征的方法和装置。在一个实施例中，电介质材料在暴露于紫外线辐射的同时进行蒸汽退火。在一个实施例中，电介质材料在氮气环境中进一步热退火。

33. 发明申请

US20100096569A1 ULTRAVIOLET-TRANSMITTING MICROWAVE REFLECTOR COMPRISING A MICROMESH SCREEN 审中-公开
标题翻译：包含MICROMESH屏幕的超紫外线发射微波反射器
公开(公告)号：US20100096569A1
公开(公告)日：2010-04-22
申请号：US12255578
申请日：2008-10-21
申请人： Tuan Anh Nguyen , Yao-Hung Yang , Sanjeev Baluja , Thomas Nowak , Juan Carlos Rocha-Alvarez
发明人： Tuan Anh Nguyen , Yao-Hung Yang , Sanjeev Baluja , Thomas Nowak , Juan Carlos Rocha-Alvarez
IPC分类号： H01J1/52 , C25D5/02 , C25D1/00
CPC分类号： C25D5/022 , C25D1/08
摘要： An ultraviolet-transmitting microwave reflector for a substrate processing chamber, comprises a micromesh screen extending across the metallic frame. In one version, the micromesh screen comprises at least one electroformed layer. A method of fabricating the microwave reflector comprises electroforming a metallic frame surrounding a micromesh screen such that the micromesh screen comprises an open area of greater than 80% of the total area.
摘要翻译：用于基板处理室的紫外线透射微波反射器包括跨过金属框架延伸的微镜屏幕。在一个版本中，微镜屏幕包括至少一个电铸层。制造微波反射器的方法包括电铸微型屏幕周围的金属框架，使得微型屏幕包括大于总面积的80％的开放面积。

34. 发明授权

US07554103B2 Increased tool utilization/reduction in MWBC for UV curing chamber 有权
标题翻译：增加UV固化室的MWBC工具利用/减少
公开(公告)号：US07554103B2
公开(公告)日：2009-06-30
申请号：US11562043
申请日：2006-11-21
申请人： Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Andrzej Kaszuba , Ndanka O. Mukuti
发明人： Juan Carlos Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Andrzej Kaszuba , Ndanka O. Mukuti
IPC分类号： G21G1/00
CPC分类号： F27B17/0025 , H01L21/67115
摘要： A pump liner is used to direct a laminar flow of purge gas across a workpiece to remove contaminants or species outgassed or otherwise produced by the workpiece during processing. The pump liner can take the form of a ring having a plurality of injection ports, such as slits of a variety of shapes and/or sizes, opposite a plurality of receiving ports in order to provide the laminar flow. The flow of purge gas is sufficient to carry a contaminant or outgassed species from the processing chamber in order to prevent the collection of the contaminants on components of the chamber. The pump liner can be heated, via conduction and irradiation from a radiation source, for example, in order to prevent the condensation of species on the liner. The pump liner also can be anodized or otherwise processed in order to increase the emissivity of the liner.
摘要翻译：泵衬套用于引导吹扫气体的层流穿过工件以去除在加工过程中由工件脱气或以其它方式产生的污染物或物质。泵衬套可以采取具有多个注入口的环的形式，例如与多个接收端口相对的各种形状和/或尺寸的狭缝，以提供层流。吹扫气体的流动足以承载来自处理室的污染物或去气物质，以便防止在室的部件上收集污染物。可以通过例如辐射源的传导和辐射来加热泵衬垫，以防止物质在衬套上的冷凝。泵衬垫也可以被阳极化处理或以其它方式加工，以便增加衬套的发射率。

35. 发明授权

US07572337B2 Blocker plate bypass to distribute gases in a chemical vapor deposition system 有权
标题翻译：阻挡板旁路以在化学气相沉积系统中分配气体
公开(公告)号：US07572337B2
公开(公告)日：2009-08-11
申请号：US11131010
申请日：2005-05-16
申请人： Juan Carlos Rocha-Alvarez , Ganesh Balasubramanian , Tom K. Cho , Deenesh Padhi , Thomas Nowak , Bok Hoen Kim , Hichem M'Saad , Daemian Raj
发明人： Juan Carlos Rocha-Alvarez , Ganesh Balasubramanian , Tom K. Cho , Deenesh Padhi , Thomas Nowak , Bok Hoen Kim , Hichem M'Saad , Daemian Raj
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/45574 , C23C16/4405 , C23C16/45565 , H01J37/3244 , H01J37/32449
摘要： Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed therethrough and a blocker plate having both a plurality of apertures disposed therethrough and a plurality of feed through passageways disposed therein. A first gas pathway delivers a first gas through the plurality of apertures in the blocker plate and the gas distribution plate. A bypass gas pathway delivers a second gas through the plurality of feed through passageways in the blocker plate and to areas around the blocker plate prior to the second gas passing through the gas distribution plate.
摘要翻译：公开了将气体分配到处理室中的装置和方法。在一个实施例中，该装置包括一个气体分配板，该气体分配板具有穿过其中的多个孔，以及一个阻挡板，其具有设置在其间的多个孔和设置在其中的多个进给通道。第一气体通道通过阻挡板和气体分配板中的多个孔传送第一气体。旁路气体通道在第二气体通过气体分配板之前，通过多个进料通过阻挡板中的通道和阻塞板周围的区域输送第二气体。

36. 发明授权

US08884524B2 Apparatus and methods for improving reliability of RF grounding 有权
标题翻译：提高射频接地可靠性的装置和方法
公开(公告)号：US08884524B2
公开(公告)日：2014-11-11
申请号：US13302012
申请日：2011-11-22
申请人： Jianhua Zhou , Dale R. Du Bois , Mohamad A. Ayoub , Juan Carlos Rocha-Alvarez
发明人： Jianhua Zhou , Dale R. Du Bois , Mohamad A. Ayoub , Juan Carlos Rocha-Alvarez
IPC分类号： H05B31/26 , H01J37/32
CPC分类号： H01J37/32091 , H01J37/32577
摘要： Embodiments of the present invention provide an RF conducting rod comprising a hollow portion. Particularly, the RF conducting rod comprises an elongated hollow body having a sidewall enclosing an inner volume, a first solid connector extending from a first end of the elongated hollow body, and a second solid connector extending from a second end of the elongated hollow body. Each of the elongated hollow body, the first solid connector and the second solid connector is formed from an electrically conductive material.
摘要翻译：本发明的实施例提供一种包括中空部分的RF导电棒。特别地，RF导杆包括细长的中空本体，其具有封闭内部容积的侧壁，从细长中空体的第一端延伸的第一固体连接器和从细长中空体的第二端延伸的第二固体连接器。每个细长的中空体，第一固体连接器和第二固体连接器由导电材料形成。

37. 发明申请

US20130126206A1 APPARATUS AND METHODS FOR IMPROVING RELIABILITY OF RF GROUNDING 有权
标题翻译：改善射频接地可靠性的装置和方法
公开(公告)号：US20130126206A1
公开(公告)日：2013-05-23
申请号：US13302012
申请日：2011-11-22
申请人： Jianhua Zhou , Dale R. Du Bois , Mohamad A. Ayoub , Juan Carlos Rocha-Alvarez
发明人： Jianhua Zhou , Dale R. Du Bois , Mohamad A. Ayoub , Juan Carlos Rocha-Alvarez
IPC分类号： H02G3/04
CPC分类号： H01J37/32091 , H01J37/32577
摘要： Embodiments of the present invention provide an RF conducting rod comprising a hollow portion. Particularly, the RF conducting rod comprises an elongated hollow body having a sidewall enclosing an inner volume, a first solid connector extending from a first end of the elongated hollow body, and a second solid connector extending from a second end of the elongated hollow body. Each of the elongated hollow body, the first solid connector and the second solid connector is formed from an electrically conductive material.
摘要翻译：本发明的实施例提供一种包括中空部分的RF导电棒。特别地，RF导杆包括细长的中空本体，其具有封闭内部容积的侧壁，从细长中空体的第一端延伸的第一固体连接器和从细长中空体的第二端延伸的第二固体连接器。每个细长的中空体，第一固体连接器和第二固体连接器由导电材料形成。

38. 发明申请

US20090314211A1 BIG FOOT LIFT PIN 审中-公开
标题翻译：大脚提升针
公开(公告)号：US20090314211A1
公开(公告)日：2009-12-24
申请号：US12483845
申请日：2009-06-12
申请人： Dale R. Du Bois , Mark A. Fodor , Karthik Janakiraman , Juan Carlos Rocha-Alvarez
发明人： Dale R. Du Bois , Mark A. Fodor , Karthik Janakiraman , Juan Carlos Rocha-Alvarez
IPC分类号： C23C16/458 , B23Q1/44
CPC分类号： H01L21/68742
摘要： Embodiments described herein generally provide a lift pin assembly having increased wafer placement accuracy, repeatability, reliability, and corrosion resistance. In one embodiment, a lift pin assembly for positioning a substrate relative to a substrate support is provided. The lift pin assembly comprises a lift pin comprising a pin shaft, a pin head coupled with a first end of the pin shaft for supporting the substrate, and a shoulder coupled with a second end of the pin shaft. The lift pin assembly further comprises a cylindrical body slidably coupled with the pin shaft and a locking pin for preventing the cylindrical body from sliding along the shaft, wherein the shoulder has a through-hole dimensioned to accommodate the locking pin.
摘要翻译：本文描述的实施例通常提供具有增加的晶片放置精度，重复性，可靠性和耐腐蚀性的提升销组件。在一个实施例中，提供了一种用于相对于衬底支撑件定位衬底的提升销组件。提升销组件包括提升销，该提升销包括销轴，与销轴的第一端联接以支撑衬底的销头，以及与销轴的第二端联接的肩部。提升销组件还包括与销轴可滑动地连接的圆柱形主体和用于防止圆柱形主体沿着轴滑动的锁定销，其中肩部具有尺寸适于容纳锁定销的通孔。

39. 发明申请

US20130177706A1 METHOD FOR SEASONING UV CHAMBER OPTICAL COMPONENTS TO AVOID DEGRADATION 审中-公开
标题翻译：用于分解紫外线光学元件以避免降解的方法
公开(公告)号：US20130177706A1
公开(公告)日：2013-07-11
申请号：US13719047
申请日：2012-12-18
申请人： Sanjeev Baluja , Alexandros T. Demos , Bo Xie , Juan Carlos Rocha-Alvarez
发明人： Sanjeev Baluja , Alexandros T. Demos , Bo Xie , Juan Carlos Rocha-Alvarez
IPC分类号： B05D3/06
CPC分类号： B05D3/066 , C23C16/4404 , C23C16/4405
摘要： Methods for depositing a carbon-based seasoning layer on exposed surfaces of the optical components within a UV processing chamber are disclosed. In one embodiment, the method includes flowing a carbon-containing precursor radially inwardly across exposed surfaces of optical components within the thermal processing chamber from a circumference of the optical components, exposing the carbon-containing precursor to a thermal radiation emitted from a heating source to form a carbon-based seasoning layer on the exposed surfaces of the optical components, exposing the carbon-based seasoning layer to ozone, wherein the ozone is introduced into the processing chamber by flowing the ozone radially inwardly across exposed surfaces of optical components from the circumference of the optical components, heating the optical components to a temperature of about 400° C. or above while flowing the ozone to remove the carbon-based seasoning layer from exposed surfaces of the optical components.
摘要翻译：公开了在UV处理室内的光学部件的暴露表面上沉积碳基调味剂层的方法。在一个实施例中，该方法包括使含碳前驱体从光学部件的圆周径向向内流过热处理室内的光学部件的暴露表面，将含碳前体暴露于从加热源发射的热辐射至在光学部件的暴露表面上形成碳基调味剂层，将碳基调味剂层暴露于臭氧，其中臭氧通过径向向内流过来自圆周的光学部件的暴露表面而将臭氧引入处理室的光学部件，将光学部件加热至约400℃以上的温度，同时使臭氧流动，以从光学部件的露出表面除去碳基调味剂层。

40. 发明申请

US20120132618A1 METHOD AND APPARATUS FOR MODULATING WAFER TREATMENT PROFILE IN UV CHAMBER 有权
标题翻译：用于调节UV室中的水处理轮廓的方法和装置
公开(公告)号：US20120132618A1
公开(公告)日：2012-05-31
申请号：US13301558
申请日：2011-11-21
申请人： SANJEEV BALUJA , Juan Carlos Rocha-Alvarez , Alexandros T. Demos
发明人： SANJEEV BALUJA , Juan Carlos Rocha-Alvarez , Alexandros T. Demos
IPC分类号： C23F1/08 , G02B5/22 , C23F1/00 , C23C16/48 , C08J7/18
CPC分类号： G02B5/22 , G02B5/208 , H01L21/67115
摘要： A method and apparatus for providing a uniform UV radiation irradiance profile across a surface of a substrate is provided. In one embodiment, a substrate processing tool includes a processing chamber defining a processing region, a substrate support for supporting a substrate within the processing region, an ultraviolet (UV) radiation source spaced apart from the substrate support and configured to transmit ultraviolet radiation toward the substrate positioned on the substrate support, and a light transmissive window positioned between the UV radiation source and the substrate support, the light transmissive window having an optical film layer coated thereon. In one example, the optical film layer has a non-uniform thickness profile in a radial direction, wherein a thickness of the optical film layer at the peripheral area of the light transmissive window is relatively thicker than at the center region of the optical film layer.
摘要翻译：提供了一种用于在衬底的表面上提供均匀的UV辐射辐照度分布的方法和装置。在一个实施例中，衬底处理工具包括限定处理区域的处理室，用于支撑处理区域内的衬底的衬底支撑件，与衬底支撑件间隔开并且被配置成向衬底支撑件发射紫外线辐射的紫外线（UV）辐射源位于基板支撑件上的基板和位于UV辐射源和基板支撑件之间的透光窗口，透光窗口具有涂覆在其上的光学膜层。在一个示例中，光学膜层在径向上具有不均匀的厚度分布，其中在透光窗的周边区域处的光学膜层的厚度比在光学膜层的中心区域处的厚度更厚。

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