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31. 发明授权

US07815738B2 Deposition tool cleaning process having a moving plasma zone 有权
标题翻译：具有移动等离子体区域的沉积工具清洁工艺
公开(公告)号：US07815738B2
公开(公告)日：2010-10-19
申请号：US11459819
申请日：2006-07-25
申请人： Ignacio Blanco , Jin Zhao , Nathan Kruse
发明人： Ignacio Blanco , Jin Zhao , Nathan Kruse
IPC分类号： C23C16/455 , H01L21/306
CPC分类号： H01J37/32082 , B08B7/0035 , C23C16/4405 , H01J2237/335 , Y10S438/905
摘要： The present invention provides, in one embodiment, a process for cleaning a deposition chamber (100). The process includes a step (100) of forming a reactive plasma cleaning zone by dissociating a gaseous fluorocompound introduced into a deposition chamber having an interior surface and in a presence of a plasma. The process (100) further includes a step (120) of ramping a flow rate of said gaseous fluorocompound to move the reactive plasma cleaning zone throughout the deposition chamber, thereby preventing a build-up of localized metal compound deposits on the interior surface. Other embodiments advantageously incorporate the process (100) into a system (200) for cleaning a deposition chamber (205) and a method of manufacturing semiconductor devices (300).
摘要翻译：在一个实施例中，本发明提供了一种用于清洁沉积室（100）的方法。该方法包括通过使引入到具有内表面并且存在等离子体的沉积室中的气态氟化合物离解形成反应性等离子体清洗区的步骤（100）。方法（100）还包括使所述气体氟化合物的流速升高以使整个沉积室中的反应性等离子体清洗区域移动的步骤（120），从而防止局部金属化合物沉积在内表面上。其他实施例有利地将工艺（100）并入到用于清洁沉积室（205）的系统（200）和制造半导体器件（300）的方法中。

32. 发明申请

US20100093937A1 POLAR GROUP FUNCTIONALIZED CO-POLYMERS 审中-公开
标题翻译：极性基团官能化聚合物
公开(公告)号：US20100093937A1
公开(公告)日：2010-04-15
申请号：US12515597
申请日：2007-11-12
申请人： Hoang T. Pham , Richard F. Fibiger , Eddy I. Garcia-Meitin , Jin Zhao
发明人： Hoang T. Pham , Richard F. Fibiger , Eddy I. Garcia-Meitin , Jin Zhao
IPC分类号： C08L23/08 , C08F210/02 , C08F8/00 , C08F8/32
CPC分类号： C08L23/0815 , B82Y30/00 , C08F255/02 , C08F287/00 , C08J5/005 , C08J2323/14 , C08L23/06 , C08L23/12 , C08L23/142 , C08L23/16 , C08L51/003 , C08L51/006 , C08L51/06 , C08L2666/24 , C08L2666/06 , C08L2666/02 , C08L2666/04
摘要： The invention relates to a polar group functionalized copolymer useful to prepare a nanocomposite polymer and to the nanocomposite polymer, wherein the polar group functionalized copolymer useful to prepare a nanocomposite polymer and the nanocomposite polymer are as defined in the specification.
摘要翻译：本发明涉及可用于制备纳米复合材料聚合物和纳米复合材料聚合物的极性基团官能化共聚物，其中可用于制备纳米复合材料聚合物的极性基官能化共聚物和纳米复合材料聚合物如本说明书中所定义。

33. 发明申请

US20090099048A1 FUNCTIONAL FLUID COMPOSITION FOR IMPROVING LUBRICITY OF A BRAKING SYSTEM 审中-公开
标题翻译：用于改善制动系统润滑性的功能性流体组合物
公开(公告)号：US20090099048A1
公开(公告)日：2009-04-16
申请号：US12249174
申请日：2008-10-10
申请人： Jin Zhao , Kenn L. Bouchard , Tina M. Killebrew
发明人： Jin Zhao , Kenn L. Bouchard , Tina M. Killebrew
IPC分类号： C10M139/00 , C10M137/04 , C10M133/40 , C10M139/04 , C10M129/18
CPC分类号： C10M129/18 , C10M133/40 , C10M137/04 , C10M139/00 , C10M139/04 , C10M169/044 , C10M2201/087 , C10M2207/022 , C10M2207/046 , C10M2207/127 , C10M2209/104 , C10M2209/1045 , C10M2209/107 , C10M2209/108 , C10M2215/042 , C10M2215/223 , C10M2223/04 , C10M2223/041 , C10M2227/061 , C10M2229/041 , C10N2230/06 , C10N2240/08 , C10M2209/1085
摘要： The functional fluids of the present invention comprise about 50 parts by weight to about 99 parts by weight of a glycol component and about 0.3 parts by weight to about 10 parts by weight of one or more additives including a phosphate content. Desirably, in one aspect of this invention, the functional fluid composition exhibits an average scar width according to ASTM D 2670 (100 lb break-in for 1 min, 200 lb load for 30 minutes) that ranges from about 0.05 mm to about 0.45 mm, an average tooth count according to ASTM D 2670 (100 lb break-in for 1 min, 200 lb load for 30 minutes) of less than about 15, or both.
摘要翻译：本发明的功能性流体包含约50重量份至约99重量份的二醇组分和约0.3重量份至约10重量份的一种或多种包括磷酸盐含量的添加剂。理想地，在本发明的一个方面，功能性流体组合物根据ASTM D 2670（100磅断裂1分钟，200磅载荷30分钟）显示平均瘢痕宽度，其范围为约0.05mm至约0.45mm ，根据ASTM D 2670（100磅断裂1分钟，200分钟负荷30分钟）的平均齿数小于约15，或两者均匀。

34. 发明申请

US20080146043A1 METHOD FOR MANUFACTURING AN ISOLATION STRUCTURE USING AN ENERGY BEAM TREATMENT 有权
标题翻译：使用能量束处理制造隔离结构的方法
公开(公告)号：US20080146043A1
公开(公告)日：2008-06-19
申请号：US11610758
申请日：2006-12-14
申请人： Puneet Kohli , Manoj Mehrotra , Jin Zhao , Sameer Ajmera
发明人： Puneet Kohli , Manoj Mehrotra , Jin Zhao , Sameer Ajmera
IPC分类号： H01L21/00
CPC分类号： H01L21/3105 , H01L21/76224 , H01L21/823412 , H01L21/823481 , H01L21/823807 , H01L21/823878 , H01L29/6656 , H01L29/6659 , H01L29/7843 , H01L29/7846
摘要： The invention provides a method for manufacturing a semiconductor device. The method for manufacturing the semiconductor device, among others, may include forming one or more layers of material within an opening in a substrate, the opening and the one or more layers forming at least a portion of an isolation structure, and subjecting at least one of the one or more layers to an energy beam treatment, the energy beam treatment configured to change a stress of the one or more layers subjected thereto, and thus change a stress in the substrate.
摘要翻译：本发明提供一种制造半导体器件的方法。用于制造半导体器件的方法尤其可以包括在衬底的开口内形成一层或多层材料，所述开口和所述一层或多层形成隔离结构的至少一部分，并使至少一层的能量束处理，所述能量束处理被配置为改变受其影响的一个或多个层的应力，从而改变衬底中的应力。

35. 发明申请

US20070213339A1 Quinolone Carboxylic Acid Derivatives for Treatment of Hyperproliferative Conditions 审中-公开
标题翻译：喹诺酮羧酸衍生物治疗过度增生症状
公开(公告)号：US20070213339A1
公开(公告)日：2007-09-13
申请号：US10594978
申请日：2005-03-31
申请人： Uday Khire , Xiao-Gao Liu , Dhanapalan Nagarathnam , Jill Wood , Lei Wang , Donglei Liu , Jin Zhao , Leatte Guernon , Lei Zhang
发明人： Uday Khire , Xiao-Gao Liu , Dhanapalan Nagarathnam , Jill Wood , Lei Wang , Donglei Liu , Jin Zhao , Leatte Guernon , Lei Zhang
IPC分类号： A61K31/506 , A61K31/496 , C07D403/14
CPC分类号： C07D215/56 , C07D401/12 , C07D401/14
摘要： Quinolone carboxylic acid derivatives of formula (I) wherein Ar is an optionally substituted phenyl, pyridyl, or pyrimidinyl group and the substituent groups R1, R4, R10, R11, R19, and R20 are as defined in the specification, pharmaceutical compositions containing them, and methods of using them in treatment of hyperproliferative diseases such as cancer are disclosed and claimed.
摘要翻译：式（I）的喹诺酮羧酸衍生物，其中Ar是任选取代的苯基，吡啶基或嘧啶基，取代基R 1，R 4，R 4， 10，R 11，R 19和R 20如说明书中所定义，含有它们的药物组合物和方法将其用于治疗过度增殖性疾病如癌症的方法。

36. 发明授权

US07199047B2 Bi-layer etch stop process for defect reduction and via stress migration improvement 有权
公开(公告)号：US07199047B2
公开(公告)日：2007-04-03
申请号：US10857150
申请日：2004-05-28
申请人： Tae S. Kim , Jin Zhao , Nathan J. Kruse , August J. Fischer , Ralf B. Willecke
发明人： Tae S. Kim , Jin Zhao , Nathan J. Kruse , August J. Fischer , Ralf B. Willecke
IPC分类号： H01L21/4763
CPC分类号： H01L21/76801 , H01L21/76822 , H01L21/76832
摘要： A method of forming a film stack in an integrated circuit, said method comprising depositing a layer of silicon carbide adjacent a first layer of dielectric material, depositing a layer of silicon nitride adjacent the layer of silicon carbide, and depositing a second layer of dielectric material adjacent the layer of silicon nitride.

37. 发明申请

US20050045213A1 Deposition tool cleaning process having a moving plasma zone 有权
标题翻译：具有移动等离子体区域的沉积工具清洁工艺
公开(公告)号：US20050045213A1
公开(公告)日：2005-03-03
申请号：US10653661
申请日：2003-09-02
申请人： Ignacio Blanco , Jin Zhao , Nathan Kruse
发明人： Ignacio Blanco , Jin Zhao , Nathan Kruse
IPC分类号： B08B7/00 , C23C16/44 , B08B9/00
CPC分类号： H01J37/32082 , B08B7/0035 , C23C16/4405 , H01J2237/335 , Y10S438/905
摘要： The present invention provides, in one embodiment, a process for cleaning a deposition chamber (100). The process includes a step (100) of forming a reactive plasma cleaning zone by dissociating a gaseous fluorocompound introduced into a deposition chamber having an interior surface and in a presence of a plasma. The process (100) further includes a step (120) of ramping a flow rate of said gaseous fluorocompound to move the reactive plasma cleaning zone throughout the deposition chamber, thereby preventing a build-up of localized metal compound deposits on the interior surface. Other embodiments advantageously incorporate the process (100) into a system (200) for cleaning a deposition chamber (205) and a method of manufacturing semiconductor devices (300).
摘要翻译：在一个实施例中，本发明提供了一种用于清洁沉积室（100）的方法。该方法包括通过使引入到具有内表面并且存在等离子体的沉积室中的气态氟化合物离解形成反应性等离子体清洗区的步骤（100）。方法（100）还包括使所述气体氟化合物的流速升高以使整个沉积室中的反应性等离子体清洗区域移动的步骤（120），从而防止局部金属化合物沉积在内表面上。其他实施例有利地将工艺（100）并入到用于清洁沉积室（205）的系统（200）和制造半导体器件（300）的方法中。

38. 发明申请

US20050019963A1 Maintaining a reactor chamber of a chemical vapor deposition system 审中-公开
标题翻译：维持化学气相沉积系统的反应室
公开(公告)号：US20050019963A1
公开(公告)日：2005-01-27
申请号：US10623757
申请日：2003-07-21
申请人： Jin Zhao , Nathan Kruse , Ignacio Blanco , Mercer Brugler
发明人： Jin Zhao , Nathan Kruse , Ignacio Blanco , Mercer Brugler
IPC分类号： C23C16/44 , C23C16/52 , C23C16/00 , C25F1/00 , C25F5/00 , H01L21/31 , H01L21/66
CPC分类号： C23C16/4405 , C23C16/52
摘要： Maintaining a reactor chamber of a chemical vapor deposition system includes depositing layers on an inner surface of the reactor chamber, where the layers form an accumulation layer. When the accumulation layer reaches a specified thickness, a plasma clean cycle is performed by introducing cleaning gas into the reactor chamber. The volume of the cleaning gas used during one or more plasma clean cycles is calculated, where the volume indicates the volume of cleaning gas introduced into the reactor chamber. A notification is provided when the volume of the cleaning gas used during the plasma clean cycles has reached a predetermined volume.
摘要翻译：维持化学气相沉积系统的反应室包括在反应室的内表面上沉积层，其中层形成堆积层。当累积层达到规定厚度时，通过将清洁气体引入反应室来执行等离子体清洁循环。计算在一个或多个等离子体清洁循环期间使用的清洁气体的体积，其中体积表示引入反应器室的清洁气体的体积。当在等离子体清洁循环期间使用的清洁气体的体积达到预定体积时，提供通知。

39. 发明授权

US06649666B1 Propylene polymer coupling and foams 失效
标题翻译：丙烯聚合物偶联和泡沫
公开(公告)号：US06649666B1
公开(公告)日：2003-11-18
申请号：US10153058
申请日：2002-05-21
申请人： Michael D. Read , Kevin R. Hughes , Jin Zhao , Thomas J. Styranec , Eung Kyu Kim
发明人： Michael D. Read , Kevin R. Hughes , Jin Zhao , Thomas J. Styranec , Eung Kyu Kim
IPC分类号： C08J900
CPC分类号： C08J9/0033 , C08J9/12 , C08J2323/10 , C08J2323/12 , C08K5/43 , C08L23/10
摘要： The invention includes a process for providing a coupled propylene polymer foam. The invention also includes any composition comprising a product formed by the process of the invention and any article formed from such a composition.
摘要翻译：本发明包括提供偶联的丙烯聚合物泡沫的方法。本发明还包括包含通过本发明的方法形成的产品和由这种组合物形成的任何制品的任何组合物。

40. 发明授权

US5675294A Single pin crystal oscillator circuit 失效
标题翻译：单针晶体振荡电路
公开(公告)号：US5675294A
公开(公告)日：1997-10-07
申请号：US582881
申请日：1996-01-04
申请人： Jyn-Bang Shyu , Jin Zhao
发明人： Jyn-Bang Shyu , Jin Zhao
IPC分类号： H03B5/36
CPC分类号： H03B5/364
摘要： A single pin integrated oscillator circuit includes an amplifier having a first input terminal to which an external crystal may be connected, and a second input terminal which receives a feedback path from an output terminal of the amplifier. An oscillator output signal having a relatively large voltage swing is provided from the first input terminal through a buffer. The oscillator operates over a wide range of voltages and process variations, and it can accept an input signal from an external crystal or can accept any clock signal having a swing of approximately 1 V.
摘要翻译：单引脚集成振荡器电路包括具有可以连接外部晶体的第一输入端子的放大器和从放大器的输出端子接收反馈路径的第二输入端子。通过缓冲器从第一输入端子提供具有相对较大电压摆幅的振荡器输出信号。振荡器在宽范围的电压和工艺变化范围内工作，并且可以接受来自外部晶体的输入信号，或者可以接受具有大约1V的摆幅的任何时钟信号。

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