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31. 发明授权

US6059167A End base of a power stapler 有权
标题翻译：动力订书机的底座
公开(公告)号：US6059167A
公开(公告)日：2000-05-09
申请号：US431373
申请日：1999-11-01
申请人： Roman Ho , Jack Chen , Hsuam-Chi Chiang
发明人： Roman Ho , Jack Chen , Hsuam-Chi Chiang
IPC分类号： B25C1/04
CPC分类号： B25C1/047 , B25C1/042
摘要： A power stapler includes a barrel with a cylinder received therein and a piston is movably received in the cylinder. An end cap is connected to the rear end of the barrel and a frame is movably engaged with the inside of the end cap. A seal part is engaged with an annular space in the outside of the frame and contacts the cylinder. A plurality of passages are defined through the frame and communicate with the annular space so that the seal part is securely positioned because the pressure in the passages is lower than the outside of the seal part. A fixed member is connected to the end cap and a pad is engaged with the fixed member. The pad has notches in the distal end thereof which contacts the piston so that air trapped between the pad and piston is released via the notches when the piston moves back to the original position after a shot.
摘要翻译：动力订书机包括具有容纳在其中的气缸的筒体，活塞可移动地容纳在气缸中。端盖连接到筒的后端，并且框架与端盖的内部可移动地接合。密封部分与框架外部的环形空间接合，并与气缸接触。通过框架限定多个通道并与环形空间连通，使得密封部分被牢固地定位，因为通道中的压力低于密封部分的外部。固定构件连接到端盖，并且垫与固定构件接合。垫在其远端处具有接触活塞的凹口，使得当活塞在射击后移回到原始位置时，捕获在垫和活塞之间的空气经由凹口释放。

32. 发明授权

US6059166A Exhausted air dispensing device for a power nailer 有权
标题翻译：用于电动打钉机的排气分配装置
公开(公告)号：US6059166A
公开(公告)日：2000-05-09
申请号：US431135
申请日：1999-11-01
申请人： Roman Ho , Jack Chen , Hsuam-Chi Chiang
发明人： Roman Ho , Jack Chen , Hsuam-Chi Chiang
IPC分类号： B25C1/00 , B25C1/04
CPC分类号： B25C1/048 , B25C1/047
摘要： An exhausted air dispensing device for a hydraulic power nailer includes a ring engaged with a flange extending from a recessed area defined in an end cap of the body of the nailer. The flange has a plurality of notches which communicate with a passage from which the exhausted air of the nailer flows. The flange has a plurality of blocks extending from the ring and located in alignment with the notches in the flange so that the speed of the exhausted air is reduced when the exhausted air blows against the blocks. A cover has an opening defined in a periphery of the cover which is rotatably engaged with the recessed area. A positioning pin biasedly extends from the end cap and the cover has a plurality of dents in the bottom thereof so that the positioning pin is engaged with one of the dents of the cover.
摘要翻译：用于液压动力打钉机的排气分配装置包括与从限定在打钉机主体的端盖中的凹陷区域延伸的凸缘接合的环。凸缘具有多个凹口，其与钉子的排出空气流过的通道连通。凸缘具有从环延伸并与凸缘中的凹口对准的多个块，使得当排出的空气吹向块时，排出的空气的速度减小。盖具有限定在盖的周边中的开口，其与凹陷区域可旋转地接合。定位销从端盖偏置地延伸，并且盖在其底部具有多个凹痕，使得定位销与盖的凹陷中的一个接合。

33. 发明授权

US6025772A Potentiometer 失效
标题翻译：电位器
公开(公告)号：US6025772A
公开(公告)日：2000-02-15
申请号：US112168
申请日：1998-07-08
申请人： Jack Chen
发明人： Jack Chen
IPC分类号： H01C10/14 , H01C10/30 , H01C10/32
CPC分类号： H01C10/30 , H01C10/32
摘要： A resistor card for a potentiometer to measure the fuel in a fuel tank consists of a non-conductive substrate with a plurality of elongate conductive contacts deposited. The contacts have an elevation above the surface of the substrate and the contacts are oriented in parallel relationship to each other to form a wiper track across which a wiper is movable. To reduce the rate at which the upper surfaces of the contacts are worn away by movement of the wiper, a non-conductive filler is deposited between the conductive materials which form the lands.
摘要翻译：用于测量燃料箱中的燃料的电位计的电阻器卡由具有沉积的多个细长导电触头的非导电衬底组成。触头具有在基板的表面上方的高度，并且触点彼此平行地定向以形成擦拭器轨道，擦拭器可通过该擦拭器轨迹移动。为了降低触头的上表面通过擦拭器的移动磨损的速率，在形成焊盘的导电材料之间沉积非导电填料。

34. 发明公开

US20240057823A1 SHOWER ROD ASSEMBLY 审中-公开
公开(公告)号：US20240057823A1
公开(公告)日：2024-02-22
申请号：US18386376
申请日：2023-11-02
申请人： Jack Chen
发明人： Jack Chen
IPC分类号： A47K3/38 , A47H1/02 , A47H1/142
CPC分类号： A47K3/38 , A47H1/02 , A47H1/142 , A47H2001/021
摘要： A shower rod assembly comprising a first arm engaged at a proximal end to a first swivel bracket assembly which includes a mounting bracket and a swivel bracket hingedly engaged to the mounting bracket, a second arm engaged to a second swivel bracket assembly which includes a mounting bracket and a swivel bracket hingedly engaged to the mounting bracket, a first attachment end engaged to a distal end of the first arm, first attachment end including a pin sleeve accessible from an outer surface, a second attachment end springingly engaged to a distal end of the second arm, the second attachment end including a coil spring mounted within a spring chamber engaged to the distal end of the second arm, and a pin emanating from an outer surface of the second attachment end where the pin springingly engages the pin sleeve to form a continuous shower rod.

35. 发明授权

US11839337B2 Shower rod assembly 有权
公开(公告)号：US11839337B2
公开(公告)日：2023-12-12
申请号：US17332200
申请日：2021-05-27
申请人： Jack Chen
发明人： Jack Chen
IPC分类号： A47K3/38 , A47H1/142 , A47H1/02
CPC分类号： A47K3/38 , A47H1/02 , A47H1/142 , A47H2001/021
摘要： A shower rod assembly comprising a first arm engaged at a proximal end to a first swivel bracket assembly which includes a mounting bracket and a swivel bracket hingedly engaged to the mounting bracket, a second arm engaged to a second swivel bracket assembly which includes a mounting bracket and a swivel bracket hingedly engaged to the mounting bracket, a first attachment end engaged to a distal end of the first arm, first attachment end including a pin sleeve accessible from an outer surface, a second attachment end springingly engaged to a distal end of the second arm, the second attachment end including a coil spring mounted within a spring chamber engaged to the distal end of the second arm, and a pin emanating from an outer surface of the second attachment end where the pin springingly engages the pin sleeve to form a continuous shower rod.

36. 发明授权

US11208132B2 Wheeled folding tray cart with safety device and method 有权
公开(公告)号：US11208132B2
公开(公告)日：2021-12-28
申请号：US16246460
申请日：2019-01-12
申请人： Jack Chen
发明人： Jack Chen
IPC分类号： B62B3/02 , A47B43/00
摘要： The invention is a wheeled folding tray cart and method. The wheeled folding tray cart comprises a collapsible wheeled framework pivotally supporting a set of split shelves, each split shelf comprises a pair of half shelves. The wheeled folding tray cart moves between an open operating position wherein the set of split shelves are held in spaced-apart, stacked, horizontal orientation within the collapsible wheeled framework and a closed storage position wherein the collapsible wheeled framework is collapsed in manner to move each half shelf pair into an accordion-like, inverted “V”-shaped or accordion like configuration. An extension coiled spring attached to the collapsible wheeled framework assists in the movement of the wheeled folding tray cart between open operating position and the closed storage position. A sheath encloses at least a portion of the spring to provide resistance to the spring's movement to limit potential operator exposure to pinch injuries.

37. 发明授权

US08562750B2 Method and apparatus for processing bevel edge 有权
标题翻译：斜边加工方法及装置
公开(公告)号：US08562750B2
公开(公告)日：2013-10-22
申请号：US12640926
申请日：2009-12-17
申请人： Jack Chen , Yunsang Kim
发明人： Jack Chen , Yunsang Kim
IPC分类号： B08B7/04
CPC分类号： H01L21/02274 , C23C16/0245 , C23C16/04 , C23C16/509 , H01L21/02087 , H01L21/02115 , H01L21/3083 , H01L21/31144
摘要： A method and apparatus for processing a bevel edge is provided. A substrate is placed in a bevel processing chamber and a passivation layer is formed on the substrate only around a bevel region of the substrate using a passivation plasma confined in a peripheral region of the bevel processing chamber. The substrate may undergo a subsequent semiconductor process, during which the bevel edge region of the substrate is protected by the passivation layer. Alternatively, the passivation layer may be patterned using a patterning plasma formed in an outer peripheral region of the processing chamber, the patterning plasma being confined by increasing plasma confinement. The passivation layer on outer edge portion of the bevel region is removed, while the passivation layer on an inner portion of the bevel region is maintained. The bevel edge of the substrate may be cleaned using the patterned passivation layer as a protective mask.
摘要翻译：提供了一种用于处理斜边的方法和装置。将衬底放置在斜面处理室中，并且使用限制在斜面处理室的周边区域中的钝化等离子体在衬底的仅一个斜面区域周围形成钝化层。衬底可以经历随后的半导体工艺，在此期间衬底的斜边缘区域被钝化层保护。或者，可以使用在处理室的外围区域中形成的图案化等离子体对钝化层进行图案化，通过增加等离子体限制来限制图形化等离子体。去除斜面区域的外边缘部分上的钝化层，同时保持斜面区域的内部部分上的钝化层。可以使用图案化的钝化层作为保护掩模来清洁基底的斜边缘。

38. 发明授权

US08500951B2 Low-K damage avoidance during bevel etch processing 有权
标题翻译：斜角蚀刻加工期间的低K损伤避免
公开(公告)号：US08500951B2
公开(公告)日：2013-08-06
申请号：US12730146
申请日：2010-03-23
申请人： Yunsang Kim , Andrew Bailey, III , Jack Chen
发明人： Yunsang Kim , Andrew Bailey, III , Jack Chen
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01L21/02041 , H01L21/02087 , H01L21/31116 , H01L21/31138 , H01L21/67069 , H01L21/6833
摘要： A method for etching a bevel edge of a substrate is provided. A patterned photoresist mask is formed over the etch layer. The bevel edge is cleaned comprising providing a cleaning gas comprising at least one of a CO2, CO, CxHy, H2, NH3, CxHyFz and a combination thereof, forming a cleaning plasma from the cleaning gas, and exposing the bevel edge to the cleaning plasma. Features are etched into the etch layer through the photoresist features and the photoresist mask is removed.
摘要翻译：提供了蚀刻基板的斜边缘的方法。在蚀刻层上形成图案化的光致抗蚀剂掩模。清洁斜面边缘，包括提供包括CO 2，CO，C x H y，H 2，NH 3，C x H y Fz及其组合中的至少一种的清洁气体，从清洁气体形成清洁等离子体，并将斜面边缘暴露于清洁等离子体。通过光致抗蚀剂特征将特征蚀刻到蚀刻层中，并去除光致抗蚀剂掩模。

39. 发明申请

US20130166777A1 DEVICE PROFILE ASSIGNMENT BASED ON DEVICE CAPABILITIES 有权
标题翻译：基于设备能力的设备配置文件分配
公开(公告)号：US20130166777A1
公开(公告)日：2013-06-27
申请号：US13410410
申请日：2012-03-02
申请人： Jack Chen , Rupen Chanda
发明人： Jack Chen , Rupen Chanda
IPC分类号： G06F15/16 , G06F3/00
CPC分类号： H04M1/72522 , H04L67/303 , H04M1/72525 , H04N21/25825 , H04N21/41407 , H04W4/18 , H04W8/24 , H04W28/06 , H04W28/18
摘要： Systems and methods, including computer software implementations, involve identifying a first set of device capabilities associated with an electronic device. The first set of device capabilities include one or more device capabilities. A description of the first set of device capabilities is provided to a remote source, and a first device profile identifier is received from the remote source. The first device profile identifier is associated with the first set of device capabilities. The first device profile identifier is stored on the electronic device, and the received first device profile identifier is included in a communication to the remote source.
摘要翻译：包括计算机软件实现的系统和方法涉及识别与电子设备相关联的第一组设备能力。第一套设备功能包括一个或多个设备功能。将第一组设备能力的描述提供给远程源，并且从远程源接收第一设备配置文件标识符。第一设备配置文件标识符与第一组设备能力相关联。第一设备配置文件标识符存储在电子设备上，并且所接收的第一设备配置文件标识符被包括在与远程源的通信中。

40. 发明授权

US08384222B2 Semiconductor device and manufacturing method thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US08384222B2
公开(公告)日：2013-02-26
申请号：US13030887
申请日：2011-02-18
申请人： Chia-Lun Tsai , Ching-Yu Ni , Jack Chen , Wen-Cheng Chien
发明人： Chia-Lun Tsai , Ching-Yu Ni , Jack Chen , Wen-Cheng Chien
IPC分类号： H01L23/48
CPC分类号： H01L24/11 , H01L2224/0401 , H01L2224/05124 , H01L2224/05155 , H01L2224/05166 , H01L2224/05548 , H01L2224/05644 , H01L2224/13022 , H01L2224/13099 , H01L2224/16 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01019 , H01L2924/01022 , H01L2924/01029 , H01L2924/01032 , H01L2924/01033 , H01L2924/01074 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01327 , H01L2924/014 , H01L2924/10329 , H01L2924/12041 , H01L2924/14 , H01L2924/1461 , H01L2924/30105 , H01L2924/3025 , H01L2924/00 , H01L2924/00014 , H01L2924/013
摘要： A semiconductor device and manufacturing method thereof are disclosed. The device comprises a semiconductor die, a passivation layer, a wiring redistribution layer (RDL), an Ni/Au layer, and a solder mask. The semiconductor die comprises a top metal exposed in an active surface thereof. The passivation layer overlies the active surface of the semiconductor die, and comprises a through passivation opening overlying the top metal. The wiring RDL, comprising an Al layer, overlies the passivation layer, and electrically connects to the top metal via the passivation opening. The solder mask overlies the passivation layer and the wiring RDL, exposing a terminal of the wiring RDL.
摘要翻译：公开了一种半导体器件及其制造方法。该器件包括半导体管芯，钝化层，布线再分布层（RDL），Ni / Au层和焊料掩模。半导体管芯包括在其活性表面中暴露的顶部金属。钝化层覆盖半导体管芯的有源表面，并且包括覆盖顶部金属的贯通钝化开口。包括Al层的布线RDL覆盖钝化层，并通过钝化开口电连接到顶部金属。焊接掩模覆盖钝化层和布线RDL，露出布线RDL的端子。

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