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31. 发明授权

US06879379B2 Projection lens and microlithographic projection exposure apparatus 失效
标题翻译：投影镜头和微光刻投影曝光装置
公开(公告)号：US06879379B2
公开(公告)日：2005-04-12
申请号：US10714573
申请日：2003-11-14
申请人： Martin Brunotte , Jürgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
发明人： Martin Brunotte , Jürgen Hartmaier , Hubert Holderer , Winfried Kaiser , Alexander Kohl , Jens Kugler , Manfred Maul , Christian Wagner
IPC分类号： G02B7/02 , G02B1/02 , G02B5/30 , G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
摘要翻译：用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。

32. 发明申请

US20060146384A1 Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
标题翻译：光束变换系统和包括光束变换系统的照明系统
公开(公告)号：US20060146384A1
公开(公告)日：2006-07-06
申请号：US11271976
申请日：2005-11-14
申请人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
发明人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
IPC分类号： G03H1/08
CPC分类号： G03F7/70183 , G02B5/32 , G02B27/09 , G02B27/0927 , G02B27/0944 , G02B27/095 , G02B27/0977 , G03F7/70108 , G03F7/70566
摘要： An optical beam transformation system, which can be designed to be utilized in an illuminating system of a microlithograpic projection exposure apparatus, has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include at least one transformation element causing a radial redistribution of light intensity and having at least one transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include at least one optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface. Axicon elements with axicon surfaces may be used as transformation elements.
摘要翻译：可以设计用于微光学投影曝光装置的照明系统的光束转换系统具有沿着光束转换系统的光轴布置的光学元件序列，并被设计用于转换入射光分布光束转换系统的入射表面通过光强度的径向再分布从光束转换系统的出射表面出射到出射光分布中。光学元件包括至少一个变换元件，其导致光强度的径向重新分布并且具有至少一个相对于光轴倾斜的变换表面，并且根据效率对称特性引起入射在相变表面上的光分布的偏振选择反射用于转化面。光学元件还包括至少一个光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，对由变换表面处的偏振选择反射引起的透射不均匀性进行空间依赖的补偿。具有转轴表面的Axicon元件可用作转换元件。

33. 发明授权

US06963449B2 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 失效
标题翻译：用于改善至少两个光学元件的成像特性和光刻制造方法的方法
公开(公告)号：US06963449B2
公开(公告)日：2005-11-08
申请号：US10709098
申请日：2004-04-13
申请人： Birgit Mecking , Toralf Gruner , Alexander Kohl
发明人： Birgit Mecking , Toralf Gruner , Alexander Kohl
IPC分类号： G02B7/00 , G02B5/30 , G03F7/20 , H01L21/027 , G02B27/28 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70591 , G02B5/3083 , G03F7/70258 , G03F7/70566 , G03F7/70966 , Y10S359/90
摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarization-dependent perturbation. In a further step a polarization-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarization-dependent perturbations and polarization-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.
摘要翻译：一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动光学元件被最小化。最后，将至少一个可移动光学元件移动到计算出的目标位置。

34. 发明申请

US20050013012A1 METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AT LEAST TWO OPTICAL ELEMENTS AND PHOTOLITHOGRAPHIC FABRICATION METHOD 失效
标题翻译：用于改善最小二重光学元件和光刻制造方法的成像特性的方法
公开(公告)号：US20050013012A1
公开(公告)日：2005-01-20
申请号：US10709098
申请日：2004-04-13
申请人： Birgit Kurz , Toralf Gruner , Alexander Kohl
发明人： Birgit Kurz , Toralf Gruner , Alexander Kohl
IPC分类号： G02B7/00 , G02B5/30 , G03F7/20 , H01L21/027 , G02B3/00 , G02B9/00
CPC分类号： G03F7/70591 , G02B5/3083 , G03F7/70258 , G03F7/70566 , G03F7/70966 , Y10S359/90
摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.
摘要翻译：一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动光学元件被最小化。最后，将至少一个可移动光学元件移动到计算出的目标位置。

35. 发明授权

US08467031B2 Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权
标题翻译：用于在微光刻曝光设备中照射掩模的照明系统
公开(公告)号：US08467031B2
公开(公告)日：2013-06-18
申请号：US12795014
申请日：2010-06-07
申请人： Erich Schubert , Alexander Kohl , Gerhard-Wilhelm Ziegler , Michael Patra , Markus Deguenther , Michael Layh
发明人： Erich Schubert , Alexander Kohl , Gerhard-Wilhelm Ziegler , Michael Patra , Markus Deguenther , Michael Layh
IPC分类号： G03B27/68 , G03B27/32
CPC分类号： G03F7/70083 , G03F7/70116 , G03F7/70191 , G03F7/70433
摘要： An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.
摘要翻译：提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。

36. 发明授权

US07511886B2 Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
标题翻译：光束变换系统和包括光束变换系统的照明系统
公开(公告)号：US07511886B2
公开(公告)日：2009-03-31
申请号：US11271976
申请日：2005-11-14
申请人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
发明人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
IPC分类号： G02B5/30 , G02B27/28 , F21V9/14 , G03B27/72
CPC分类号： G03F7/70183 , G02B5/32 , G02B27/09 , G02B27/0927 , G02B27/0944 , G02B27/095 , G02B27/0977 , G03F7/70108 , G03F7/70566
摘要： An optical beam transformation system has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include a transformation element causing a radial redistribution of light intensity and having a transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include an optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface.
摘要翻译：光束变换系统具有沿着光束转换系统的光轴布置的一系列光学元件，其被设计用于将入射光束分布到光束转换系统的入射面上，使得入射光分布从出射表面出射的出射光分布的光束转换系统通过光强度的径向再分布。光学元件包括变换元件，其导致光强度的径向重新分布并且具有相对于光轴倾斜的变换表面，并且根据转变表面的效率对称特性引起入射在相变表面上的光分布的偏振选择反射。光学元件还包括光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，在变换表面处实现由偏振选择反射引起的透射不均匀性的空间依赖补偿。

37. 发明申请

US20050254773A1 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 失效
标题翻译：用于改善至少两个光学元件的成像特性和光刻制造方法的方法
公开(公告)号：US20050254773A1
公开(公告)日：2005-11-17
申请号：US11185066
申请日：2005-07-20
申请人： Birgit Kurz , Toralf Gruner , Alexander Kohl
发明人： Birgit Kurz , Toralf Gruner , Alexander Kohl
IPC分类号： G02B7/00 , G02B5/30 , G03F7/20 , H01L21/027 , G02B6/00
CPC分类号： G03F7/70591 , G02B5/3083 , G03F7/70258 , G03F7/70566 , G03F7/70966 , Y10S359/90
摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.
摘要翻译：一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振独立扰动构成的至少两个光学元件的总扰动光学元件被最小化。最后，将至少一个可移动光学元件移动到计算出的目标位置。

38. 发明授权

US09223226B2 Microlithographic projection exposure apparatus illumination optics 有权
公开(公告)号：US09223226B2
公开(公告)日：2015-12-29
申请号：US13325734
申请日：2011-12-14
申请人： Alexander Kohl
发明人： Alexander Kohl
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70091 , G03F7/70108 , G03F7/70208 , G03F7/70466 , G03F7/70566
摘要： Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

39. 发明授权

US08085382B2 Microlithographic projection exposure apparatus illumination optics 有权
标题翻译：微光刻投影曝光装置照明光学元件
公开(公告)号：US08085382B2
公开(公告)日：2011-12-27
申请号：US11777845
申请日：2007-07-13
申请人： Alexander Kohl
发明人： Alexander Kohl
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70091 , G03F7/70108 , G03F7/70208 , G03F7/70466 , G03F7/70566
摘要： Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.
摘要翻译：公开了诸如微光刻投影曝光设备照明光学器件的光学元件，以及相关的系统，方法，部件和装置。

40. 发明授权

US09052611B2 Microlithographic projection exposure apparatus illumination optics 有权
标题翻译：微光刻投影曝光装置照明光学元件
公开(公告)号：US09052611B2
公开(公告)日：2015-06-09
申请号：US13325642
申请日：2011-12-14
申请人： Alexander Kohl
发明人： Alexander Kohl
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70091 , G03F7/70108 , G03F7/70208 , G03F7/70466 , G03F7/70566
摘要： Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.
摘要翻译：公开了诸如微光刻投影曝光设备照明光学器件的光学元件，以及相关的系统，方法，部件和装置。

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