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    • 31. 发明授权
    • Sensor device, method of driving sensor element, display device with input function and electronic unit
    • 传感器装置,驱动传感器元件的方法,具有输入功能的显示装置和电子单元
    • US08665243B2
    • 2014-03-04
    • US12947038
    • 2010-11-16
    • Michiru SendaMakoto Takatoku
    • Michiru SendaMakoto Takatoku
    • G06F3/042
    • G06F3/0412G06F3/0416G06F3/0418G06F3/042G06F3/04883G06F2203/04808
    • A sensor device includes sensor elements arranged in a matrix form, and a sensor driving section driving the sensor elements. Each of the sensor elements includes a photoelectric conversion element generating electric charge, a storage node storing electric charge, to show a voltage which fluctuates according to the stored electric charge, a reset transistor resetting the voltage in the storage node and a readout section reading the voltage value resulted from the stored electric charge in the storage node, to output the resultant voltage value. The sensor driving section controls the reset transistor so that the storage nodes of the sensor elements over sensor element lines are reset into the predetermined reset voltage at a time, and then performs read control after a lapse of a predetermined exposure period to allow the sensor detection signals to be sequentially outputted from the respective sensor elements arranged in each sensor element lines.
    • 传感器装置包括以矩阵形式布置的传感器元件和驱动传感器元件的传感器驱动部。 每个传感器元件包括产生电荷的光电转换元件,存储电荷的存储节点,以显示根据存储的电荷而波动的电压,复位晶体管复位存储节点中的电压,读出部分 电压值由存储节点中存储的电荷产生,以输出合成的电压值。 传感器驱动部分控制复位晶体管,使得传感器元件线上的传感器元件的存储节点一次被复位到预定的复位电压中,然后在经过预定的曝光周期之后执行读取控制,以允许传感器检测 从布置在每个传感器元件线中的各个传感器元件顺序地输出信号。
    • 35. 发明申请
    • RADIATION IMAGE PICKUP APPARATUS AND METHOD OF DRIVING THE SAME
    • 辐射图像拾取装置及其驱动方法
    • US20110204246A1
    • 2011-08-25
    • US13027328
    • 2011-02-15
    • Tsutomu TanakaMakoto TakatokuYasuhiro YamadaRyoichi Ito
    • Tsutomu TanakaMakoto TakatokuYasuhiro YamadaRyoichi Ito
    • G01T1/24H01L29/04H01L27/146
    • H01L27/14676G01T1/2018H04N5/2251H04N5/374H04N5/378
    • A radiation image pickup apparatus allowed to restore a change in characteristics in a pixel transistors caused by radiation, and a method of driving the same are provided. The radiation image pickup apparatus includes: a pixel section including a plurality of unit pixels and generating an electrical signal based on incident radiation, each of the unit pixels including one or more pixel transistors and a photoelectric conversion element; a drive section for selectively driving the unit pixels of the pixel section; and a characteristic restoring section including a first constant current source for annealing and a selector switch for changing a current path from the unit pixels to the first constant current source at the time of non-measurement of the radiation, and allowing an annealing current to flow through the pixel transistor, thereby restoring characteristics of the pixel transistor.
    • 允许放射线摄像装置恢复由辐射引起的像素晶体管的特性变化,以及其驱动方法。 放射线图像拾取装置包括:像素部分,包括多个单位像素,并且基于入射辐射产生电信号,每个单位像素包括一个或多个像素晶体管和光电转换元件; 用于选择性地驱动像素部分的单位像素的驱动部分; 以及特征恢复部,其包括用于退火的第一恒流源和用于在不测量辐射时改变从单位像素到第一恒定电流源的电流路径的选择器开关,并且允许退火电流流动 通过像素晶体管,从而恢复像素晶体管的特性。
    • 36. 发明授权
    • Method of manufacturing a thin film transistor and a method of evaluating a polysilicon film
    • 薄膜晶体管的制造方法及多晶硅膜的评价方法
    • US06555423B2
    • 2003-04-29
    • US09912713
    • 2001-07-25
    • Hiroyuki WadaMakoto Takatoku
    • Hiroyuki WadaMakoto Takatoku
    • H01L2100
    • H01L21/02675B23K26/032H01L21/02532H01L21/02686H01L21/2026H01L21/268H01L22/26H01L29/66765H01L29/78678H01L2924/0002Y10T29/41H01L2924/00
    • In manufacturing a thin-film transistor the condition of a polysilicon film is evaluated, a manufacture margin for the film is determined from the condition evaluated, and the power of an excimer laser annealing apparatus is set based on the manufacture margin. The annealing apparatus anneals an amorphous silicon film, converting the same to a polysilicon film. The surface spatial structure of the polysilicon film thus formed exhibits linearity or periodicity, or both, depending on the energy applied to the amorphous silicon film during the annealing. The image data of the polysilicon film is processed, thereby determining the linearity and/or periodicity in numerical values, by utilizing the auto-correlation function of the surface image of the polysilicon film. A difference between the auto-correlation function of the surface image of parts of the polysilicon film, which are a source region and a drain region, and the auto-correlation function of the part of the polysilicon film, which lies above a gate electrode, is obtained, and the manufacture margin of the polysilicon film is calculated from this difference.
    • 在制造薄膜晶体管时,评估多晶硅膜的状态,根据评估条件确定膜的制造裕度,并且基于制造裕度设定准分子激光退火装置的功率。 退火设备使非晶硅膜退火,将其转化为多晶硅膜。 由此形成的多晶硅膜的表面空间结构根据在退火过程中施加到非晶硅膜的能量而呈现线性或周期性,或者两者。 处理多晶硅膜的图像数据,通过利用多晶硅膜的表面图像的自相关函数来确定数值的线性和/或周期性。 作为源极区域和漏极区域的多晶硅膜的部分的表面图像的自相关函数与位于栅电极上方的多晶硅膜部分的自相关函数之间的差异, ,并根据该差异计算多晶硅膜的制造裕度。
    • 37. 发明授权
    • Active matrix display device
    • 主动矩阵显示装置
    • US5708485A
    • 1998-01-13
    • US617299
    • 1996-03-18
    • Takusei SatoYoshihiro HashimotoKazuyoshi YoshidaShingo MakimuraMakoto Takatoku
    • Takusei SatoYoshihiro HashimotoKazuyoshi YoshidaShingo MakimuraMakoto Takatoku
    • G02F1/136G02F1/1362G02F1/1368G09F9/30H01L21/336H01L29/786G02F1/1343G02F1/1333
    • G02F1/136209
    • To give an electric shield function and an electric contact function to a light shielding film formed on a drive substrate. An active matrix display device includes a drive substrate 1 having pixels 4, an opposed substrate 2 having an opposed electrode 5, and a liquid crystal 3 held in a space defined between the drive substrate 1 and the opposed substrate 2. An upper layer portion of the drive substrate 1 includes pixel electrodes 6 formed individually for the pixels 4. A lower layer portion of the drive substrate 1 includes thin-film transistors 7 for individually driving the pixel electrodes 6, scanning lines 8, and signal lines 9. A light shielding film having conductivity is interposed between the upper layer portion and the lower layer portion, and is divided into mask shielding films 16M and pad shielding films 16P. Each mask shielding film 16M is continuously patterned along each row of the pixels 4 to partially shield at least the corresponding thin-film transistor 7. Each mask shielding film 16M is insulated from both the upper layer portion and the lower layer portion, and is maintained at a fixed potential. The pad shielding films 16P are discretely patterned for the individual pixels 4, and each pad shielding film 16P is located at a contact portion C between the corresponding pixel electrode 6 and the corresponding thin-film transistor 7 to provide electrical connection therebetween and light shielding.
    • 为了对形成在驱动基板上的遮光膜赋予电屏蔽功能和电接触功能。 有源矩阵显示装置包括具有像素4的驱动基板1,具有相对电极5的相对基板2和保持在驱动基板1和相对基板2之间的空间中的液晶3。 驱动基板1包括为像素4分别形成的像素电极6.驱动基板1的下层部分包括用于单独驱动像素电极6,扫描线8和信号线9的薄膜晶体管7.遮光 具有导电性的膜插入在上层部分和下层部分之间,并被分成掩模屏蔽膜16M和焊盘屏蔽膜16P。 每个掩模屏蔽膜16M沿着像素4的每一行连续地图案化,以至少部分地屏蔽相应的薄膜晶体管7.每个掩模屏蔽膜16M与上层部分和下层部分都被绝缘,并被保持 处于固定的潜力。 衬垫屏蔽膜16P对于各个像素4离散地图案化,并且每个衬垫屏蔽膜16P位于相应的像素电极6和相应的薄膜晶体管7之间的接触部分C处,以提供其间的电连接和遮光。