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31. 发明授权

US07732351B2 Manufacturing method of semiconductor device and laser processing apparatus 失效
标题翻译：半导体器件和激光加工设备的制造方法
公开(公告)号：US07732351B2
公开(公告)日：2010-06-08
申请号：US11856885
申请日：2007-09-18
申请人： Hirotada Oishi , Koichiro Tanaka
发明人： Hirotada Oishi , Koichiro Tanaka
IPC分类号： H01L21/31 , H01L21/469 , H01L21/302 , H01L21/461
CPC分类号： H01L21/31105 , B23K26/0613 , B23K26/0676 , B23K26/382 , B23K26/389 , B23K26/40 , B23K2101/40 , B23K2103/08 , B23K2103/10 , B23K2103/12 , B23K2103/14 , B23K2103/172 , B23K2103/26 , B23K2103/50 , B23K2103/52 , G02F1/133707 , G02F1/13452 , G02F1/13454 , G02F1/136227 , G02F1/1368 , G02F1/167 , G02F2001/133622 , G02F2001/136231 , H01L21/02675 , H01L21/31127 , H01L27/124
摘要： In a manufacturing process of a semiconductor device, a manufacturing technique and a manufacturing apparatus of a semiconductor device which simplify a lithography step using a photoresist is provided, so that the manufacturing cost is reduced, and the throughput is improved. An irradiated object, in which a light absorbing layer and an insulating layer are stacked over a substrate, is irradiated with a multi-mode laser beam and a single-mode laser beam so that both the laser beams overlap with each other, and an opening is formed by ablation in part of the irradiated object the irradiation of which is performed so that both the laser beams overlap with each other.
摘要翻译：在半导体器件的制造工艺中，提供了使用光刻胶简化光刻步骤的半导体器件的制造技术和制造装置，从而降低了制造成本，提高了生产量。用多模激光束和单模激光束照射在基板上堆积光吸收层和绝缘层的被照射物体，使得激光束彼此重叠，并且开口是通过在被照射物体的一部分进行烧蚀而形成的，其照射进行为使得激光束彼此重叠。

32. 发明授权

US07595932B2 Laser irradiation method and laser irradiation apparatus 有权
标题翻译：激光照射方法和激光照射装置
公开(公告)号：US07595932B2
公开(公告)日：2009-09-29
申请号：US11120990
申请日：2005-05-04
申请人： Koichiro Tanaka , Hirotada Oishi
发明人： Koichiro Tanaka , Hirotada Oishi
IPC分类号： G02B27/10
CPC分类号： B23K26/0608 , B23K15/0093 , B23K15/10 , B23K26/0648 , B23K26/0732 , B23K26/0738 , B23K2103/56 , G02B3/0062 , G02B27/0927 , G02B27/0961 , G02B27/0966
摘要： The present invention is to provide a laser irradiation technique for irradiating the irradiation surface with the laser beam having homogeneous intensity distribution using a cylindrical lens array without being affected by the intensity distribution of the original beam. A laser beam emitted from a laser oscillator is divided by two kinds of cylindrical lens arrays into a plurality of beams, which are two kinds of linear laser beams with their energy intensity distribution inverted each other, and the two kinds of linear laser beams are superposed in a minor-axis direction. This can form the linear laser beam having homogeneous intensity distribution on the irradiation surface.
摘要翻译：本发明提供一种激光照射技术，其不受原始光束的强度分布的影响，使用柱面透镜阵列对具有均匀强度分布的激光束照射照射面。从激光振荡器发射的激光束被两种柱面透镜阵列分成多个光束，它们是能量强度分布相反的两种线性激光束，并且两种线性激光束被叠加在短轴方向。这可以形成在照射表面上具有均匀强度分布的线性激光束。

33. 发明申请

US20080267245A1 Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device 有权
标题翻译：光束均化器，激光照射装置以及半导体装置的制造方法
公开(公告)号：US20080267245A1
公开(公告)日：2008-10-30
申请号：US12149969
申请日：2008-05-12
申请人： Koichiro Tanaka , Hirotada Oishi
发明人： Koichiro Tanaka , Hirotada Oishi
IPC分类号： H01S3/10 , G02B27/10
CPC分类号： H01L21/02617 , G02B6/001 , G02B6/0048 , G02B6/0055 , G02B6/262 , G02B27/0927 , G02B27/095 , G02B27/0977 , G02B27/0994
摘要： The present invention is to provide a beam homogenizer, a laser irradiation apparatus, and a method for manufacturing a semiconductor device, which can suppress the loss of a laser beam and form a beam spot having homogeneous energy distribution constantly on an irradiation surface without being affected by beam parameters of a laser beam. A deflector is provided at an entrance of an optical waveguide or a light pipe used for homogenizing a laser beam emitted from a laser oscillator. A pair of reflection planes of the deflector is provided so as to have a tilt angle to an optical axis of the laser beam, whereby the entrance of the optical waveguide or the light pipe is expanded. Accordingly, the loss of the laser beam can be suppressed. Moreover, by providing an angle adjusting mechanism to the deflector, a beam spot having homogeneous energy distribution can be formed at an exit of the optical waveguide.
摘要翻译：本发明提供一种光束均化器，激光照射装置和半导体装置的制造方法，其能够抑制激光束的损失，并且在照射面上不间断地形成具有均匀的能量分布的光斑，而不受影响通过激光束的光束参数。在用于使从激光振荡器发射的激光束均匀化的光波导或光管的入口处设置偏转器。偏转器的一对反射面被设置为具有与激光束的光轴的倾斜角，从而扩大了光波导或光管的入射。因此，可以抑制激光束的损失。此外，通过向偏转器设置角度调节机构，可以在光波导的出口处形成具有均匀能量分布的束斑。

34. 发明申请

US20070197049A1 Method for manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20070197049A1
公开(公告)日：2007-08-23
申请号：US11702082
申请日：2007-02-05
申请人： Koichiro Tanaka , Hirotada Oishi
发明人： Koichiro Tanaka , Hirotada Oishi
IPC分类号： H01L21/00
CPC分类号： B23K26/067 , B23K2101/40 , B82Y10/00 , G11C13/0014 , G11C13/04 , H01L51/0017
摘要： To provide a method for manufacturing a semiconductor device using a method in which a desired position is rapidly subjected to laser irradiation while switching laser irradiation patterns. With respect to an organic memory element having a structure in which an organic compound layer is interposed between a pair of conductive layers, data is written to the organic memory element by laser irradiation using a laser irradiation apparatus. Further, a laser beam emitted from a laser oscillator is split by a diffractive optical element into a plurality of laser beams, thereby irradiating a plurality of portions on the organic compound layer with laser beams by single irradiation.
摘要翻译：为了提供使用在切换激光照射图案时期望位置快速进行激光照射的方法制造半导体器件的方法。对于具有有机化合物层插入在一对导电层之间的结构的有机存储元件，通过使用激光照射装置的激光照射将数据写入有机存储元件。此外，从激光振荡器发射的激光束被衍射光学元件分裂成多个激光束，从而通过单次照射用激光束照射有机化合物层上的多个部分。

35. 发明申请

US20060072877A1 Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device 有权
标题翻译：光束均化器，激光照射装置以及半导体装置的制造方法
公开(公告)号：US20060072877A1
公开(公告)日：2006-04-06
申请号：US11240470
申请日：2005-10-03
申请人： Koichiro Tanaka , Hirotada Oishi
发明人： Koichiro Tanaka , Hirotada Oishi
IPC分类号： G02B6/26
CPC分类号： H01L21/02617 , G02B6/001 , G02B6/0048 , G02B6/0055 , G02B6/262 , G02B27/0927 , G02B27/095 , G02B27/0977 , G02B27/0994
摘要： The present invention is to provide a beam homogenizer, a laser irradiation apparatus, and a method for manufacturing a semiconductor device, which can suppress the loss of a laser beam and form a beam spot having homogeneous energy distribution constantly on an irradiation surface without being affected by beam parameters of a laser beam. A deflector is provided at an entrance of an optical waveguide or a light pipe used for homogenizing a laser beam emitted from a laser oscillator. A pair of reflection planes of the deflector is provided so as to have a tilt angle to an optical axis of the laser beam, whereby the entrance of the optical waveguide or the light pipe is expanded. Accordingly, the loss of the laser beam can be suppressed. Moreover, by providing an angle adjusting mechanism to the deflector, a beam spot having homogeneous energy distribution can be formed at an exit of the optical waveguide.
摘要翻译：本发明提供一种光束均化器，激光照射装置和半导体装置的制造方法，其能够抑制激光束的损失，并且在照射面上不间断地形成具有均匀的能量分布的光斑，而不受影响通过激光束的光束参数。在用于使从激光振荡器发射的激光束均匀化的光波导或光管的入口处设置偏转器。偏转器的一对反射面被设置为具有与激光束的光轴的倾斜角，从而扩大了光波导或光管的入射。因此，可以抑制激光束的损失。此外，通过向偏转器设置角度调节机构，可以在光波导的出口处形成具有均匀能量分布的束斑。

36. 发明授权

US07187507B2 Optical component and laser irradiation apparatus 有权
标题翻译：光学部件和激光照射装置
公开(公告)号：US07187507B2
公开(公告)日：2007-03-06
申请号：US10852140
申请日：2004-05-25
申请人： Hirotada Oishi , Tomoaki Moriwaka
发明人： Hirotada Oishi , Tomoaki Moriwaka
IPC分类号： G02B7/02
CPC分类号： G02B7/026 , G02B7/025
摘要： The present invention provides an optical component for fixing a lens comprising a base, a holder, and a fastener. The base has a concave side surface and at least one first hole. The holder has a cylindrical shape and has a second hole penetrating through a center portion of at least one of the top surface and the bottom surface thereof. The lens is sandwiched between the holder and the part of the base which extends from the edge of the side surface to the inner side and which corresponds to the inner part of a circle drawn so as to circumscribe all the insertion holes. The base and the holder are fastened by the fasteners inserted in the first insertion hole and the second insertion hole.
摘要翻译：本发明提供一种用于固定包括基座，保持器和紧固件的透镜的光学部件。底座具有凹的侧表面和至少一个第一孔。保持器具有圆柱形形状并且具有穿过其顶表面和底表面中的至少一个的中心部分的第二孔。透镜被夹持在支架与从侧面的边缘延伸到内侧的基部的一部分之间，并且其对应于所画的圆的内部，以便包围所有的插入孔。基座和支架通过插入在第一插入孔和第二插入孔中的紧固件紧固。

37. 发明申请

US20110269060A1 Photomask 有权
标题翻译：光掩模
公开(公告)号：US20110269060A1
公开(公告)日：2011-11-03
申请号：US13093974
申请日：2011-04-26
申请人： Hideaki Shishido , Yuto Yakubo , Hirotada Oishi
发明人： Hideaki Shishido , Yuto Yakubo , Hirotada Oishi
IPC分类号： G03F1/00
CPC分类号： G03F1/36
摘要： A photomask is provided, with which the roundness of a corner portion of a resist mask can be reduced in a photolithography step. Further, a method for manufacturing a semiconductor device with less variation is provided. A photomask includes an auxiliary pattern at a corner portion of a light-blocking portion, and (k+1) sides (k is a natural number of 3 or more) form k obtuse angles in the auxiliary pattern. Alternatively, a photomask includes an auxiliary pattern at a corner portion of a light-blocking portion, and the auxiliary pattern includes a zigzag curve.
摘要翻译：提供了一种光掩模，利用该光掩模可以在光刻步骤中减小抗蚀剂掩模的角部的圆度。此外，提供了一种具有较小变化的半导体器件的制造方法。光掩模在遮光部分的角部包括辅助图案，并且辅助图案中的（k + 1）边（k是3以上的自然数）形成k个钝角。或者，光掩模在遮光部分的角部包括辅助图案，并且辅助图案包括锯齿形曲线。

38. 发明授权

US08512917B2 Photomask 有权
标题翻译：光掩模
公开(公告)号：US08512917B2
公开(公告)日：2013-08-20
申请号：US13093974
申请日：2011-04-26
申请人： Hideaki Shishido , Yuto Yakubo , Hirotada Oishi
发明人： Hideaki Shishido , Yuto Yakubo , Hirotada Oishi
IPC分类号： G03F1/26 , G03F1/36
CPC分类号： G03F1/36
摘要： A photomask is provided, with which the roundness of a corner portion of a resist mask can be reduced in a photolithography step. Further, a method for manufacturing a semiconductor device with less variation is provided. A photomask includes an auxiliary pattern at a corner portion of a light-blocking portion, and (k+1) sides (k is a natural number of 3 or more) form k obtuse angles in the auxiliary pattern. Alternatively, a photomask includes an auxiliary pattern at a corner portion of a light-blocking portion, and the auxiliary pattern includes a zigzag curve.
摘要翻译：提供了一种光掩模，利用该光掩模可以在光刻步骤中减小抗蚀剂掩模的角部的圆度。此外，提供了一种具有较小变化的半导体器件的制造方法。光掩模在遮光部分的角部包括辅助图案，并且辅助图案中的（k + 1）边（k是3以上的自然数）形成k个钝角。或者，光掩模在遮光部分的角部包括辅助图案，并且辅助图案包括锯齿形曲线。

39. 发明授权

US07405114B2 Laser irradiation apparatus and method of manufacturing semiconductor device 有权
标题翻译：激光照射装置及半导体装置的制造方法
公开(公告)号：US07405114B2
公开(公告)日：2008-07-29
申请号：US10684416
申请日：2003-10-15
申请人： Hirotada Oishi
发明人： Hirotada Oishi
IPC分类号： H01L21/00 , H01L21/84
CPC分类号： H01L21/02691 , B23K26/0736 , B23K26/0738 , B23K26/08 , B23K26/082 , B23K26/0821 , B23K2101/40 , H01L21/02683 , H01L21/2026 , H01L21/268 , H01L21/32136 , H01L27/12 , H01L27/1285 , H01L29/04 , H01L29/78675
摘要： The present invention provides the laser irradiation apparatus that has a galvanometer mirror and an f-θ lens optical system, can offset the change of the energy due to the transmittance change of the f-θ lens, and can scan a laser beam while the change of the energy on a substrate is suppressed. Further, the laser beam energy that is incident on the lens is controlled in advance by combining the optical system changing the branching ratio of polarization of the laser beam and the optical system having dependence on direction of polarization of the laser beam and changed continuously according to the transmittance of the lens on which the laser beam is incident. The laser energy is controlled to offset the transmittance of the lens, and thereby energy fluctuation of the laser beam irradiation of a substrate can be prevented.
摘要翻译：本发明提供了具有电流计反射镜和f-theta透镜光学系统的激光照射装置，可以抵消由于f-theta透镜的透射率变化引起的能量变化，并且可以在改变时扫描激光束的能量被抑制。此外，入射到透镜上的激光束能量通过组合改变激光束的偏振分支比的光学系统和与激光束的偏振方向有关的光学系统而预先控制，并根据激光束入射的透镜的透射率。控制激光能量以抵消透镜的透射率，从而可以防止基板的激光束照射的能量波动。

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