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    • 31. 发明授权
    • Cobalt-base sintered alloy
    • 钴基烧结合金
    • US4089682A
    • 1978-05-16
    • US744783
    • 1976-11-24
    • Yuichi SaitoOsamu Mayama
    • Yuichi SaitoOsamu Mayama
    • B22F9/20C22C1/04C22C19/07B22F3/00
    • C22C1/0433
    • A cobalt-base sintered alloy which comprises: being manufactured from a reduced powder by the conventional powder metallurgy process with said reduced powder as a material powder, said reduced powder being prepared by simultaneously reducing a mixed powder consisting of powders of oxides of elements constituting said sintered alloy with a carbon powder added and mixed therein, and said reduced powder consisting of powders of said constituent elements and powders of carbides thereof; and consisting essentially of, in weight percentage:Chromium from 15.0 to 35.0%Tungsten from 3.0 to 19.0%Nickel from 0.2 to 12.0%Molybdenum from 0.1 to 15.0%Iron from 0.05 to 5.00%Titanium from 0.05 to 2.00%Silicon from 0.05 to 1.50%Manganese from 0.05 to 1.00%Carbon from 0.2 to 3.5%AndThe balance cobalt and incidental impurities.The above-mentioned cobalt-base sintered alloy, also containing, in weight percentage, from 0.05 to 1.00% boron.These cobalt-base sintered alloys provide a relatively wide range of sintering temperatures applicable in the manufacture thereof, and have furthermore a high sintered density of at least 95% of the theoretical value and are excellent in machinability, heat resistance, wear resistance and corrosion resistance.
    • 一种钴基烧结合金,其特征在于,包括:通过常规粉末冶金方法用所述还原粉末作为原料粉末,由还原粉末制造,所述还原粉末通过同时还原由构成所述的粉末的元素的氧化物粉末组成的混合粉末 烧结合金,其中加入和混合碳粉,所述还原粉末由所述组成元素的粉末和其碳化物粉末组成; 并基本上由重量百分比组成:
    • 32. 发明授权
    • Cask cushioning body
    • 酒柜缓冲体
    • US09022189B2
    • 2015-05-05
    • US13701073
    • 2011-06-28
    • Yuichi SaitoJunichi KishimotoTadashi KimuraAkio KitadaHiroki Tamaki
    • Yuichi SaitoJunichi KishimotoTadashi KimuraAkio KitadaHiroki Tamaki
    • F16F7/12G21F5/08G21F9/36
    • G21F5/08G21F9/36
    • A cask cushioning body includes an end-surface side member (2) in which a plurality of plates (21, 22) made of steel are formed at a distance between plate surfaces of the plates (21, 22) that face each other, and in which the plate surfaces of the plates (21, 22) are arranged along an end surface (100a) of a cask (100), and a circumferential-surface side member (3) that forms a cylindrical body (31) made of steel, one end of which is connected to a periphery of the end-surface side member (2), and that is arranged along an end-portion outer-circumferential surface (100b), wherein an impact absorber (4) that absorbs an impact by deforming is provided outside of the end-surface side member (2) and the circumferential-surface side member (3).
    • 一种桶式缓冲体,包括端面侧构件(2),在该端面侧构件(2)上形成有多个彼此相对的板(21,22)的板表面之间的距离的由钢制成的板(21,22),以及 其特征在于,所述板(21,22)的板面沿着桶(100)的端面(100a)配置,并且形成由钢制成的圆筒体(31)的周面侧部件(3) 其一端与端面侧构件(2)的周围连接,并且沿着端部外周面(100b)配置,其中,吸收冲击的冲击吸收体(4) 在端面侧构件(2)和周面侧构件(3)的外侧设置有变形。
    • 35. 发明申请
    • Active matrix substrate, method of making the substrate, and display device
    • 有源矩阵基板,制造基板的方法和显示装置
    • US20110003417A1
    • 2011-01-06
    • US12807215
    • 2010-08-31
    • Yoshihiro OkadaYuichi SaitoShinya YamakawaAtsushi BanMasaya OkamotoHiroyuki Ohgami
    • Yoshihiro OkadaYuichi SaitoShinya YamakawaAtsushi BanMasaya OkamotoHiroyuki Ohgami
    • H01L21/336H01L33/02
    • H01L29/78603G02F1/1362H01L27/124H01L27/1288H01L29/66765
    • An active matrix substrate includes base substrate, gate lines, data lines, thin-film transistors and pixel electrodes. The gate lines are formed on the base substrate. The data lines are formed over the gate lines. Each of the data lines crosses all of the gate lines with an insulating film interposed therebetween. The thin-film transistors are formed over the base substrate. Each of the thin-film transistors is associated with one of the gate lines and operates responsive to a signal on the associated gate line. Each of the pixel electrodes is associated with one of the data lines and one of the thin-film transistors and is electrically connectable to the associated data line by way of the associated thin-film transistor. Each of the pixel electrodes and the associated thin-film transistor are connected together by way of a conductive member. Each of the pixel electrodes crosses one of the gate lines, while the conductive member for the pixel electrode crosses another one of the gate lines that is adjacent to the former gate line.
    • 有源矩阵基板包括基底,栅线,数据线,薄膜晶体管和像素电极。 栅极线形成在基底基板上。 数据线形成在栅极线上。 每条数据线与绝缘膜相交,跨越所有栅极线。 薄膜晶体管形成在基底基板上。 每个薄膜晶体管与一条栅极线路相关联,并且响应于相关联的栅极线上的信号而工作。 每个像素电极与数据线之一和薄膜晶体管中的一个相关联,并且可通过相关联的薄膜晶体管电连接到相关联的数据线。 每个像素电极和相关联的薄膜晶体管通过导电构件连接在一起。 每个像素电极与一条栅极线交叉,而用于像素电极的导电构件与另一条与前一栅极线相邻的栅极线交叉。
    • 36. 发明授权
    • Production methods of pattern thin film, semiconductor element, and circuit substrate, and resist material, semiconductor element, and circuit substrate
    • 图案薄膜,半导体元件和电路基板以及抗蚀剂材料,半导体元件和电路基板的制造方法
    • US07858415B2
    • 2010-12-28
    • US11918398
    • 2006-01-31
    • Yuichi SaitoTakeshi Hara
    • Yuichi SaitoTakeshi Hara
    • H01L21/84
    • H01L27/1285H01L27/1288H01L27/1292
    • The present invention provides production methods of a pattern thin film, a semiconductor element and a circuit substrate, capable of eliminating the number of photolithography processes needed for patterning; and a semiconductor element, a circuit substrate, and an electron device obtained by the production methods. The production method of the pattern thin film of the present invention is a production method of a pattern thin film, comprising the steps of: forming a first resist pattern film on a thin film formed on a substrate; forming a second resist pattern film; patterning the thin film using at least the second resist pattern film, wherein in the step of forming the second resist pattern film, a fluid resist material or an organic solvent is applied on a groove of a bank pattern formed using the first resist pattern film.
    • 本发明提供了能够消除图案化所需的光刻处理次数的图案薄膜,半导体元件和电路基板的制造方法; 以及通过制造方法得到的半导体元件,电路基板和电子元件。 本发明的图案薄膜的制造方法是图案薄膜的制造方法,包括以下工序:在形成于基板上的薄膜上形成第一抗蚀剂图案膜; 形成第二抗蚀剂图案膜; 使用至少第二抗蚀剂图案膜对薄膜进行图案化,其中在形成第二抗蚀剂图案膜的步骤中,将流体抗蚀剂材料或有机溶剂施加到使用第一抗蚀剂图案膜形成的堤形图案的凹槽上。
    • 39. 发明授权
    • Active matrix substrate, method of making the substrate, and display device
    • 有源矩阵基板,制造基板的方法和显示装置
    • US07459723B2
    • 2008-12-02
    • US11450810
    • 2006-06-08
    • Yoshihiro OkadaYuichi SaitoShinya YamakawaAtsushi BanMasaya OkamotoHiroyuki Ohgami
    • Yoshihiro OkadaYuichi SaitoShinya YamakawaAtsushi BanMasaya OkamotoHiroyuki Ohgami
    • H01L29/04H01L31/036H01L31/0376H01L31/20
    • H01L29/78603G02F1/1362H01L27/124H01L27/1288H01L29/66765
    • An active matrix substrate includes base substrate, gate lines, data lines, thin-film transistors and pixel electrodes. The gate lines are formed on the base substrate. The data lines are formed over the gate lines. Each of the data lines crosses all of the gate lines with an insulating film interposed therebetween. The thin-film transistors are formed over the base substrate. Each of the thin-film transistors is associated with one of the gate lines and operates responsive to a signal on the associated gate line. Each of the pixel electrodes is associated with one of the data lines and one of the thin-film transistors and is electrically connectable to the associated data line by way of the associated thin-film transistor. Each of the pixel electrodes and the associated thin-film transistor are connected together by way of a conductive member. Each of the pixel electrodes crosses one of the gate lines, while the conductive member for the pixel electrode crosses another one of the gate lines that is adjacent to the former gate line.
    • 有源矩阵基板包括基底,栅线,数据线,薄膜晶体管和像素电极。 栅极线形成在基底基板上。 数据线形成在栅极线上。 每条数据线都插入绝缘膜,与所有栅极线交叉。 薄膜晶体管形成在基底基板上。 每个薄膜晶体管与一条栅极线路相关联,并且响应于相关联的栅极线上的信号而工作。 每个像素电极与数据线之一和薄膜晶体管中的一个相关联,并且可通过相关联的薄膜晶体管电连接到相关联的数据线。 每个像素电极和相关联的薄膜晶体管通过导电构件连接在一起。 每个像素电极与一条栅极线交叉,而用于像素电极的导电构件与另一条与前一栅极线相邻的栅极线交叉。
    • 40. 发明授权
    • Vortex flow meter
    • 涡街流量计
    • US07409872B2
    • 2008-08-12
    • US11647041
    • 2006-12-28
    • Nobuyuki IshikawaYuichi Saito
    • Nobuyuki IshikawaYuichi Saito
    • G01F1/32
    • G01F1/3209G01F1/3245G01F15/006
    • It is an object to provide a vortex flow meter with less measurement errors caused by a temperature change, a pressure change, and a mechanical vibration, and capable of performing a precise measurement regardless of conditions, in addition, to provide a vortex flow meter capable of sufficiently preventing corrosive chemicals that is a fluid to be measured from leaking from a measurement pipe line due to corrosion.A vortex generator that generates the Karman vortex and a measurement pipe line in which a holder body housing a detecting element that detects an alternating force of the Karman vortex is disposed are made of a material having a small coefficient of linear thermal expansion such as a quartz glass, and the vortex generator and the holder body are fixed to the measurement pipe line by welding in an integrating manner.
    • 本发明的目的是提供一种涡流流量计,其具有由温度变化,压力变化和机械振动引起的较小的测量误差,并且能够执行精确的测量,而不管条件如何,另外还提供了一种能够提供的涡流流量计 足以防止作为测量流体的腐蚀性化学品由于腐蚀而从测量管线泄漏。 产生卡曼涡流的涡流发生器和设置有检测卡曼涡流的交替力的检测元件的保持体的测量管线由具有小的线性热膨胀系数的材料制成,例如石英 玻璃,并且涡流发生器和保持器主体通过以积分的方式进行焊接而固定到测量管线。