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    • 32. 发明授权
    • Process for producing flaky titanium oxide capable of absorbing visible light
    • 能够吸收可见光的片状氧化钛的制造方法
    • US07651675B2
    • 2010-01-26
    • US11662504
    • 2005-09-13
    • Taki MatsumotoNobuo IyiYoshiro KanekoKenji Kitamura
    • Taki MatsumotoNobuo IyiYoshiro KanekoKenji Kitamura
    • C01G23/047C01G25/00
    • C09C1/0018B01J21/063B01J27/24B01J35/004B01J37/036C01G23/053C01P2002/72C01P2002/82C01P2002/84C01P2004/03C09C1/3607
    • When titanium oxide is doped with nitrogen, the resulting titanium oxide photocatalyst can be driven with visible light, which is a main component of sunlight. However, in a known process, since a high-temperature heat treatment process necessary for nitrogen doping degrades the photocatalytic activity inherent in titanium oxide, it is difficult to produce a titanium oxide photocatalyst that can be driven with a high efficiency under sunlight.A titania/organic substance composite, which includes an organic ligand coordinated to flaky titania and forms a layered structure, is immersed in aqueous ammonia to substitute the organic ligand between layers with a hydroxyl group by a ligand exchange reaction, and at the same time, to introduce ammonium into between layers of the titania having the layered structure. The resulting composite of titania and ammonium is heated at a temperature of 400° C. or higher and in such a temperature range that does not cause rutile transition, whereby nitrogen is doped into the titania by thermal decomposition of the ammonium and, in addition, titania is crystallized to an anatase form.
    • 当氧化钛掺杂氮时,所得到的氧化钛光催化剂可以作为阳光的主要成分的可见光驱动。 然而,在已知的方法中,由于氮掺杂所需的高温热处理工艺降低了氧化钛中固有的光催化活性,因此难以生产能够在阳光下以高效率驱动的氧化钛光催化剂。 将包含与片状二氧化钛配位并形成层状结构的有机配体的二氧化钛/有机物复合体浸渍在氨水中,通过配体交换反应将羟基的层间的有机配体取代, 以将铵引入具有层状结构的二氧化钛的层之间。 将所得的二氧化钛和铵的复合物在400℃以上的温度下加热,并且在不引起金红石转变的温度范围内,通过铵的热分解将氮掺杂到二氧化钛中,另外, 二氧化钛结晶成锐钛矿形式。
    • 36. 发明授权
    • Semiconductor device
    • 半导体器件
    • US06740935B2
    • 2004-05-25
    • US10195339
    • 2002-07-15
    • Kenji Kitamura
    • Kenji Kitamura
    • H01L2362
    • H01L21/76218H01L21/823807H01L21/823842H01L21/823878H01L2924/0002H01L2924/00
    • A semiconductor device has a gate-insulating film formed on a semiconductor substrate. Gate electrodes comprised of P- and N-type polysilicon thin films and thin conductive films are formed over the gate-insulating film. The P- and N-type polysilicon thin films are doped with impurities at an impurity concentration sufficient to prevent depletion layers from being formed in the P- and N-type polysilicon thin films when a voltage is applied between each of the conductive thin films and the semiconductor substrate. Source and drain regions are formed over the semiconductor substrate in spaced-apart relation to one another and on opposite sides of the gate electrodes.
    • 半导体器件具有形成在半导体衬底上的栅极绝缘膜。 在栅极绝缘膜上形成由P型和N型多晶硅薄膜构成的栅电极和薄导电膜。 P型和N型多晶硅薄膜掺杂有杂质浓度的杂质,其杂质浓度足以防止当在每个导电薄膜和/或多晶硅薄膜之间施加电压时在P型和N型多晶硅薄膜中形成耗尽层 半导体衬底。 源极和漏极区域形成在半导体衬底上彼此间隔开并且在栅电极的相对侧上。
    • 38. 发明授权
    • Damping force generator
    • 阻尼力发电机
    • US06499572B2
    • 2002-12-31
    • US09813322
    • 2001-03-21
    • Tatsuya MasamuraKenji Kitamura
    • Tatsuya MasamuraKenji Kitamura
    • F16F934
    • F16F9/348F16F9/3235F16F9/3485
    • In a damping force generator for a hydraulic damper, the valve is protected from pressure rise in the damper and its durability is thereby enhanced. The damping force characteristics can be vary in stepwise fashion by providing a main leaf valve 21 and a sub-leaf valve which closes an opening 21A formed in the main leaf valve 21, and the approximate mid-point of the main leaf valve 21 is supported by a plurality of intermediate seat surfaces 16 from the side of a port 13. The outer circumference of a main leaf valve 64 is supported by an outer circumferential seat surface 62, and the outer circumference of a sub-leaf valve 65 extends outwards to the vicinity of a part where the outer circumference of the main leaf valve 64 and the outer circumferential seat surface 62 overlap.
    • 在用于液压阻尼器的阻尼力发生器中,阀被保护以防止阻尼器中的压力升高,从而增强其耐用性。 阻尼力特性可以通过设置主叶片阀21和闭合形成在主叶片阀21中的开口21A的副叶片阀而逐步地变化,并且主叶片阀21的近似中点被支撑 通过从端口13侧的多个中间座位表面16构成。主叶片阀64的外周由外圆周座表面62支撑,副叶片阀65的外周向外延伸至 主叶片阀64和外周座表面62的外周重叠的部分附近。
    • 40. 发明授权
    • Semiconductor device and method of manufacturing the same
    • 半导体装置及其制造方法
    • US06369409B1
    • 2002-04-09
    • US08689867
    • 1996-08-15
    • Hiroaki TakasuJun OsanaiKenji Kitamura
    • Hiroaki TakasuJun OsanaiKenji Kitamura
    • F02K900
    • H01L28/20H01L21/8221H01L21/84H01L27/0802H01L27/1203
    • It is an object to provide a highly precise bleeder resistance circuit having an accurate voltage division ratio and a small temperature coefficient of the resistance value and a highly precise semiconductor device having a small temperature coefficient using such a bleeder resistance circuit, e.g., a semiconductor device such as a voltage detector and a voltage regulator. Such characteristic features that the potential of electric conductors on the thin film resistors and electric conductors under the thin film resistors of a bleeder resistance circuit using thin film resistors is made almost equal to the potential of respective thin film resistors and that, when polysilicon is used in the thin film resistor, the dispersion of the resistance value is controlled and the temperature dependency of the resistance value is made lower by thinning the film thickness of the polysilicon thin film resistor are constituted.
    • 本发明的目的是提供具有精确的分压比和较小的电阻值温度系数的高精度放电电阻电路,以及使用这种泄放电阻电路(例如半导体器件)具有较小温度系数的高精度半导体器件 例如电压检测器和电压调节器。 使用薄膜电阻器的泄放电阻电路的薄膜电阻器和薄膜电阻器下方的电导体的电位与各薄膜电阻器的电位几乎相等的特征在于,当使用多晶硅时 在薄膜电阻器中,控制电阻值的分散,并且通过使多晶硅薄膜电阻器的膜厚变薄来降低电阻值的温度依赖性。