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    • 31. 发明授权
    • Method and apparatus for inspecting patterns
    • 检查模式的方法和装置
    • US06888958B1
    • 2005-05-03
    • US09538398
    • 2000-03-29
    • Eiji SawaHiromu InoueSatoshi Imi
    • Eiji SawaHiromu InoueSatoshi Imi
    • G06K9/00G06K9/36G06K9/62G06T7/00
    • G06T7/001G06T7/32
    • The difference data between the real patter data Sij, and a 5×5 window with a noticed pixel in the center and the design pattern data Rij obtained by the design pattern data of the window being shifted in a plurality of directions with respect to the design pattern data Rij is found by a shift direction operation section, and the design pattern data in the direction in which the total of the pixels is minimum is selected from the difference data by a selection section, the difference between the central pixels Sij, Qij of the selected design pattern data and the central pixels Sij, Qij of the windows of the real pattern data is found by a difference operation section, and the difference and a threshold are compared in a defect judgement section, and thereby the pattern inspection of the object is carried out.
    • 实际图形数据Sij和中心处的注意像素的5×5窗口与通过相对于设计图案数据在多个方向上偏移的窗口的设计图案数据获得的设计图案数据Rij之间的差分数据 通过移位方向操作部分找到Rij,并且通过选择部分从差分数据中选择像素总数最小的方向上的设计图案数据,所选择的中心像素Sij,Qij之间的差异 设计图案数据和实际图案数据的窗口的中心像素Sij,Qij由差异运算部分找到,并且在缺陷判断部分比较差异和阈值,从而携带对象的图案检查 出来